This application is based upon and claims the benefit of priority from prior Japanese Patent Application No. 2005-113483, filed Apr. 11, 2005, the entire contents of which are incorporated herein by reference.
1. Field of the Invention
The present invention relates to a semiconductor device such as a variable capacitor or switch formed by using a micromachining, or MEMS, (Micro-Electro-Mechanical Systems) technique.
2. Description of the Related Art
A variable capacitor or switch manufactured by using the MEMS technique is advantageous over that using a PIN diode or FET in that, for example, the loss is small (the Q value is large) and distortion is small. Such devices are therefore expected to be mounted in next-generation cellular phones.
As driving schemes for these MEMS variable capacitors and switches, an electrostatic type scheme, piezoelectric type scheme, thermal type scheme, electromagnetic type scheme, and the like are used. Of these schemes, the thermal type scheme and electromagnetic type scheme consume high power and hence are not suitable to be mounted in portable devices. In contrast, the electrostatic type scheme (see, for example, U.S. Pat. No. 5,578,976) consumes low power but has the following drawbacks:
i) The driving voltage is high.
ii) Sticking occurs due to charge trapping by an insulating film.
In a MEMS variable capacitor with an inter-electrode distance of about 1 μm, in order to make the electrodes contact with each other by using electrostatic attraction, a high voltage of about 20V is required. Since this voltage is higher than the power supply voltage of a cellular phone system, a component or circuit which generates a high voltage is required, resulting in an increase in cost. In addition, as a high voltage is generated, the power consumption increases. It is known that in an electrostatic type variable capacitor or switch, charge is trapped in the insulating film between electrodes owing to this high voltage. The amount of charge trapped by one switching operation is small. However, as switching is repeated, a large amount of charge is stored, and the pull-out voltage shifts. If this shift amount becomes large, the electrodes are kept in contact with each other and do not separate from each other (sticking). It is known that such sticking occurs when switching is repeated 106 times or more.
In contrast, a piezoelectric type variable capacitor or switch can be driven by a low voltage of 5V or lower, and the power consumption is low (see, for example, H. C. Lee et al., “Silicon Bulk Micromachined RF MEMS Switches with 3.5 Volts Operation by using Piezoelectric Actuator”, MTT-S Digest, pp. 585-588, 2004). However, since the driving force is weak, the contact force is about 10 μN, which is 1/10 that of an electrostatic type device. The following problems therefore arise:
iii) In a MEMS switch, the contact resistance is high.
iv) In a MEMS variable capacitor, the adhesion between electrodes is poor (Even if the electrodes have minute recesses or warpage, strong driving force can bring the electrodes into tight contact with each other. If the driving force is weak, the electrodes cannot be brought into tight contact with each other, resulting in a reduction in variable width.)
As described above, electrostatic type and piezoelectric type variable capacitors and switches are suitable to be mounted in portable devices as compared with thermal type and electromagnetic type devices, but have both merits and demerits in terms of characteristics and functions associated with driving voltage, sticking, contact resistance, the adhesion between electrodes, and the like. None of them are sufficient, are required to be improved.
According to an aspect of the present invention, there is provided a semiconductor device comprising an elastic member having one end which is fixed on a substrate through an anchor so as to form a gap between the one end and the substrate and is deformed to change a distance between the substrate and the other end of the elastic member, a first electrode which is placed at the other end of the elastic member, a second electrode which is placed on the substrate so as to face the first electrode, a piezoelectric actuator which is placed in the elastic member and is deformed to bring the other end of the elastic member close to the substrate, and an electrostatic actuator which includes a third electrode placed in the elastic member and a fourth electrode placed on the substrate so as to face the third electrode and is deformed to bring the other end of the elastic member close to the substrate, wherein a distance between the first electrode and the second electrode is changed by driving the piezoelectric actuator and the electrostatic actuator.
