This application is based upon and claims the benefit of priority from the prior Japanese Patent Application 2013-035600, filed on Feb. 26, 2013, the entire contents of which are incorporated herein by reference.
Embodiments described herein are generally related to a semiconductor switch circuit.
High-frequency switches are used for mobile communication terminals in order to switch antennas for transmitting or receiving.
In the background art, the high-frequency switch employs a semiconductor switch circuit including insulated gate field effect transistors (MOS transistors) that are connected in series.
The MOS transistors connected in series have the same parameters including a threshold value, a gate length, and a gate width.
When a semiconductor switch is a multiport semiconductor switch circuit having one output (input) terminal and two or more input (output) terminals, the MOS transistors are connected so as to be a multistage connection in a tree structure. The semiconductor switch circuit having the tree structure effectively reduces insertion loss.
Meanwhile, in the semiconductor switch circuit having the tree structure, voltage of high-frequency signals applied to off-state MOS transistors have larger voltage amplitude at the first stage than at the second stage.
Unfortunately, excessively large voltage amplitude of the high-frequency signals does not allow the MOS transistors to keep off-states, thereby deteriorating distortion characteristic of the high-frequency signals.
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description, serve to explain the principles of the invention.
According to one embodiment, a semiconductor switch circuit includes first semiconductor switch units and second semiconductor switch units. The first semiconductor switch units each have a first threshold and two first ends. One first end is connected to a common terminal. The second semiconductor switch units each have a second threshold and two second ends. One second end is connected to the other first end of the first semiconductor switch units. The second threshold is lower than the first threshold.
Hereinafter, embodiments will be described with reference to drawings. In the drawings, same reference characters denote the same or similar portions.
A semiconductor switch circuit in accordance with a first embodiment will be described with reference to
The semiconductor switch circuit of the embodiment is a multiport bidirectional switch circuit with one input (output) terminal (common terminal) and two or more output (input) terminals (respective terminals), and is also a high-frequency switch circuit to switch an antenna for the transmitting or receiving of a mobile communication terminal.
As shown in
The tree structure is substantially one of data structures. In the tree structure, one element (node) has two or more child-elements, each child-element has two or more grandchild-elements, and each grandchild-element further has two or more subordinate elements. The tree structure is analogous to a tree in which a stem has two or more branches each having two or more leaves.
The tree structure has two stages, in which 4 second nodes N11 to N14 branch off from a first node N0, and third nodes N201 to N212 branch off 3 by 3 from each second node. The third nodes N201 to N212 are undermost nodes without under nodes. The first to third nodes will be referred to simply as “nodes.”
The first stage of the tree structure has 4 semiconductor switch units S11 to S14 (first semiconductor switch units). The second stage of the tree structure has 12 semiconductor switch units S201 to S212 (second semiconductor switch units).
The semiconductor switch unit S11 is connected between the node NO and the node N11. The semiconductor switch unit S12 is connected between the node NO and the node N12. The semiconductor switch unit S13 is connected between the node NO and the node N13. The semiconductor switch unit S14 is connected between the node NO and the node N14.
The semiconductor switch unit S201 is connected between the node N11 and the node N201. The semiconductor switch unit 5202 is connected between the node N11 and the node N202. The semiconductor switch unit S203 is connected between the node N11 and the node N203. The semiconductor switch units S204 to S212 are connected as well as the semiconductor switch units S201 to S203. The specific description will not be repeated.
No semiconductor switch units are connected to the nodes N201 to N212 because of just the two stages in the tree structure. A common terminal 11 is connected to the node N0 to input or output high-frequency signals RF. The common terminal 11 is connected to an antenna, for example. Corresponding terminals (not shown) are connected to the respective nodes N201 to N212. The corresponding terminals are connected to circuits including a transmitter circuit and a receiver circuit.
In the semiconductor switch circuit 10 having a tree structure, the semiconductor switch units S are driven such that any one of the semiconductor switch units S11 to S14 at the first stage is tuned on and any one of the semiconductor switch units S201 to S212 at the second stage is turned on.
