Patent Application
20220064834
This application claims priority to Japanese Patent Application No. 2020-145720 filed Aug. 31, 2020, the content of which is hereby incorporated herein by reference in its entirety.
The present disclosure relates to a sewing machine.
In a known sewing machine capable of embroidery sewing, a size of an embroidery pattern represented by sewing data can be adjusted in accordance with a scale factor input by a user.
The user may adjust the size of the embroidery pattern using a design feature of a sewing object held by an embroidery frame, a decorative component such as a button, or the like, as an index. In this case, with the known sewing machine, it is necessary for the user to measure the size of the index using a ruler or the like, and to input a numerical value into the sewing machine in accordance with the measured size, which is complex.
Embodiments of the broad principles derived herein provide a sewing machine that improves convenience for a user, compared to known art, when re-shaping an embroidery pattern using a design feather or the like of a sewing object held in an embroidery frame as index.
Embodiments provide a sewing machine that includes a sewing portion, a movement portion, a processor, and a memory. The sewing portion includes a needle bar, the sewing portion is configured to form stitches on a sewing object by moving the needle bar up and down. The movement portion includes a holder on which an embroidery frame that holds the sewing object is detachably mounted, the movement portion is configured to move the holder with respect to the needle bar. The processor is configured to control the sewing portion and the movement portion. The memory is configured to store computer-readable instructions that, when executed by the processor, instruct the processor to perform processes. The processes include pattern acquisition processing of acquiring data relating to an embroidery pattern, first position information acquisition processing of acquiring first position information indicating a position of the holder when the holder is in a first position. The first position information is represented by a coordinate system of the movement portion. The processes include second position information acquisition processing of acquiring second position information indicating a position of the holder when the holder is in a second position different from the first position. The second position information is represented by the coordinate system of the movement portion. The processes include generating processing of generating sewing data for sewing the embroidery pattern re-shaped on the basis of the first position information and the second position information. The sewing data indicates positions of a plurality of needle drop points using the coordinate system of the movement portion. The processes include sewing control processing of controlling the sewing portion and the movement portion in accordance with the generated sewing data, and sewing the re-shaped embroidery pattern on the sewing object held by the embroidery frame.
Embodiments will be described below in detail with reference to the accompanying drawings in which:
First and second embodiments of the present disclosure will be explained sequentially with reference to the drawings. A physical configuration of a sewing machine 1 on which a movement portion 40 is mounted will be explained with reference to
As shown in
The upper surface of the bed portion 11 is provided with a needle plate (not shown in the drawings). The needle plate includes a needle hole (not shown in the drawings) through which a sewing needle 7 to be described later is insertable. A feed dog 24, a feed mechanism 23, a shuttle mechanism 28 that are shown in
An LCD 15 is provided in the front surface of the pillar 12. The LCD 15 displays an image including various items, such as commands, illustrations, setting values, messages and the like. A touch panel 26, which is configured to detect a depressed position, is provided on the front surface side of the LCD 15. When a user performs a pressing operation on the touch panel 26, using a finger or a stylus pen not shown in the drawings, the touch panel 26 detects the depressed position. A processor 2 (refer to
An upper portion of the arm portion 13 is provided with a cover 16 that can open and close.
The head portion 14 is provided with a sewing portion 30 (refer to
The projector 58 is configured to project a color image toward the bed portion 11. The projector 58 is provided with a cylindrical housing, a reflective display device 59 housed in the housing, a light source 56 (refer to
The movement portion 40 is detachably mounted on the bed portion 11 of the sewing machine 1. The movement portion 40 is provided with a holder 43 a holder that is configured to mount with embroidery frame 50 configured to hold a sewing object C, and the movement portion 40 is configured to relatively move the holder 43 with respect to the needle bar 6. The single embroidery frame selected from among a plurality of types of embroidery frames including the embroidery frame 50, can be mounted on and removed from the movement portion 40. The embroidery frame 50 includes a first frame 51 and a second frame 52, and is configured to hold the sheet-shaped sewing object C with the first frame 51 and the second frame 52. The sewing object C is a work cloth, for example. The movement portion 40 is provided with a main body portion 41 and a carriage 42. The carriage 42 is provided with the holder 43, a Y movement mechanism 47 and a Y motor 45 shown in
An electrical configuration of the sewing machine 1 that is common to first and second embodiments will be explained with reference to
The CPU 81 performs overall control of the sewing machine 1 and performs various types of calculations and processing that relate to sewing, in accordance with various programs stored in the ROM 82. The ROM 82 is provided with a plurality of storage areas (not shown in the drawings) including a program storage area. The various programs including a program to execute main processing described later to operate the sewing machine 1 are stored in the program storage area.
