Semiconductor deposition reactor ring

Information

  • Patent Grant
  • D1028913
  • Patent Number
    D1,028,913
  • Date Filed
    Wednesday, June 30, 2021
    3 years ago
  • Date Issued
    Tuesday, May 28, 2024
    11 months ago
  • US Classifications
    Field of Search
    • US
    • D13 123
    • D13 154
    • D13 173
    • D13 178
    • D13 182
    • D13 184
    • D13 199
    • D08 353
    • D08 354
    • D08 366
    • D08 371
    • D08 381
    • CPC
    • H01M10/46
    • H01M10/425
    • H01M2/1022
    • H01R24/00
    • H01R12/592
    • H01R4/2433
    • H01R112/716
    • H01R13/6461
    • H01R13/506
    • H01R13/639
    • H01R13/5837
    • H01R13/6594
    • H01R13/16582
    • H02J7/0003
    • H02J7/0013
    • H02J7/044
    • H02J7/0045
    • H02J201/006
    • H05B3/143
    • H01L21/02
    • H01L21/64
    • H01L21/67
    • H01L21/68
    • C30B25/10
    • C23C16/44
    • C23C16/45
    • C23C16/4582
    • C23C16/4583
    • C23C16/4586
  • International Classifications
    • 1303
    • Term of Grant
      15Years
Abstract
Description


FIG. 1 is a top perspective view of a semiconductor deposition reactor ring;



FIG. 2 is a bottom perspective view thereof;



FIG. 3 is a front view thereof;



FIG. 4 is a back view thereof;



FIG. 5 is a left view thereof;



FIG. 6 is a right view thereof;



FIG. 7 is a top view thereof; and,



FIG. 8 is a bottom view thereof.


The broken lines in the drawings illustrate portions of the semiconductor deposition reactor ring that form no part of the claimed design.


Claims
  • The ornamental design for a semiconductor deposition reactor ring, as shown and described.
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Entry
International Search Report and Written Opinion dated Mar. 30, 2010, in counterpart International Appl. No. PCT/US2009/044734, 11 pages.