Patent Application
20220057642
This application claims priority to Korean Patent Application No. 10-2020-0104156, filed on Aug. 19, 2020, in the Korean Intellectual Property Office, the disclosure of which is incorporated by reference herein in its entirety.
Apparatuses and methods consistent with example embodiments relate to a spatial light modulator capable of increasing a beam steering speed, a beam steering apparatus including the spatial light modulator, and a method of manufacturing the spatial light modulator.
An advanced driving assistance system (ADAS) having various functions has been commercialized. For example, there is an increased demand for vehicles having functions such as adaptive cruise control (ACC) for recognizing a position and a speed of another vehicle to reduce a speed of a driver's vehicle when there is a risk of collision and to drive the vehicle within a set speed range when there is no risk of collision, and an autonomous emergency braking system (AEB) for detecting another vehicle in front of a driver's vehicle and automatically stopping the driver's vehicle to prevent collision when the driver does not respond to a risk of collision or a response method to the risk of collision is not proper. In addition, it is expected that vehicles capable of autonomously driving will be commercialized in the near future.
Accordingly, there is an increasing interest in optical measurement devices capable of providing information around a vehicle. For example, a light detection and ranging (LiDAR) device mounted in a vehicle emits a laser beam to a selected region around the vehicle and detects a reflected laser beam to provide information on a distance to an object around the vehicle, a relative speed, an azimuth angle, and so on. To this end, the LiDAR device includes a beam steering apparatus capable of steering light to a desired region.
The beam steering apparatus may be divided into a mechanical beam steering apparatus and a non-mechanical beam steering apparatus. For example, the mechanical beam steering apparatus uses a method of rotating a light source, a method of rotating a mirror that reflects light, a method of moving a spherical lens in a direction perpendicular to an optical axis, and so on. In addition, the non-mechanical beam steering apparatus uses a method of using a semiconductor element and a method of electrically controlling an angle of reflected light by using a reflective phased array.
One or more example embodiments provide a spatial light modulator capable of increasing a beam steering speed and a beam steering apparatus including the spatial light modulator.
One or more example embodiments also provide a method of manufacturing a spatial light modulator capable of increasing a beam steering speed.
According to an aspect of an example embodiment, there is provided a spatial light modulator including: a first reflective layer; a cavity layer provided on the first reflective layer; and a second reflective layer including a plurality of unit lattice structures that are provided on the cavity layer and spaced apart from each other, wherein each of the plurality of unit lattice structures may have a polycrystalline structure, and at least one grain of the polycrystalline structure may have a column shape and a height equal to a height of the plurality of unit lattice structures.
Each of the plurality of unit lattice structures may have the polycrystalline structure in which a number of grains is 5 or less.
A width of each of the plurality of unit lattice structures may be 500 nm or less, and a width of the at least one grain may be 100 nm or more.
The plurality of unit lattice structures may include silicon (Si).
The plurality of unit lattice structures may be PIN diodes.
The second reflective layer may further include a dielectric material that is filled between the plurality of unit lattice structures and has a refractive index less than refractive indices of the plurality of unit lattice structures.
The cavity layer may include silicon oxide (SiO2).
The first reflective layer may be a distributed Bragg reflector.
The first reflective layer may include first layers and second layers that are alternately stacked with each other. The first layers may include one of silicon (Si), silicon nitride (Si3N4), silicon oxide (SiO2), and titanium oxide (TiO2), and the second layers may include another one of silicon (Si), silicon nitride (Si3N4), silicon oxide (SiO2), and titanium oxide (TiO2).
According to an aspect of another example embodiment, there is provided a beam steering apparatus including: a light source configured to emit light; the spatial light modulator which is configured to transmit the light to an object by adjusting a travelling direction of the light emitted from the light source; a photodetector configured to detect the light reflected from the object; and a controller configured to control the spatial light modulator.
According to an aspect of another example embodiment, there is provided a method of manufacturing a spatial light modulator, the method including: providing a cavity layer on a first reflective layer; and providing a second reflective layer on the cavity layer, the second reflective layer including a plurality of unit lattice structures that are spaced apart from each other, wherein, the providing of the second reflective layer may include performing a heat treatment so that each of the plurality of unit lattice structures has a polycrystalline structure and at least one grain of the polycrystalline structure has a column shape and a height equal to a height of the plurality of unit lattice structures.
