Claims
- 1. A method of making an ultrasmall flow channel device, the method comprising:forming an elongate trench in a substrate; and forming hemispherical grain silicon in the elongate trench, wherein the ultrasmall flow channel device is included in a sample flow processing system so as to permit a sample to flow through the elongate trench.
- 2. The method of claim 1, further comprising disposing a stationary phase on the hemispherical grain silicon.
- 3. The method of claim 2, wherein said disposing comprises forming silicon oxide on the hemispherical grain silicon.
- 4. A method of making and using an ultrasmall flow channel device, the method comprising:forming an elongate trench in a substrate; forming hemispherical grain silicon in the elongate trench so as to permit a sample to flow through the elongate trench; and flowing a sample through said device.
- 5. The method of claim 4, further comprising:disposing a stationary phase on the hemispherical grain silicon.
- 6. The method of claim 5, wherein said disposing comprises forming silicon oxide on the hemispherical grain silicon.
- 7. A method of making an ultrasmall flow channel device, the method composing:forming an elongate trench in a substrate; forming hemispherical grain silicon in the elongate trench so as to permit a sample to flow through the elongate trench; and disposing a stationary phase on the hemispherical grain silicon.
- 8. The method of claim 7, wherein said disposing comprises forming silicon oxide on the hemispherical grain silicon.
CROSS REFERENCE TO RELATED APPLICATIONS
This application is a divisional of application Serial No. 09/177,814, filed Oct. 23, 1998 pending.
US Referenced Citations (28)
Non-Patent Literature Citations (1)
Entry |
Stephen C. Terry et al., “A Gas Chromatographic Air Analyzer Fabricated on a Silicon Wafer”, IEEE Transactions On Electron Devices, vol. ED-26, No. 12, Dec. 1979, pps. 1880-1886. |