Sputter target for a physical vapor deposition chamber

Information

  • Patent Grant
  • D970566
  • Patent Number
    D970,566
  • Date Filed
    Tuesday, October 26, 2021
    3 years ago
  • Date Issued
    Tuesday, November 22, 2022
    2 years ago
  • US Classifications
    Field of Search
    • US
    • D23 249
    • D23 259
    • D23 262
    • D23 269
    • D15 138
    • D15 139
    • D15 143
    • D15 144
    • D15 1441
    • D15 1442
    • D15 150
    • D15 199
    • D13 118
    • D13 122
    • D13 133
    • D13 162
    • D13 182
    • D13 184
    • D13 199
    • D22 113
    • D22 119
    • CPC
    • H01J37/3414
    • H01J37/3423
    • H01L21/02631
    • H01L2221/68363
    • H01L2224/75186-75189
    • H01L21/67742
    • H01L21/0226
    • H01L21/02263
    • H01L21/02266
    • H01L21/02269
    • H01L21/02271
    • F16J7/00
    • E04D13/14
    • C23C14/3407
    • C23C14/35
  • International Classifications
    • 1509
    • Term of Grant
      15Years
Abstract
Description


FIG. 1 is a top isometric view of a sputter target for a physical vapor deposition chamber, according to our novel design.



FIG. 2 is a top plan view thereof.



FIG. 3 is a bottom plan view thereof.



FIG. 4 is a right elevation view thereof.



FIG. 5 is a left elevation view thereof.



FIG. 6 is a front elevation view thereof.



FIG. 7 is a back elevation view thereof; and,



FIG. 8 is an enlarged cross-sectional view taken along line 8-8 in FIG. 2.


The dashed lines in FIGS. 1-8 represent unclaimed environment and form no part of the claimed design.


Claims
  • We claim the ornamental design for a sputter target for a physical vapor deposition chamber, as shown and described.
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Divisions (1)
Number Date Country
Parent 29728957 Mar 2020 US
Child 29813065 US