The providing of the second reflective layer may further include: depositing a semiconductor layer on the cavity layer; patterning the semiconductor layer to form the plurality of unit lattice structures spaced apart from each other; and applying the heat treatment to the plurality of unit lattice structures.
The applying the heat treatment may include: heating the plurality of unit lattice structures at a temperature of 500° C. to 650° C. for 8 hours to 12 hours.
The applying the heat treatment may further include: heating the plurality of unit lattice structures at a temperature of at least 750° C. within 10 minutes.
Each of the plurality of unit lattice structures may have the polycrystalline structure in which a number of grains is 5 or less.
A width of each the plurality of unit lattice structures may be 500 nm or less, and a width of the at least one grain may be 100 nm or more.
The method may further include forming a dielectric between the plurality of unit lattice structures, the dielectric having a refractive index less than refractive indices of the plurality of unit lattice structures.
The plurality of unit lattice structures may be PIN diodes.
The cavity layer may include silicon oxide (SiO2).
The first reflective layer may be a distributed Bragg reflector.
The above and other aspects, features, and advantages of certain example embodiments of the disclosure will be more apparent from the following description taken in conjunction with the accompanying drawings, in which:
Example embodiments are described in greater detail below with reference to the accompanying drawings.
In the following description, like drawing reference numerals are used for like elements, even in different drawings. The matters defined in the description, such as detailed construction and elements, are provided to assist in a comprehensive understanding of the example embodiments. However, it is apparent that the example embodiments can be practiced without those specifically defined matters. Also, well-known functions or constructions are not described in detail since they would obscure the description with unnecessary detail.
As used herein, the term “and/or” includes any and all combinations of one or more of the associated listed items. Expressions such as “at least one of,” when preceding a list of elements, modify the entire list of elements and do not modify the individual elements of the list. For example, the expression, “at least one of a, b, and c,” should be understood as including only a, only b, only c, both a and b, both a and c, both b and c, all of a, b, and c, or any variations of the aforementioned examples.
Hereinafter, a spatial light modulator and a beam steering apparatus including the spatial light modulator according to various embodiments will be described in detail with reference to the accompanying drawings. In the drawings, like reference numerals refer to like elements, and a size of each element in the drawings may be exaggerated for clarity and convenience of description. The terms “first”, “second”, and the like may be used to describe various configuration elements, and the configuration elements should not be limited by the terms. Terms are only used for the purpose of distinguishing one configuration element from another configuration element.
A singular expression includes plural expressions unless the context clearly indicates otherwise. In addition, when a part is described to “include” a certain configuration element, which means that the part may further include other configuration elements, except to exclude other configuration elements unless otherwise stated. In addition, a size and a thickness of each element in the drawings may be exaggerated for clarity and convenience of description. In addition, when it is described that a certain material layer exists on a substrate or another layer, the material layer may exist in direct contact with the substrate or a second layer, or a third layer may exist therebetween. In addition, in the embodiments below, materials forming each layer are examples, and thus, other materials may be used.
In addition, a term “. . . unit”, “. . . module”, or the like described in the specification means a unit for processing at least one function or operation, which may be implemented by hardware or software, or a combination of the hardware and the software.
Certain implementations described in the present embodiment are examples, and do not limit the technical scope in any way. For the sake of the brief specification, descriptions on electronic configurations of related art, control systems, software, and other functional aspects of the systems may be omitted. In addition, connections of lines between configuration elements or connection members illustrated in the drawings represent functional connections and/or physical or circuit connections by way of example and may be replaced or represented as additional various functional connections, physical connections, or circuit connections in the actual device.
The use of a term “the above-described” and similar instruction terms may correspond to both the singular and the plural.
The steps constituting the method may be performed in any suitable order unless there is a clear statement that the steps should be performed in the order described. In addition, all exemplary terms (for example, and so on) are used simply for the purpose of describing technical concepts in detail, and the scope is not limited by the terms unless limited by the claims.
