Number | Date | Country | Kind |
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11-182648 | Jun 1999 | JP |
Number | Name | Date | Kind |
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5883418 | Kimura | Mar 1999 | A |
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K. Goto et al., “Leakage Mechanism and Optimized Conditions of Co Salicide Process for Deep-Submicron CMOS Devices”, Technical Digest Of IEEE International Electron Device Meeting 1995 (IEDM95), pp. 449-452, 1995. |