Claims
- 1. A process for the production of a foam suppressant composition comprising
- 1) reacting a mixture of
- a) from about 80 to about 98 wt.%, based upon the total weight of reactants a, b and c, of at least one polyorganosiloxane having the formula ##STR3## wherein R represents an alkyl group having from 1 to about 6 carbon atoms; R.sup.1 represents a hydrogen atom, a hydroxyl group, an alkyl group having from 1 to about 16 carbon atoms, an epoxy group having from 2 to about 16 carbon atoms or the group --OR.sup.3 wherein R.sup.3 represents an alkyl group having from 1 to about 16 carbon atoms, an arylalkyl group having from about 7 to about 23 carbon atoms or --OR.sup.3 may be a polyoxyalkylene group having a molecular weight of from about 50 to 5000; R.sup.2 represents an alkyl group having from 1 to about 16 carbon atoms, a phenyl group, a hydrogen atom, an alkyl-substituted phenyl group wherein the alkyl group contains from 1 to about 6 carbon atoms, an epoxy group having from about 2 to about 16 carbon atoms, or a polysiloxane group having a molecular weight of from about 100 to about 10,000; y is an integer ranging from 5 to about 10,000; and the sum of x, and y ranges from about 500 to about 10,000,
- b) from about 0.1 to about 30 wt. %, of amphorous silica based upon the total weight of reactants a, b and c; and
- c) from about 0.0001 to about 2 wt. %, based upon the total weight of reactants a, b and c of at least on free radical initiator catalyst,
- d) optionally, from about 0 to about 20 wt. %, based upon the total weight of reactants a, b and c of at least one vinyl monomer,
- e) optionally, from about 0 to about 20 wt.,% based upon the total weight of reactants a, b, and c of a vinyl-modified polyorganosiloxane of the formula ##STR4## wherein R represents an alkyl group having from 1 to about 6 carbon atoms; R.sup.1 represents a hydrogen atom, a hydroxyl group, an alkyl group having from 1 to about 16 carbon atoms, an epoxy group having from 2 to about 16 carbon atoms or the group --OR.sup.3 wherein R.sup.3 represents an alkyl group having from 1 to about 16 carbon atoms, an arylalkyl group having from about 7 to about 23 carbon atoms or --OR.sup.3 may be a polyoxyalkylene group having a molecular weight of from about 50 to about 5000; R.sup.2 represents an alkyl group having from 1 to about 16 carbon atoms, a phenyl group, a hydrogen atom, an alkyl-substituted phenyl group wherein the alkyl group contains from 1 to about 6 carbon atoms, an epoxy group having from about 2 to about 16 carbon atoms, or a polysiloxane group having a molecular weight of from about 100 to about 10,000; R.sup.4 represents a vinyl group containing from 2 to about 24 carbon atoms; y is an integer ranging from 0 to about 10,000; z is an integer ranging from 0 to about 400; and the sum of x, y and z ranges from about 500 to about 10,000;
- under conditions and for a time sufficient such that free radical polymerization occurs and a polymerization product forms; and
- 2) diluting the polymerization product formed through the reaction of the above described materials with sufficient quantities of a polydiorganosiloxane having a viscosity of about 10 to about 300 cst. such that a final composition having a viscosity of about 100 to about 10,000 cst. is produced.
- 2. The process of claim 1 wherein R, R.sup.1, and R.sup.2 of polydiorganosiloxane (a) are methyl groups, x is an integer ranging from about 600 to about 4000, and y is 0.
- 3. The process of claim 2 wherein R, R.sup.1, and R.sup.2 of polydiorganosiloxane (a) are methyl groups and x ranges from about 800 to about 2000.
- 4. The process of claim 2 wherein the amphorous silica has a surface area of from about 50 m.sup.2 /g to about 400 m.sup.2 /g and an average particle size less than about 100 micrometers as determined by the Hegman Gauge.
- 5. The process of claim 4 wherein the amphorous silica has a surface area of from about 100 m.sup.2 /g to about 300 m.sup.2 /g and an average particle size less than about 50 micrometers as determined by the Hegman Gauge.
- 6. The process of claim 4 wherein the amphorous silica is prehydrophobized fumed silica.
- 7. The process of claim 1 wherein the silica (b) is present in amounts of from about 0.1% to about 10%, by weight, based upon the total weight of reactants (a), (b) and (c).
- 8. The process of claim 7 wherein the silica (b) is present in amounts of from about 2% to about 4%, by weight, based upon the total weight of reactants (a), (b) and (c).
- 9. The process of claim 6 wherein the silica (b) is present in amounts of from about 2% to about 4%, by weight, based upon the total weight of reactants (a), (b) and (c).