As a result, a current path is formed so as to cause high-frequency signals RF to pass through the semiconductor switch units having been in an on state. High-frequency signals RF are inputted into the common terminal 11 to be outputted from any one of the respective terminals. High-frequency signals RF are inputted into any one of the respective terminals to be outputted from the common terminal 11.
A configuration of the semiconductor switch units S will be described below. As shown in
The semiconductor switch unit S11 includes two or more n-channel insulated gate field effect transistors 24 (hereinafter, referred to as MOS transistors) which are connected in serial. The MOS transistors 24 have a gate width Wg of 4 mm and a threshold (first threshold) Vth1 of 0.5 V.
The drain electrode of the MOS transistor 24, which is located at one end of the series circuit of the MOS transistors 24, is connected to the first terminal 21. The source electrode of the MOS transistor 24, which is located at the other end of the series circuit of the MOS transistors 24, is connected to to second terminal 22.
A first resistance R11 is connected between the gate electrode of each MOS transistor 24 and the control terminal 23. A second resistance R12 is connected between the drain electrode and the source electrode of each MOS transistor 24.
The first, second and third terminals 21, 22, and 23 are referred to as a drain terminal, a source terminal, and a gate terminal, respectively. The semiconductor switch units S12 to S14 are the same as the semiconductor switch unit S11. The same description will not be repeated.
As shown in
The semiconductor switch unit S201 includes a first terminal 26 connected to the node N11, a second terminal 27 connected to the node N201, and a control terminal 28 into which a gate voltage (second control voltage) Vg2 is inputted.
In the semiconductor switch unit S201, two or more MOS transistors 29 are connected in serial. The MOS transistors 29 have a gate width Wg of 4 mm and a threshold (second threshold) Vth2 of 0 V, for example.
The drain electrode of the MOS transistor 29, which is located at one end of a series circuit of the MOS transistors 29, is connected to the first terminal 26. The source electrode of the MOS transistor 29, which is located at the other end of the series circuit of the MOS transistors 29, is connected to the second terminal 27.
A first resistance R21 is connected between the gate electrode of each MOS transistor 29 and the control terminal 28. A second resistance R22 is connected between the drain electrode and the source electrode of each MOS transistor 29.
The series-connected MOS transistors 24 ensure a withstanding voltage over maximum voltage amplitude of high-frequency signals RF inputted into the semiconductor switch unit S11.
The first resistances R11 are connected to the respective gates of the MOS transistors 24 in order to stabilize switching operation of the MOS transistors 24. The first resistances R11 are so high that high-frequency signals RF do not leak to a bias circuit which will be described later.
The second resistances R21 are breeder resistances that allow high-frequency current to slightly pass through the respective MOS transistors 24 having been in a off state, and are used to average voltage amplitude of high-frequency signals RF applied to the respective MOS transistors 24. The second resistances R21 are so high that high-frequency signals RF do not bypass the MOS transistors 24.
The above description is just as valid for the MOS transistors 29, the first resistances R21, and the second resistance R22. The same description will not be repeated.
As shown in
The bias circuit 30 includes a decode circuit 31, a voltage generation circuit 32, and a voltage output circuit 33. The decode circuit 31 decodes a control signal Vcont showing a state of the semiconductor switch units S to output a high level signal or a low level signal in accordance with a corresponding state of the semiconductor switch units S. The voltage generation circuit 32 generates a gate voltage Vg(off). In accordance with the decoded results, the voltage output circuit 33 outputs a gate voltage Vg(on) to the semiconductor switch units S to be on-state, and outputs a gate voltage Vg(off) to the semiconductor switch units S to be off-state.
A control signal Vcont is a 6-bit binary signal. Upper two bits of the 6-bit binary signal indicate which one of the semiconductor switch units S11 to S14 is on-state, and lower bits of the 6-bit binary signal indicate which one of the semiconductor switch units S201 to S212 is on-state.
The decode circuit 31 converts the upper two bits and the lower four bits into corresponding binary-coded decimals (BCD) to output 16-channel signals. Each of the 16-channel signals is high level or low level in accordance with the corresponding state of the semiconductor switch units S.
The voltage generation circuit 32 includes a charge pump circuit and a clock-signal generation circuit to generate a voltage NVGout of, e.g., −1.5 V.
