Claims
- 1. A soft magnetic thin film consisting essentially of a single layer of a FeaBbNc composition, wherein a, b and c each denote atomic percent, provided that a+b+c=100, and B denotes at least one of Co, Ni and Ru, and wherein the compositional range is given by0<b≦5, and0<c<5, wherein said composition is substantially uniform along the thickness of the film, and wherein said magnetic film has a coercivity not exceeding 2.5 Oe and a saturation magnetic flux density B25 of at least 16 kG measured at a magnetic field of 25 Oe.
- 2. The soft thin magnetic film according to claim 1, wherein the film exhibits uniaxial anisotropy.
- 3. The soft thin magnetic film according to claim 1, wherein b is at least 0.5 atomic percent and c is at least 0.5 atomic percent.
- 4. The soft thin magnetic film according to claim 3, wherein b is at least 1 atomic percent.
- 5. The soft thin magnetic film according to claim 2, which has a uniaxial anisotropy field strength of at least 1 Oe.
- 6. The soft thin magnetic film according to claim 5, which has a uniaxial anisotropy field strength of 2 to 5 Oe.
- 7. The soft thin magnetic film according to claim 1, which has been produced by subjecting a deposited thin film having said compositional formula to heat treatment at a temperature of 220 to 450° C.
- 8. The soft thin magnetic film according to claim 1, which has an average crystal grain size of not more than 50 nm.
- 9. The soft thin magnetic film according to claim 7, which has an average crystal grain size of not more than 50 nm.
- 10. The soft thin magnetic film according to claim 7, which has an average crystal grain size of not more than 30 nm.
- 11. The soft thin magnetic film according to claim 2, which has been produced by subjecting a deposited thin film having said compositional formula to heat treatment at a temperature of 220 to 450° C. within a magnetic field.
- 12. The soft thin magnetic film according to claim 11, which has an average crystal grain size of not more than 50 nm.
- 13. The soft thin magnetic film according to claim 2, which has an average crystal grain size of not more than 50 nm.
- 14. The soft thin magnetic film according to claim 1, wherein B denotes Co.
- 15. The soft thin magnetic film according to claim 1, wherein B denotes Ni.
Priority Claims (1)
Number |
Date |
Country |
Kind |
1-81606 |
Apr 1989 |
JP |
|
Parent Case Info
This is a Continuation of application Ser. No. 08/001,239 filed Jan. 6, 1993, now abandoned, which is a Continuation of application Ser. No. 07/504,165 filed Apr. 3, 1990, now abandoned.
US Referenced Citations (12)
Foreign Referenced Citations (5)
Number |
Date |
Country |
286124 |
Oct 1988 |
EP |
303324 |
Feb 1989 |
EP |
197916 |
Sep 1987 |
JP |
A-64-42108 |
Feb 1989 |
JP |
A-1-229408 |
Sep 1989 |
JP |
Non-Patent Literature Citations (2)
Entry |
Thermal Stability of Compositionally Modulated Amorphous Nitride Alloy Films, Sakakima et al, The Journal of the Magnetics Society of Japan, vol. 12, No. 2, (1988), pp. 299-304. |
Magnetics Properties of Amorphous Films Prepared by N2 Reactive Sputtering, Sakakima et al, IECE Technical Report MR 86-4, vol. 86, No. 27. pp. 25-32 (IECE: Institute of Electronics & Communication Engineers of Japan, 1986. |
Continuations (2)
|
Number |
Date |
Country |
Parent |
08/001239 |
Jan 1993 |
US |
Child |
08/479843 |
|
US |
Parent |
07/504165 |
Apr 1990 |
US |
Child |
08/001239 |
|
US |