Referring to
The spatial light modulator 100 may modulate a phase of an incident light Li and outputs the modulated phase. The spatial light modulator 100 may include a plurality of pixels PX. The pixel PX may be a unit for independently driving the spatial light modulator 100. Alternatively, the pixel PX may represent a basic unit for independently modulating a phase of light. One second reflective layer 150 may be arranged in the pixel PX, or a plurality of the second reflective layers 150 may be arranged in the pixel PX.
The first reflective layer 130 may be arranged on a substrate 110.
The substrate 110 may be a transparent substrate 110 that transmits light. For example, the substrate 110 may be a silicon substrate or a glass substrate. However, the substrate 110 is not limited thereto and may be a substrate 110 composed of various materials. In addition, the substrate 110 corresponds to an optional configuration and may be removed if necessary.
The first reflective layer 130 may be a distributed Bragg reflector. For example, the first reflective layer 130 may be formed by alternately stacking a first layer 131 and a second layer 132 having different refractive indices a plurality of times. Waves reflected from an interface of each layer may interfere with each other due to a difference in refractive index. The first reflective layer 130 may have a structure in which layers including two of, for example, silicon (Si), silicon nitride (Si3N4), silicon oxide (SiO2), and titanium oxide (TiO2) are alternately stacked. The first reflective layer 130 may have a structure in which, for example, a silicon (Si) layer and a silicon oxide (SiO2) layer are alternately stacked. Light reflectance may be adjusted according to a thickness and the number of stacks of the first and second layers 131 and 132 of the first reflective layer 130.
In the above-described embodiment, a distributed Bragg reflector is mainly described as an example of the first reflective layer 130, but embodiments are not limited thereto. For example, at least one surface of the first reflective layer 130 may be a metal reflector formed of metal.
Referring back to
The cavity layer 140 may include, for example, silicon oxide (SiO2). A resonance wavelength may be determined according to a thickness of the cavity layer 140. As a thickness of the cavity layer 140 is great, a resonance wavelength of light may be long, and as the thickness of the cavity layer 140 is small, the resonance wavelength of light may be short.
In the second reflective layer 150, a plurality of unit lattice structures 151 may be arranged to be spaced apart from each other at predetermined intervals. The second reflective layer 150 may be referred to as a grating reflector. Reflectance of the second reflective layer 150 may be different from the reflectance of the first reflective layer 130.
Reflection and transmission of light may be adjusted by adjusting a width, a height, and a pitch of the plurality of unit lattice structures 151.
A width W0 of the unit lattice structure material 151 may be 300 nm to 500 nm. A height H0 of the unit lattice structure material 151 may be 550 nm to 650 nm. A pitch P0 of the unit lattice structure material 151 may be 700 nm to 770 nm. However, the width W0, the height H0, and the pitch P0 of the unit lattice structure material 151 are not limited thereto and may vary depending on wavelengths of light.
The unit lattice structure material 151 may have a refractive index greater than refractive indices of surrounding materials. For example, the unit lattice structure material 151 may be formed of silicon. However, a material of the unit lattice structure material 151 is not limited thereto.
The second reflective layer 150 may further include a dielectric 155 filled between the plurality of unit lattice structures 151. The dielectric 155 may have a refractive index smaller than the refractive indices of the plurality of unit lattice structures 151. For example, when the unit lattice structure material 151 includes silicon, the dielectric 155 may include silicon oxide. The dielectric 155 may be formed of the same material as the cavity layer 140. The dielectric 155 not only may increase a refractive index of the second reflective layer 150, but also may protect the plurality of unit lattice structures 151 during a manufacturing step.
When light is incident toward the first reflective layer 130 of the spatial light modulator 100 according to the embodiment described above, incident light is repeatedly reflected between the first reflective layer 130 and the second reflective layer 150 and light (Lo) of a certain phase may be outputted. The certain phase may be controlled by a current supplied to the second reflective layer 150. The incident light Li may pass through the second reflective layer 150 in a vertical direction, and may propagate through the cavity layer 140 in a horizontal direction. The first reflective layer (including the distributed Bragg reflector) 130 and the second reflective layer 150 may reflect the incident light Li, and thereby have the incident light Li resonated and trapped in the cavity layer 140, and then emitted through the second reflective layer 150.