The voltage output circuit 33 includes level-shift circuits L11 to L14 and level-shift circuits L201 to L212. The level-shift circuits L12 to L14 and the level-shift circuits L202 to L211 are not shown in
Each of the level-shift circuits L11 to L14 and L201 to L212 is supplied with a voltage Vcc (>0V) at a power supply terminal thereof, and supplied with a voltage NVGout (Vss) at a ground terminal thereof.
Each of the level-shift circuits L11 to L14 and L201 to L212 converts a logic level into, e.g., a high level of the voltage Vcc or a low level of the voltage NVGout in accordance with a high-level signal or a low-level signal that has been supplied from the decode circuit 31.
Each of the level-shift circuits L11 to L14 and L201 to L212 can be configured to have a pair of PMOS transistors and a pair of NMOS transistors that is complementarily connected to the pair of the PMOS transistors.
Operation of the semiconductor switch circuit 10 will be described below. A current path for high-frequency signals RF is formed by an on-state semiconductor switch unit of the semiconductor switch units S11 to S14 at the first stage and an on-state semiconductor switch unit of the semiconductor switch units S201 to S212 at the second stage. The on-state semiconductor switch units have so low on-resistances that a voltage drop of the high-frequency signals RF does not occur.
In contrast, the other off-state semiconductor switch units function as capacitive elements including a capacitance between drain and source, a capacitance between drain and gate, and a capacitance between gate and source. A voltage of the high frequency signals applied to the semiconductor switch circuit 10 is divided into two voltages in accordance with the capacitance of the off-state semiconductor switch units at the first stage and the capacitance of the off-state semiconductor switch units at the second stage. The two divided voltages are applied to the off-state semiconductor switch units at the respective stages.
The voltage amplitude of the high-frequency signals RF is denoted by V0, the voltage amplitude of the high-frequency signals RF applied to the off-state semiconductor switch units at the first stage is denoted by V1, and the voltage amplitude of the high-frequency signals RF which is applied to the off-state semiconductor switch units at the second stage is denoted by V2. V1 and V2 satisfy a relation of V1+V2=V0. The voltage amplitude of the high-frequency signals RF is assumed to a half of a peak-to-peak voltage Vp-p of a high-frequency signal RF.
As shown in
The voltage amplitude of the high-frequency signals RF applied to the off-state semiconductor switch units at the first stage is 3 times (=0.75/0.25) larger than the corresponding voltage amplitude at the second stage. The voltage amplitude of the high-frequency signals RF applied to the first stage when each node of the second stage has three branches is 1.5 times (=0.75/0.5) larger than the voltage amplitude applied to the first stage when each node of the second stage has just one branch.
The margin voltage Voff describes a margin to maintain off states of the MOS transistors 24 when voltage amplitude (signal amplitude) V1 of the high-frequency signal RF is superimposed on a gate voltage Vg1(off), and is expressed by the equation (1) defined as
Voff=Vth1−Vg1−V1 (1)
When the margin voltage Voff for the signal amplitude is positive, the MOS transistors 24 are in an off state. When the margin voltage Voff for the signal amplitude is negative, the signal amplitude that exceeds the threshold Vth1 leaks so that the high-frequency signals RF partially pass through the MOS transistors 24. When the margin voltage Voff for the signal amplitude is positive and near zero, variation in the threshold Vth1 causes the high-frequency signals RF to measurably pass through the MOS transistors 24. The margin voltage Voff above a certain level is needed to prevent the high-frequency signals RF from leaking through the MOS transistors 24.
When the leakage of the high-frequency signal RF through the MOS transistors 24 becomes too much to neglect, signal-distortion characteristic of the semiconductor switch circuit 10 deteriorates to worsen distortion in the high-frequency signals RF.
When the threshold Vth1 is 0 V and when the number of the branches is equal to 1, i.e., each node does not branch at the second stage, the margin voltage Voff is 0.5 V, i.e., sufficient margin voltage Voff is provided. In contrast, when the threshold Vth1 is 0 V and when the number of the branches is equal to 3, the margin voltage Voff is 0.25 V, thereby leading to a decrease in
An increase in the threshold Vth1 of up to 0.3 V causes the margin voltage Voff to reach 0.55 V. The margin voltage Voff at 3 branches is equal to or more than the margin voltage Voff at just one branch, thereby enabling it to obtain sufficient margin voltage Voff.
