The invention relates generally to imaging devices and more particularly to signal slew rate control in an imaging device.
A CMOS imager circuit includes a focal plane array of pixel cells, each one of the cells including a photosensor, for example, a photogate, photoconductor or a photodiode overlying a substrate for accumulating photo-generated charge in the underlying portion of the substrate. Each pixel cell has a charge storage region, formed on or in the substrate, which is connected to the gate of an output transistor that is part of a readout circuit. The charge storage region may be constructed as a floating diffusion region. In some imager circuits, each pixel may include at least one electronic device such as a transistor for transferring charge from the photosensor to the storage region and one device, also typically a transistor, for resetting the storage region to a predetermined charge level prior to charge transference.
In a CMOS imager, the active elements of a pixel cell perform the necessary functions of: (1) photon to charge conversion; (2) accumulation of image charge; (3) resetting the storage region to a known state before the transfer of charge to it; (4) transfer of charge to the storage region accompanied by charge amplification; (5) selection of a pixel for readout; and (6) output and amplification of a signal representing pixel charge. Photo charge may be amplified when it moves from the initial charge accumulation region to the storage region. The charge at the storage region is typically converted to a pixel output voltage by a source follower output transistor.
CMOS imagers of the type discussed above are generally known as discussed, for example, in U.S. Pat. No. 6,140,630, U.S. Pat. No. 6,376,868, U.S. Pat. No. 6,310,366, U.S. Pat. No. 6,326,652, U.S. Pat. No. 6,204,524 and U.S. Pat. No. 6,333,205, assigned to Micron Technology, Inc., which are hereby incorporated by reference in their entirety.
A typical four transistor (4T) CMOS image pixel 10 is shown in
The reset transistor 16 is connected between the floating diffusion region N and an array pixel supply voltage VAA. A reset control signal RST is used to activate the reset transistor 16, which resets the floating diffusion region N to the array pixel supply voltage VAA level (approximately 2.8V) as is known in the art.
The source follower transistor 18 has its gate connected to the floating diffusion region N and is connected between the array pixel supply voltage VAA and the row select transistor 20. The source follower transistor 18 converts the stored charge at the floating diffusion region N into an electrical output voltage signal. The row select transistor 20 is controllable by a row select signal RS for selectively connecting the source follower transistor 18 and its output voltage signal to a column line 22 of a pixel array.
To ensure that the floating diffusion region FD is fully reset by the reset transistor 16, it is desirable to dynamically boost the driving voltage of the reset control signal RST that is applied to the gate of the reset transistor 16. The boosting causes the voltage level of the reset control signal RST to rise above the array pixel supply voltage VAA by a predetermined amount when the transistor 16 is turned on. Similarly, to ensure that the charges accumulated by the photodiode 12 are fully transferred to the floating diffusion region FD by the transfer transistor 14, it is desirable to dynamically boost the driving voltage of the transfer control signal TX that is applied to the gate of the transfer transistor 14. These boosted voltages are referred to herein as the boosted reset control voltage VRST
Moreover, to ensure a smooth reset and/or a smooth charge transfer, it is also desirable to control the rising and falling slew rates of the reset control signal RST and/or the transfer control signal TX. Control of the rising and falling slew rates of these control signals RST, TX is illustrated in
A typical way to implement controllable slew rates (as shown in
The circuit 50 includes two PMOS transistors M1, M2 and two NMOS transistors M3, M4 connected between the high voltage VRST
The gates of the second PMOS and first NMOS transistors M2, M3 are connected to an enable signal RST_EN/TX_EN, which controls the output of the reset/transfer control signals RST/TX. The gate of the first PMOS transistor M1 is connected to a rising control signal VRST
Unfortunately, power supply, process and temperature “corners” adversely impact the operation of the illustrated control circuit. The term “corner” as used herein and as is known in the art refers to variations. For example, the phrase “process corner” means process variations that arise during the fabrication of the circuit 50. “Temperature corner” means temperature variations within a specified range of temperatures (e.g., −20° C. to +70° C.) while “power supply corner” means power supply variations within a specified range (e.g., 2.5V to 3.1V). In operation, when the rising and falling control signals VRST
These problems are more severe when the slew rates are set to be small, i.e., small effective voltages across the gate and source of the first PMOS transistor M1 and second NMOS transistor M4 are used. In these cases, small power supply changes, or small changes in the threshold voltage of the first PMOS transistor M1 and/or the threshold voltage of the second NMOS transistor M4 due to either process variation or temperature change, can cause a significant slew rate change. The inventors have run simulations, and have discovered that when using the illustrated circuit 50 (or similar circuits) slew rates can vary more than 100% at different power supply, temperature and process corners. This is undesirable.
