Claims
- 1. A method of making silicon nitride articles, comprising:
- a) dissolving polysilazine in a solvent and adding a silicon nitride composition to form a homogeneous mixture, said silicon nitride composition comprising silicon nitride and a densification aid;
- b) evaporating the solvent form the homogeneous mixture to form a powder;
- c) molding the powder at ambient temperature to form a molded article;
- d) heating the molded article at a rate of approximately 5.degree. C./minute to a temperature of about 900.degree. C. in a nonoxidizing atmosphere to remove volatile organic species from the molded article and holding the temperature at about 900.degree. C. for a time sufficient to form silicon nitride and silicon carbide from the polysilazane;
- e) sintering the molded article in a non-oxidizing atmosphere at a temperature from about 1685.degree. C. to about 1900.degree. C. to form a densified silicon nitride article having a density greater than or equal to 2.94 g/cc.
- 2. The method according to claim 1 wherein said densification aid is selected from the group consisting of alumina, yttria and combinations thereof.
- 3. The method according to claim 1 wherein said homogeneous mixture comprises for about 10 w/o to about 40 w/o polysilazane.
- 4. The method according to claim 1 wherein the solvent is toluene.
- 5. A method of making silicon nitride articles, comprising:
- a) dissolving polysilazane in a solvent and adding a silicon nitride composition to form a homogenous mixture, said silicon nitride composition comprising silicon nitride and a densification aid;
- b) evaporating the solvent from the homogenous mixture to form a solvent;
- c) mixing the powder in alcohol to form a slip casting formulation;
- d) adding the slip casting formulation to a mold and removing the excess liquid to form a body;
- e) heating the body at a rate of approximately 5.degree. C./min to a temperature of about 900.degree. C. in a nonoxidizing atmosphere and to remove volatile organic species from the body holding the temperature at about 900.degree. C. for a time sufficient to form silicon nitride and silicon carbide from the polysilazane;
- f) sintering the pressed cake in a nonoxidizing atmosphere at a temperature of about 1685.degree. C. to about 1900.degree. C. to form a densified silicon nitride article having a density greater than or equal to 2.94 g/cc.
- 6. The method according to claim 5 wherein said densification aid is selected from the group consisting of alumina, yttria and combinations thereof.
- 7. The method according to claim 5 wherein said homogeneous mixture comprise from about 10 w/o to about 40 w/o polysilazane.
- 8. The method according to claim 5 wherein the solvent is toluene.
- 9. A method of making silicon nitride articles, comprising:
- a) dissolving polysilazane in a solvent and adding a silicon nitride composition to form a homogeneous mixture, said silicon nitride composition comprising silicon nitride and a densification aid;
- b) evaporating the solvent from the homogeneous mixture to form a powder;
- c) mixing the powder in alcohol to form a slip casting formulation;
- d) adding the slip coasting formulation to a mold and removing the excess liquid to form a body
- e) isostatically pressing the body at a temperature less than 100.degree. C. to form a green body;
- f) heating the body at a rate of approximately 5.degree. C./min to a temperature of about 900.degree. C. in a nonoxidizing atmosphere and to remove volatile organic species from the body holding the temperature at about 900.degree. C. for a time sufficient to form silicon nitride and silicon carbide from the polysilazane;
- f) sintering the pressed cake in a nonoxidizing atmosphere at a temperature of about 1685.degree. C. to about 1900.degree. C. to form a densified silicon nitride article having a density greater than or equal to 2.94 g/cc.
- 10. The method according to claim 9 wherein said densification aid is selected from the group consisting of alumina, yttria and combinations thereof.
- 11. The method according to claim 9 wherein said homogeneous mixture comprises for about 10 w/o to about 40 w/o polysilazane.
- 12. The method according to claim 9 wherein the solvent is toluene.
Parent Case Info
This is a divisional of co-pending application Ser. No. 07/092,270 filed on 8-31-87, now abandoned.
US Referenced Citations (5)
Foreign Referenced Citations (1)
Number |
Date |
Country |
A1-800021 |
Jul 1980 |
WOX |
Non-Patent Literature Citations (1)
Entry |
Schwartz et al., Microstructural Development in Si.sub.3 N.sub.4 /Polysilazane Bodies During Heating, Presented to ACS 5/4/87. |
Divisions (1)
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Number |
Date |
Country |
Parent |
92270 |
Aug 1987 |
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