The unit lattice structure material 151 may be a PIN diode. For example, the unit lattice structure material 151 may include a p-type semiconductor region 1513, an n-type semiconductor region 1511, and an undoped intrinsic semiconductor region 1512 arranged between the p-type semiconductor region 1513 and the an n-type semiconductor region 1511. A height of each of the p-type semiconductor region 1513 and the n-type semiconductor region 1511 may be 50 nm to 200 nm, and a height of the intrinsic semiconductor region 1512 may be 100 nm to 600 nm.
As an example, when the unit lattice structure material 151 includes silicon (Si), the unit lattice structure material 151 may include a p-type silicon region, an intrinsic silicon region, and an n-type silicon region.
In the unit lattice structure material 151, the n-type semiconductor region 1511, the intrinsic semiconductor region 1512, and the p-type semiconductor region 1513 may be arranged in a height direction and may be connected to an upper wire 1517 and a lower wire 1516. In
A refractive index of the second reflective layer 150 may vary depending on currents flowing through the unit lattice structure material 151. The refractive index of the second reflective layer 150 may be changed depending on the currents, and resonance characteristics may be changed depending on changes of the refractive index, and thus, a phase of the light Lo emitted to the outside may be adjusted. Further, reflectance of the second reflective layer 150 may be adjusted by the flowing current.
However, as described above, the phase of the emitted light Lo varies depending on currents flowing through the unit lattice structure material 151, and thus, when the current flowing through the unit lattice structure material 151 is small, the phase of the light Lo emitted from the spatial light modulator 100 may be reduced.
In consideration of this point, the spatial light modulator 100 according to the embodiment may provide the unit lattice structure material 151 having a columnar polycrystalline structure which has relatively less grain boundaries GB and defects D, and thereby a current that causes a relatively large change in refractive index in the second reflective layer 150, may flow through the polycrystalline structure.
Referring to
The grain 1510 may have the height H greater than a width W to have a column shape or a cylindrical pillar shape. For example, the height H of the grain 1510 may be greater than the width W of the grain 1510 by two or more times. For example, the height H of the grain 1510 may be greater than the width W of the grain 1510 by five or more times. For example, the height H of the grain 1510 may be greater than the width W of the grain 1510 by seven or more times. For example, the height H of the grain 1510 may be greater than the width W of the grain 1510 by ten or more times. However, the height H of the grain 1510 may be less than the width W of the grain 1510 by 20 or more times.
A crystal structure of the unit lattice structure material 151 may be formed by a heat treatment. A heat treatment method will be described below when describing
The grain 1510 has an end portion in contact with the cavity layer 140 and extends in a direction away from the cavity layer 140. The height H of the grain 1510 may be 550 nm to 650 nm.
The unit lattice structure material 151 may have a polycrystalline structure in which the number of grains 1510 is 10 or less. For example, the unit lattice structure material 151 may have a polycrystalline structure in which the number of grains 1510 is 7 or less. For example, the unit lattice structure material 151 may have a polycrystalline structure in which the number of grains 1510 is 5 or less.
The width W of the grain 1510 may be 1/10 to ½ of the width W0 of the unit lattice structure material 151. For example, the width W of the grain 1510 may be ⅕ or more of the width W0 of the unit lattice structure material 151. When the width W0 of the unit lattice structure material 151 is 500 nm or less, the width W of the grain 1510 may be 100 nm or more. Here, when the width W of the grain 1510 changes toward a height direction, the width W may be defined as an average width. When the width W of the grain 1510 is reduced, the width W of the grain 1510 may be greater than 50 nm in consideration of an increase in resistance of the unit lattice structure material 151.
