Claims
- 1. A stencil material kit, comprising:
- (I) a stencil comprising a porous support and a masking film formed thereon, wherein the masking film comprises a waterinsoluble polymer selected from the group consisting of:
- (a) a homopolymer of diethylaminoethyl methacrylate,
- (b) a homopolymer of tertiary aminoalkyl acrylate,
- (c) a hompolymer of 2-vinylpyridine,
- (d) a hompolymer of 4-vinylpyridine,
- (e) a copolymer of dimethylaminoethyl methacrylate and at least one monoethylenic monomer,
- (f) a copolymer of tertiary aminoalkyl acrylate and a monoethylenic monomer,
- (g) a copolymer of 4-vinylpyridine and a monoethylenic monomer,
- (h) a copolymer of 2-vinylpyridine and a monoethylenic monomer, and
- (i) a copolymer of 4-vinylpyridine and 2-vinylpyridine and a monoethylenic monomer, wherein said polymer is one which can be made soluble in water or an aqueous solution upon contacting with an acid; and
- (II) an acid solution for forming a patternwise perforated stencil from said stencil (I), wherein said solution is capable of forming, upon contacting with said water-insoluble polymer selected from the group consisting of:
- (a) a homopolymer of diethylaminoethyl methacrylate,
- (b) a homopolymer of tertiary aminoalkyl acrylate,
- (c) a homopolymer of 2-vinylpyridine,
- (d) a homopolymer of 4-vinylpyridine,
- (e) a copolymer of dimethylaminoethyl methacrylate and at least one monoethylenic monomer,
- (f) a copolymer of tertiary aminoalkyl acrylate and a monoethylenic monomer,
- (g) a copolymer of 4-vinylpyridine and a monoethylenic monomer,
- (h) a copolymer of 2-vinylpyridine and a monoethylenic monomer, and
- (i) a copolymer of 4-vinylpyridine and 2-vinylpyridine and a monoethylenic monomer, a product which can be made soluble in water on in an equeous solution.
- 2. A stencil material kit as claimed in claim 1, wherein the acid solution for forming the patternwise perforated stencil comprises an acid and a solvent, the solvent being selected from the group consisting of water, alcohols, polyols and polyethers.
- 3. A stencil material kit as claimed in claim 2, wherein the acid in said acid solution is an inorganic acid selected from the group consisting of hydrochloric acid, sulfuric acid, and phosphoric acid or an organic acid selected from the group consisting of formic acid, acetic acid, propionic acid, chloracetic acid, dichloracetic acid, trichloroacetic acid, glycolic acid, lactic acid, oxalic acid, malonic acid, succinic acid, fumaric acid, maleic acid, malic acid, tartaric acid, and citric acid.
- 4. A stencil material kit as claimed in claim 2, wherein the acid solution for forming the patternwise perforated stencil further comprises a surface active agent.
- 5. A stencil material kit as claimed in claim 2, wherein the acid solution for forming the patternwise perforated stencil further comprises a dye.
- 6. A stencil material kit as claimed in claim 2, wherein the acid solution for forming the patternwise perforated stencil further comprises a humectant.
- 7. A stencil material kit as claimed in claim 1, wherein the acid is present in the acid solution for forming the patternwise perforated stencil in an amount of from 3% to 50%.
- 8. A stencil material kit, comprising:
- (I) a stencil comprising a porous support and a masking film formed thereon, wherein the masking film comprises a waterinsoluble polymer selected from the group consisting of:
- (a) a homopolymer of diethylaminoethyl methacrylate,
- (b) a homopolymer of tertiary aminoalkyl acrylate,
- (c) a homopolymer of 2-vinylpyridine,
- (d) a homopolymer of 4-vinylpyridine,
- (e) a copolymer of dimethylaminoethyl methacrylate and at least one monoethylenic monomer,
- (f) a copolymer of tertiary aminoalkyl acrylate and a monoethylenic monomer,
- (g) a copolymer of 4-vinylpyridine and a monoethylenic monomer,
- (h) a copolymer of 2-vinylpyridine and a monoethylenic monomer, and
- (i) a copolymer of 4-vinylpyridine and 2-vinylpyridine and a monoethylenic monomer, wherein said polymer is one which can be made soluble in water or an aqueous solution upon contacting with an acid; and
- (II) an acid solution for forming a patternwise perforated stencil from said stencil (I), wherein said solution is capable of forming, upon contacting with said water-insoluble polymer selected from the group consisting of:
- (a) a homopolymer of diethylaminoethyl methacrylate,
- (b) a homopolymer of tertiary aminoalkyl acrylate,
- (c) a homopolymer of 2-vinylpyridine,
- (d) a homopolymer of 4-vinylpyridine,
- (e) a copolymer of dimethylaminoethyl methacrylate and at least one monoethylenic monomer,
- (f) a copolymer of tertiary aminoalkyl acrylate and a monoethylenic monomer,
- (g) a copolymer of 4-vinylpyridine and a monoethylenic monomer,
- (h) a copolymer of 2-vinylpyridine and a monoethylenic monomer, and
- (i) a copolymer of 4-vinylpyridine and 2-vinylpyridine and a monoethylenic monomer, a product which can be made soluble in water or in an aqueous solution;
- (III) a stencil duplicator for duplicating the pattern of said patternwise perforated stencil, and
- (IV) printing ink for forming the pattern of said patternwise perforated stencil.
- 9. A kit for duplication as claimed in claim 8, further comprising:
- a frame having the stencil or a patternwise perforated stencil attached thereto, wherein the frame has a square flexible transparent polyvinyl chloride sheet on the opposite side to the side where the stencil or the patternwise perforated stencil is attached, wherein the sheet is separable from the stencil or the patternwise perforated stencil.
- 10. A kit for duplication as claimed in claim 8, further comprising:
- a writing tool capable of containing the acid solution for forming the patternwise perforated stencil.
- 11. A kit for duplication as claimed in claim 8, further comprising:
- a sponge capable of absorbing the acid solution for forming the patternwise perforated stencil.
Priority Claims (2)
Number |
Date |
Country |
Kind |
57-176405 |
Oct 1982 |
JPX |
|
57-200779[U] |
Dec 1982 |
JPX |
|
Parent Case Info
This is a division of application Ser. No. 540,979 filed Oct. 11, 1983.
US Referenced Citations (11)
Divisions (1)
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Number |
Date |
Country |
Parent |
540979 |
Oct 1983 |
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