Chemical Abstracts, CA84-172769h, Ultrahigh Purification of Silane for Semiconductor Silicon, Yusa et al., Japan. |
Chemical Abstracts, CA79-138335a, Purification of Silane, Muraoka et al., Japan. |
Chemical Abstracts, CA80-138464n, Purification of Monosilane Useful as a Raw Material for Semiconductors, Kuratomi et al., Japan. |
Chemical Abstracts, CA81-140458c, Purification of Poisonous Gas Produced in the Semiconductor Manufacturing Process, Watanabe, Japan. |
Chemical Abstracts, CA82-158318n, Purification of Silane, Asano et al., Japan. |
Chemical Abstracts, CA89-131816f, Purification of Silane, Tarancon, USA (Ger. Offen. 2,755,824). |
Chemical Abstracts, CA92-167081p, Purification of Silane, Union Carbide Corp. (Neth. Appl. 78 03,471). |
Chemical Abstracts, CA94-194253u, Purification of Monosilane, Lebedev et al., USSR. |
Chemical Abstracts, CA97-200298t, Purification of Chlorosilanes by Distillation, Carvalho et al., Brazil. |
Chemical Abstracts, CA99-55843b, Monosilane Purification, Japan. |
Chemical Abstracts, CA84-166812a, Production and Purification of Monosilane, Yushkov et al., USSR. |
Yusa et al., "Ultrahigh Purification of Silane for Semiconductor Silicon," J. Electrochem. Soc., vol. 122, No. 12, Dec. 1975, pp. 1700-1705. |
Lorenz, "A Survey of the Preparation, Purity, and Availability of Silanes,"-A Subcontract Report for the Department of Energy, Subcontract No. CL-3-00321-01, Dec. 1983. |
Lewis et al., "Preparation of High-Purity Silicon from Silane," Journal of the Electrochemical Society, vol. 108, No. 12, Dec. 1961, pp. 1114-1118. |
Chemical Abstracts, (49766v), vol. 80, 1974, p. 106. |
Chemical Abstracts, (62804n), vol. 83, 1975, p. 270. |
Chemical Abstracts, (90:161368z), vol. 90, 1979, p. 607. |
Gmelin, Gmelin Handbuch der Anorganischen Chemie, Springer-Verlag, 1982, pp. 76-78 (Translated). |