Slider-level microactuator for precise head positioning

Information

  • Patent Grant
  • 6683757
  • Patent Number
    6,683,757
  • Date Filed
    Friday, December 8, 2000
    24 years ago
  • Date Issued
    Tuesday, January 27, 2004
    21 years ago
Abstract
A microactuator is built at the slider level to achieve high resolution positioning of a transducing head with respect to a track of a rotatable disc having a plurality of concentric tracks in a disc drive system. The slider includes a main body carried by a flexure. A stator portion extends from the main body, and a plurality of beams extend from the stator portion, the beams being flexible in a lateral direction. A rotor portion is connected to the stator portion by the plurality of beams, forming a gap between the stator portion and the rotor portion. The rotor portion carries the transducing head. A plurality of stator electrodes are formed on the stator portion, and a plurality of rotor electrodes are formed on the rotor portion to confront the stator electrodes across the gap. Control circuitry applies selected voltages to the stator electrodes and the rotor electrodes to create a force in the lateral direction for moving the rotor portion with respect to the stator portion of the slider, thereby finely positioning the transducing head.
Description




INCORPORATION BY REFERENCE




The aforementioned Provisional Application No. 60/194,983 is hereby incorporated by reference.




BACKGROUND OF THE INVENTION




The present invention relates to a disc drive microactuator, and more particularly to a high resolution positioning mechanism implemented at the slider level for selectively moving a transducer portion of the slider radially with respect to circumferential data tracks of a rotatable disc.




The density of concentric data tracks on magnetic discs continues to increase (that is, the size of data tracks and radial spacing between data tracks are decreasing), requiring more precise radial positioning of the head. Conventionally, head positioning is accomplished by operating an actuator arm with a large-scale actuation motor, such as a voice coil motor, to radially position a head on a flexure at the end of the actuator arm. The large-scale motor lacks sufficient resolution to effectively accommodate high track-density discs. Thus, a high resolution head positioning mechanism, or microactuator, is necessary to accommodate the more densely spaced tracks.




One promising approach for high resolution head positioning involves employing a high resolution microactuator in addition to the conventional lower resolution actuator motor, thereby effecting head positioning through dual-stage actuation. Various microactuator designs have been considered to accomplish high resolution head positioning. Some designs are employed to deform disc drive components such as the actuator arm or the flexure in order to achieve minute displacements by bending. Other designs introduce a separate microactuator component at an interface between disc drive components. While many previous microactuator designs are able to deliver satisfactory micropositioning performance, their effectiveness is inherently limited by the sheer mass that the microactuators are designed to move. In order to move or bend one or more of the disc drive components, the microactuator employed must provide a relatively large amount of force, which requires either a complex or relatively massive microactuator motor mechanism.




A microactuator designed to move only a transducer-carrying portion of the slider with respect to the main portion of the slider is disclosed in U.S. application No. 09/007,007 which is assigned to Seagate Technology, Inc., the same assignee as the present invention. The present invention provides another microactuator for moving a transducer-carrying portion of the slider with high resolution and frequency response, in a configuration that is readily and inexpensively manufactured by thin-film processing techniques.




BRIEF SUMMARY OF THE INVENTION




The present invention is a microactuator built at the slider level for achieving high resolution positioning of a transducing head with respect to a track of a rotatable disc having a plurality of concentric tracks in a disc drive system. The slider includes a main body carried by a flexure. A stator portion extends from the main body, and a plurality of beams extend from the stator portion, the beams being flexible in a lateral direction. A rotor portion is connected to the stator portion by the plurality of beams, forming a gap between the stator portion and the rotor portion. The rotor portion carries the transducing head. A plurality of stator electrodes are formed on the stator portion, and a plurality of rotor electrodes are formed on the rotor portion to confront the stator electrodes across the gap. Control circuitry applies selected voltages to the stator electrodes and the rotor electrodes to create a force in the lateral direction for moving the rotor portion with respect to the stator portion of the slider, thereby finely positioning the transducing head.











BRIEF DESCRIPTION OF THE DRAWINGS





FIG. 1

is a perspective view of a disc drive including an actuation system for positioning a slider over tracks of a disc.





FIG. 2

is a perspective view of a typical flexure and slider arrangement in a disc drive.





FIG. 3

is a top sectional view of a slider employing a slider-level microactuator according to the present invention.





FIG. 4

is a top sectional view illustrating the slider of the present invention having a microactuator deflected by one step.





FIG. 5

is a top sectional view illustrating the slider of the present invention having a microactuator deflected by two steps.





FIG. 6

is a top sectional view illustrating the slider of the present invention having a microactuator deflected by three steps.





FIGS. 7A-7G

are schematic diagrams of the progressive deflection steps of the microactuator of the present invention.





FIGS. 8-25

are section views illustrating a process of fabricating the slider and microactuator according to the present invention.





FIG. 26

is a section view illustrating a step of forming the slider and microactuator of the present invention according to an alternate embodiment.





FIG. 27

is a side section view of the slider and microactuator of the present invention employing a labyrinth seal.











DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS





FIG. 1

is a perspective view of a prior art disc drive actuation system


10


. Actuation system


10


includes voice coil motor (VCM)


12


arranged to rotate actuator arm


16


on a spindle around axis


14


. Head suspension


18


is connected to actuator arm


16


at head mounting block


20


. Flexure


22


is connected to an end of head suspension


18


, and carries slider


24


. Slider


24


carries a transducing head (not shown in

FIG. 1

) for reading and/or writing data on disc


27


, which rotates around axis


28


and includes concentric tracks


29


on which the data is written. As disc


27


rotates, windage is encountered by slider


24


to keep it aloft a small distance above the surface of disc


27


.




