Sputter target for a physical vapor deposition chamber

Information

  • Patent Grant
  • D937329
  • Patent Number
    D937,329
  • Date Filed
    Monday, March 23, 2020
    4 years ago
  • Date Issued
    Tuesday, November 30, 2021
    3 years ago
  • US Classifications
    Field of Search
    • US
    • D23 249
    • D23 259
    • D23 262
    • D23 269
    • D15 138
    • D15 139
    • D15 143
    • D15 144
    • D15 1441
    • D15 1442
    • D15 150
    • D15 199
    • D13 118
    • D13 122
    • D13 133
    • D13 162
    • D13 182
    • D13 184
    • D13 199
    • D22 113
    • D22 119
    • CPC
    • H01J37/3414
    • H01J37/3423
    • H01L21/02631
    • H01L2221/68363
    • H01L2224/75186-75189
    • H01L21/67742
    • H01L21/0226
    • H01L21/02263
    • H01L21/02266
    • H01L21/02269
    • H01L21/02271
    • F16J7/00
    • E04D13/14
    • C23C14/3407
    • C23C14/35
  • International Classifications
    • 1509
    • Term of Grant
      15Years
Abstract
Description


FIG. 1 is a top isometric view of a sputter target for a physical vapor deposition chamber, according to one embodiment of the novel design.



FIG. 2 is a top plan view thereof.



FIG. 3 is a bottom plan view thereof.



FIG. 4 is a right elevation view thereof.



FIG. 5 is a left elevation view thereof.



FIG. 6 is a front elevation view thereof.



FIG. 7 is a back elevation view thereof; and,



FIG. 8 is an enlarged cross-sectional view taken along line 8-8 in FIG. 2.


The broken lines in the drawings represent unclaimed environment and form no part of the claimed design.


