Number | Date | Country | Kind |
---|---|---|---|
10-142189 | May 1998 | JP | |
10-254625 | Aug 1998 | JP | |
11-122495 | Apr 1999 | JP |
Number | Name | Date | Kind |
---|---|---|---|
5624769 | Li et al. | Apr 1997 | |
5798188 | Mukohyama et al. | Aug 1998 | |
6090228 | Hwang et al. | Jul 2000 |
Number | Date | Country |
---|---|---|
19523637 | Jul 1996 | DE |
19523673 | Jul 1996 | DE |
19627504 | Oct 1997 | DE |
0889536 | Jan 1999 | EP |
7-282821 | Oct 1975 | JP |
5-182679 | Jul 1993 | JP |
WO9635825 | Nov 1996 | WO |
WO9735349 | Sep 1997 | WO |
Entry |
---|
(Reese Puckett, Stephen L. Michel, William E. Hughes), Ion Beam Etching, Thin Film Processes II, V2, 749-782, 1991.* |
Patent Abstracts of Japan, vol. 006, No. 194 (E-134), Oct. 2, 1982 (1982-10-02) & JP 57 105974 A (Tohsiba Corp), Jul. 1, 1982 (1982-07-01). |