The RAM 83 is provided with a storage area to store calculation results etc. obtained by the CPU 81 performing arithmetic processing. The flash memory 84 stores various parameters etc. for the sewing machine 1 to perform various types of processing. The flash memory 84 stores sewing data to sew various patterns that can be sewn by the sewing machine 1, for each of the plurality of patterns. The sewing data includes coordinate data. The coordinate data is data that indicates formation positions of the stitches, namely positions of the needle drop points, included in the pattern, using coordinates of the embroidery coordinate system. More specifically, the coordinate data includes a data group representing a plurality of coordinates of each of the needle drop points. The flash memory 84 further stores a correspondence between a type of the embroidery frame that can be mounted on the holder 43 and a sewing area. The sewing area is an area in which sewing is possible, and is set inside the embroidery frame mounted on the holder 43 of the sewing machine 1. The flash memory 84 of the present embodiment further stores a variable that associates the coordinates of the embroidery coordinate system with coordinates of a projection coordinate system that is a coordinate system of the projected image of the projector 58. Therefore, the sewing machine 1 can perform processing to identify the coordinates of the projection coordinate system, on the basis of the sewing data. For example, the sewing machine 1 can project the pattern represented by the sewing data onto a position at which the pattern is sewn on the sewing object C held by the embroidery frame 50. Drive circuits 91 to 96, the touch panel 26, the start/stop switch 29, the light source 56 of the projector 58 and a detector 35 are connected to the I/O interface 85. The light source 56 emits light in accordance with a control signal from the CPU 81, and projects the projected image displayed on the reflective display device 59 onto the sewing object that is to be moved on the bed portion 11. The detector 35 is configured to detect that the embroidery frame 50 has been mounted on the movement portion 40, and to output a detection result corresponding to the type of the embroidery frame. The detector 35 of the present embodiment is configured to detect the type of embroidery frame according to the ON and OFF combination of a plurality of mechanical switches.
The drive circuit 91 is connected to the sewing machine motor 33. The drive circuit 91 drives the sewing machine motor 33 in accordance with a control signal from the CPU 81. When the sewing machine motor 33 is driven, the needle bar up-and-down movement mechanism 55 is driven via the drive shaft 34 of the sewing machine 1, and the needle bar 6 moves up and down. The drive circuit 92 is connected to a feed adjustment motor 22. The drive circuit 93 drives the LCD 15 in accordance with a control signal from the CPU 81, and causes an image to be displayed on the LCD 15. The drive circuit 94 is connected to the X motor 44. The drive circuit 95 is connected to the Y motor 45. The drive circuits 94 and 95 drive the X motor 44 and the Y motor 45, respectively, in accordance with a control signal from the CPU 81. When the X motor 44 and the Y motor 45 are driven, the embroidery frame 50 mounted on the movement portion 40 moves in the left-right direction (the X direction) and the front-rear direction (the Y direction) by a movement amount corresponding to the control signal. The drive circuit 96 drives the reflective display device 59 in accordance with a control signal from the CPU 81, and causes the reflective display device 59 to project the projected image.
Operations of the sewing machine 1 will be explained briefly. When embroidery sewing is performed using the embroidery frame 50, the needle bar up-and-down movement mechanism 55 and the shuttle mechanism 28 are driven in combination with the embroidery frame 50 being moved in the X direction and the Y direction by the movement portion 40. Thus, an embroidery pattern is sewn on the sewing object C held by the embroidery frame 50, using the sewing needle 7 mounted on the needle bar 6.
The main processing of the sewing machine 1 according to the first embodiment will be explained with reference to
As shown in
As shown in
The processor 2 determines whether a reference point input command has been detected (S4). The reference point input command is input by a panel operation via the touch panel 26 when the user sets a first reference point P1 and a second reference point P2. The first reference point P1 and the second reference point P2 are points set with respect to the embroidery pattern E acquired at S2, and are points used as references when re-shaping the embroidery pattern E. As will be described later with reference to
When the reference point input command has not been detected (no at S4), the processor 2 refers to the flash memory 84, and acquires the initial values of the first reference point P1 and the second reference point P2 (S6). When the reference point input command has been detected (yes at S4), the processor 2 performs reference point input setting processing (S5). In the present embodiment, each of the first reference point P1 and the second reference point P2 is set on the embroidery pattern E or on the mask M to be described later. Specifically, as shown in
As shown in
The processor 2 controls the drive circuit 93 to display, on the LCD 15 shown in
As shown in
The processor 2 displays the second reference point P2 on the screen in the same manner as the screen G2. The user selects the key 75, and, after changing the position of the second reference point P2 to the desired position, selects the key 74. The processor 2 determines whether the selection of the key 74 has been detected (S30). The processor 2 stands by until the selection of the key 74 is detected (no at S30). When the selection of the key 74 is detected (yes at S30), the processor 2 acquires a center position of the second reference point P2 as the position of the second reference point P2, and determines whether the acquired position of the second reference point P2 is on the mask M (S31). When the position of the second reference point P2 is not on the mask M (no at S31), the processor 2 determines whether the acquired position of the second reference point P2 is on the embroidery pattern E (S32). When the position of the second reference point P2 is not on the embroidery pattern E (no at S32), the processor 2 controls the drive circuit 93 to display an error message on the LCD 15 (S33), thus prompting the user to re-set the second reference point P2. The processor 2 returns the processing to S30. When the position of the second reference point P2 is on the mask M (yes at S31), or when the position of the second reference point P2 is on the embroidery pattern E (yes at S32), the processor 2 sets the second reference point P2 to the acquired position of the second reference point P2 (S34). The processor 2 ends the reference point setting processing, and returns the processing to the main processing shown in
As shown in
The processor 2 acquires an offset amount (S9). The offset amount is a value used in processing to change the size of the embroidery pattern E acquired at S2, and in the present embodiment, prescribes an interval of a margin set on the outside of the mask M. The offset amount may be set for each of the four sides of the mask M, may be mutually different values for the two sides extending the X direction and the two sides extending in the Y direction, or may be a value that is common to the four sides of the mask M. In the first and third specific examples, the offset amount common to the four sides of the mask M is set to zero, and in the second specific example, the offset amount for the two sides extending in the X direction is set as D1, and the offset amount for the two sides extending in the Y direction is set as D2.
