Claims
- 1. A semiconductor memory device comprising:
- first and second parallel word lines, each having a first end and a second end;
- a first word line reverse diode connected to said first word line at said first end;
- a second word line reverse diode connected to said second word line at said second end;
- a first ground voltage strapping line, extending along the first ends of said first and second word lines;
- a second ground voltage strapping line, extending along the second ends of said first and second word lines;
- a first well bias tapping region in said second ground voltage strapping line, at the second end of said first word line; and
- a second well bias tapping region in said first ground voltage strapping line, at the first end of said second word line.
- 2. A semiconductor memory device according to claim 1 wherein said first word line reverse diode is in said first ground voltage strapping line and wherein said second word line reverse diode is in said second ground voltage strapping line.
- 3. A semiconductor memory device according to claim 1 wherein said first word line reverse diode and said second word line reverse diode electrically contact an N-type semiconductor region.
- 4. A semiconductor memory device according to claim 1 further comprising an array of memory cells connected to said first and second word lines.
- 5. A semiconductor memory device comprising:
- a plurality of parallel word lines;
- a plurality of word line reverse diodes located at alternating ends of said plurality of parallel word lines; and
- a plurality of well bias tapping regions located at alternating ends of said plurality of parallel word lines, but at opposite ends of said word lines from said plurality of reverse diodes.
- 6. A semiconductor memory device according to claim 5 further comprising first and second ground voltage strapping lines, a respective one of which extends along a respective end of said word lines, and wherein said plurality of word line reverse diodes and said plurality of well bias tapping regions are located in said first and second ground voltage strapping regions.
- 7. A semiconductor memory device according to claim 5 wherein said word line reverse diodes electrically contact an N-type semiconductor region.
- 8. A semiconductor memory device according to claim 5 further comprising an array of memory cells connected to said plurality of parallel word lines.
Priority Claims (1)
Number |
Date |
Country |
Kind |
95-18961 |
Jun 1995 |
KRX |
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CROSS-REFERENCE TO RELATED APPLICATIONS
This continuation-in-part application is related to application Ser. No. 08/671,498, filed Jun. 27, 1996, now abandoned, entitled "Semiconductor Memory Devices Having Alternating Word Line Reverse Diodes and Well Bias Tapping Regions", to the present inventor Hyang-Ja Yang, assigned to the assignee of the present application, the disclosure of which is hereby incorporated herein by reference.
US Referenced Citations (5)
Non-Patent Literature Citations (2)
Entry |
Shone et al., "Gate Oxide Charging and Its Elimination for Metal Antenna Capacitor and Transistor in VLSI CMOS Double Layer Metal Technology", 1989 Symposium on VLSI Technology Digest of Technical Papers, May 22-25, 1989, Kyoto, Japan, pp. 73-74. |
Tsunokuni et al., "The Effect of Charge Build-up on Gate Oxide Breakdown During Dry Etching", Extended Abstracts of the 19.sup.th Conference on Solid State Devices and Materials, Tokyo-1987, pp. 195-198. |
Continuation in Parts (1)
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Number |
Date |
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Parent |
671498 |
Jun 1996 |
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