Claims
- 1. A solvent mixture for use in a vapor degreasing system, said solvent mixture comprising:(a) about 85 wt. % to less than about 96.5 wt. % n-propyl bromide; (b) about 3.5 wt. % to less than about 15 wt. % of a mixture of low boiling solvents, said mixture of low boiling solvents comprising about 0.5 wt. % to about 1 wt. % nitromethane, based on the solvent mixture, about 0.5 wt. % to about 1 wt. % 1,2-butylene oxide based on the solvent mixture, and the balance of said mixture of low boiling solvents being 1,3-dioxolane; and (c) an effective amount of up to about 5 wt. % of at least one additive selected from the group consisting of sec-butanol, ethanol, and methanol, provided that sec-butanol comprises 0 wt. % to about 3 wt. % of said solvent mixture.
- 2. The solvent mixture of claim 1 further comprising an effective amount of at least one saturated terpene.
- 3. The solvent mixture of claim 2 comprising up to about 6.5 wt. % of a terpene mixture of cis-pinane and trans-pinane.
- 4. The solvent mixture of claim 3 wherein said terpene mixture comprises about 35 wt. % to about 50 wt. % cis-pinane and about 35 wt. % to about 50 wt. % tran-spinane.
- 5. The solvent mixture of claim 2 wherein said terpene mixture further comprises at least one terpene selected from the group consisting of endo-isocamphene, α-pinene, cis-para-menthane, and trans-para-menthane.
- 6. The solvent mixture of claim 2 wherein said terpene mixture further comprises endo-isocamphene, α-pinene, cis-para-menthane, and trans-para-menthane.
- 7. The solvent mixture of claim 1 wherein said additive consists essentially of up to about 3 wt. % of sec-butanol.
- 8. The solvent mixture of claim 7 wherein said sec-butanol comprises about 1 wt. % of said solvent mixture.
- 9. The solvent mixture of claim 1 comprising about 3.5 wt. % to about 5 wt. % of said mixture of low boiling solvents.
- 10. A method for cleaning an article having a surface in a vapor degreaser, said method comprising:(a) providing a vapor degreaser system having a solvent reservoir; (b) adding to the solvent reservoir of said vapor degreaser system a solvent mixture, said solvent mixture comprising: i) about 85 wt. % to less than about 96.5 wt. % n-propyl bromide; ii) about 3.5 wt. % to less than about 15 wt. % of a mixture of low boiling solvents, said mixture of low boiling solvents comprising about 0.5 wt. % to about 1 wt. % nitromethane, based on the solvent mixture, about 0.5 wt. % to about 1 wt. % 1,2-butylene oxide, and the balance of said mixture of low boiling solvents being 1,3-dioxolane; and iii) an effective amount of up to about 5 wt. % of at least one additive selected from the group consisting of sec-butanol, ethanol, and methanol, provided that sec-butanol comprises 0 wt. % to about 3 wt. % of said solvent mixture; (c) boiling said solvent mixture to form a vapor layer; (d) introducing into said vapor layer said article to be cleaned, said vapor layer condensing on a surface of said article, thereby subjecting the surface of said article to a solvent-flushing action; and (e) removing said article from said vapor layer.
- 11. The method of claim 10 further comprising an effective amount of at least one saturated terpene.
- 12. The method of claim 11 comprising up to about 6.5 wt. % of a terpene mixture of cis-pinane and trans-pinane.
- 13. The method of claim 12 wherein said terpene mixture comprises about 35 wt. % to about 50 wt. % cis-pinane and about 35 wt. % to about 50 wt. % trans-pinane.
- 14. The method of claim 11 wherein said terpene mixture further comprises a terpene selected from the group consisting of endo-isocamphene, α-pinene, cis-para-menthane and trans-para-menthane.
- 15. The method of claim 11 wherein said terpene mixture further comprises endo-isocamphene, α-pinene, cis-para-menthane and trans-para-menthane.
- 16. The method of claim 10 wherein said additive consists essentially of up to about 3 wt. % of sec-butanol.
- 17. The method of claim 16 wherein said sec-butanol comprises about 1 wt. % of said solvent mixture.
- 18. The method of claim 10 wherein said solvent mixture comprises about 3.5 wt. % to about 5 wt. % of said mixture of low boiling solvents.
- 19. A solvent mixture for use in a vapor degreasing system, said solvent mixture comprising:(a) about 85 wt. % to less than about 96.5 wt. % n-propyl bromide; (b) about 3.5 wt. % to less than about 15 wt. % of a mixture of low boiling solvents, said mixture comprising about 0.5 wt. % to about 1 wt. % nitromethane, based on the solvent mixture, about 0.5 wt. % to about 1 wt. % 1,2-butylene oxide, based on the solvent mixture, and the balance of said mixture of low boiling solvents being 1,3-dioxolane; and (c) the balance being at least one additive selected from the group consisting of sec-butanol, ethanol, and methanol, provided that sec-butanol comprises 0 wt. % to about 3 wt. % of said solvent mixture.
- 20. The solvent mixture of claim 19 comprising about 3.5 wt. % to about 5 wt. % of said mixture of low boiling solvents.
- 21. A method for cleaning an article having a surface in a vapor degreaser, said method comprising:(a) providing a vapor degreaser system having a solvent reservoir; (b) adding to the solvent reservoir of said vapor degreaser system a solvent mixture, said solvent mixture comprising: i) about 85 wt. % to less than about 96.5 wt. % n-propyl bromide; ii) about 3.5 wt. % to less than about 15 wt. % of a mixture of low boiling solvents, said mixture comprising about 0.5 wt. % to about 1 wt. % nitromethane, based on the solvent mixture, about 0.5 wt. % to about 1 wt. % 1,2-butylene oxide, based on the solvent mixture, and the balance of said mixture of low boiling solvents being 1,3-dioxolane; and iii) the balance being at least one additive selected from the group consisting of sec-butanol, ethanol, and methanol, provided that sec-butanol comprises 0 wt. % to about 3 wt. % of said solvent mixture; (c) boiling said solvent mixture to form a vapor layer; (d) introducing into said vapor layer said article to be cleaned, said vapor layer condensing on a surface of said article, thereby subjecting the surface of said article to a solvent-flushing action; and (e) removing said article from said vapor layer.
- 22. The method of claim 21 wherein said solvent mixture comprises about 3.5 wt. % to about 5 wt. % of said mixture of low boiling solvents.
CROSS-REFERENCE TO RELATED APPLICATION
This is a continuation of U.S. application Ser. No. 08/894,495 filed Nov. 10, 1997, now U.S. Pat. No. 5,938,859 issued Aug. 17, 1999, which is the U.S. national phase of International Application No. PCT/US97/05183 filed Mar. 28, 1997, which is a continuation-in-part of U.S. application Ser. No. 08/580,840 filed Dec. 29, 1995, now U.S. Pat. No. 5,616,549 issued Apr. 1, 1997.
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Continuations (1)
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08/894495 |
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Child |
09/375089 |
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Continuation in Parts (1)
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08/580840 |
Dec 1995 |
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08/894495 |
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US |