VCM


12


is selectively operated to move actuator arm


16


around axis


14


, thereby moving slider


24


between tracks


29


of disc


27


. However, for disc drive systems with high track density, VCM


12


lacks sufficient resolution and frequency response to position a transducing head on slider


24


precisely over a selected track of disc


27


. Therefore, a higher resolution actuation device is necessary.





FIG. 2

is an exploded perspective view of a portion of the prior art disc drive, showing flexure


22


attached to suspension


18


and supporting slider


24


above a surface of disc


27


(FIG.


1


). Transducing head


30


is carried by slider


24


to transduce data with the disc. In operation of the disc drive, suspension


18


, flexure


22


and slider


24


are all moved together as coarse positioning is performed by VCM


12


(

FIG. 1

) moving actuator arm


16


(

FIG. 1

) to which load beam


18


is attached.





FIG. 3

is a top sectional view of slider


40


employing a slider-level microactuator according to the present invention (slider


40


of the present invention replaces prior art slider


24


shown in

FIG. 2

) Slider


40


includes main body


42


, stator portion


44


, rotor portion


46


carrying transducing head


48


, beams


50


and


52


, stator electrodes


54


and rotor electrodes


56


. Main body


42


of slider


40


is formed with apertures


58


and


60


on opposite sides of stator portion


44


. Beams


50


and


52


extend from main body


42


in respective apertures


58


and


60


to connect to rotor portion


46


. Beams


50


and


52


are flexible in the lateral direction (designated by arrows


62


) to enable lateral movement of rotor portion


46


, and thus transducing head


48


, with respect to stator portion


44


.




In order to operate the microactuator shown in

FIG. 3

, a voltage difference is applied between stator electrodes


54


and rotor electrodes


56


. This voltage difference creates an electrostatic force of attraction, normal to the lateral direction of arrows


62


, and also produces a lateral electrostatic force in the direction of arrows


62


. The lateral electrostatic force F


lat


is given by:










F
lat

=

N




ε
0







L
e



2






L
g





V
2






(

Eq
.




1

)













where N is the number of electrically active electrodes, ε


0


is the dielectric constant of free space or air (8.854×10


−12


Farads per meter (F/m)), L


e


is the length of the electrodes in meters, L


g


is the size of the gap between stator electrodes


54


and rotor electrodes


56


in meters, and V is the voltage difference between stator electrodes


54


and rotor electrodes


56


. The normal electrostatic force F


norm


, attempting to pull rotor portion


46


and stator portion


44


together, is given by:










F
norm

=

N




ε
0







L
e



W
e



2






L
g
2





V
2






(

Eq
.




2

)













where N is the number of electrically active electrodes, ε


0


is the dielectric constant of free space or air (8.854×10


−12


Farads per meter (F/m)), L


e


is the length of the electrodes in meters, W


e


is the width of the electrodes in meters, L


g


is the size of the gap between stator electrodes


54


and rotor electrodes


56


in meters, and V is the voltage difference between stator electrodes


54


and rotor electrodes


56


. Therefore, the ratio of the desired lateral force to the potentially problematic normal force is given by:











F
lat


F
norm


=



L
g


W
e


.





(

Eq
.




3

)













In an exemplary embodiment, the gap between stator electrodes


54


and rotor electrodes


56


is about 1 micro-meter (μm). Since the lateral electrostatic force utilized to move rotor portion


46


is inversely proportional to the size of the gap, a small gap size is desired. Also, in an exemplary embodiment, the width of stator electrodes


54


is about 3 μm, at a 4 μm pitch (that is, there is a 1 μm insulative space between the electrodes), and the width of rotor electrodes


56


is about 1.67 μm at a 2.67 μm pitch (again, there is a 1 μm insulative space between the electrodes). The desired lateral electrostatic force is proportional to the number of electrodes, as long as the width of the electrodes is larger than the size of the gap between stator portion


44


and rotor portion


46


. As the electrode width becomes too small compared to the size of the gap, the lateral electrostatic force will decrease due to fringing field effects.




For the exemplary embodiment where the gap is 1 μm and the electrode width is 3 μm, the lateral electrostatic force produced by the microactuator is about one-third of the normal electrostatic force produced. A relatively simple mechanism can be designed to permit lateral motion of rotor portion


46


without allowing rotor portion


46


to move closer to stator portion


44


. For example, as shown in

FIG. 3

, beams


50


and


52


are provided to connect rotor portion


46


to main body


42


of slider


40


. Beams


50


and


52


are flexible in the lateral direction, but are highly resistant to normal motions tending to move rotor portion


46


and stator portion


44


closer together.





FIG. 4

is a top sectional view illustrating the slider


40


with the microactuator configured to deflect rotor portion


46


, carrying transducing head


48


, one step to the right. Differential voltages are applied between selected ones of stator electrodes


54


and rotor electrodes


56


to cause a lateral force therebetween.




Since stator portion


44


of slider


40


is fixedly attached to slider body


42


, the lateral force between stator electrodes


54


and rotor electrodes


56


induces a lateral movement of rotor portion


46


with respect to stator portion


44


. Beams


50


and


52


bend in order to accommodate the lateral movement of rotor portion


46


dictated by the lateral movement of rotor electrodes


56


with respect to stator electrodes


54


. Similarly,

FIG. 5

is a top sectional view illustrating slider


40


with the microactuator configured to deflect rotor portion


46


two steps to the right, and

FIG. 6

is a top sectional view illustrating slider


40


with the microactuator configured to deflect rotor portion


46


three steps to the right. As shown in

FIGS. 5 and 6

, beams


50


and


52


bend further to accommodate the further lateral movement of rotor portion


46


for greater displacement of transducing head


48


.




