Secondary Ion Mass Spectrometer (SIMS) Analysis of Defects in Semiconductors

Information

  • NSF Award
  • 8860839
Owner
  • Award Id
    8860839
  • Award Effective Date
    1/1/1989 - 36 years ago
  • Award Expiration Date
    9/30/1989 - 35 years ago
  • Award Amount
    $ 49,766.00
  • Award Instrument
    Standard Grant

Secondary Ion Mass Spectrometer (SIMS) Analysis of Defects in Semiconductors

Traditional methods for characterizing defects in semiconductors are not entirely adequate at the VLSI/ULSI level of integration. SIMS coupled with defect decoration by a SIMS-sensitive element is proposed as a complementary method. The objectives of this Phase I project are: (1) to determine how well SIMS can detect oxygen precipitates, dislocation loops, and stacking faults in silicon when a SIMS-sensitive element is used to decorate the defects; and (2) to determine the quantitative relationship between the SIMS measurement of the decorative element and the defect density and size. The primary decorative element to be studied is fluorine.

  • Program Officer
    Darryl G. Gorman
  • Min Amd Letter Date
    11/16/1988 - 36 years ago
  • Max Amd Letter Date
    11/16/1988 - 36 years ago
  • ARRA Amount

Institutions

  • Name
    Charles Evans & Associates
  • City
    Redwood City
  • State
    CA
  • Country
    United States
  • Address
    301 Chesapeake Drive
  • Postal Code
    940634723
  • Phone Number
    4153694567

Investigators

  • First Name
    Richard
  • Last Name
    Hockett
  • Start Date
    1/1/1989 12:00:00 AM