The processor 2 controls the drive circuit 93 to display, on the LCD 15, a screen G5 (refer to
The processor 2 determines whether the selection of the key 74 has been detected (S11). When the selection of the key 74 has not been detected (no at S11), the processor 2 determines whether the selection of the key 75 has been detected (S12). When the selection of the key 75 has been detected (yes at S12), the processor 2 controls the drive circuits 94 and 95 to move the holder 43 in the direction indicated by the selected key 75, by an amount detected (S13). When the selection of the key 75 has not been detected (no at S12), or after S13, the processor 2 returns the processing to S11. The user sets the first position Q1 using the needle drop point with respect to the sewing area R as a reference, for example. In other words, the user selects the key 75, and sets the first position Q1 by disposing an index, such as the design of the sewing object C held by the embroidery frame 50, to a position corresponding to the needle drop point, such as below the needle bar 6, for example. The processor 2 may control the projector 58 and may project a graphic indicating the needle drop point, such as a circle, for example, onto the sewing object C at a position corresponding to the needle drop point. The position corresponding to the needle drop may be a position of the needle drop point, or may be a predetermined position in the vicinity of the needle drop point. In this case, the user may dispose the index in the position corresponding to the needle drop point by disposing the index at the position of the projected needle drop point. As shown in
After acquiring the first position information at S14, and before acquiring second position information at step S16, the processor 2 controls the drive circuits 94 and 95 to move the holder 43 in the movement direction decided at S7 (S15). It is sufficient that a movement distance at S15 be set as appropriate, and may be, for example, the movement distance decided at S8. In the first to third specific examples, the holder 43 is moved in the movement direction and by the movement distance indicated by a vector V in
The processor 2 performs position information acquisition processing (S16). In the position information acquisition processing according to the first embodiment, processing to acquire the second position information is performed. As shown in
The processor 2 determines whether the selection of the key 74 has been detected (S43). When the selection of the key 74 has not been detected (no at S43), the processor 2 determines whether the selection of the key 75 has been detected (S44). When the selection of the key 75 has been detected (yes at S44), the processor 2 controls the drive circuits 94 and 95 to move the holder 43 in the direction indicated by the selected key 75 by the detected amount (S45). When the selection of the key 74 has not been detected (no at S44), or after S45, the processor 2 returns the processing to S43. The user selects one of the keys 75, and, after causing the holder 43 to be moved to a position shown in
On the basis of the first position information acquired at S14 in
On the basis of the first position information and the second position information, the processor 2 re-shapes the embroidery pattern E acquired at S2 in
The processor 2 sets a sewing position of the embroidery pattern EM re-shaped at S50 to a position in which the first reference point P1 is disposed at the position identified using the first position information and the second reference point P2 is disposed at the position identified using the second position information, respectively (S51). As in the first specific example, when the re-shaping method is the first method, and the offset amount is zero, the position identified using the first position information is the first position Q1, and the position identified using the second position information is the second position Q2. In other words, in the first specific example, the processor 2 sets the sewing position of the embroidery pattern E1 to a position in which the first reference point P1 is disposed at the first position Q1 and the second reference point P2 is disposed at the second position Q2. On the other hand, as in the second specific example, when the re-shaping method is the first method and the offset amount is not zero, the position identified using the first position information is a fourth position Q4 that is further to the side of the center of the embroidery pattern E2 from the first position Q1 by the offset amount. The position identified using the second position information is a fifth position Q5 that is further to the side of the center of the embroidery pattern E2 from the second position Q2 by the offset amount. Further, as in the third specific example, when the re-shaping method is the second method or the third method, the position identified using the first position information is a position on a straight line passing through the first position Q1 and extending in an orthogonal direction that is orthogonal to the direction specified by the re-shaping method in which the embroidery pattern E is enlarged or reduced. The orthogonal direction of the second method is the X direction, and the orthogonal direction of the third method is the Y direction. The position identified using the first position information may be the first position Q1. The position identified using the second position information is a position on a straight line passing through the second position Q2 and extending in the orthogonal direction. The position identified using the second position information may be the second position Q2.