- 10. The process of claim 1 wherein the free radical initiator catalyst comprises benzoyl peroxide.
- 11. The process of claim 1 wherein the vinyl monomer is selected from the group consisting of olefins, vinyl esters of aliphatic or aromatic carboxylic acids, (meth)acrylic acid, methyl (meth)acrylate, ethyl (meth)acrylate, propyl or isopropyl (meth)acrylate, n-butyl, iso-butyl or tert butyl (meth)acrylate, 2-ethyl-hexyl(meth)acrylate, (meth)acrylamide, N-alkyl-substituted (meth)acrylamide derivatives, (meth)acrylonitrile, maleic anhydride, maleic acid amide, N-alkyl-malemide, maleic acid half esters or diesters, vinyl aromatics, vinyl chloride, vinylidene chloride, vinylidene fluoride, tetrafluoroethylene, vinyl ethers, allyl compounds and mixtures thereof.
- 12. The process of claim 10 wherein the vinyl monomer is selected from the group consisting of vinyl acetate and methyl methacrylate.
- 13. The process of claim 1 wherein the vinyl-modified polyorganosiloxane (e) is present in amounts of from about 2 to about 10 wt. %, based upon the total weight of reactants (a), (b) and (c).
- 14. The process of claim 13 wherein the vinyl-modified polyorganosiloxane (e) is present in an amount of about 5 wt. %, based upon the total weight of the reactants (a), (b) and (c).
- 15. The process of claim 1 wherein R and R.sup.1 of polydiorganosiloxane (e) are methyl groups and x is an integer ranging from about 5000 to about 10000, y is 0 and z is an integer ranging from about 5 to 25.
- 16. The process of claim 15 wherein R and R.sup.1 of polydiorganosiloxane (e) are methyl groups and x is an integer ranging from about 3000 to about 8000, y is 0 and z is an integer ranging from about 5 to 20.
- 17. The process of claim 15 wherein R and R.sup.1 of polydiorganosiloxane (e) are methyl groups and x is an integer ranging from about 6000 to about 8000, y is 0 and z has a value of about 14.
- 18. A foam suppressant composition comprising
- 1) the reaction product of
- a) from about 80 to about 98 wt.%, based upon the weight of the reactants (a), (b) and (c), of at least one polyorganosiloxane having the formula ##STR5## wherein R represents an alkyl group having from 1 to about 6 carbon atoms; R.sup.1 represents a hydrogen atom, a hydroxyl group, an alkyl group having from 1 to about 16 carbon atoms, an epoxy group having from 2 to about 16 carbon atoms or the group --OR.sup.3 wherein R.sup.3 represents an alkyl group having from 1 to about 16 carbon atoms, an arylalkyl group having from about 7 to about 23 carbon atoms or --OR.sup.3 may be a polyoxyalkylene group having a molecular weight of from about 50 to 5000; R.sup.2 represents an alkyl group having from 1 to about 16 carbon atoms, a phenyl group, a hydrogen atom, an alkyl-substituted phenyl group wherein the alkyl group contains from 1 to about 6 carbon atoms, an epoxy group having from about 2 to about 16 carbon atoms, or a polysiloxane group having a molecular weight of from about 100 to about 10,000; y is an integer ranging from 0 to about 10,000; and the sum of x and y ranges from about 500 to about 10,000.
- b) from about 0.1 to about 30 wt. %, of amphorous silica based upon the total weight of reactants a, b and c; and
- c) from about 0.0001 to about 2 wt. %, based upon the total weight of reactants a, b and c of at least on free radical initiator catalyst,
- d) optionally, from about 0 to about 20 wt. %, based upon the total weight of reactants a, b and c of at least one vinyl monomer,
- e) optionally, from about 0 to about 20 wt. % based upon the total weight of reactants a, b, and c of a vinyl-modified polyorganosiloxane of the formula ##STR6## wherein R represents an alkyl group having from 1 to about 6 carbon atoms; R.sup.1 represents a hydrogen atom, a hydroxyl group, an alkyl group having from 1 to about 16 carbon atoms, an epoxy group having from 2 to about 16 carbon atoms or the group --OR.sup.3 wherein R.sup.3 represents an alkyl group having from 1 to about 16 carbon atoms, an arylalkyl group having from about 7 to about 23 carbon atoms or --OR3 may be a polyoxyalkylene group having a molecular weight of from about 50 to about 5000; R.sup.2 represents an alkyl group having from 1 to about 16 carbon atoms, a phenyl group, a hydrogen atom, an alkyl-substituted phenyl group wherein the alkyl group contains from 1 to about 6 carbon atoms, an epoxy group having from about 2 to about 16 carbon atoms, or a polysiloxane group having a molecular weight of from about 100 to about 10,000; R.sup.4 represents a vinyl group containing from 2 to about 24 carbon atoms; y is an integer ranging from 0 to about 10,000; and the sum of x, y and z ranges from about 500 to about 10,000;
- said reaction product being formed under conditions for a time sufficient such that free radical polymerization occurs; and
- 2) diluting the reaction product with sufficient quantities of a polydiorganosiloxane having a viscosity of about 10 to about 300 cst. such that a final composition having a viscosity of about 100 to about 10,000 cst. is produced.