According to another aspect of the present invention, there is provided a semiconductor device comprising an elastic member having two ends which are fixed on a substrate through a first anchor and second anchor so as to form a gap in a middle portion and is deformed to change a distance between the middle portion and the substrate, a first electrode which is placed at the middle portion of the elastic member, a second electrode which is placed on the substrate so as to face the first electrode, a first piezoelectric actuator and a second piezoelectric actuator which are placed in the elastic member with the first electrode being placed therebetween and deform the middle portion of the elastic member so as to bring the middle portion close to the substrate, and an electrostatic actuator which includes a third electrode and fourth electrode placed in the elastic member with the first electrode being placed therebetween, and a fifth electrode and sixth electrode placed on the substrate to face the third electrode and the fourth electrode, and deforms the middle portion of the elastic member to bring the middle portion close to the substrate, wherein a distance between the first electrode and the second electrode is changed by driving the first piezoelectric actuator and second piezoelectric actuator and the first electrostatic actuator and second electrostatic actuator.
FIGS. 1 to 3 are views for explaining a semiconductor device according to the first embodiment of the present invention.
The variable capacitor unit 11 comprises an upper electrode 21 formed in the elastic member 15 and lower electrodes 22 and 23 formed on the substrate 10. The upper electrode 21 is a floating electrode. When this electrode is driven by the actuator units 12-1, 12-2, 13-1, and 13-2, the inter-electrode distance changes. When the upper electrode 21 of the variable capacitor unit 11 is lowered by the actuator units 12-1, 12-2, 13-1, and 13-2, the upper electrode 21 moves close to the lower electrodes 22 and 23. As a result, the lower electrodes 22 and 23 are capacitively coupled to each other. While the upper electrode 21 is located at the upper position, a gap of about 1.5 μm is formed between the upper electrode 21 and an insulating film 33. In this state, the capacitance between the lower electrodes 22 and 23 is negligibly small. As described above, moving the upper electrode 21 up and down makes it possible to form a digital variable capacitor whose capacitive value changes in a binary manner.
A hybrid-type actuator which controls the inter-electrode distance of the variable capacitor unit 11 will be described next. The above electrostatic actuator units 12-1 and 12-2 are arranged on the two sides of the variable capacitor unit 11, and are comprised of upper electrodes 25-1 and 25-2 and lower electrodes 26-1 and 26-2, respectively. The piezoelectric actuator units 13-1 and 13-2 are respectively provided between the electrostatic actuator units 12-1 and 12-2 and the anchors 27-1 and 27-2 on the two sides. The piezoelectric actuator units 13-1 and 13-2 include piezoelectric films 28-1 and 28-2 and upper electrodes 29-1 and 29-2 and lower electrodes 30-1 and 30-2 which are respectively arranged to sandwich piezoelectric films 28-1 and 28-2. As a material for the piezoelectric films 28-1 and 28-2, AlN, PZT, or the like is used.
The insulating film 31 is formed on the upper electrode 21 of the variable capacitor unit 11, the upper electrodes 25-1 and 25-2 of the electrostatic actuator units 12-1 and 12-2, and the upper electrodes 29-1 and 29-2 of the piezoelectric actuator units 13-1 and 13-2. An insulating film 32 is formed under the lower electrodes 30-1 and 30-2 of the piezoelectric actuator units 13-1 and 13-2. The lower electrodes 22 and 23 of the variable capacitor unit 11 and the lower electrodes 26-1 and 26-2 of the electrostatic actuator units 12-1 and 12-2 are formed on an insulating film 34 formed on the substrate 10. The insulating film 33 is formed on the lower electrodes 22, 23, 26-1, and 26-2.
In the above arrangement, when a potential difference is applied between the upper electrodes 29-1 and 29-2 and lower electrodes 30-1 and 30-2 of the piezoelectric actuator units 13-1 and 13-2, the piezoelectric films 28-1 and 28-2 are displaced, and the other end of the elastic member 15 is displaced downward. As the piezoelectric actuator units 13-1 and 13-2, either unimorph type actuators or bimorph type actuators can be used. When the upper electrodes 21, 25-1, and 25-2 are displaced downward by applying the first potential difference between the upper electrodes 29-1 and 29-2 and lower electrodes 30-1 and 30-2 of the piezoelectric actuator units 13-1 and 13-2, the upper electrodes 25-1 and 25-2 move close to the lower electrodes 26-1 and 26-2. In this state, the second potential difference is applied between the upper electrodes 25-1 and 25-2 and the lower electrodes 26-1 and 26-2. The second potential difference may be equal to the first potential difference or may be smaller or larger than the first potential difference. This displaces the upper electrode 21 of the variable capacitor unit 11 downward, and the distance between the upper electrode 21 and the lower electrodes 22 and 23 decreases. As a consequence, the capacitive value changes in a binary manner.
