BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 shows a schematic structure of a semiconductor device according to a first embodiment of the invention.
FIGS. 2A-2C illustrate an MTCMOS circuit according to the first embodiment of the invention.
FIG. 3 shows an example of an arithmetic and logic unit forming a logic circuit group L1.
FIG. 4 illustrates a voltage level of a pseudo ground line of the MTCMOS circuit according to the first embodiment of the invention.
FIG. 5 illustrates an MTCMOS circuit according to a first modification of the first embodiment of the invention.
FIG. 6 illustrates another voltage supply control circuit according to the first modification of the first embodiment of the invention.
FIG. 7 illustrates a transistor according to the first modification of the first embodiment of the invention.
FIGS. 8A and 8B illustrate a transistor having a T-shaped gate.
FIGS. 9A and 9B illustrate a transistor having a partially trench-isolated structure.
FIGS. 10-14 illustrate MTCMOS circuits according to second to sixth modifications of the first embodiment of the invention, respectively.
FIG. 15 illustrates a voltage level of a pseudo ground line of the MTCMOS circuit according to the sixth modification of the first embodiment of the invention.
FIGS. 16 and 17 illustrate MTCMOS circuits according to seventh and eighth modifications of the first embodiment of the invention, respectively.
FIG. 18 illustrates a voltage level of a pseudo ground line of the MTCMOS circuit according to the eighth modification of the first embodiment of the invention.
FIGS. 19 and 20 illustrate MTCMOS circuits according to ninth and tenth modifications of the first embodiment of the invention, respectively.
FIGS. 21A, 21B and 21C illustrate a voltage supply control circuit according to an eleventh modification of the first embodiment of the invention.
FIG. 22 shows a schematic structure for partially illustrating a storage according to a second embodiment of the invention.
FIG. 23 illustrates a circuit structure of a memory cell according to the second embodiment of the invention.
FIG. 24 specifically illustrates a layout structure of a lower layer region of the memory cell according to the second embodiment of the invention.
FIGS. 25, 26 and 27 specifically illustrate layout structures in which first, second and third metal interconnection layers are formed at upper layer regions of the memory cell according to the second embodiment of the invention, respectively.
FIG. 28 illustrates a structure in which a voltage supply control circuit is arranged for a pseudo ground line of the memory cell according to the second embodiment of the invention.
FIG. 29 illustrates a voltage level of the pseudo ground line in standby and active modes.
FIG. 30 illustrates the voltage level of the pseudo ground line in data write, data read and Nop states.
FIG. 31 illustrates a relationship between potentials of various nodes in an operation of writing inverted data of data stored in the memory cell.
FIG. 32 illustrates a structure having a voltage supply control circuit corresponding to each of memory arrays according to a second modification of the second embodiment of the invention.
FIGS. 33A and 33B illustrate an MTCMOS circuit according to a third embodiment of the invention.
FIGS. 34A and 34B illustrate other structures of switches.
FIG. 35 illustrates an MTCMOS circuit according to a fourth embodiment of the invention.
FIG. 36 illustrates an MTCMOS circuit according to a first modification of the fourth embodiment of the invention.
FIG. 37 illustrates an MTCMOS circuit according to a second modification of the fourth embodiment of the invention.
FIG. 38 illustrates a conventional MTCMOS circuit.
FIG. 39 illustrates another conventional MTCMOS circuit.
FIG. 40 illustrates a potential level of a pseudo ground line in FIGS. 38 and 39 rising with time.