Example embodiments relate generally to the technical field of microelectronics and their manufacture.
As the integrated circuit manufacturing technology advances, device feature sizes shrink and the number of transistors that can be integrated on a single die grows exponentially. Associated with the decreasing feature sizes are benefits as well as complexities. Some of the complexities are related to breakdown in reversed bias junctions at sufficiently high voltages. For example, programming some memory devices currently involves high voltages which may exceed the breakdown voltage of gate-drain junction of MOS transistors.
The breakdown may result in a damaging leakage current passing through the device when the device is expected to be in non-conducting (OFF) state. The breakdown effect is deemed to be exacerbated as the feature sizes decrease, even when the applied high voltages are unchanged.
Some embodiments are illustrated by way of example and not limitation in the figures of the accompanying drawings in which:
Example methods and circuits for current mode data sensing and propagation by using voltage amplifier will be described. In the following description, for purposes of explanation, numerous examples having example-specific details are set forth in order to provide a thorough understanding of example embodiments. It will be evident, however, to one skilled in the art that the present examples may be practiced without these example-specific details.
Some example embodiments described herein may include a method and a circuit for preventing snap-back current in N-channel MOS (NMOS) transistors of integrated circuits. Example embodiments may include preventing snap-back current in a circuit including a first NMOS transistor having an associated parasitic bipolar transistor. A second NMOS transistor may be connected in series with the first NMOS transistor. A gate node of the second NMOS transistor may be coupled to a bias node, such that the second NMOS transistor is in conductive (ON) state.
An auxiliary circuit coupled to a source node of the first NMOS transistor may be configured to provide a bias potential at the source of the first NMOS transistor, when the first NMOS transistor is in non-conducting state (OFF). The bias potential may prevent the associated parasitic bipolar transistor from turning on, therefore reducing the chance of snap-back in the first NMOS transistor.
In the absence of the transistor 120, if transistor 110 was directly connected to the high-voltage node, at a certain value of the high-voltage, depending on the feature size (e.g., approximately 16 volts, for a feature size of approximately 250 nanometer (nm)), and the voltage connected to the VG1 node, a breakdown may occur at the gate-drain junction of the transistor resulting in a snap-back current (discussed below) flowing through drain-source nodes of the transistor. However, connecting the transistor 120 in series with the transistor 110 and coupling the gate node of the transistor 120 to VM may prevent the snap-back current form forming in transistor 120 and reduce the chance of snap-back current in transistor 110.
To understand the formation of snap-back current, a cross-sectional view 200 of the structure of an NMOS transistor having an associated parasitic bipolar transistor 260 is shown (see
In normal operation of the NMOS transistor, the associated parasitic bipolar transistor 260 is OFF and thus plays no role in the transistor operation. When the NMOS transistor is turned off by setting VG to zero, a voltage drop of VM at the gate-drain junction induces a depletion region at this junction. Increasing VM to a certain value (e.g., the breakdown voltage of the junction) may initiate an avalanche breakdown resulting in a release of positive charges that, when passing through the parasitic resistor 280, may raise the potential at the base of the associated parasitic bipolar transistor 260. Such a rise of the base potential of the associated parasitic bipolar transistor 260 to and beyond a certain threshold level may cause the base-emitter junction (e.g., the junction between the p-well and the source 240) of the associated parasitic bipolar transistor 260 to conduct, thereby, turning on the associated parasitic bipolar transistor 260 and leading to a leakage current (e.g., the snap-back current) between the drain and the source of the NMOS transistor.
Based on the discussion above, connecting the VG2 node of the transistor 120 (see
The snap-back current may reduce the voltage delivered to a load drastically. It may also damage the devices in its path and cause reliability issues. Therefore, as an additional measure to secure the transistor 110 (see
In an example embodiment, the potential at the source 240 may be raised to the potential of the supply voltage VCC (e.g., 3 or 5 volts). For example, in a circuit 400 shown in
Some example embodiments may include auxiliary circuits that employ the techniques described above to make them snap-back tolerant. Such auxiliary circuits may use bias voltages greater than VCC (e.g., approximately 10 volts, when the VM is approximately 16 volts). This may further assure the prevention of formation of the snap-back current in transistor 410.