Making the threshold Vth1 higher than the threshold Vth2 allows it to prevent a high-frequency signal RF from passing through the off-state MOS transistors 24. As a result, the distortion characteristic of the semiconductor switch circuit 10 is improved, and the distortion of a high-frequency signal RF is reduced.
An increase in the number of the branches reduces V2, thereby causing a high-frequency signal RF passing through the MOS transistors 29 to be negligibly small.
The simulation conditions are set as:
As shown in
The increase in the harmonic distortion arises from the fact that the increase in the input electric power Pin (increase in V1) decreases the margin voltage Voff to cause the high-frequency signal RF passing through the MOS transistors 24 to increase. The high-frequency signal RF passing through the MOS transistors 24 slightly increases at low input power, but rapidly increases over an input power range exceeding a certain value.
The simulation reveals that the semiconductor switch circuit 10 reduces the second-order harmonic distortion and the third-order harmonic distortion more effectively than the semiconductor switch circuit of the comparative example. The second-order harmonic distortion is reduced by 5 to 10 dBc, and the third-order harmonic distortion is reduced by 5 to 13 dBc.
This is due to the fact that the threshold Vth1 of the MOS transistors 24 is 0.3 V higher in the embodiment than in the comparative example, i.e., the margin voltage Voff is higher in the embodiment than in the comparative example.
Making the threshold Vth1 of the MOS transistors 24 higher than the threshold Vth2 of the MOS transistors 29 is performed by modifying parameters including a dose of impurity ions for channels, a gate length, and a thickness of a gate insulating film.
As described above, in the semiconductor switch circuit 10 of the embodiment, two or more semiconductor switch units S are electrically connected so as to form a tree structure in which two or more nodes (elements) repeatedly branch off from each node. The threshold Vth1 of the MOS transistors 24 included in the semiconductor switch units S11 to S14 is higher than the threshold Vth2 of the MOS transistors 29 included in the semiconductor switch units S201 to S212.
In other words, the threshold Vth1 of the MOS transistors 24 of the semiconductor switch units S11 to S14 on the side of the node NO is higher than the threshold Vth2 of the MOS transistors 29 of the semiconductor switch units S201 to S212 on the opposite side of the node N0.
As a result, also when the voltage amplitude V0 of a high-frequency signal RF increases, the high-frequency signal RF passing through the MOS transistors 24 is reduced. Thus, the semiconductor switch circuit with little high-frequency distortion is obtained.
In the description of the embodiment, the semiconductor switch circuit 10 has the tree structure such that four nodes N11 to N14 branch off from a node N0 and three nodes further branch off from each of the four nodes N11 to N14. Alternatively, the semiconductor switch circuit 10 may have a different tree structure. The same result of the embodiment may be obtained in the semiconductor switch circuit with the different tree structure.
The semiconductor switch circuit 40 operates as well as the semiconductor switch circuit 10 shown in
The threshold Vth1 of MOS transistors 24 of the semiconductor switch unit 50 at the first stage, the threshold Vth2 of MOS transistors 29 of the semiconductor switch unit 50 at the second stage, and the threshold Vth3 of MOS transistors of the semiconductor switch unit 50 at the second stage have the relation defined as
Vth1>Vth2>Vth3 (2)
The semiconductor switch circuit 50 operates as well as the semiconductor switch circuit 10 shown in
The number of stages in the tree structure is not limited to the number specified in
In the above description, a semiconductor switch has a series circuit of MOS transistors, and the number of the series-connected MOS transistors is not limited particularly. Alternatively, just one MOS transistor having a tolerance to voltage amplitude of a high-frequency signal RF may be employed.
In the above description, the first resistance R11 and the second resistance R12 are connected to each MOS transistor 24; and the first resistance R21 and the second resistance R22 are connected to each MOS transistor 29. The semiconductor switches can provide the same result of the embodiment without the resistances R11, R21, R12, and R22.