The upper electrode 21 of the variable capacitor unit 11 can be displaced upward and restored to the initial state by eliminating the potential difference between the piezoelectric actuator units 13-1 and 13-2 after or at the same time as eliminating the potential difference between the electrostatic actuator units 12-1 and 12-2.
In the above arrangement, since the displacement amounts of the piezoelectric actuator units 13-1 and 13-2 are large, this device can be operated even if the first potential difference is 5V or less. In general, in order to drive the electrostatic actuator units 12-1 and 12-2, a high potential difference of 20V or more is required. In this embodiment, the electrostatic actuator units 12-1 and 12-2 are driven while the inter-plate distance (inter-electrode distance) is shortened by driving the piezoelectric actuator units 13-1 and 13-2. Since the electrostatic attraction between the plates is proportional to the square of the reciprocal of the inter-plate distance, even if, therefore, the potential difference between the electrodes is equal to or lower than the first potential difference, sufficiently strong electrostatic attraction can be obtained. This makes it possible to ensure high adhesion between the upper electrode 21 and lower electrodes 22 and 23 of the variable capacitor unit 11.
In the arrangement of this embodiment, since the potential difference between the plates of the electrostatic actuator units 12-1 and 12-2 is small, charge trapping does not easily occur in the insulating film 33. This allows to increase the number of times of switching as compared with the prior art.
In addition, windows 14 formed in the variable capacitor unit 11 and electrostatic actuator units 12-1 and 12-2 in
In this embodiment, the lower electrodes 30-1 and 30-2 of the electrostatic actuator units 12-1 and 12-2 are short-circuited (connected) to the upper electrodes 25-1 and 25-2 of the electrostatic actuator units 12-1 and 12-2. However, substantially the same functions and effects as those of the above arrangement can be obtained even if the upper electrodes 29-1 and 29-2 for piezoelectric driving are short-circuited to the upper electrodes 25-1 and 25-2 of the electrostatic actuator units 12-1 and 12-2. In addition, the upper electrodes 25-1 and 25-2 and lower electrodes 30-1 and 30-2 of the electrostatic actuator units 12-1 and 12-2 may be independently controlled.
The variable capacitor of this embodiment described above is suitable to be used for the antenna matching circuit of a cellular phone, e.g., a cellular phone capable of receiving terrestrial digital broadcasts. Such an application example will be described below.
The matching circuit system 43 will be described in more detail next.
Terrestrial digital broadcasts are aired by using electric waves in the UHF band of 470 to 770 MHz (wavelengths of 63 cm to 39 cm). Since the wavelength of electric waves is long, when this terrestrial digital broadcast is to be received by a dipole antenna, the antenna needs to have a length of about 15 cm. As to recent cellular phones, great importance is especially attached to design, and hence it is required to minimize the length of an antenna. If possible, an antenna is preferably built into the housing of a cellular phone. If, however, the antenna is simply reduced in size, the bandwidth decreases, resulting in incapability of receiving signals with all frequencies of 470 to 770 MHz. In order to avoid this problem, the matching circuit 48 is provided to change the matching frequency in accordance with a desired program. The matching circuit 48 may be formed from, for example, a variable capacitor, and the matching frequency may be changed by changing the capacitive value of the variable capacitor.
Another problem in reducing the antenna size is that the antenna efficiency deteriorates. The antenna efficiency is determined by the radiation resistance of the antenna itself and the loss resistance that occurs between the antenna and the reception circuit and is expressed by
antenna efficiency=radiation resistance/(radiation resistance+loss resistance)
As the antenna is reduced in size, the radiation resistance decreases. Therefore, the antenna efficiency deteriorates unless the loss radiation decreases. If, for example, a PIN diode is used as the variable capacitor of the matching circuit 48, the antenna efficiency deteriorates because the loss resistance is large. In contrast, a MEMS device has a small loss resistance, which can be suppressed to 1Ω or less. If, therefore, a MEMS variable capacitor is used for the matching circuit 48, a compact antenna can be realized and can be built into the housing of a cellular phone.