The gate node of the second NMOS transistor may be connected to a bias node to keep the second NMOS transistor free from snap-back current (operation 520). As discussed above and shown in
The auxiliary circuit may be configured to provide a bias potential at the source of the first NMOS transistor when the first NMOS transistor is in an OFF state. For example, in the case when a low input (e.g., VI1=0) turns the first NMOS transistor OFF, an inverter 430 is connected between the node 460 with a voltage VI2 and source node of the NMOS to provide high voltage (e.g., VCC) and bias the source node with VCC to further prevent the associated parasitic bipolar transistor from turning on (as discussed above) and consequently prevent the snap-back current in the NMOS transistor.
The operation of the level shifter 610 is briefly discussed here. When the input at node 650 is zero volts, the gate nodes of transistors 620 and 622 are respectively at VCC and zero, due to operation of the inverter 624. Meanwhile, the source nodes of the transistors 620 and 622 are biased at zero and VCC, due to operation of auxiliary circuits 626 and 628, respectively. Therefore, transistors 620 and 622 are ON and OFF, respectively, resulting in a low voltage (approximately zero volts) at the gate node of the PMOS transistor 615 which turns the PMOS transistor 615 into conducting state, resulting in providing VM at the output node 619 of the level shifter 610.
Since transistor 622 is OFF, in the absence of the series connected NMOS transistor 618 and the auxiliary circuits 624, 626, and 628, the snap-back current in transistor 622 would not allow the voltage VM to be provided at the output node 619 of the level shifter 610. However, the use of the series connected NMOS transistor 618 and the auxiliary circuits 626 and 628 as discussed above, may prevent the snap-back current in transistor 622. The CMOS inverter stages 630 and 640 are common inverters, except for the series connected transistors 636 and 644 and the auxiliary circuit (e.g., inverter) 643. In the CMOS inverter stages 630 and 640 the gate nodes of the series connected NMOS transistors 636 and 644 are coupled to VM, and proper biases at the source nodes of the transistors 638 and 646 provided by the inverter 643 (e.g., VCC when one of the transistors 638 and 646 are OFF) may prevent the formation of snap-back current in transistors 638 and 646, when any of the transistors 638 and 646 is in OFF state.
In example embodiments, the PMOS transistors 614, 615, 634, and 642 may also be protected against snap-back current using a technique similar to the technique discussed above with respect to NMOS transistors 636 and 644. Also, the auxiliary circuits that employ the techniques described above may be used to make them snap-back tolerant. Such auxiliary circuits may use bias voltages greater than VCC (e.g. approximately 10 volts, when the VM is approximately 16 volts). This may further assure the prevention of the formation of snap-back current in transistors 620, 622, 638, and 646.
A method and a circuit for preventing snap-back current in NMOS transistors of MOS integrated circuits have been described. Although the present embodiments have been described, it will be evident that various modifications and changes may be made to these embodiments. Accordingly, the specification and drawings are to be regarded in an illustrative rather than a restrictive sense.
The Abstract of the Disclosure is provided to comply with 37 C.F.R. ยง1.72(b). The abstract will allow the reader to quickly ascertain the nature of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the claims. In addition, in the foregoing Detailed Description, it may be seen that various features are grouped together in a single embodiment for the purpose of streamlining the disclosure. This method of disclosure is not to be interpreted as limiting the claims. Thus, the following claims are hereby incorporated into the Detailed Description, with claims standing on their own as a separate embodiments.