Claims
  • We claim the ornamental design for a sputter target for a physical vapor deposition chamber, as shown and described.
US Referenced Citations (138)
Number Name Date Kind
5320728 Tepman Jun 1994 A
D351450 Maryska Oct 1994 S
5401675 Lee et al. Mar 1995 A
D363464 Fukasawa et al. Oct 1995 S
D376744 Eisenblatter Dec 1996 S
5624536 Wada et al. Apr 1997 A
D381030 Tepman Jul 1997 S
5643428 Krivokapic et al. Jul 1997 A
5702573 Biberger et al. Dec 1997 A
5705042 Leiphart et al. Jan 1998 A
D395483 Maryska Jun 1998 S
D411516 Lmafuku et al. Jun 1999 S
5958193 Brugge Sep 1999 A
D425919 Burkhart May 2000 S
6086725 Abburi et al. Jul 2000 A
6114216 Yieh et al. Sep 2000 A
6362097 Demaray et al. Mar 2002 B1
6390905 Korovin et al. May 2002 B1
6659850 Korovin et al. Dec 2003 B2
D487254 Suenaga Mar 2004 S
6815352 Tamura et al. Nov 2004 B1
D503729 Leeuw et al. Apr 2005 S
D553104 Oohashi et al. Oct 2007 S
D557226 Uchino Dec 2007 S
D559066 Tano et al. Jan 2008 S
D559993 Nagakubo et al. Jan 2008 S
D559994 Nagakubo et al. Jan 2008 S
7402098 Severson et al. Jul 2008 B2
D584591 Tano et al. Jan 2009 S
D592029 Tano et al. May 2009 S
D592030 Tano et al. May 2009 S
D598717 Jalet Aug 2009 S
D600660 Sato Sep 2009 S
D600989 Tano et al. Sep 2009 S
D614593 Lee et al. Apr 2010 S
D616389 Takahashi May 2010 S
D616390 Sato May 2010 S
D633452 Namiki et al. Mar 2011 S
D649126 Takahashi Nov 2011 S
D660645 Zandona May 2012 S
D669509 Krink et al. Oct 2012 S
8371904 Jindal et al. Feb 2013 B2
D678745 Nguyen Mar 2013 S
D683806 Dueck Jun 2013 S
D687790 Krishnan et al. Aug 2013 S
D687791 Krishnan et al. Aug 2013 S
D691974 Osada Oct 2013 S
D703162 Tamaso Apr 2014 S
D716742 Jang et al. Nov 2014 S
D722298 Saito et al. Feb 2015 S
D724553 Choi et al. Mar 2015 S
D732094 Jussel et al. Jun 2015 S
D732145 Yamagishi et al. Jun 2015 S
D733843 Yamagishi et al. Jul 2015 S
D741823 Tateno et al. Oct 2015 S
D741921 Jarvius et al. Oct 2015 S
D746647 Roaks Jan 2016 S
D750728 Kremer Mar 2016 S
D753449 Liebowitz et al. Apr 2016 S
D754468 Nason Apr 2016 S
D759603 Saito et al. Jun 2016 S
D767234 Kirkland et al. Sep 2016 S
D769200 Fukushima et al. Oct 2016 S
9475996 Mandle Oct 2016 B2
D770992 Tauchi et al. Nov 2016 S
9543126 Riker Jan 2017 B2
D790039 Hawrylchak et al. Jun 2017 S
D790041 Jang Jun 2017 S
D793572 Kozuka et al. Aug 2017 S
D794753 Miller Aug 2017 S
D795208 Sasaki et al. Aug 2017 S
D796458 Jang et al. Sep 2017 S
D797067 Zhang et al. Sep 2017 S
D797691 Joubert et al. Sep 2017 S
D798248 Hanson et al. Sep 2017 S
D801942 Riker et al. Nov 2017 S
D804230 Allan Dec 2017 S
D808349 Fukushima et al. Jan 2018 S
D810705 Krishnan et al. Feb 2018 S
9892890 Bluck et al. Feb 2018 B2
D813181 Okajima Mar 2018 S
9960024 Riker et al. May 2018 B2
D819580 Krishnan Jun 2018 S
D821039 Owens Jun 2018 S
D821140 Mirchandani et al. Jun 2018 S
D825504 Zhang et al. Aug 2018 S
D825505 Hanson et al. Aug 2018 S
D830435 Wakisaka et al. Oct 2018 S
D830981 Jeong Oct 2018 S
D836572 Riker et al. Dec 2018 S
D837755 Riker et al. Jan 2019 S
D839224 Yamaki et al. Jan 2019 S
D851613 Johanson et al. Jun 2019 S
D858468 Riker et al. Sep 2019 S
D859333 Riker et al. Sep 2019 S
10442056 Namiki et al. Oct 2019 B2
D868124 Riker Nov 2019 S
D869409 Riker Dec 2019 S
D877101 Johanson et al. Mar 2020 S
10662520 West May 2020 B2
D888903 Gunther et al. Jun 2020 S
D891382 Koppa et al. Jul 2020 S
D893441 Rao et al. Aug 2020 S
D894137 Johanson et al. Aug 2020 S
10811232 Srikantaiah et al. Oct 2020 B2
D902165 Johanson et al. Nov 2020 S
D908645 Savandaiah et al. Jan 2021 S
D913979 Babu Mar 2021 S
D913980 Lee Mar 2021 S
20030015421 Cha et al. Jan 2003 A1
20030029715 Yu et al. Feb 2003 A1
20040149567 Kosyachkov Aug 2004 A1
20040211665 Yoon et al. Oct 2004 A1
20050152089 Matsuda et al. Jul 2005 A1
20050193952 Goodman et al. Sep 2005 A1
20060249369 Marangon et al. Nov 2006 A1
20070076345 Bang Apr 2007 A1
20070228302 Norman Oct 2007 A1
20080121620 Guo et al. May 2008 A1
20080308416 Allen et al. Dec 2008 A1
20090260982 Riker et al. Oct 2009 A1
20090308732 Cao et al. Dec 2009 A1
20090308739 Riker et al. Dec 2009 A1
20100096261 Hoffman et al. Apr 2010 A1
20100108500 Hawrylchak et al. May 2010 A1
20100170786 Wang et al. Jul 2010 A1
20120033340 Roy et al. Feb 2012 A1
20120263569 Priddy Oct 2012 A1
20130316628 Jang et al. Nov 2013 A1
20140261180 Yoshidome et al. Sep 2014 A1
20150114823 Lee et al. Apr 2015 A1
20150170888 Riker et al. Jun 2015 A1
20150357169 Yuan Dec 2015 A1
20160002776 Nal et al. Jan 2016 A1
20160002788 Nal et al. Jan 2016 A1
20160035547 Johanson et al. Feb 2016 A1
20170009367 Harris Jan 2017 A1
20170117121 Riker et al. Apr 2017 A1
Foreign Referenced Citations (30)
Number Date Country
206573738 Oct 2017 CN
D1420846 Aug 2011 JP
D1421157 Aug 2011 JP
D1422692 Sep 2014 JP
223429 May 1994 TW
223430 May 1994 TW
M267462 Jun 2005 TW
D122892 May 2006 TW
D117576 Jun 2007 TW
M346018 Dec 2008 TW
D129207 Jun 2009 TW
2009388890 Sep 2009 TW
D137192 Oct 2010 TW
D146490 Apr 2012 TW
D153743 May 2013 TW
D159673 Apr 2014 TW
D159674 Apr 2014 TW
D159675 Apr 2014 TW
D159676 Apr 2014 TW
D166552 Mar 2015 TW
D169790 Aug 2015 TW
D174341 Mar 2016 TW
D174342 Mar 2016 TW
D175852 May 2016 TW
D175853 May 2016 TW
D175855 May 2016 TW
D176440 Jun 2016 TW
D178698 Oct 2016 TW
D180288 Dec 2016 TW
D197827 Jun 2019 TW
Non-Patent Literature Citations (9)
Entry
Search Report for Taiwan Design Application No. 106301373 dated Jun. 20, 2017.
Search Report for Taiwan Design Application No. 107305358 dated Feb. 21, 2019.
Search Report for Taiwan Design Application No. 1077303086 dated Jul. 6, 2018.
Sputtering Targets, posted at Angstrom Sciences, posting date May 5, 2016. Site visited Apr. 1, 2019. URL: <https://web.archive.org/web/20160505015447/https://www.angstromsciences.com/sputtering-targets> (Year: 2016).
Sputtering Targets for LSis, posted at JX Nippon Mining & Metals, posting date Mar. 22, 2016. Site visited Apr. 1, 2019. URL: <https://web .archive .org/web/20160322055046/http :1/www.nmm.jx-group.co.jp/english/products/04_supa/target_adv.html> (Year: 2016).
Search Report for Taiwan Design Application No. 107305411, dated Feb. 21, 2019, 2 pages.
Search Report for Taiwan Design Application No. 109305355, dated Mar. 29, 2021.
Sputtering Targets and Evaporation Materials. Thin Film Materials Technology, 2 pages, HC14040155, Japan.
Sputtering Targets, GMR TMR MRAM, 2 pages, HC16042450. Japan.