Number | Date | Country | Kind |
---|---|---|---|
199 24 649 | May 1999 | DE |
Number | Name | Date | Kind |
---|---|---|---|
5403406 | Falster et al. | Apr 1995 | A |
5994761 | Falster et al. | Nov 1999 | A |
Number | Date | Country |
---|---|---|
0476 480 | Jul 1995 | EP |
0 675 524 | Oct 1995 | EP |
9838675 | Sep 1998 | WO |
Entry |
---|
Pagani, M. et al. “Spatial Variations in Oxygen Precipitation in silicon after high temperature thermal annealing”, Appl. Phys. Lett 70 (12) Mar. 24, 1997, pp. 1572-1574.* |
W. Zulehner and D. Huber, Czochralski-Grown Silicon, Crystals 8, Springer Verlag Berlin-Heidelberg, 1982. |
“Oxygen in Silicon”, F. Shimura, Semiconductors and Semimaterials vol. 42, Academic Press, San Diego, 1994. |
Vanhellemont et al., J. Appl. Phys. 62, p. 3960, 1987. |