Control of the microactuator movement may be accomplished in a digital, step-wise manner, or in a smooth continuum by analog control. The connections of rotor electrodes


56


for each progressive microactuation step are shown in

FIGS. 7A-7G

, with stator electrodes


54


being fixedly connected alternately to high and low sources of potential. Rotor electrodes


56


are alternately connected to terminals


70


,


72


and


74


, the voltages of which are controlled by appropriate control circuitry


76


.

FIG. 7A

shows the quiescent position of the microactuator, in which rotor electrodes


56


connected to terminal


70


are at a high potential, rotor electrodes


56


connected to terminal


72


are at a low potential, and rotor electrodes


56


connected to terminal


74


are at a high potential. The potentials applied to terminals


70


,


72


and


74


are then adjusted by control circuitry


76


(shown only in

FIG. 7A

, for simplicity) in either a gradual or a step-wise manner through a plurality of phases, shown in

FIGS. 7B-7G

. The first phase is shown in

FIG. 7B

, where the voltage applied to terminal


74


is shifted low, while the voltage applied to terminal


70


remains high and the voltage applied to terminal


72


remains low. As a result, a lateral force is exerted on rotor electrodes


56


, causing rotor electrodes to be displaced one step to the right with respect to stator electrodes


54


.




Similarly, the second, third, fourth and fifth phases of actuation are shown in respective

FIGS. 7C

,


7


D,


7


E and


7


F, and the return to tile initial (quiescent) phase is shown in

FIG. 7G

, with rotor electrodes


56


actuated six steps. The voltages applied to terminals


70


,


72


and


74


are adjusted to cause lateral forces to be exerted on rotor electrodes


56


and achieve further displacement of rotor electrodes


56


with respect to stator electrodes


54


. For simplicity, the voltages applied for each actuation phase are listed in the table below:
















TABLE 1











Terminal 70




Terminal 72




Terminal 74





























Quiescent




HIGH




LOW




HIGH







Phase 1




HIGH




LOW




LOW







Phase 2




HIGH




HIGH




LOW







Phase 3




LOW




HIGH




LOW







Phase 4




LOW




HIGH




HIGH







Phase 5




LOW




LOW




HIGH







Quiescent




HIGH




LOW




HIGH







(Phase 6)















Each actuation step displaces rotor electrodes


56


by an amount equal to one-third of the pitch of stator electrodes


54


. Thus, one complete cycle of actuation displaces rotor electrodes


56


by an amount equal to twice the pitch of stator electrodes


54


. Following the actuation steps in the opposite order achieves displacement of rotor electrodes


56


in the opposite direction. In this manner, lateral displacements on the order of 10 micro-meters (μm) or more are readily achievable by the microactuator of the present invention.




Although the microactuator has been shown and described with fixed potentials connected to stator electrodes


54


and with switched potentials connected to rotor electrodes


56


, it should be understood that the electrodes could be reversed, so that the fixed potentials are connected to rotor electrodes


56


and the switched potentials are connected to stator electrodes


54


. With such a modified configuration, the number of leads needed for connections to the rotor may be reduced, if the driver chip controlling the microactuator is either integrated into main body


42


of slider


40


or is connected to slider


40


from the disc drive suspension and/or flex circuit supporting slider


40


. In addition, the fixed potential connected to rotor electrodes


56


shields transducing head


48


from noise generated by switching the phase voltages, reducing the need for additional shielding between the microactuator and the head.




In order to implement the microactuator shown in FIG.


3


and achieve the type of performance shown in

FIGS. 4-6

, several design consideration must be taken into account. Rotor portion


46


must be stiff enough to resist bending due to the normal electrostatic attractive force between rotor portion


46


and stator portion


44


, to prevent rotor portion


46


and stator portion


44


from contacting one another. Since the normal force between rotor portion


46


and stator portion


44


is proportional to the reciprocal of the square of the gap distance, deflection of rotor portion


46


toward stator portion


44


by more than one-third of the original gap distance would cause a positive feedback relationship between the force and the gap distance, forcing rotor portion


46


to snap into contact with stator portion


44


and a preventing any lateral motion of the microactuator. In an exemplary embodiment, rotor portion


46


is composed of Al


2


O


3


, having an elastic modulus of 530 giga-Pascals (GPa). At 80 Volts with a gap distance of 1.0 μm, the normal force between rotor portion


46


and stator portion


44


is approximately 1.3 milli-Newtons (mN). This force causes a deflection of less than 0.05 μm when rotor portion


46


has a thickness of 10 μm, and even less for greater thickness of rotor portion


46


. Such deflections are acceptable, and do not degrade the performance of the microactuator.




Rotor portion


46


may also be deflected toward stator portion


44


by compression of beams


50


and


52


normal to the gap between rotor portion


46


and stator portion


44


. In an exemplary embodiment, beams


50


and


52


have a length of 250 μm, a width of 2 μm, and are composed of silicon with an elastic modulus of 160 GPa. In this configuration, the normal force of 1.3 mN causes compression stress in beams


50


and


52


of 1.3 mega-Pascals (MPa), which reduces the length of the beams (and thus the spacing between rotor portion


46


and stator portion


44


) by 0.002 μm. This compression is acceptable, and does not degrade the performance of the microactuator.




Buckling of beams


50


and


52


under the forces applied thereto is another characteristic which must be considered. The critical buckling load for an embodiment where beams


50


and


52


are composed of silicon and have a length of 250 μm and a width of 2 μm is about 33.6 mN, which is about 26 times greater than the expected force generated at 80 Volts. Therefore, buckling is not a problem for the exemplary design of the present invention.