On the basis of the above consideration, the matching circuit 48 in the matching circuit system 43 in
The fuse data fuse-i (i=1, . . . , n) is used as the capacitive value selection signal CSS to compensate for variations in the capacitive value of the MEMS variable capacitor and the effect of the parasitic capacitance of the matching circuit 48. The fuse data fuse-i is determined in the following manner in a test step. First of all, the capacitive value selection signal CSS is output to a test circuit 52 and is changed step by step until the capacitive value of the matching circuit 48 changes its minimum value to its maximum value. In this case, the capacitive value of the matching circuit 48 is monitored by a tester. The fuse data fuse-i in the driver 47 is then determined so as to realize a capacitive value corresponding to channel select information in accordance with this monitored value. The determination of this fuse data fuse-i is performed by, for example, laser blow.
Note that a nonvolatile memory may be used in place of a fuse.
In addition, if variations in the capacitive value of the MEMS variable capacitor and the effect of the parasitic capacitance of the matching circuit 48 are sufficiently small and need not be compensated for, the test circuit may be omitted, and the fuses may be replaced with ROMs (ROM-1, . . . , ROM-n).
For example,
Using the arrangement shown in FIGS. 1 to 3 as that of the digital variable capacitors (capacitors A3-1, . . . , A3-4) shown in
This semiconductor device comprises a variable capacitor unit 11, electrostatic actuator unit 12, and piezoelectric actuator unit 13. These units are formed in a structure formed such that one end of an elastic member 15 is fixed on a substrate (e.g., a silicon substrate) 10 with an anchor 27. A hollow 35′ is formed between the elastic member 15 and the substrate 10. When the piezoelectric actuator unit 13 and the electrostatic actuator unit 12 are driven, the other end (an upper electrode 21 of the variable capacitor unit 11) of the elastic member 15 deforms to move close to the substrate 10 (a lower electrode 22 of the variable capacitor unit 11), and the distance between the elastic member 15 and the substrate 10 changes.
The same reference numerals as in
That is, according to the second embodiment, the elastic member 15 is cantilevered. With such an arrangement as well, the device operates basically in the same manner as in the first embodiment, and substantially the same functions and effects as those in the first embodiment can be obtained.
With such an arrangement as well, the device operates basically in the same manner as in the first embodiment, and substantially the same functions and effects as those in the first embodiment can be obtained. In addition, the tensile stress of an elastic member 15 can be reduced and the capacitive value can be effectively changed with small force as compared with the case wherein the variable capacitor unit, electrostatic actuator units, and piezoelectric actuator units are arranged linearly.
Note that the elastic member 15 in the third embodiment may be cantilevered, as in the second embodiment.
With such an arrangement as well, the device operates basically in the same manner as in the first and third embodiments, and substantially the same functions and effects as those in the first and third embodiments can be obtained. In addition, since the flexure portions of the piezoelectric actuator units 13-1, 13-2, 13-3, and 13-4 serve as springs, the capacitive value can be effectively changed with small force.
Obviously, the elastic member 15 can be cantilevered as in the second embodiment.
In this semiconductor device, an upper electrode 21 of a variable capacitor unit 11 is not floating but is fixed with a contact 36. This makes it possible to apply a potential to the upper electrode 21 through the contact 36.
With such an arrangement as well, the device operates basically in the same manner as in the first embodiment, and substantially the same functions and effects as those in the first embodiment can be obtained. In addition, since the upper electrode 21 can be electrically fixed, the capacitance of the variable capacitor unit 11 can increase. Since it suffices to provide one lower electrode for the variable capacitor unit 11, the pattern occupying area can be reduced. Furthermore, grounding the upper electrode 21 in advance can prevent charge-up in a manufacturing process.
Obviously, the elastic member 15 can be cantilevered as in the second embodiment.