When the embroidery pattern E is re-shaped on the basis of the first position information and the second position information, the processor 2 determines whether the re-shaped embroidery pattern EM fits within the sewing area R (S52). A known method may be adopted as appropriate for the determination at S52. When the embroidery pattern EM re-shaped at S50 is disposed in the sewing position set at S51, the processor 2 of the present embodiment determines whether the entire re-shaped embroidery pattern EM is disposed inside the sewing area R. When the entire re-shaped embroidery pattern EM is disposed inside the sewing area R (yes at S52), when the embroidery pattern E has been re-shaped on the basis of the first position information and the second position information, the processor 2 determines whether a modification amount of the re-shaped embroidery pattern EM fits within the modifiable range (S53). The processor 2 of the present embodiment determines whether the size of the embroidery pattern E has been enlarged or reduced at S50 using the modifiable range. When the entire re-shaped embroidery pattern EM is not disposed inside the sewing area R (no at S52), or when the modification amount is not within the modifiable range (no at S53), the processor 2 refers to the flash memory 84 and determines whether a re-acquisition setting of the second position information is stored (S54). In the present embodiment, when the conditions at S52 or S53 are not satisfied, whether or not to re-set the second position information can be set depending on whether the re-acquisition setting is stored in the flash memory 84. When the re-acquisition setting is stored (yes at S54), the processor 2 invalidates the second position information (S57), and, after displaying an error message on the LCD 15 (S58), returns the processing to S43. In this way, when it is determined that the re-shaped embroidery pattern EM does not fit within the sewing area R (no at S52), and when it is determined that the modification amount is not within the modifiable range (no at S53), respectively, the processor 2 causes the second position information to be re-acquired.
When the re-acquisition setting is not stored (no at S54), the processor 2 does not invalidate the second position information, and corrects at least one selected from the group of the first position information and the second position information (S55) such that the conditions at S52 and S53 are satisfied. When it is determined that the re-shaped embroidery pattern EM does not fit within the sewing area R (no at S52), when the embroidery pattern E has been re-shaped on the basis of the first position information and the second position information, at least one selected from the group of the first position information and the second position information is corrected such that the re-shaped embroidery pattern EM fits within the sewing area R. When it is determined that the modification amount is not within the modifiable range (no at S53), when the embroidery pattern E has been re-shaped on the basis of the first position information and the second position information, at least one selected from the group of the first position information and the second position information is corrected such that the modification amount of the re-shaped embroidery pattern EM is within the modifiable range. For example, the processor 2 corrects at least one selected from the group of the first position information and the second position information by moving at least one selected from the group of the first position Q1 and the second position Q2 to an arbitrary position on a line segment joining the first position Q1 and the second position Q2 such that a distance between the first position Q1 and the second position Q2 becomes shorter. The processor 2 identifies the distance B1 in the same manner as at S47 on the basis of the first position information and the second position information after S55 (S56), and returns the processing to S50. At S50 after S56, the processor 2 re-shapes the embroidery pattern E acquired at S2 in
When it is determined that the modification amount is within the modifiable range (yes at S53), the processor 2 controls the drive circuit 93 to display, on the LCD 15, the size of the re-shaped embroidery pattern E when the embroidery pattern E has been re-shaped on the basis of the first position information and the second position information (S59). For example, the processor 2 displays a screen G7 shown in
The processor 2 generates the sewing data for sewing the embroidery pattern EM re-shaped on the basis of the first position information and the second position information, indicating the positions of a plurality of needle drop points using the embroidery coordinate system of the movement portion 40 (S17). The processor 2 generates the sewing data for sewing the re-shaped embroidery pattern EM by correcting the sewing data for sewing the embroidery pattern E acquired at S2, on the basis of the results at S50 and S51. A known method may be adopted as appropriate as a method for correcting the sewing data. The processor 2 may generate the sewing data for sewing the re-shaped embroidery pattern EM using the known method, on the basis of graphic data representing the embroidery pattern EM. The processor 2 determines whether the sewing start command has been detected (S18). The user inputs the sewing start command by selecting the key 77 or by pressing the start/stop switch 29. The processor 2 stands by until the sewing start command is detected (no at S18). When the sewing start command is detected (yes at S18), in accordance with the sewing data generated at S17, the processor 2 controls the sewing portion 30 and the movement portion 40, and sews the re-shaped embroidery pattern EM on the sewing object C held by the embroidery frame 50 (S19). The processor 2 ends the main processing.
As shown in
In the second specific example, the embroidery pattern E2 is sewn on the sewing object C. The embroidery pattern E2 is rotated by the angle calculated at S49 after the embroidery pattern E is enlarged or reduced to a size indicated by a mask M2 such that the distance B2 and a distance B3 match each other. The distance B3 is a distance between the fourth position Q4 and the fifth position Q5. The first reference point P1 is disposed on the fourth position Q4 and the second reference point P2 is disposed on the fifth position Q5. A distance between the mask M2 and a rectangle U including four sides parallel to the four sides of the mask M2 and passing through the first position Q1 and the second position Q2 matches the offset amounts D1 and D2 acquired at S9.