As beams


50


and


52


bend during lateral deflection of rotor portion


46


with respect to stator portion


44


, their effective length controlling the size of the gap between rotor portion


46


and stator portion


44


is reduced (although their actual length as determined by integrating along the curved shape of the beam remains constant). The bending of beams


50


and


52


can be roughly modeled as strings in tension, remaining generally straight and pivoting at the ends. The change in the dimension of the gap (dy) for a given lateral motion (dx) is given by the following:








dy=L−{square root over (L


2


−(


dx


)


2


)}


  (Eq.4)






where L is the effective length of beams


50


and


52


. The effective length of beams


50


and


52


is approximately 75% of the actual length of beams


50


and


52


, or (0.75)(250 μm)=167.5 μm. The effective shortening (dy) for lateral deflections (dx) from 0.5 μm to 50 μm and beam lengths of 125 μm, 250 μm and 500 μm are shown in the table below:















TABLE 2










dy (μm), beam




dy (μm), beam




dy (μm), beam






dx (μm)




length = 125 μm




length = 250 μm




length = 500 μm


























0.5




0.00133




0.000667




0.000333






1.0




0.00533




0.00267




0.00133






2.0




0.0213




0.0107




0.00533






3.0




0.0480




0.0240




0.0120






5.0




0.133




0.0667




0.0333






7.0




0.262




0.131




0.0653






10.0




0.535




0.267




0.133






15.0




1.21




0.601




0.300






20.0




2.16




1.07




0.534






30.0




4.93




2.42




1.20






50.0




14.4




6.79




3.35














In view of the table above, and assuming a maximum tolerable gap reduction (dy) of one-third of the nominal 1 μm gap, or about 0.33 μm gap reduction, a maximum lateral deflection (dx) is about 7.0 μm for a 125 μm beam, about 10.0 μm for a 250 μm beam, and about 15 μm for a 500 μm beam. The effective shortening of the beams is therefore one of the primary limiting factors on the total achievable stroke of the microactuator, but still does enable significant and usable lateral deflections.




The potential for lateral instability due to the lateral component of normal force between rotor electrodes


56


and stator electrodes


54


must also be accounted for by the microactuator design. At large lateral displacements, the angle of beams


50


and


52


away from the normal axis results in a component of the normal attractive force between rotor portion


46


and stator portion


44


being resolved into the lateral direction. It this lateral force component becomes greater than the sum of the beam spring force and the lateral electrostatic force, rotor portion


46


will move uncontrollably in the lateral direction until it is restrained by contacting something. The lateral component of the normal force of attraction is equal to the normal force multiplied by the ratio of the lateral deflection of rotor portion


46


to the length of beams


50


and


52


. For a 10 μm lateral deflection of rotor portion


46


and a 125 μm length of beams


50


and


52


, the size of the gap between rotor portion


46


and stator portion


44


is reduced to about 0.5 μm, or about half of the nominal 1.0 μm gap size. This reduced gap size doubles the lateral electrostatic force to 877 μN, and quadruples the normal electrostatic force to 5.2 mN. The lateral component of the normal force is thus 5.2 mN multiplied by the ratio of lateral deflection (10 μm) to beam length (125 μm), yielding a lateral component of normal force equal to 416 μN. This is much less than the 877 μN of lateral electrostatic holding force that is exerted on rotor portion


46


. Therefore, for this exemplary configuration, lateral instability problems are avoided. Increasing the length of beams


50


and


52


further reduces the lateral component of the normal attraction force, resulting in even less lateral instability.




The spring constants of beams


50


and


52


must also be selected to permit the maximum lateral deflection and resonant frequency desired for the microactuator design. The maximum lateral deflection and resonant frequency of the microactuator is affected by the voltage applied between stator electrodes


54


and rotor electrodes


56


(and thus the lateral force applied by the microactuator), the spring constant of beams


50


and


52


, and the mass of rotor portion


46


. For example, at a voltage of 80 Volts, the lateral force of the microactuator is 438 μN, and thus the maximum spring constant for 10 μm of travel is 438 divided by 10, or 43.8 N/m. If the same travel is desired at a drive level of 40 Volts, the maximum spring constant is four times less, or 11.0 N/m. The mass of rotor portion


46


is typically defined by its volume, which in an exemplary embodiment is equal to its 250 μm width (parallel to the gap) multiplied by its 250 μm thickness (perpendicular to the air-bearing surface of slider


40


) multiplied by its 10 μm length (perpendicular to the gap), or 6.25×10


−13


m


3


. For an exemplary material such as Al


2


O


3


, which has a density of 4000 kilograms per cubic meter (kg/m


3


), the mass of rotor portion


46


is about 2.5 μg. With a length of 50 μm rather than 10 μm, the mass increases to 12.5 μg. The resonant frequencies of the microactuator for various masses of rotor portion


46


(corresponding to various lengths of rotor portion


46


), drive voltages and spring constants, assuming ±10 μm of maximum lateral deflection, are given in Table 3.


















TABLE 3











20 Volts,




40 Volts, 11.0





80 Volts, 43.8









2.7 N/m spring




N/m spring





N/m spring







Mass





constant




constant





constant






























2.5




μg




5269 Hertz




10,557




Hertz




21,066




Hertz






5.0




μg




3726 Hz




7465




Hz




14,896




Hz






12.5




μg




2356 Hz




4721




Hz




9421




Hz














If the desired maximum lateral deflection is only ±2.5 μm rather than ±10 μm, the spring constants can be four times greater and the resonant frequencies listed in Table 3 will be doubled.




