Claims
- 1. A process for making high purity torsemide modification II comprising the steps of:
(a) adding torsemide modification I to a solvent mixture comprising acetonitrile and water; (b) isolating torsemide modification I; (c) suspending the torsemide modification I of step (b) in water to form a solution; (d) adjusting the solution of step (c) to a pH of about 10±0.2; (e) filtering the solution of step (d); (f) adjusting the solution of step (e) to a pH of 6.25±0.2; and (g) isolating high purity torsemide modification II.
- 2. A stable pharmaceutical formulation comprising an effective amount of torsemide modification II and a pharmaceutically acceptable excipients wherein the excipients have a low moisture content.
- 3. The stable pharmaceutical formulation of claim 2 further comprising the excipients having a low moisture content selected from the group consisting of lactose anhydrous, crospovidone, povidone, microcrystalline cellulose, and magnesium stearate.
- 4. The stable pharmaceutical formulation of claim 2 comprising torsemide modification II in an amount of about 2.5 mg to about 200 mg per tablet.
- 5. The stable pharmaceutical formulation of claim 4 comprises torsemide modification II in an amount of about 2.5 mg, about 5 mg, about 10 mg, about 20 mg or about 100 mg per tablet.
- 6. A stable pharmaceutical formulation comprising an effective amount of torsemide modification II wherein the torsemide modification II does not substantially rearrange into another form of torsemide over time upon storage.
- 7. The stable pharmaceutical formulation of claim 6 wherein the formulation is stored under stress conditions.
- 8. The stable pharmaceutical formulation of claim 7 wherein the formulation is stored at about 40° C. and about 75% relative humidity.
- 9. The stable pharmaceutical formulation of claim 6 wherein the torsemide modification II does not substantially rearrange into torsemide modification I over time upon storage under stress conditions.
- 10. The stable pharmaceutical formulation of claim 9 wherein not more than 5% of the torsemide modification II rearranges into torsemide modification I.
- 11. The stable pharmaceutical formulation of claim 6 wherein the torsemide modification II is selected from the group consisting of high purity torsemide modification II and torsemide modification II containing trace amounts of torsemide modification I.
- 12. The stable pharmaceutical formulation of claim 11 wherein the torsemide modification II comprises about 0.5 to about 2% (w/w) of torsemide modification I.
- 13. The stable pharmaceutical formulation of claim 6 wherein the torsemide modification II has a particle size distribution such that 100% is below 200%.
- 14. The stable pharmaceutical formulation of claim 13 wherein the particle size distribution is such that 100% is below 100μ.
- 15. The stable pharmaceutical formulation of claim 14 wherein the particle size distribution is such that 100% is below 50μ.
- 16. High purity torsemide modification II.
- 17. The high purity torsemide modification II of claim 16 which is a stable polymorphic form of torsemiide.
- 18. The high purity torsemide modification II of claim 17 which does not substantially rearrange over times.
- 19. The high purity torsemide modification II of claim 18 further characterized by being stable during storage under stress conditions for at least 3 months.
- 20. The high purity torsemide modification II of claim 18 which is in the form of fine crystal.
- 21. The high purity torsemide modification II of claim 18 wherein the high purity torsemide modification II does not substantially rearrange over time into torsemide modification I.
- 22. The high purity torsemide modification II of claim 21 wherein not more than 10% of the high purity torsemide modification II rearranges over time into torsemide modification I.
- 23. The high purity torsemide modification II of claim 17 which is further characterized by having a particle size distribution such that 100% is below 200μ.
- 24. The high purity torsemide modification II of claim 23 which is further characterized by having a particle size distribution such that 100% is below 100μ.
- 25. The high purity torsemide modification II of claim 24 which is further characterized by having a particle size distribution such that 100% is below 50μ.
- 26. High purity torsemide modification II produced according to the process of claim 1.
- 27. The high purity torsemide modification II of claim 26 which is a stable polymorphic form of torsemide.
- 28. The high purity torsemide modification II of claim 27 which does not substantially rearrange over times.
- 29. The high purity torsemide modification II of claim 28 further characterized by being stable during storage under stress conditions for at least 3 months.
- 30. The high purity torsemide modification II of claim 28 which is in the form of fine crystal.
- 31. The high purity torsemide modification II of claim 28 wherein the high purity torsemide modification II does not substantially rearrange over time into torsemide modification I.
- 32. The high purity torsemide modification II of claim 31 wherein not more than 10% of the high purity torsemide modification II rearranges over time into torsemide modification I.
- 33. The high purity torsemide modification II of claim 32 which is further characterized by having a particle size distribution such that 100% is below 200μ.
- 34. The high purity torsemide modification II of claim 33 which is further characterized by having a particle size distribution such that 100% is below 100μ.
- 35. The high purity torsemide modification II of claim 34 which is further characterized by having a particle size distribution such that 100% is below 50μ.
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application is a continuation-in-part of the U.S. patent application Ser. No. 09/789,424, filed on Feb. 21, 2001, the content of which is incorporated herein by reference.
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09789424 |
Feb 2001 |
US |
Child |
10071423 |
Feb 2002 |
US |