- 19. The composition of claim 18 wherein R, R.sup.1 and R.sup.2 of polydiorganosiloxane (a) are methyl groups, x is an integer ranging from about 600 to about 4000, and y is 0.
- 20. The composition of claim 19 wherein R, R.sup.1 and R.sup.2 polydiorganosiloxane (a) are methyl groups and x ranges from about 800 to about 2000.
- 21. The composition of claim 19 wherein the amphorous silica has a surface area of from about 50 m.sup.2 /g to about 400 m.sup.2 /g and an average particle size less than about 100 micrometers as determined by the Hegman Gauge.
- 22. The composition of claim 21 wherein the amphorous silica has a surface area of from about 100 m.sup.2 /g to about 300 m.sup.2 /g and an average particle size less than about 50 micrometers as determined by the Hegman Gauge.
- 23. The composition of claim 22 wherein the amphorous silica is prehydrophobized fumed silica.
- 24. The composition of claim 18 wherein the silica (b) is present in amounts of from about 0.1% to about 10%, by weight, based upon the total weight of reactants (a), (b) and (c).
- 25. The composition of claim 24 wherein the silica (b) is present in amounts of from about 2% to about 4%, by weight, based upon the total weight of reactants (a), (b) and (c).
- 26. The composition of claim 24 wherein the silica (b) is present in amounts of from about 2% to about 4%, by weight, based upon the total weight of reactants (a), (b) and (c).
- 27. The composition of claim 18 wherein the free radical initiator catalyst comprises benzoyl peroxide.
- 28. The composition of claim 18 wherein the vinyl monomer is selected from the group consisting of olefins, vinyl esters of aliphatic or aromatic carboxylic acids, (meth)acrylic acid, methyl (meth)acrylate, ethyl (meth)acrylate, propyl or isopropyl (meth)acrylate, n-butyl, iso-butyl or tert butyl (meth)acrylate, 2-ethyl-hexyl(meth)acrylate, (meth)acrylamide, N-alkyl-substituted (meth)acrylamide derivatives, (meth)acrylonitrile, maleic anhydride, maleic acid amide, N-alkyl-malemide, maleic acid half esters or diesters, vinyl aromatics, vinyl chloride, vinylidene chloride, vinylidene fluoride, tetrafluoroethylene, vinyl ethers, allyl compounds and mixtures thereof.
- 29. The composition of claim 28 wherein the vinyl monomer comprises vinyl acetate.
- 30. The composition of claim 28 wherein the vinyl monomer comprises methyl methacrylate.
- 31. The composition of claim 18 wherein the vinyl-modified polyorganosiloxane (e) is present in amounts of from about 2 to about 10 wt. %, based upon the total weight of reactants (a), (b) and (c).
- 32. The composition of claim 31 wherein the vinyl-modified polyorganosiloxane (e) is present in an amount of about 5 wt. %, based upon the total weight of reactants (a), (b) and (c).
- 33. The composition of claim 18 wherein R and R.sup.1 of polydiorganosiloxane (e) are methyl groups and x is an integer ranging from about 5000 to about 10000, y is 0 and z is an integer ranging from about 5 to 25.
- 34. The composition of claim 33 wherein R and R.sup.1 of polydiorganosiloxane (e) are methyl groups and x is an integer ranging from about 3000 to about 8000, y is 0 and z is an integer ranging from about 5 to 20.
- 35. The composition of claim 33 wherein R and R.sup.1 of polydiorganosiloxane (e) are methyl groups and x is an integer ranging from about 6000 to about 8000, y is 0 and z has a value of about 14.
- 36. A process for suppressing foam, or the formation of foam, in a liquid medium comprising adding the composition of claim 18 to said medium in quantities sufficient to suppress said foam or said formation of foam.
Parent Case Info
This application is a Continuation of prior U.S. application Ser. No. 947,876, filing date 12-30-86, now abandoned.
US Referenced Citations (14)
Foreign Referenced Citations (1)
Number |
Date |
Country |
1337022 |
Nov 1973 |
GBX |
Continuations (1)
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Number |
Date |
Country |
Parent |
947876 |
Dec 1986 |
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