Accordingly, there is a desire and need for improved slew rate control of the reset and transfer control signals RST, TX used in an imager, where the control mechanism is substantially insensitive to process, temperature and power supply corners. There is also a desire and need for improved slew rate control of other signals and supply voltages used in an imager or other circuit, where the control mechanism is substantially insensitive to process, temperature and power supply corners.
The invention provides an apparatus for controlling the slew rate of boosted signals, such as transistor gate signals, and supply voltages, where the mechanism has a lower sensitivity to process, temperature and power supply corners.
Various exemplary embodiments of the invention provide an imager with a slew rate control circuit that uses digital control signals to control the rising and falling slew rates of gate signals and/or supply voltages used by the imager. By using digital signals, the invention provides slew rate control that is less affected by power supply, temperature and process variations.
The foregoing and other advantages and features of the invention will become more apparent from the detailed description of exemplary embodiments provided below with reference to the accompanying drawings in which:
The present invention can be utilized to control the slew rate of boosted signals, such as boosted transistor gate signals, and supply voltages in an imager or other circuit where precise slew rate control is desired. The invention, however, is described as being part of an imager application in an exemplary embodiment of the invention, but should not be limited to an imager application.
Referring to the figures, where like reference numbers designate like elements,
Unlike the circuit 50 illustrated in
Although the illustrated slew rate control circuit 150 uses four parallel connected PMOS transistors M1a, M1b, M1c, M1d (i.e., “sub-transistors”), and four parallel connected NMOS transistors M4a, M4b, M4c, M4d (i.e., “sub-transistors”), it should be appreciated that the invention is not limited to using of only four sub-transistors. That is, any number of sub-transistors can be used to practice the invention. Moreover, the sub-transistors M1a, M1b, M1c, M1d, M4a, M4b, M4c, M4d may be sized equally or differently (preferably in a binary way; i.e., where each transistor is two times in size compared to the next sub-transistor) as desired.
Similar to the circuit 50 illustrated in
In operation, instead of using analog voltages for the rising control signal VRST
Likewise, depending on the digital code of the falling control signals FALL<3:0>, some of the NMOS transistors M4a, M4b, M4c, M4d are turned on while others are turned off; this changes the effective size of the transistor combination (e.g., M4a, M4b, M4c, M4d) used for discharging the output node O that generates the output signal OUT. In essence, the NMOS transistor combination M4a, M4b, M4c, M4d acts as a digitally controlled resistor network. The effective size of the transistor combination (e.g., M1a, M1b, M1c, M1d, M4a, M4b, M4c, M4d) used for charging/discharge the output node O determines the charging/discharging rates. Thus, the rising and falling slew rates can be controlled by different settings of the digital rising control signals RISE<3:0> and the digital falling control signals FALL<3:0>, respectively.
Because the rising control signals RISE<3:0> and the falling control signals FALL<3:0> are digital signals with large swings, small threshold voltage changes of the PMOS and/or NMOS transistors M1a, M1b, M1c, M1d, M4a, M4b, M4c, M4d due to process variations or temperature changes will not significantly affect the effective voltage across the gate and source terminals of these transistors M1a, M1b, M1c, M1d, M4a, M4b, M4c, M4d when they are turned on. Thus, the rising and falling slew rates will not be significantly affected by process variations or temperature changes. Moreover, the voltage level corresponding to the logical “high” of the digital control signals RISE<3:0>, FALL<3:0> tracks the level of the power supply; thus, power supply variations also do not adversely impact the rising or falling slew rates.