In the sixth embodiment, piezoelectric films 28-1 and 28-2, upper electrodes 29-1 and 29-2, and lower electrodes 30-1 and 30-2 of piezoelectric actuator units 13-1 and 13-2 are made to extend so as to face lower electrodes 26-1 and 26-2 of electrostatic actuator units 12-1 and 12-2. In other words, the lower electrodes 30-1 and 30-2 are used as the upper electrodes of the electrostatic actuator units 12-1 and 12-2.
With such an arrangement as well, the device operates basically in the same manner as in the first embodiment, and substantially the same functions and effects as those in the first embodiment can be obtained.
Obviously, the elastic member 15 can be cantilevered as in the second embodiment.
This semiconductor device comprises a switch unit 16, electrostatic actuator units 12-1 and 12-2, and piezoelectric actuator units 13-1 and 13-2. These units are formed in a structure such that the two ends of an elastic member 15 are fixed on a substrate (e.g., a silicon substrate) 10 with anchors 27-1 and 27-2. A hollow 35 is formed between the elastic member 15 and the substrate 10. When the piezoelectric actuator units 13-1 and 13-2 and the electrostatic actuator units 12-1 and 12-2 are driven, the middle portion (switch unit 16) of the elastic member 15 deforms to move close to the substrate 10, thereby turning on/off the switch.
The same reference numerals as in
That is, the variable capacitor unit 11 in
While the upper electrode 21 is located at the upper position, a gap of about 1.5 μm is formed between the upper electrode 21 and an insulating film 33 (switched off). By moving the upper electrode 21 up and down in this manner, the switch can be turned on/off.
Note that the elastic member 15 may be cantilevered as in the second embodiment. In addition, the electrostatic actuator units 12-1 and 12-2, the piezoelectric actuator units 13-1 and 13-2, and piezoelectric actuator units 13-3 and 13-4 may be arranged as in the third embodiment or may be arranged as in the fourth embodiment. Furthermore, obviously, as in the fifth embodiment, the upper electrode 21 can be fixed with a contact 36.
Various driving methods will be described by taking the variable capacitor as the semiconductor device according to the second embodiment as an example.
(First Driving Method)
With this operation, the upper electrode 21 of the variable capacitor unit 11 moves close to the lower electrodes 22 and 23 to increase the capacitive value.
The voltage waveforms at the terminals N1 and N2 in the timing chart of
(Second Driving Method)
In this case, PZT is used for the piezoelectric film 28. The thickness and composition of a PZT film are determined so as to invert the polarization at the voltage V1 or lower. This makes it possible to always displace the piezoelectric actuator unit 13 downward even if the direction of an electric field changes.
(Third Driving Method)
This can reduce the peak current value at switching and suppress a drop in power supply voltage. The above delay time td is set to, for example, 100 ns. Referring to
(Fourth Driving Method)
(Fifth Driving Method)
With this operation, the same effect as that in the second driving method can be expected with respect to the insulating film 33 of the electrostatic actuator unit 12. In addition, since the upper electrode 25 of the electrostatic actuator unit 12 is separated from the electrodes 29 and 30 of the piezoelectric actuator unit 13, AlN, which has no polarization inversion characteristic, can be used for the piezoelectric film 28.
The use of AlN reduces fatigue due to polarization inversion as compared with the case wherein PZT is used, and hence allows to increase the number of times of switching.
Note that a driving method based on a combination of some of the first to fifth driving methods may be used. Although the driving methods for the second embodiment have been exemplified, it is obvious that the present invention can be applied to the variable capacitors and switches of all the embodiments in the same manner.
Variable capacitors according to the embodiments of the present invention can be used for circuits other than antenna matching circuits, e.g., VCOs.
As described above, according to one aspect of this invention, a semiconductor device which can obtain large contact force with a low driving voltage can be obtained.
Additional advantages and modifications will readily occur to those skilled in the art. Therefore, the invention in its broader aspects is not limited to the specific details and representative embodiments shown and described herein. Accordingly, various modifications may be made without departing from the spirit or scope of the general inventive concept as defined by the appended claims and their equivalents.
Number | Date | Country | Kind |
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2005-113483 | Apr 2005 | JP | national |