SEMICONDUCTOR LASER HAVING AN IMPROVED STACKED STRUCTURE

Abstract

An n-type first cladding layer, a first guide layer, a first enhancing layer, an active layer, a second enhancing layer, a second guide layer, and a p-type second cladding layer are sequentially stacked on an n-type GaAs substrate. The thickness of each of the first guide layer and the second guide layer is 100 nm or more. In such a semiconductor laser, the difference between the Eg (and gap energy) of the first guide layer and the Eg of the active layer (or the difference between the Eg of the second guide layer and the Eg of the active layer) is made 0.66 times or less of the difference between the Eg of the first cladding layer and the Eg of the active layer (or the difference between the Eg of the second cladding layer and the Eg of the active layer).

Description

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 shows a sectional perspective view of the semiconductor laser of the first embodiment;

FIG. 2 shows a band diagram of the conduction band and valence band of the semiconductor laser of the first embodiment;

FIG. 3 shows a result of the simulation for the voltage-current characteristics of the semiconductor laser of the first embodiment;

FIG. 4 shows a result of the simulation of the band diagram of the semiconductor laser of the first embodiment;

FIG. 5 shows a result of the simulation of the operation voltage of the semiconductor laser of the first embodiment;

FIG. 6 shows a result of the simulation of the operation voltage of the semiconductor laser of the second embodiment;

FIG. 7 shows a sectional perspective view of the semiconductor laser of the fourth embodiment;

FIG. 8 shows a result of the simulation of the operation voltage of the semiconductor laser of the fourth embodiment;

FIG. 9 shows the voltage-current characteristics of the conventional semiconductor laser; and

FIG. 10 shows the band diagram of the conventional semiconductor laser.

Claims

1. A semiconductor laser comprising: a first cladding layer of a first conductivity type and having a band gap energy Eg(C1);a first guide layer having a band gap energy Eg(G1), on said first cladding layer;an active layer having a band gap energy Eg(A), for generating a laser beam, and on said first guide layer;a second guide layer having a band gap energy Eg(G2), on said active layer; anda second cladding layer of a second conductivity type, having a band gap energy Eg(C2), and on said second guide layer, wherein at least one of said first guide layer and said second guide layer has a thickness of at least 100 nm, andthe larger one of the difference of Eg(G1) from Eg(A) and the difference of Eg(G2) from Eg(A) is no more than 0.66 times the smaller of the difference of Eg(C1) from Eg(A) and the difference of Eg(C2) from Eg(A).

2. The semiconductor laser according to claim 1, wherein said first cladding layer and said second cladding layer are AlGaInP;said first guide layer and said second guide layer are InGaAsP; andsaid active layer is InGaAs.

3. The semiconductor laser according to claim 2, wherein the percentage composition of As contained in the InGaAsP of said first guide layer and of said second guide layer is at least 0.2.

4. The semiconductor laser according to claim 1, wherein said first cladding layer and said second cladding layer are InGaP;said first guide layer and said second guide layer are InGaAsP; andsaid active layer is InGaAs.

5. The semiconductor laser according to claim 4, wherein the percentage composition of As contained in the InGaAsP of said first guide layer and of said second guide layer is at least 0.6.

6. The semiconductor laser according to claim 1, wherein said first cladding layer and said second cladding layer are AlGaInP;said first guide layer and said second guide layer are AlGaAs; andsaid active layer is InGaAs.

7. The semiconductor laser according to claim 1, wherein said first cladding layer and said second cladding layer are AlGaInP;said first guide layer and said second guide layer are InGasP; andsaid active layer is GaAsP.