In the third specific example, the embroidery pattern E3 is sewn on the sewing object C. The embroidery pattern E3 is obtained by enlarging or reducing the embroidery pattern E, in the Y direction, to a size indicated by a mask M3, such that a distance B4 (refer to
The main processing of the sewing machine 1 according to a second embodiment will be explained with reference to
In the position information acquisition processing according to the second embodiment, in addition to the first position information and the second position information, the processor 2 acquires third position information indicating the position of the holder 43 when the holder 43 is at a third position Q3 that is different from the first position Q1 and the second position Q2. Specifically, the processor 2 displays a screen J1, shown in
The processor 2 determines whether the selection of the key 74 has been detected (S62). When the selection of the key 74 has not been detected (no at S62), the processor 2 determines whether the selection of the key 75 has been detected (S63). When the selection of the key 75 has been detected (yes at S63), the processor 2 controls the drive circuits 94 and 95 to move the holder 43 in the direction indicated by the selected key 75, by the detected amount (S64). When the selection of the key 75 has not been detected (no at S63), or after S64, the processor 2 returns the processing to S62. The user selects the key 75, and, after changing the third position Q3, selects the key 74. When the selection of the key 74 has been detected (yes at S62), the processor 2 acquires the third position information indicating the position of the holder 43 when the holder 43 is in the third position Q3 that is different from the first position Q1 and the second position Q2 (S65). The third position information is represented by coordinates (X3, Y3), of the embroidery coordinate system, of the needle drop point when the holder is at the third position Q3, for example.
The processor 2 sets a reference graphic on the basis of the first position information, the second position information, and the third position information (S66). The reference graphic is a graphic prescribed at three positions, and it is sufficient that the reference graphic be a graphic that can be used to re-shape the embroidery pattern E acquired at S2. The processor 2 sets a circular arc passing through needle drop points corresponding to each of the first position Q1, the second position Q2, and the third position Q3, as a reference graphic W. The processor 2 sets a method for arranging the embroidery pattern E with respect to the reference graphic W set at S66 (S67). A method of the present embodiment for arranging the embroidery pattern E with respect to the reference graphic W is a method in which the characters A, B, and C included in the embroidery pattern E are individually arranged as partial patterns, and one operation can be selected from left-aligned, right-aligned, centered, justified, and continuous arrangement, for example. The embroidery pattern E may include the sewing data for each of the partial patterns, for example. In the fourth specific example, “justified” is selected as the arrangement of the embroidery pattern E with respect to the reference graphic W, and in the fifth specific example, “continuous arrangement” is selected.
The processor 2 re-shapes the embroidery pattern E on the basis of the first position information, the second position information, and the third position information (S68). The processor 2 re-shapes the embroidery pattern E by arranging the embroidery pattern E, using the arrangement method set at S67, along the reference graphic W set at S66. The processor 2 sets the sewing position of the embroidery pattern EM re-shaped at S68 to a position in which the reference graphic W passes through the needle drop points corresponding to each of the first position Q1, the second position Q2, the third position Q3 (S69). In the fourth specific example, the embroidery pattern E is re-shaped and the sewing position of the embroidery pattern E4 is set as shown by the embroidery pattern E4 of a screen J2 shown in
When the embroidery pattern EM re-shaped at S68 is arranged at the sewing position set at S69, the processor 2 determines whether the entire re-shaped embroidery pattern EM fits within the sewing area R (S70). When at least a part of the re-shaped embroidery pattern EM is not arranged inside the sewing area R (no at S70), the processor 2 invalidates the second position information acquired at S46 and the third position information acquired at S65 (S71). The processor 2 controls the drive circuit 93 to display an error message on the LCD 15 (S72), thus prompting the user to re-set the second position Q2 and the third position Q3, and returns the processing to S43. When the entire re-shaped embroidery pattern EM is arranged inside the sewing area R (yes at S70), the processor 2 controls the drive circuit 93 to display, on the LCD 15, the size of the re-shaped embroidery pattern EM (S73). In the fourth specific example, the processor 2 displays the size of the embroidery pattern E4 in the field 76 of the screen J2, and in the fifth specific example, the processor 2 displays the size of the embroidery pattern E5 in the field 76 of the screen J3. The processor 2 ends the position information acquisition processing according to the second embodiment, and returns the processing to the main processing that is the same as that of the first embodiment shown in
At S17, the processor 2 generates the sewing data for sewing the embroidery pattern EM re-shaped on the basis of the first position information, the second position information, and the third position information, indicating the positions of a plurality of needle drop points using the coordinate system of the movement portion 40 (S17). The processor 2 generates the sewing data for sewing the re-shaped embroidery pattern EM by correcting the sewing data for sewing the partial patterns included in the embroidery pattern E acquired at S2, on the basis of the results at S67 and S68.
As shown in
The processor 2 of the sewing machine 1 according to the first embodiment identifies the distance B1 between the first position Q1 and the second position Q2 on the basis of the first position information and the second position information (S47 in
The processor 2 of the sewing machine 1 according to the first embodiment acquires the first reference point P1 and the second reference point P2 set with respect to the embroidery pattern E (S29, S34 in
The sewing machine 1 according to the first embodiment is provided with the LCD 15 and the touch panel 26. The touch panel 26 receives the setting of the first reference point P1 and the second reference point P2 with respect to the embroidery pattern E displayed on the LCD 15. The processor 2 acquires the first reference point P1 and the second reference point P2 set with respect to the embroidery pattern E using the touch panel 26 (S29, S34). The user can set two desired points as the first reference point P1 and the second reference point P2, and can set the distance B2 between the set first reference point P1 and second reference point P2. Thus, compared to a case in which the user cannot set the first reference point P1 and the second reference point P2 with respect to the embroidery pattern E, the sewing machine 1 can improve convenience for the user when enlarging or reducing the size of the embroidery pattern E using the design or the like of the sewing object C held by the embroidery frame 50 as the index.