Number | Name | Date | Kind |
---|---|---|---|
4487639 | Lam et al. | Dec 1984 | A |
4551743 | Murakami | Nov 1985 | A |
4683637 | Varker et al. | Aug 1987 | A |
4769687 | Nakazato et al. | Sep 1988 | A |
4992843 | Blossfeld et al. | Feb 1991 | A |
5043778 | Teng et al. | Aug 1991 | A |
5086322 | Ishii et al. | Feb 1992 | A |
5148164 | Nakamura et al. | Sep 1992 | A |
5258642 | Nakamura | Nov 1993 | A |
5391907 | Jang | Feb 1995 | A |
5436183 | Davis et al. | Jul 1995 | A |
5473500 | Payne et al. | Dec 1995 | A |
5565375 | Hiser et al. | Oct 1996 | A |
5581104 | Lowrey et al. | Dec 1996 | A |
5726562 | Mizuno | Mar 1998 | A |
5767552 | Casper et al. | Jun 1998 | A |
5780897 | Krakauer | Jul 1998 | A |
5814865 | Duvvury et al. | Sep 1998 | A |
5834793 | Shibata | Nov 1998 | A |
5847429 | Lien et al. | Dec 1998 | A |
5852375 | Byrne et al. | Dec 1998 | A |
5852540 | Haider | Dec 1998 | A |
RE36024 | Ho et al. | Jan 1999 | E |
5877046 | Yu et al. | Mar 1999 | A |
5880917 | Casper et al. | Mar 1999 | A |
5930094 | Amerasekera et al. | Jul 1999 | A |
5949254 | Keeth | Sep 1999 | A |
5956598 | Huang et al. | Sep 1999 | A |
5982599 | Ma et al. | Nov 1999 | A |
5986867 | Duvvury et al. | Nov 1999 | A |
6013936 | Colt, Jr. | Jan 2000 | A |
6025736 | Vora et al. | Feb 2000 | A |
6069610 | Denda | May 2000 | A |
6091594 | Williamson et al. | Jul 2000 | A |
6096610 | Alavi et al. | Aug 2000 | A |
6104589 | Williamson | Aug 2000 | A |
6118323 | Chaine et al. | Sep 2000 | A |
6130811 | Gans et al. | Oct 2000 | A |
6137338 | Marum et al. | Oct 2000 | A |
6140682 | Liu et al. | Oct 2000 | A |
6147538 | Andresen et al. | Nov 2000 | A |
6181540 | Schoenfeld et al. | Jan 2001 | B1 |
6194764 | Gossner et al. | Feb 2001 | B1 |
6204537 | Ma | Mar 2001 | B1 |
6246094 | Wong et al. | Jun 2001 | B1 |
6271566 | Tsuchiaki | Aug 2001 | B1 |
6285213 | Makino | Sep 2001 | B1 |
6310379 | Andresen et al. | Oct 2001 | B1 |
6331469 | Park et al. | Dec 2001 | B1 |
6344669 | Pan | Feb 2002 | B1 |
6346729 | Liang et al. | Feb 2002 | B1 |
6399973 | Roberds | Jun 2002 | B1 |
6465852 | Ju | Oct 2002 | B1 |
6466423 | Yu | Oct 2002 | B1 |
6515344 | Wollesen | Feb 2003 | B1 |
6700151 | Peng | Mar 2004 | B2 |
6713993 | Descombes | Mar 2004 | B2 |
6809386 | Chaine et al. | Oct 2004 | B2 |
6826026 | Duvvury et al. | Nov 2004 | B2 |
6847235 | Graves | Jan 2005 | B2 |
6958518 | Wylie | Oct 2005 | B2 |
7215188 | Ramaraju et al. | May 2007 | B2 |
7253064 | Chaine et al. | Aug 2007 | B2 |
20020142552 | Wu | Oct 2002 | A1 |
20050275055 | Parthasarathy et al. | Dec 2005 | A1 |
20080019064 | Chaine et al. | Jan 2008 | A1 |
20090096501 | Ng et al. | Apr 2009 | A1 |
Number | Date | Country | |
---|---|---|---|
20100149710 A1 | Jun 2010 | US |