The microactuator utilized in slider


40


, as depicted in

FIGS. 3-6

, is preferably fabricated according to a novel procedure shown in

FIGS. 8-25

.

FIG. 8

is a section view of the initial configuration of substrate water


80


from which slider


40


is to be formed. Insulating layer


82


is deposited on wafer


80


with a thickness of approximately 1 μm. Wafer


80


is a typical substrate material such as silicon, while insulating layer


82


may be composed of silicon nitride, aluminum oxide, or another insulating material.

FIG. 9

is a section view depicting the subsequent fabrication step, in which slots


84


are etched into insulating layer


82


, with a thickness of one-fourth to one-half of the thickness of insulating layer


82


. Slots


84


will define the location of stator electrodes


54


(FIG.


3


).





FIG. 10

is a section view illustrating stator electrode metallization layer


86


deposited on insulating layer


82


. As is further shown in

FIG. 11

, a planarization process is performed to define the stator electrode features (stator electrodes


54


,

FIG. 3

) from electrode metallization layer


86


. The resulting structure includes insulating layer


82


and features of electrode metallization layer


86


defining a planar top surface. Planarization may be achieved by a number of methods known in the art, such as by lapping or chemical mechanical polishing (CMP), for example.





FIG. 12

is a section view illustrating phosplhosilicate glass (PSG) spacer layer


88


deposited over the planar top surface of insulating layer


82


and the features of electrode metallization layer


86


. Spacer layer


88


is a sacrificial layer, and in a preferred embodiment has a thickness of about 1 μm (corresponding to the desired gap size between the stator electrodes and the rotor electrodes of the microactuator). As is further shown in

FIG. 13

, spacer layer


88


is subsequently removed from outer regions


90


and


92


of the device.





FIG. 14

is a section view illustrating rotor electrode metallization layer


94


deposited over insulating layer


82


and spacer layer


88


. As is further shown in

FIG. 15

, high resolution etching is subsequently performed on the device to define the rotor electrode features (rotor electrodes


56


,

FIG. 3

) from electrode metallization layer


94


. The resulting structure includes rotor electrode features and stator electrode features separated by spacer layer


88


.





FIG. 16

is a section view illustrating insulating layer


96


deposited over insulating layer


82


, spacer layer


88


and the rotor electrode features of the electrode metallization layer


94


. As is further shown in

FIG. 17

, trenches


97




a


,


97




b


,


99




a


and


99




b


are subsequently etched in the resulting structure to form beam springs


98


and


100


. Beam springs


98


and


100


have a depth of 125 μm to 500 μm, depending on the desired operating characteristics of the microactuator, and have a width of about 2 μm.





FIG. 18

is a section view illustrating sacrificial filler


102


deposited over insulating layer


96


and filling trenches


97




a


,


97




b


,


99




a


and


99




b


. Filler


102


constrains and protects beam springs


98


and


100


during subsequent processing of the microactuator. The top surface of the structure is then planarized as shown in

FIG. 19

by a process known in the art such as lapping or CMIP, for example. The residual filler


102


on the outer portions of the structure is then removed, and the tips of beam springs


98


and


100


are exposed by removing a predetermined amount of insulating layer


96


, spacer layer


88


and filler


102


around the tips of beams


98


and


100


. The results of these steps are shown in FIG.


20


. The removal of material to expose the tips of beam springs


98


and


100


may be performed by a high resolution etching process known in the art, such as ion milling, reactive ion etching (RIE), or wet etching, for example.





FIG. 21

is a section view illustrating rotor


104


deposited on the microactuator structure. For the sake of clarity, insulating layers


82


and


96


are no longer referred to individually, since they are contiguous with rotor


104


and are composed of the same or similar material as rotor


104


. Rotor


104


mechanically engages the tips of beam springs


98


and


100


in the areas removed from filler


102


. Transducing head


106


is then formed on rotor


104


in a manner known in the art, as shown in FIG.


22


. An overcoating layer is then formed to encapsulate transducing head


106


, formed of the same or similar material as rotor


104


. This is shown in

FIG. 23

, with the overcoat and rotor simply referred to as rotor


104


for clarity, since they are contiguous and similar or identical in composition.





FIG. 24

is a section view illustrating trenches


108


and


110


formed through the outer portions of rotor


104


and substrate wafer


80


. Trenches


108


and


110


are formed by etching, sawing, or a similar process known in the art, and serve to mechanically separate rotor


104


from the stator of the microactuator. This separation is more clearly shown in

FIG. 25

, which illustrates the removal of spacer layer


88


and trench filler


102


to free rotor


104


to move with respect to substrate wafer


80


. These layers are preferably removed by an etching process known in the art. For the sake of clarity, the portions of insulating material that form the stator of the microactuator (attached to slider substrate wafer


80


) are referred to as stator


112


, while the portions of insulating material that form the rotor are referred to as rotor


104


. The resulting structure is a completed microactuator, with rotor


104


being movable with respect to stator


112


through bending of beam springs


98


and


100


, as generally described above with respect to

FIGS. 3-6

.




In one modified embodiment of the process of fabricating the microactuator, stator electrodes


86


and rotor electrodes


94


are formed in a recessed tub etched in substrate wafer


80


. This embodiment is shown in

FIG. 26

, which depicts the microactuator at the same stage of formation as is shown in FIG.


21


. The modified embodiment eliminates the protruding central portion of rotor


104


caused by the presence of spacer layer


88


between stator electrodes


86


and rotor electrodes


94


by recessing those elements into a tub. The tub may be formed by an etching process known in the art. The remaining process steps shown in

FIGS. 22-25

are performed in the same manner as before, to complete the fabrication of the microactuator.