Each of the first reference point P1 and the second reference point P2 of the sewing machine 1 according to the first embodiment is set on the embroidery pattern E (S29, S34). The user can set two desired points on the embroidery pattern E formed by stitches as the first reference point P1 and the second reference point P2, and can set the distance B2 between the set first reference point P1 and second reference point P2. Thus, compared to a case in which the user cannot set, on the embroidery pattern E, the first reference point P1 and the second reference point P2 with respect to the embroidery pattern E, the sewing machine 1 can improve convenience for the user.
The processor 2 of the sewing machine 1 according to the first embodiment acquires the sewing area R set on the inside of the embroidery frame 50 (S1). When the embroidery pattern E is re-shaped on the basis of the first position information and the second position information, the processor 2 determines whether the re-shaped embroidery pattern EM fits within the sewing area R (S52). When it is determined that the re-shaped embroidery pattern EM does not fit within the sewing area R (no at S52), the processor 2 causes the second position information to be re-acquired (S46 after S57). The sewing machine 1 can improve the possibility that the embroidery pattern EM re-shaped on the basis of the first position information and the second position information will fit within the sewing area R.
When it is determined that the re-shaped embroidery pattern EM does not fit within the sewing area R (no at S52), the processor 2 of the sewing machine 1 according to the first embodiment generates the sewing data for sewing the embroidery pattern EM re-shaped to fit within the sewing area R on the basis of the first position information and the second position information (S55, S17). The sewing machine 1 can improve the possibility that the embroidery pattern EM re-shaped on the basis of the first position information and the second position information will fit within the sewing area R. The sewing machine 1 can eliminate the time and effort for the user to re-set at least one selected from the group of the first position Q1 and the second position Q2.
There is a case in which the user wishes to re-shape the embroidery pattern E by offsetting the embroidery pattern E by the offset amount from the index that is the design or the like of the sewing object C held by the embroidery frame 50. With respect to this, the processor 2 of the sewing machine 1 according to the first embodiment acquires the offset amount (S9). As in the second specific example, the processor 2 generates the sewing data for sewing the embroidery pattern EM re-shaped by enlarging or reducing the size of the embroidery pattern E on the basis of the first position information, the second position information, and the offset amount (S50, S17). As a result, compared to a case in which the sewing data for sewing the embroidery pattern EM re-shaped on the basis of the offset amount cannot be generated, the sewing machine 1 can improve convenience for the user when enlarging or reducing the embroidery pattern E using the design or the like of the sewing object C held by the embroidery frame 50 as the index.
The processor 2 of the sewing machine 1 according to the first embodiment decides the movement direction of the holder 43 from the first position Q1 on the basis of the first reference point P1 and the second reference point P2 set on the embroidery pattern E (S7). The processor 2 controls the movement portion 40 after acquiring the first position information and before acquiring the second position information, and moves the holder 43 in the decided movement direction (S15). In a state in which the holder 43 has been moved to the first position Q1, the user causes the holder 43 to be moved to the second position Q2 after causing the sewing machine 1 to acquire the first position information. Compared to a case in which, after acquiring the first position Q1, the holder 43 cannot be automatically moved in the movement direction before acquiring the second position information, the sewing machine 1 can reduce a time period until the second position information is acquired after the first position information has been acquired, and can improve convenience for the user when causing the holder 43 to be moved to the second position Q2.
The processor 2 according to the first embodiment decides the movement distance of the holder 43 from the first position Q1 on the basis of the first reference point P1 and the second reference point P2 set on the embroidery pattern E (S8). The processor 2 moves the holder 43 by the decided movement distance and in the decided movement direction after acquiring the first position information and before acquiring the second position information (S15). In the state in which the holder 43 has been moved to the first position Q1, the user causes the holder 43 to be moved to the second position Q2 after causing the sewing machine 1 to acquire the first position information. Compared to a case in which, after acquiring the first position Q1, the holder 43 cannot be automatically moved in the movement direction and by the movement distance before acquiring the second position information, the sewing machine 1 can increase a possibility that the holder 43 will be moved to the vicinity of the second position Q2 set by the user, and can improve convenience when the user causes the holder 43 to be moved to the second position Q2.
The sewing machine 1 according to the first and second embodiments is provided with the LCD 15. When the embroidery pattern E is re-shaped on the basis of the first position information and the second position information, the processor 2 displays the size of the re-shaped embroidery pattern EM on the LCD 15 (S59, S73). The user can confirm the side of the re-shaped embroidery pattern EM by referring to the LCD 15.
The processor 2 of the sewing machine 1 according to the first embodiment acquires the modifiable range of the embroidery pattern E acquired at S2 (S3). When the embroidery pattern E has been re-shaped on the basis of the first position information and the second position information, the processor 2 determines whether the modification amount of the re-shaped embroidery pattern EM is within the modifiable range (S53). When it is determined that the modification amount is not within the modifiable range (no at S53), the processor 2 causes the second position information to be re-acquired (S46 after S57). The sewing machine 1 can improve the possibility that the modification amount of the embroidery pattern EM re-shaped on the basis of the first position information and the second position information will be within the modifiable range.
