Kaplan, Stephen L., Robert Holland. Gas Plasma Technology and Its Applications. Plasma Science pp. 3-5, 8, 1987.* |
Database WPI, Sec. PQ, Week 9628/, Derwent Pub., Ltd., London, GB; C1. Q43, AN 96-273108-XP002078170 & JP 08 113988 A (Ishika Wajima Kenzai Kogyo KK), May 7, 1996—Abstract. |
Database WPI, Sec. Ch, Week 9227, Derwent Pub., Ltd., London, GB; C1. A14, AN 92-222300 XP002078658 & JP 04 146132 A (Nippon Carbide Kogyo KK), May 20, 1992—Abstract. |
Database WPI, Sec. Ch, Week 8415, Derwent Pub., Ltd., London, GB; C1. A17, An 84-091660 XP002078171 & JP 59 038269 A (Sumitomo Chem. Co., Ltd) Mar. 2, 1984—Abstract. |
Database WPI, Sec. Ch, Week 9041, Derwent Pub., Ltd., London, GB: C1. A88, AN 90-308686 XP002078172 & JP 02 217684 (Nitto Denko Corp), Aug. 30, 1990, Abstract. |
Database WPI, Sec. Ch, Week 8138 Derwent Pub., Ltd., London, GB; C1. A26, AN-68689D XP002078173 & JP 56 095976 A (Toray Silicone Co. Ltd.), Aug. 3, 1981, Abstract. |
Database WPI, Sec. Ch, Week 9403, Derwent Pub., Ltd., London, GB; C1. A25, AN 94-018661 XP002078174 & JP 05 320621 A (Sekisui Chem Ind. Co. Ltd.), Dec. 3, 1993, Abstract. |