A semiconductor switch circuit in accordance with a second embodiment will be described with reference to
Wherever possible, the same reference numerals or marks as those in the first embodiment will be used to denote the same or like portions throughout the drawings. The second embodiment differs from the first embodiment in that the thresholds Vth1 and Vth2 are equal to each other, and the gate voltage Vg1(off) (second control voltage) is higher than the gate voltage Vg1(off) (first control voltage).
As shown in
As shown in
As a result, the gate voltage Vg1(off) (first gate voltage) is set to −2.0 V, and the gate voltage Vg2(off) (second gate voltage) is set to −1.5 V. The gate voltage Vg1(off) is set lower than the gate voltage Vg2(off).
The decrement (0.5 V) of Vth1 and the decrement (0.5 V) of Vg1 are cancelled in accordance with the equation (1), i.e., Voff=Vth1−Vg1−V1, thereby keeping the voltage margin Voff unchanged. As a result, the high-frequency distortion characteristic is acquired in semiconductor switch circuit 60 as well as in the semiconductor switch circuit 10 shown in
The first voltage generation circuit 71 and the second voltage generation circuit 72 have the same configuration as the voltage generation circuit 32 shown in
The threshold Vth1 and the threshold Vth2 are not needed to differ from each other, thereby enabling it to reduce the number of steps of manufacturing the semiconductor switch circuit 60. The first voltage generation circuit 71 and the second voltage generation circuit 72 differ from each other only in the number of stages in respective charge-pump circuits to have no influence on the number of the manufacturing steps.
In the semiconductor switch circuit 60 of the embodiment, the bias circuit 70 includes the first voltage generation circuit 71 to generate a voltage NVGout1 and the second voltage generation circuit 72 to generate a voltage NVGout2, thereby allowing the gate voltage Vg1(off) to be lower than the gate voltage Vg1(off). Also when the threshold Vth1 and the threshold Vth2 are equal to each other, the semiconductor switch circuit 60 provides sufficient margin voltage Voff.
Thus, the semiconductor switch circuit 60 with little high-frequency distortion is achieved. The number of the manufacturing steps for the semiconductor switch circuit 60 is advantageously reduced. In the description, the semiconductor switch circuit 60 includes a tree structure with two stages, but the number of the stages is not limited to this. Except for the semiconductor switch units S11 to S14 nearest to the node N0, all that's required of the semiconductor switch circuit 60 is that the gate voltage applied to off-state MOS transistors connected to the side of the node N0 is not higher than the gate voltage applied to MOS transistors connected to the opposite side of the node N0.
The different point is that the threshold Vth1 of the MOS transistors 24 at the first stage, the threshold Vth2 of the MOS transistors 29 at the second stage, and the threshold Vth3 of the MOS transistors at the third stage are equal to each other.
The bias circuit (not shown) applies the gate voltage Vg1(off), the gate voltage Vg2(off), and the gate voltage Vg3(off) to the MOS transistors 24 at the first stage, the MOS transistors 29 at the second stage, and the MOS transistors at the third stage, respectively.
The gate voltage Vg1(off), the gate voltage Vg2(off), and the gate voltage Vg3(off) satisfy the following relation as
Vg1(off)<Vg2(off)<Vg3(off) (3)
A bias circuit is achieved by adding a third voltage generation circuit, which generates the gate voltage Vg3(off), to the bias circuit 70.
Alternatively, the bias circuit 70 may be used for the semiconductor switch circuit 10. The semiconductor switch circuit 80 increases the margin voltage Voff of the MOS transistors 24 by the gate voltage Vg1(off) to advantageously increase the margin against lot-to-lot variability of the threshold Vth1.
While certain embodiments have been described, these embodiments have been presented by way of example only, and are not intended to limit the scope of the inventions. Indeed, the novel embodiments described herein may be embodied in a variety of other forms; furthermore, various omissions, substitutions and changes in the form of the embodiments described herein may be made without departing from the spirit of the inventions. The accompanying claims and their equivalents are intended to cover such forms or modifications as would fall within the scope and spirit of the inventions.
Number | Date | Country | Kind |
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P2013-035600 | Feb 2013 | JP | national |