Beam springs


98


and


100


are fabricated with dimensions determined by their desired spring constant, which is central to the design of the microactuator. In order to achieve a spring constant of about 45 N/m (which is a value desired in an exemplary embodiment of the microactuator), beam springs


98


and


100


are fabricated with a length of 250 μm, a depth of 250 μm, and a width of 2.06 μm, assuming an elastic modulus of 160 GPa for silicon. At 10 μm of lateral deflection, a stress of about 156 MPa is generated in beam springs


98


and


100


with such a design, which is readily handled by the beams. These dimensions of beam springs


98


and


100


may be formed by high resolution reactive ion etching (RIE), but the 2.06 μm width at an etch depth of 250 μm is near the resolution limit for this technology in its current state. In order to achieve a spring constant as low as 2.5 N/m (which is a value desired in another exemplary embodiment of the microactuator), the width of beam springs


98


and


100


must be reduced to 0.8 μm. These dimensions may be fabricated by potassium hydroxide (KOH) etching, for example, to achieve the higher aspect ratio required for the reduced beam thickness. Alternatively, it is expected that advancements in RIE processes will soon occur that enable the small beam thicknesses to be formed for a 250 μm or greater beam length.




A vertical load of one gram on rotor


104


(such as might be encountered by manual cleaning of the device with a cotton swab, for example) generates a stress of 58 MPa in the 2.06 μm wide beams, and 150 MPa in the 0.8 μm wide beams. These stresses are readily handled by the beams. In operation of the device in a disc drive, the actual vertical forces and stiction forces applied to rotor


104


are quite small, due to the relatively small area of rotor


104


, and are easily borne by beam springs


98


and


100


.




It should be understood that a number of possible designs of beam springs


98


and


100


may be utilized to support rotor


104


while allowing lateral movement of rotor


104


with respect to main slider substrate wafer


80


. For example, a beam configuration is disclosed in U.S. Application No. 09/148,178, filed Sep. 14, 1998 and assigned to Seagate Technology, the same assignee as the instant application. The 09/148,178 application is hereby incorporated by reference. The beam design of the 09/148,178 application is fabricated by a deposition process rather than an etching process, using multiple narrow beams of silicon nitride or a similar material having favorable mechanical properties. Other designs consistent with the spirit and scope of the present invention will be apparent to those skilled in the art.




Electrostatic microactuators, such as the present invention, are generally considered to be more sensitive to contamination than magnetic microactuators. This is largely due to the much larger ratio of electrical conductivity between conductors and insulators compared to the ratio of permeability between magnetic and non-magnetic materials. For example, air has a relative magnetic permeability of 1, and permalloy (which is commonly used as the magnetic material in magnetic microactuators) has a maximum permeability of about 2000, for a ratio of 2×10


3


. In an electrical circuit, the ratio between the conductivity of a conductor such as copper and an insulator such as fused quartz is on the order of 3×10


24


. Normally this higher ratio is advantageous for electrical circuits, but since magnetic circuits are designed to operate with a significant amount of leakage, the small amount of additional leakage added by a small magnetic particle does not generally have a significant effect on the operation of the microactuator. The effect of a small magnetic particle is also limited by the fact that the magnetic particle saturates rather than conducting an arbitrarily high magnetic flux, so that if the area of the particle is small compared to the size of the magnetic gap, the magnetic effect will be minimal as well. By contrast, electrical conductors do not generally exhibit saturation effects, particularly at current densities below those that would vaporize the conductor, so that a small conductive particle across the gap between electrodes could completely disrupt the operation of the microactuator. While the inside of a disc drive is very clean in order to prevent head crashes, a certain number of small conductive particles may be present to contaminate the gap between the microactuator electrodes.




A number of measures are possible to prevent gap contamination. One possibility is to etch or saw a recess in the microactuator structure, so that the electrode gap does not extend all the way to the air-bearing, surface of the slider. A simple recess could be generated by the same ion milling process that forms the air-bearing surface of the slider. In addition, an even more effective labyrinth seal could be added during the process of fabricating the microactuator, Such as by an etching step just prior to depositing the electrode gap spacer layer. This step adds some topography to the wafer that can be dealt with by utilizing an electrodeposited photoresist for the subsequent step of rotor electrode metallization rather than a standard spun on photoresist. An embodiment employing this design is shown in

FIG. 27

, which illustrates a simplified side sectional view of the device. For the sake of clarity, the mechanical beams of the device are not shown, so that emphasis may be placed on the features of air-bearing surface


110


and of the labyrinth seal. Recess


112


is formed in air-bearing surface


110


of slider substrate wafer


80


and rotor


104


. Recess


112


ensures that the gap between stator electrodes


86


and rotor electrodes


94


does not extend all the way to air-bearing surface


110


. In addition, trench


114


is formed in slider substrate wafer


80


and column


116


is formed to extend from rotor


104


, thereby forming a labyrinth seal that further protects the gap between stator electrodes


86


and rotor electrodes


94


from contamination.




Another possible measure for improving the resistance of the microactuator to electrode gap contamination is to introduce redundancy in the electrical circuit of the device. Specifically, a series resistor may be integrated between the drive voltage and each of the individual electrodes. Since the impedances of the electrodes are very high the resistor value may also be very high, on the order of 1 mega-ohm (MΩ). With this circuit configuration, a short circuit between any two electrodes due to the presence of a contaminating conductive particle will only affect a single set of electrodes, and will have very little effect on the overall operation of the microactuator.