Referring to
As described above, even when the same voltage is applied to the same unit lattice structure material 151, a current of 3 times to 2×107 times may flow through the unit lattice structure material 151 having the grains 1510 of a column shape compared to the unit lattice structure material 151′ having an amorphous structure or the unit lattice structure material 151″ having a polycrystalline structure of the small grains 1510′. Accordingly, as a crystal structure of the unit lattice structure material 151 has the grains 1510 of a column shape, the spatial light modulator 100 may provide a relatively high phase, compared with the first comparative example and the second comparative example. A beam steering apparatus including the spatial light modulator 100 may increase a steering speed and efficiency of a beam.
In the embodiment described above, an example in which the unit lattice structure material 151 is a PIN diode, and reflectance of the second reflective layer 150 changes depending on currents flowing therethrough is described but is not limited thereto. For example, as illustrated in
Referring to
The substrate 110 may be a transparent substrate 110 that transmits light. For example, the substrate 110 may be a silicon substrate 110 or a glass substrate 110. However, the substrate 110 is not limited thereto and may be a substrate 110 formed of various materials.
The first reflective layer 130 may be a distributed Bragg reflector. For example, the first reflective layer 130 may be formed by alternately stacking the first layer 131 and the second layer 132 having different refractive indices a plurality of times. Waves reflected from an interface of each layer may interfere with each other due to a difference in refractive index.
The first reflective layer 130 may have a structure in which layers including two of, for example, silicon (Si), silicon nitride (Si3N4), silicon oxide (SiO2), and titanium oxide (TiO2) are alternately stacked. The first reflective layer 130 may have a structure in which, for example, a silicon (Si) layer and a silicon oxide (SiO2) layer are alternately stacked. Reflectance of light may be adjusted by a thickness and the number of stacks of the first and second layers 131 and 132 of the first reflective layer 130.
In the embodiment described above, the distributed Bragg reflector is mainly described as an example of the first reflective layer 130, and embodiments are not limited thereto. For example, at least one surface of the first reflective layer 130 may be a metal reflector formed of metal.
Referring to
Referring to
Referring to
Referring to
Referring to
Referring to
A heat treatment for the unit lattice structures 151 may be performed at a low temperature for a long time. For example, the plurality of unit lattice structures 151 may be heated at temperatures of 500° C. to 650° C. for 8 to 12 hours. By doing so, the unit lattice structure material 151 may have a polycrystalline structure having a large crystal size (e.g., a height of 550 nm to 650 nm).
A seed arranged inside the unit lattice structure material 151 may grow in a height direction to form the grain 1510 of a column shape. In this case, the dielectric 155 filled around the unit lattice structures 151 may protect the plurality of unit lattice structures 151 from heat during a heat treatment process.
Referring to
It may be seen that, when the heat treatment is not performed, the unit lattice structure material 151′ is in an amorphous state as illustrated in
In the example embodiment described above, a method of depositing the semiconductor layer 152 and patterning the semiconductor layer 152 to form the second reflective layer 150 having the plurality of unit lattice structures 151 is described. However, the method of forming the plurality of unit lattice structures 151 is not limited thereto, and a method of directly growing the plurality of unit lattice structures 151 on the cavity layer 140 may be used therefor.
Meanwhile, a step of performing the heat treatment of the plurality of unit lattice structures 151 may further include a high-temperature heat treatment step of performing heating at a high temperature for a short time after the low-temperature heat treatment step described above.
The high-temperature heat treatment may be performed at 750° C. or more within 10 minutes. The high-temperature heat treatment is may be performed at 900° C. or less 1 minute or more.
Few defects D may remain in the unit lattice structure material 151 in which the above-described low-temperature heat treatment is completed as illustrated in
The nanostructure material 120 may include a dielectric material with a high refractive index and a low loss. The nanostructure material 120 may include, for example, a dielectric with a refractive index in a range of 1.9 to 4.0. The nanostructure material 120 may include at least one of, for example, Si, Ge, SiGe, GaAs, Si3N4, TiO2, GaP, and InSb, or a combination thereof.
