Claims
- 1. In a method for preparing concentrated aqueous silica sols of small silica particles about 10 nm or less in diameter and substantially uniform in size by the deposition of silica upon already-formed silica nuclei particles dispersed in a heated aqueous solution of alkali metal silicate at a temperature of 50.degree.-100.degree. C., the nuclei having been formed by reducing the pH to 8-9.5 at a temperature of 10.degree.-50.degree. C. thereby spontaneously forming silica nuclei particles which are dispersed in the solution, the improvement comprising forming the nuclei and maintaining a substantially constant number of particles by:
- (a) forming an aqueous solution which contains dissolved therein an alkali metal salt of a nonsiliceous anion at a concentration of about 0.03 to about 0.08 N, and has a concentration of alkali metal silicate in the solution no greater than about 1% wt., basis SiO.sub.2, and reducing the pH of the solution to effect nucleation by electrodialysis of the solution at pH 8-9.5 by which alkali metal ions are removed through a cation-selective membrane;
- (b) raising the temperature of the formation solution by at least 10.degree. C. to the deposition temperature of 50.degree.-100.degree. C.; and
- (c) removing alkali metal ions from the system to maintain the pH in 8-9.5 range while adding alkali metal silicate at a rate of 0.05-6 g of SiO.sub.2 /hr/1000 cm.sup.2 of surface of the silica nuclei in the system when the growth temperature is less than 70.degree. C., and a rate of 1-10 g/hr/1000 cm.sup.2 when the growth temperature is in the range of 70.degree.-100.degree. C.
- 2. The method of claim 1 in which the small silica particles are less than 5 nm.
- 3. The method of claim 1 in which the temperature of the formation solution is raised at a rate of about 1-4.degree. C. per minute.
- 4. The method of claim 1 in which the rate of adding alkali metal silicate is such as to introduce silica at a rate of 1-4 g/hr/1000 m.sup.2 of surface of the silica nuclei in the system when the temperature is less than 70.degree. C. and a rate of 2-4 g/hr/1000 m.sup.2 when the temperature is in the range of 70.degree.-100.degree. C.
- 5. The method of claim 4 in which reduction of the pH of the solution is accomplished by adsorption of alkali metal ions upon a cationic exchange resin in the H.sup.+ or NH.sub.4.sup.+ form.
- 6. The method of claim 5 in which removal of alkali metal ions is accomplished by adsorption upon a cationic exchange resin in the H.sup.+ or NH.sub.4.sup.+ form.
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of copending application Ser. No. 101,877, filed Dec. 10, 1979, now abandoned, which is a continuation of parent application Ser. No. 732,751, filed Oct. 15, 1976, now abandoned, which is a continuation of parent application Ser. No. 591,097, filed June 27, 1975, also abandoned.
US Referenced Citations (4)
Continuations (2)
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Number |
Date |
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Parent |
732751 |
Oct 1976 |
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Parent |
591097 |
Jun 1975 |
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Continuation in Parts (1)
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101877 |
Dec 1979 |
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