A further possible measure for improving the resistance of the microactuator to electrode gap contamination is to coat the exposed surfaces of the electrodes with a thin insulating coating. If the coating is thin compared to the size of the gap between electrodes, the effect of the coating on the actuation force will be minimal. As a result, a small conductive particle in the gap will not disable any of the electrodes, but will merely short out the electric field in a volume of space on the order of the size of the particle itself, assuming that the insulating coating is able to withstand the driving voltage.




Electrical connections to the stator and the rotor of the microactuator can be made in a number of ways. For example, connection to the stator may be made from the top surface of the slider to a flex circuit connected to external drive circuitry, or alternatively the drive circuitry may be integrated on the slider itself. Electrical connection to the rotor, for both the microactuator and the transducing head, may be achieved in an exemplary embodiment by depositing an electrically conductive material in beams


98


and


100


connecting the rotor to the stator. The electrical interconnects will be quite thin, so as not to add excessive stiffness to the beams.




The present invention provides a microactuator for achieving high resolution head positioning in a disc drive with high frequency response and a relatively simple and inexpensive formation process. The high performance of the microactuator is achieved by moving only a small mass of the microactuator that includes the transducing head. As a result, the reaction force upon the suspension of the disc drive when actuating the microactuator is reduced by a factor of about 100 as compared to previous microactuator designs. This effectively eliminates any negative effects of suspension resonances due to actuation of the microactuator, which is highly desirable in a microactuator design. The mechanism for achieving microactuation in the present invention is fabricated in an essentially planar manner, with layers of material being formed on flat surfaces and features being etched in the material layers, as is well-known in the art.




Although the present invention has been described with reference to preferred embodiments, workers skilled in the art will recognize that changes may be made in form and detail without departing from the spirit and scope of the invention.



Claims
  • 1. A microactuator for finely positioning a transducing head with respect to a track of a rotatable disc having a plurality of concentric tracks in a disc drive system, the disc drive system including a slider having a body carried by a flexure, the microactuator comprising:a stator portion extending from the body of the slider; a plurality of beams extending from the stator portion, the beams being flexible in a lateral direction; a rotor portion connected to the stator portion by the plurality of beams with a gap between the rotor portion and the stator portion, the rotor portion carrying the transducing head; a plurality of stator electrodes on the stator portion, the plurality of stator electrodes being alternately connected to a fixed high potential and a fixed low potential; a plurality of rotor electrodes on the rotor portion confronting the stator electrodes across the gap; and control circuitry for applying selected voltages to the rotor electrodes in a predetermined pattern to create a force in the lateral direction for moving the rotor portion with respect to the stator portion.
  • 2. The microactuator of claim 1, wherein the control circuitry is operable to apply voltages to the plurality of rotor electrodes to generate the force in the lateral direction in a step-wise manner.
  • 3. The microactuator of claim 1, wherein the control circuitry is operable to apply voltages to the plurality of rotor electrodes to generate the force in the lateral direction in a continuous manner.
  • 4. The microactuator of claim 1, wherein the plurality of rotor electrodes are alternately connected to three terminals each having a voltage controlled by the control circuitry.
  • 5. The microactuator of claim 4, wherein the predetermined pattern of voltages applied to the plurality of rotor electrodes by the control circuitry includes six phases.
  • 6. The microactuator of claim 1, wherein the plurality of beams connecting the rotor portion to the stator portion have a length of about 250 micro-meters.
  • 7. The microactuator of claim 1, wherein the plurality of beams connecting the rotor portion to the stator portion have a spring constant between 2.5 Newtons per meter and 45 Newtons per meter.
  • 8. The microactuator of claim 1, further comprising a labyrinth seal protecting the gap between the rotor portion and stator portion from contamination.
  • 9. The microactuator of claim 8, wherein the labyrinth seal comprises:a recess in the slider at an air-bearing surface of the slider around the gap between the rotor portion and the stator portion; a trench extending into the stator portion; and a column extending from the rotor portion into the trench.
  • 10. The microactuator of claim 1, wherein each of the plurality of beams is composed of silicon.
  • 11. The microactuator of claim 1, wherein an exposed surface of the rotor and stator electrodes is coated with a thin insulation coating.
  • 12. The microactuator of claim 1, wherein the transducing head is encapsulated by an overcoating layer.
  • 13. A microactuator for finely positioning a transducing head with respect to a track of a rotatable disc having a plurality of concentric tracks in a disc drive system, the disc drive system including a slider having a body carried by a flexure, the microactuator comprising:a stator portion extending from the body of the slider; a plurality of beams extending from the stator portion, the beams being flexible in a lateral direction; a rotor portion connected to the stator portion by the plurality of beams with a gap between the rotor portion and the stator portion, the rotor portion carrying the transducing head; a plurality of stator electrodes on the stator portion; a plurality of rotor electrodes on the rotor portion confronting the stator electrodes in a normal direction across the gap; and control circuitry for applying selected voltages to the stator electrodes and the rotor electrodes to create a lateral force for moving the rotor portion in the lateral direction with respect to the stator portion.
  • 14. The microactuator of claim 13, wherein the plurality of stator electrodes are alternately connected to a fixed high potential and a fixed low potential, and the control circuitry is operable to selectively apply voltages to the plurality of rotor electrodes in a predetermined pattern to generate the lateral force for moving the rotor portion in the lateral direction with respect to the stator portion.
  • 15. The microactuator of claim 13, wherein the control circuitry is operable to apply voltages to the plurality of rotor electrodes to generate the lateral force in a step-wise manner.
  • 16. The microactuator of claim 13, wherein the control circuitry is operable to apply voltages to the plurality of rotor electrodes to generate the lateral force in a continuous manner.
  • 17. The microactuator of claim 13, wherein the plurality of rotor electrodes are alternately connected to three terminals each having a voltage controlled by the control circuitry.
  • 18. The microactuator of claim 17, wherein the predetermined pattern of voltages applied to the plurality of rotor electrodes by the control circuitry includes six phases.
  • 19. The microactuator of claim 13, further comprising a labyrinth seal protecting the gap between the rotor portion and stator portion from contamination.
  • 20. The microactuator of claim 19, wherein the labyrinth seal comprises:a recess in the slider at an air-bearing surface of the slider around the gap between the rotor portion and the stator portion; a trench extending into the stator portion; and a column extending from the rotor portion into the trench.
CROSS-REFERENCE TO RELATED APPLICATION(S)