When it is determined that the modification amount is not within the modifiable range (no at S53), the processor 2 of the sewing machine 1 according to the first embodiment generates the sewing data for sewing the embroidery pattern EM re-shaped on the basis of the first position information and the second position information such that the modification amount is within the modifiable range (S55,
S17). The sewing machine 1 can cause the modification amount of the embroidery pattern EM re-shaped on the basis of the first position information and the second position information to be within the modifiable range. The sewing machine 1 can eliminate the time and effort for the user to re-set at least one selected from the group of the first position Q1 and the second position Q2.
The processor 2 of the sewing machine 1 according to the first embodiment sets the sewing position of the embroidery pattern E to a position in which the first reference point P1 is disposed at the position identified using the first position information and the second reference point P2 is disposed at the position identified using the second position information, respectively (S51). By moving the holder 43 to the first position Q1 and to the second position Q2, the user can set both the modification amount of the embroidery pattern E and the arrangement of the embroidery pattern E. Compared to a case in which the sewing position is not set on the basis of the first position information and the second position information, the sewing machine 1 can improve convenience for the user when sewing the re-shaped embroidery pattern EM using the design or the like of the sewing object C held by the embroidery frame 50 as the index.
The processor 2 according to the first embodiment calculates the angle of the vector V from the first position Q1 toward the second position Q2, with respect to the reference direction (S49). The processor 2 enlarges or reduces the size of the embroidery pattern E on the basis of the distance B1 identified at S47, and generates the sewing data for sewing the embroidery pattern EM re-shaped by rotating the embroidery pattern E by the angle calculated at S49 (S50, S17). By moving the holder 43 to the first position Q1 and to the second position Q2, the user can set the modification amount of the embroidery pattern E, and the sewing position and the angle of the embroidery pattern E. Compared to a case in which the angle of the embroidery pattern E is not set on the basis of the first position information and the second position information, the sewing machine 1 can improve convenience of the user when sewing the re-shaped embroidery pattern EM using the design or the like of the sewing object C held by the embroidery frame 50 as the index.
The processor 2 of the sewing machine 1 according to the first embodiment determines whether the distance B1 is equal to or larger than the predetermined value (S48). When it is determined that the distance B1 is not equal to or larger than the predetermined value (no at S48), the processor 2 causes the second position information to be re-acquired (S46 after S57). The sewing machine 1 can suppress the setting of the angle of the embroidery pattern E on the basis of the first position information and the second position information in which there is insufficient distance for setting the angle of the embroidery pattern E.
The processor 2 of the sewing machine 1 according to the second embodiment acquires the third position information indicating the position of the holder 43 when the holder 43 is in the third position Q3 that is different from the first position Q1 and the second position Q2 (S65 in
The processor 2 of the sewing machine 1 according to the second embodiment sets the reference graphic W on the basis of the first position information, the second position information, and the third position information (S66). The processor 2 generates the sewing data for sewing the embroidery pattern EM re-shaped in accordance with the set reference graphic W (S68, S17). By moving the holder 43 to the first position Q1, the second position Q2, and the third position Q3 in accordance with the design or the like of the sewing object C held by the embroidery frame 50, the user can set the reference graphic W in accordance with the design or the like of the sewing object C. Compared to a case in which the embroidery pattern E is not re-shaped in accordance with the reference graphic W, the sewing machine 1 can improve convenience for the user when re-shaping the embroidery pattern E using the design or the like of the sewing object C held by the embroidery frame 50 as the index.
The sewing machine according to the present disclosure is not limited to the above-described embodiments, and various modifications may be added insofar as they do not depart from the gist and scope of the present disclosure. For example, the following modifications may be added as appropriate.
(A) The configuration of the sewing machine 1 on which the embroidery frame 50 can be mounted may be changed as appropriate. The sewing machine 1 may be an industrial sewing machine or may be a multi-needle sewing machine. It is sufficient that the movement portion 40 be able to move the holder 43 relative to the needle bar 6. The movement portion 40 may be integrally formed with the sewing machine 1. The shape and size of the embroidery frame 50 may be changed as appropriate, and the embroidery frame 50 may be a circular shape, an elliptical shape or the like. The sewing machine 1 according to the second embodiment may omit at least one selected from the group of the projector 58, the LCD 15, and the touch panel 26. The sewing machine 1 according to the first embodiment may be provided with an illumination device, such as a laser pointer or the like, in place of the projector 58. An arrangement position of the projector 58, and the projection area B and the like may be changed as appropriate. in place of the touch panel 26, the input portion may be a keyboard, a mouse, a joystick and the like. It is sufficient that the display portion be able to display images, and the display portion may be an organic EL display, a plasma display, a plasma tube array display, an electronic paper display using electrophoresis, or the like.
(B) The program including the commands for executing the main processing shown in
(C) The respective steps of the main processing executed by the sewing machine 1 are not limited to the example in which they are executed by the processor 2, and a part or all of the steps may be executed by another electronic device (an ASIC, for example). The respective steps of the main processing may be executed through distributed processing by a plurality of electronic devices (a plurality of CPUs, for example). The respective steps of the main processing can be changed in order, omitted or added, as necessary. An aspect in which an operating system (OS) or the like operating on the sewing machine 1 executes a part or all of the main processing on the basis of a command from the processor 2 is also included in the scope of the present disclosure. For example, the following modifications (C-1) to (C-5) may be added to the main processing, as appropriate.
