Claims
- 1. Process for retarding the decomposition of an amine alane, said process comprising contacting an amine alane which is substantially free of zirconium, hafnium, niobium, uranium, vanadium, and chromium, with an effective amount of a decomposition retarding agent selected from the class consisting of O.sub.2, CO, nitrogen oxides and alkyl nitrites.
- 2. The process of claim 1, wherein said agent is contacted with said amine alane prior to the onset of appreciable decomposition of said amine alane.
- 3. The process of claim 1 wherein said agent is contacted with said amine alane after the onset of appreciable decomposition of said amine alane.
- 4. The process of claim 2 wherein said agent is carbon monoxide.
- 5. The process of claim 3 wherein said agent is carbon monoxide.
- 6. The process of claim 1 being conducted at a temperature within the range of ambient temperature to about 70.degree. C.
- 7. Process for retarding the autodecomposition of an amine alane, said process comprising contacting an amine alane with an effective amount of a decomposition retarding agent selected from the class consisting of O.sub.2, CO, nitrogen oxides and alkyl nitrites.
- 8. The process of claim 7 wherein said decomposition retarding agent is carbon monoxide.
- 9. A process for stabilizing an amine alane product, said process comprising
- (a) preparing of NaAlH.sub.4 by reacting Na, Al and H.sub.2 in the presence of a promoter quantity of V, Zr, Hf, Nb, U, Cr or Ti,
- (b) recrystallizing the NaAlH.sub.4 thereby produced to remove or substantially remove the promoter,
- (c) using the purified NaAlH.sub.4 produced in (b) to prepare an amine alane, and
- (d) stabilizing the amine alane product by contacting it with a decomposition retarding amount of O.sub.2, CO, nitrogen oxide or alkyl nitrite.
- 10. The process of claim 9 wherein said decomposition retarding agent is carbon monoxide.
CROSS-REFERENCE TO RELATED APPLICATIONS
This invention is a continuation-in-part of application Ser. No. 133,141, filed Dec. 14, 1987, now U.S. Pat. No. 4,782,171, which in turn is a continuation-in-part of application Ser. No. 051,720, filed May 20, 1987, now U.S. Pat. No. 4,730,070.
US Referenced Citations (11)
Non-Patent Literature Citations (2)
Entry |
Ruff et al., "J. Am. Chem. Soc.", 82, 2141 (1960). |
Ashley, "Adv. Inorg. and Radiochem.", 8, 283 (1966). |
Continuation in Parts (2)
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Number |
Date |
Country |
Parent |
133141 |
Dec 1987 |
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Parent |
51720 |
May 1987 |
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