This application claims priority from Provisional Application No. 60/194,983 filed Apr. 5, 2000 for “Transducer-Level Electrostatic Linear Microactuator by W. Bonin, Z. Boutaghou, R. Hipwell, Jr. and B. Wissman.

US Referenced Citations (35)
Number Name Date Kind
3924268 McIntosh et al. Dec 1975 A
4374402 Blessom et al. Feb 1983 A
4605977 Matthews Aug 1986 A
4651242 Hirano et al. Mar 1987 A
4764829 Makino Aug 1988 A
4914725 Belser et al. Apr 1990 A
5021906 Chang et al. Jun 1991 A
5034828 Ananth et al. Jul 1991 A
5177652 Yamaguchi et al. Jan 1993 A
5189578 Mori et al. Feb 1993 A
5303105 Jorgenson Apr 1994 A
5325244 Takano et al. Jun 1994 A
5364742 Fan et al. Nov 1994 A
5375033 MacDonald Dec 1994 A
5521778 Boutaghou et al. May 1996 A
5657188 Jurgenson et al. Aug 1997 A
5745319 Takekado et al. Apr 1998 A
5764432 Kasahara Jun 1998 A
5764444 Imamura et al. Jun 1998 A
5781381 Koganezawa et al. Jul 1998 A
5796558 Hanrahan et al. Aug 1998 A
5801472 Wada et al. Sep 1998 A
5805375 Fan et al. Sep 1998 A
5856896 Berg et al. Jan 1999 A
5867347 Knight et al. Feb 1999 A
5896246 Budde et al. Apr 1999 A
5898541 Boutaghou et al. Apr 1999 A
5898544 Krinke et al. Apr 1999 A
5920441 Cunningham et al. Jul 1999 A
5920978 Koshikawa et al. Jul 1999 A
5936805 Imaino Aug 1999 A
5943189 Boutaghou et al. Aug 1999 A
5959808 Fan et al. Sep 1999 A
6249402 Katayama Jun 2001 B1
6362542 Novotny Mar 2002 B1
Foreign Referenced Citations (8)
Number Date Country
0 412 221 Feb 1991 EP
63-122069 May 1988 JP
02-263369 Oct 1990 JP
04-134681 May 1992 JP
04-368676 Dec 1992 JP
05-094682 Apr 1993 JP
06-020412 Jan 1994 JP
07-085621 Mar 1995 JP
Non-Patent Literature Citations (11)
Entry
“Silicon Micromachined Electromagnetic Microactuators for Rigid Disk Drives” by Tang et al, IEEE Transactions on Magnetics, vol. 31, No. 6, pp. 2964-2966 Nov. 1995.
“Magnetic Recording Head Positioning at Very High Track Densities Using a Microactuator-Based, Two-Stage Servo System” by Fan et al., IEEE Transactions on Industrial Electronics, vol. 42, No. 3, pp. 222-233 Jun. 1995.
“A Flexural Piggyback Milli-Actuator for Over 5 Gbit/in2 Density Magnetic Recording” by Koganezawa et al, IEEE Transactions on Magnetics, vol. 32, No. 5, pp. 3908-3910 Sep. 1996.
“Transverse Mode Electrostatic Microactuator for MEMS-Based HDD Slider” by Imamura et al, IEEE pp. 216-221 1996.
“An Experiment for Head Positioning System Using Submicron Track-width GMR Head” by Yoshikawa et al., IEEE Transactions on Magnetics, vol. 32, No. 5, pp. 3905-3907 Sep. 1996.
“Micro Electrostatic Actuators in Dual-Stage Disk Drives with High Track Density” by Tang et al., IEEE Transactions on Magnetics, vol. 32, No. 5, pp. 3851-3853 Sep. 1996.
“Piezoelectric Microactuator Compensating for Off-Track Errors in Magnetic Disk Drives” by Imamura et al, ASME Advance Information Storage Systems, vol. 5, pp 119-125, 1993.
“A Dual-Stage Magnetic Disk Drive Actuator Using a Piezoelectric Device for a High Track Density” by Mori et al., IEEE Transactions on Magnetics, vol. 27, No. 6, pp. 5298-5300 Nov. 1991.
“Dynamic Loading Criteria for 3-1/2 Inch Inline HDD Using Multilayer Piezoelectric Load/Unload Mechanism” by Kajitani et al., IEEE Transactions on Magnetics, vol. 27, No. 6, pp. 5079-5081 Nov. 1991.
“Design, Fabrication, and Testing of Silicon Microgimbals for Super-Compact Rigid Disk Drives” by Temesvary et al., Journal of Microelectromechanical Systems, vol. 4, No. 1, pp. 18-27 Mar. 1995.
Application No. 09/007,007, Filed Jan. 14, 1998, Entitled: Piezoelectric Microactuator for Precise Head Positioning, Inventor: Vlad Joseph Novotny, Attorney Docket No.: 169.12-0345.
Provisional Applications (1)
Number Date Country
60/194983 Apr 2000 US