(C-1) In the main processing according to the first embodiment, the processing at S5 may be changed as appropriate. The processor 2 may omit S21 to S23, and a configuration may be adopted in which the re-shaping method cannot be set. The range in which the first reference point and the second reference point can be set may be changed as appropriate. At least one selected from the group of the first reference point and the second reference point may be set at a desired position on the mask M or inside the mask M, or may be set at a desired position outside the mask M. When an embroidery pattern of the alphabetic character O is acquired at S2, for example, the processor 2 may set at least one selected from the group of the first reference point and the second reference point in a portion surrounded by stitches at which the stitches are not formed, such as the central portion of the O. The processor 2 may set an offset area on the outside of the mask M, namely, on the opposite side from the center of the embroidery pattern, on the basis of the offset amount acquired at S9, and may set at least one selected from the group of the first reference point and the second reference point inside the set offset area. The setting method of the first reference point and the second reference point may be changed as appropriate. A configuration may be adopted in which at least one selected from the group of the first reference point and the second reference point cannot be set by the user, or a configuration may be adopted in which at least one selected from the group of the first reference point and the second reference point can be selected from among a plurality of candidates for the reference point. The acquisition method of the first position information, the second position information, and the third position information may be changed as appropriate. For example, the holder 43 and the embroidery frame 50 may be manually moved by the user, and in this case, the processor 2 may acquire the position of the holder 43 when the key 74 is pressed.
(C-2) In the main processing according to the first embodiment, the processing at S1 and S52 may be omitted as appropriate. The processing from S54 to S56 after S52 may be omitted as appropriate. The processing at S57 and S58 after S52 may be omitted as appropriate. The processing at S3 and S53 may be omitted as appropriate. The processing from S54 to S56 after S53 may be omitted as appropriate. The processing at S57 and S58 after S53 may be omitted as appropriate. The processor 2 may end the main processing after S58. The processor 2 may invalidate the first position information instead of the second position information at S57, and may cause the first position information to be re-acquired. The processor 2 may decide the position information to be re-acquired in accordance with a command instructing which of the first position information and the second position information is to be re-acquired. The processor 2 may omit S9, and may not be able to re-shape the embroidery pattern while taking the offset amount into account. The processor 2 may omit S7, S8, and 515. The processor 2 may omit S59 and S73. The processor 2 may omit S51 and S69. In other words, while the first position information, the second position information, and the third position information are used in the processing to re-shape the embroidery pattern, at least one selected from the group of the first position information, the second position information, and the third position information need not necessarily be used in setting the sewing position of the re-shaped embroidery pattern EM. For example, the processor 2 may enlarge or reduce the embroidery pattern in accordance with a ratio between the distance B1 calculated on the basis of the first position information and the second position information, and the distance B2 between the first reference point P1 and the second reference point P2 in the embroidery coordinate system. The processor 2 may omit S49, and need not necessarily rotate the embroidery pattern in accordance with the first position information and the second position information. The processor 2 may omit S48. At S45, the processor 2 may cause the holder 43 to be moved only in the second position range, and, when the holder 43 has moved outside the second position range, the processor 2 may issue a warning. When it is determined that the embroidery pattern EM re-shaped at S52 does not fit within the sewing area R (no at S52), using a known method, the processor 2 may divide the re-shaped embroidery pattern EM, and may generate the sewing data for sewing the divided embroidery pattern.
(C-3) In the main processing according to the second embodiment, a type and a setting method of the reference graphic set at S66 may be changed as appropriate. The reference graphic may be a graphic that is a polygonal shape, a circle, or an annular shape such as an ellipse, and the processor 2 may re-shape the embroidery pattern such that the embroidery pattern is disposed inside the reference graphic. For example, the processor 2 may re-shape the embroidery pattern along the reference graphic, as in a modified example shown in
(C-4) In the main processing according to the second embodiment, the processor 2 may omit S66, and may re-shape the embroidery pattern on the basis of the first position information, the second position information, and the third position information, without using the reference graphic. For example, the processor 2 may re-shape the embroidery pattern along a reference graphic as in a modified example shown in
(C-5) A number of the reference points used in the processing to re-shape the embroidery pattern may be changed as appropriate, and may be four or more. A number of pieces of position information indicating the position of the holder 43 used in the processing to re-shape the embroidery pattern may be changed as appropriate, and may be four or more. The main processing according to the first embodiment and the main processing according to the second embodiment may be combined as appropriate insofar as no contradictions arise.
The apparatus and methods described above with reference to the various embodiments are merely examples. It goes without saying that they are not confined to the depicted embodiments. While various features have been described in conjunction with the examples outlined above, various alternatives, modifications, variations, and/or improvements of those features and/or examples may be possible. Accordingly, the examples, as set forth above, are intended to be illustrative. Various changes may be made without departing from the broad spirit and scope of the underlying principles.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2020-145720 | Aug 2020 | JP | national |
