Claims
- 1. A sintered ceramic article having a smooth, thin reaction-formed surface layer preponderantly of silicon oxynitride (Si.sub.2 N.sub.2 O) formed on a surface of a sintered Si.sub.3 N.sub.4 article having a density of 3.0 gr/cm.sup.3 or more, said silicon oxynitride being a reaction product of SiO.sub.2 and Si.sub.3 N.sub.4 of said sintered article.
- 2. A sintered ceramic article according to claim 1, wherein said silicon oxynitride layer has a thickness in the range of 5 to 500 .mu.m.
Priority Claims (1)
Number |
Date |
Country |
Kind |
59-58593 |
Mar 1984 |
JPX |
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Parent Case Info
The present application is a continuation-in-part of U.S. patent application Ser. No. 716,215 filed on Mar. 26, 1985 now abandoned.
US Referenced Citations (4)
Number |
Name |
Date |
Kind |
3895219 |
Richerson et al. |
Jul 1975 |
|
4099924 |
Berkman et al. |
Jul 1978 |
|
4187344 |
Fredriksson |
Feb 1980 |
|
4622186 |
Mizutani |
Nov 1986 |
|
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
716215 |
Mar 1985 |
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