Claims
- 1. A nanostructure, comprising:
a free-standing, helical semiconductor oxide nanostructure including a nanobelt having a substantially rectangular cross-section, wherein the nanobelt is about 5 nanometers to about 200 nanometers in width and about 3 nanometers to about 50 nanometers in height, and wherein the radius of the helical semiconductor oxide nanostructure is about 200 to 5000 nanometers.
- 2. The nanostructure of claim 1, wherein the semiconductor oxide is chosen from oxides of zinc, cadmium, mercury, gallium, indium, tellurium, germanium, tin, and lead.
- 3. The nanostructure of claim 1, wherein the semiconductor oxide is zinc oxide.
- 4. The nanostructure of claim 1, wherein the nanobelt is a single crystalline structure.
- 5. The nanostructure of claim 1, wherein the nanobelt is a polar surface dominated zinc oxide nanobelt.
- 6. The nanostructure of claim 1, wherein the nanobelt includes polarized +(000 1) facets.
- 7. The nanostructure of claim 1, wherein the nanobelt has a substantially uniform width along the length of the free-standing helical semiconductor oxide nanostructure.
- 8. The nanostructure of claim 1, wherein the semiconductor oxide is zinc oxide, wherein the nanobelt has a top ±(0001) surface, bottom ±(0001) surface, a right side ±(10 {overscore (1)} 0) surface, and a left side ±(10 {overscore (1)} 0) surface.
- 9. The nanostructure of claim 1, wherein the semiconductor oxide is zinc oxide, wherein the nanobelt is described by characteristics selected from an interior (0001)-Zn surface and an exterior (000 {overscore (1)})-O surface, and an interior surface (000 {overscore (1)})-O and exterior surface (0001)-Zn.
- 10. A nanostructure comprising:
a free-standing semiconductor oxide nanoring, wherein the nanoring has a radius of about 500 to 10,000 nanometers, a height of about 5 to 2000 nanometers, and a width of about 50 to 7500 nanometers.
- 11. The nanostructure of claim 10, wherein the semiconductor is chosen from ZnS, GaN, CdSe, and oxides of zinc, cadmium, gallium, indium, tin, lead, and, and combinations thereof.
- 12. The nanostructure of claim 10, wherein the semiconductor oxide is zinc oxide.
- 13. The nanostructure of claim 12, wherein the nanoring includes a nanobelt having a substantially rectangular cross-section, wherein the nanobelt is about 5 nanometers to about 200 nanometers in width and about 3 nanometers to about 50 nanometers in height.
- 14. The nanostructure of claim 13, wherein the nanoring includes about 1 to 250 loops of the nanobelt.
- 15. The nanostructure of claim 13, wherein the semiconductor oxide is zinc oxide, and wherein the nanobelt includes a top ±(0001) surface, a bottom ±(0001) surface, a right side ±(1 {overscore (2)} 10) surface, and a left side ±(1 {overscore (2)} 10) surface.
- 16. The nanostructure of claim 13, wherein the semiconductor oxide is zinc oxide, wherein the nanobelt has an interior (0001)-Zn surface and an exterior ±(000 {overscore (1)})-O surface.
- 17. The nanostructure of claim 11, wherein the nanoring is a single crystalline structure.
- 18. A method of preparing nanostructures comprising:
exposing a homogeneous metal oxide powder mixture to thermal conditions of about 900 to 1600° C. at a pressure of about 10−3 to 10−2 torr for about 5 to 100 minutes; flowing an inert gas over the homogeneous metal oxide powder mixture; and forming a free-standing semiconductor oxide nanostructure via a condensation reaction at a pressure of about 50 to 800 torr and at thermal conditions of about 100 to 700° C., each of the free-standing semiconductor oxide nanostructures having a substantially rectangular cross-section.
- 19. The method of claim 18, wherein the homogeneous metal oxide powder mixture is selected from zinc oxide, lithium oxide, lithium carbonate, indium oxide, gallium oxide, and combinations thereof.
- 20. The method of claim 18, wherein the free-standing semiconductor oxide nanostructure is a free-standing, helical semiconductor oxide nanostructure including a nanobelt having a substantially rectangular cross-section, wherein the nanobelt is about 5 nanometers to about 200 nanometers in width and about 3 nanometers to about 50 nanometers in height, and wherein the radius of the helical semiconductor oxide nanostructure is about 200 to 5000 nanometers.
- 21. The method of claim 18, wherein the free-standing semiconductor oxide nanostructure is a free-standing semiconductor oxide nanoring, wherein the nanoring has a radius of about 500 to 10,000 nanometers, a height of about 5 to 2000 nanometers, and a width of about 50 to 7500 nanometers.
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application is a continuation-in-part of and claims priority to copending U.S. utility application entitled, “Semiconducting Oxide Nanostructures,” having Ser. No. 10/216,696, filed on Aug. 8, 2002, which is a divisional application of U.S. Pat. No. 6,586,095 entitled “Semiconducting Oxide Nanostructures,” having Ser. No. 10/042,868, filed on Jan. 8, 2002, which claimed priority to copending U.S. provisional application entitled, “Semiconductive Oxide Nanobelts,” having ser. No. 60/261,367, filed Jan. 12, 2001, which is entirely incorporated herein by reference.
Provisional Applications (1)
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Number |
Date |
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60261367 |
Jan 2001 |
US |
Divisions (1)
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Number |
Date |
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Parent |
10042868 |
Jan 2002 |
US |
Child |
10216696 |
Aug 2002 |
US |
Continuation in Parts (1)
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Number |
Date |
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Parent |
10216696 |
Aug 2002 |
US |
Child |
10756913 |
Jan 2004 |
US |