Claims
- 1. A solid-state image sensor comprising:a semiconductor substrate; an image area having unit cells each comprising a plurality of photoelectric conversion sections formed within respective isolated active regions on said semiconductor substrate and a signal scanning circuit arranged in a two-dimensional array; and signal lines configured to read signals from each of said unit cells within said image area, wherein each of said plurality of photoelectric conversion sections is formed by at least two ion implantations.
- 2. The solid-state image sensor according to claim 1, wherein each of said plurality of photoelectric conversion sections has a first area in a vicinity of a surface thereof, and has a second area, which is smaller than the first area, at a deeper portion thereof.
- 3. The solid-state image sensor according to claim 1, wherein said active regions are isolated by an insulator element isolation.
- 4. The solid-state image sensor according to claim 1, wherein an energy of ions implanted in one of said at least two ion implantations is different from an energy of ions implanted in another one of said at least two ion implantations.
- 5. The solid-state image sensor according to claim 4, wherein ions implanted in one of said at least two ion implantations are different from ions implanted in another one of said at least two ion implantations.
- 6. The solid-state image sensor according to claim 1, wherein ions implanted in one of said at least two ion implantations are different from ions implanted in another one of said at least two ion implantations.
- 7. A solid-state imaging system comprising:an optical system configured to receive an optical image from an object and to introduce the optical image onto a specified position; an image processor having a sensor configured to convert the optical image introduced onto the specified position into electric signals corresponding to the quantity of light of the optical image, for every pixel unit; and a signal processor configured to process outputs from the image processor into a desired format to output the processed signals, wherein the sensor comprises: a semiconductor substrate; an image area having unit cells each comprising a plurality of photoelectric conversion sections formed within respective isolated active regions on said semiconductor substrate and a signal scanning circuit arranged in a two-dimensional array; and signal lines configured to read signals from each of said unit cells within said image area; wherein each of said plurality of photoelectric conversion sections is formed by at least two ion implantations.
- 8. The solid-state imaging system according to claim 7, wherein eh of said plurality of photoelectric conversion sections has a first area in a vicinity of a surface thereof, and has a second area, which is smaller than the first area, at a deeper portion thereof.
- 9. The solid-state imaging system according to claim 7, wherein said active regions are isolated by an insulator element isolation.
- 10. The solid-state imaging system according to claim 7, wherein an energy of ions implanted in one of said at least two ion implantations is different from an energy of ions implanted in another one of said at least two ion implantations.
- 11. The solid-state image sensor according to claim 10, wherein ions implanted in one of said at least two ion implantations are different from ions implanted in another one of said at least two ion implantations.
- 12. The solid-state image sensor according to claim 7, wherein ions implanted in one of said at least two ion implantations are different from ions implanted in another one of said at least two ion implantations.
Priority Claims (2)
Number |
Date |
Country |
Kind |
9-179928 |
Jul 1997 |
JP |
|
9-188726 |
Jul 1997 |
JP |
|
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a divisional application of, and claims priority to, Ser. No. 09/109,061, filed Jul. 2, 1998, now U.S. Pat. No. 6,194,244, the entire content of which is hereby incorporated by reference. The present application also claims priority to Japanese Applications No. JP 9-179928, filed Jul. 4, 1997 and JP 9-188726, filed Jul. 14, 1997, the entire contents of which are hereby incorporated by reference.
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