When a wavelength of light used by the spatial light modulator 100B is referred to as λ and a refractive index of the nanostructure material 120 is referred to as n, an arrangement interval ΛD of the nanostructure material 120 may be in a range of λ/(2n)-(5λ/2n). In addition, when the wavelength of light used by the spatial light modulator 100B is referred to as λ and the refractive index of the nanostructure material 120 is referred to as n, a height h of the nanostructure material 120 may be in a range of (3λ/2n)-(7λ/2n). The nanostructure material 120 may increase light transmission characteristics to increase light efficiency. The nanostructure material 120 may also widen a field of view (FOV) of light. The spatial light modulator 100B according to an example embodiment may change the FOV. For example, the FOV may be adjusted while maintaining intensity of light by adjusting a size of a cylinder. The FOV may be adjusted by arranging the nanostructures 120 by using a combination of a shape and an arrangement interval of the nanostructures 120 and a size of the nanostructure material 120.
Spatial light modulators according to the various example embodiments described above may be employed in a beam steering apparatus such as a three-dimensional (3D) sensor such as a light detection and ranging (LiDAR) device for vehicle or a depth sensor used for a 3D camera to increase precision.
The beam steering apparatus according to various example embodiments may be used for LiDAR for robots, LiDAR for drones, an intruder detection system for security, a subway screen door obstacle detection system, a depth sensor, a sensor for user face recognition in a mobile phone, augmented reality (Ar), motion recognition and object profiling in TV or game device, and so on in addition to the vehicle LiDAR.
For example,
Referring to
The light source 1110 may include, for example, a light source that emits visible light, a laser diode (LD) that emits near-infrared rays in a band of approximately 800 nm to approximately 1500 nm, or a light emitting diode (LED).
The spatial light modulator 1100 may include the example embodiments described with reference to
The controller 1130 may control operations of the spatial light modulator 1100, the light source 1110, and the photodetector 1120. For example, the controller 1130 may control ON/OFF operations of the light source 1110 and the photodetector 1120 and a beam scanning operation of the spatial light modulator 1100. In addition, the controller 1130 may calculate information on an object based on a measurement result of the photodetector 1120.
The beam steering apparatus 1000 may periodically emit light to several surrounding regions by using the spatial light modulator 1100 to obtain information on objects at a plurality of peripheral positions.
As illustrated in
The spatial light modulator according to the example embodiment described above may be applied to various systems. As an example, the spatial light modulator according to the embodiment may be applied to a LiDAR device. The LiDAR device may be a phase-shift device or a time-of-flight (TOF) device. The LiDAR device may be applied to an autonomous vehicle, a flying object such as a drone, a mobile device, a small walking apparatus (for example, bicycle, motorcycle, stroller, board, and so on), a robot, a human/animal assistance apparatus (for example, cane, helmet, jewelry, clothing, watch, bag, and so on), Internet of things (IoT) device/system, security device/system, and so on.
Referring to
The beam steering apparatus according to various example embodiments may be applied to various systems other than LiDAR. For example, when using a beam steering apparatus according to various example embodiments, 3D information on a space and an object may be obtained through scanning, and thus, the beam steering apparatus may be applied to a 3D image acquisition device, a 3D camera, or so on. In addition, the beam steering apparatus may also be applied to a holographic display device and a structured light generation device. In addition, the beam steering apparatus may be applied to various optical devices such as a hologram generation device, a light coupling device, a variable focus lens, and a depth sensor. In addition, the beam steering apparatus may be applied to various fields in which a meta surface or a meta structure is used. In addition, the spatial light modulator and the beam steering apparatus including the same according to the example embodiments may be applied to various optical and electronic devices for various purposes.
A spatial light modulator and a beam steering apparatus according to an example embodiment may obtain a high phase by increasing a change in refractive index of a reflective layer and may easily drive individual pixels to increase a beam steering speed.
A method of manufacturing a spatial light modulator according to an example embodiment may provide a spatial light modulator capable of increasing a change in refractive index of a reflective layer.
The foregoing exemplary embodiments are merely exemplary and are not to be construed as limiting. The present teaching can be readily applied to other types of apparatuses. Also, the description of the exemplary embodiments is intended to be illustrative, and not to limit the scope of the claims, and many alternatives, modifications, and variations will be apparent to those skilled in the art.
| Number | Date | Country | Kind |
|---|---|---|---|
| 10-2020-0104156 | Aug 2020 | KR | national |