Thus, the slew rate control circuit 150 of the invention provides digital slew rate control that has a lower sensitivity to power supply, temperature and process corners compared with the circuit 50 of
As an example of a specific implementation of the invention, the inventors have simulated the operation of the slew rate control circuit 150 of the invention using different power supply, temperature and process corners. The simulation used transistor dimensions of 8 um/0.5 um, 4 um/0.5 um, 2 um/0.5 um, 1 um/0.5 um, and 20 um/0.5 um for the PMOS transistors M1a, M1b, M1c, M1d, M2, respectively and transistor dimensions of 20 um/0.5 um, 8 um/0.5 um, 4 um/0.5 um, 2 um/0.5 um, and 1 um/0.5 um for the NMOS transistors M3, M4a, M4b, M4c, M4d, respectively. The array power supply voltage VAA was set to 2.8V. The high voltage limit VHI was set to the array supply voltage VAA before boosting and was raised from VAA to VAA+0.8V when boosted. The low voltage limit VLO was set to ground. The enable signal EN was set to logic high before boosting (which disabled PMOS transistor M2 and enable NMOS transistor M3) and logic low (which enabled PMOS transistor M2 and disable NMOS transistor M3) during the boosting period. The load at the output node O was assumed to be 10 pF.
The simulated nominal process was “TT” (i.e., typical NMOS and typical PMOS), which means that the NMOS and PMOS transistors used in the simulation have typical values for parameters such as e.g., threshold voltage, transconductance, etc. Other processes that could have been used include “SS” (slow NMOS, slow PMOS), “FF” (fast NMOS, fast PMOS), “SF” (slow NMOS, fast PMOS) and “FS” (fast NMOS, slow PMOS) as is known in the art, some of which were used in the process corner simulation illustrated in
The simulations were performed with different settings for the digital rising control signals RISE<3:0> and falling control signals FALL<3:0> at different power supply, process and temperature corners. The rising time and falling time were measured using a criteria of 20%-80% of the final value.
It should be appreciated that although the invention has been shown for controlling gate signals for a four transistor CMOS image pixel (
Row lines are selectively activated by a row driver 710 in response to row address decoder 720. In a preferred embodiment, the row driver contains a plurality of slew rate control circuits 150. In a desired embodiment, there is at least one slew rate control circuit 150 for each signal to be boosted in each row in the array 705 (i.e., there may be multiple circuits 150 connected to each row in the array 705, each circuit 150 being for a different boosted signal). A column driver 760 and column address decoder 770 are also included in the imager 700. The imager 700 is operated by the timing and control circuit 750, which controls the address decoders 720, 770. The control circuit 750 also controls the row and column driver circuitry 710, 760.
A sample and hold circuit 761 associated with the column driver 760 reads a pixel reset signal Vrst and a pixel image signal Vsig for selected pixels. A differential signal (Vrst-Vsig) is produced by differential amplifier 762 for each pixel and is digitized by analog-to-digital converter 775 (ADC). The analog-to-digital converter 775 supplies the digitized pixel signals to an image processor 780 which forms a digital image.
System 800, for example a camera system, generally comprises a central processing unit (CPU) 802, such as a microprocessor, that communicates with an input/output (I/O) device 806 over a bus 820. Imaging device 700 also communicates with the CPU 802 over the bus 820. The processor-based system 800 also includes random access memory (RAM) 804, and can include removable memory 814, such as flash memory, which also communicate with the CPU 802 over the bus 820. The imaging device 700 may be combined with a processor, such as a CPU, digital signal processor, or microprocessor, with or without memory storage on a single integrated circuit or on a different chip than the processor.
It should be appreciated that other embodiments of the invention include a method of manufacturing the circuit 150 of the invention as illustrated in
The processes and devices described above illustrate preferred methods and typical devices of many that could be used and produced. The above description and drawings illustrate embodiments, which achieve the objects, features, and advantages of the present invention. However, it is not intended that the present invention be strictly limited to the above-described and illustrated embodiments. Any modification, though presently unforeseeable, of the present invention that comes within the spirit and scope of the following claims should be considered part of the present invention.