Claims
- 1. A method of preparing a patternwise perforated stencil which comprises:
- drawing a pattern using a patternwise perforated stencil-making solution comprising a water-soluble acid solution, on a stencil comprising a porous support and a masking film formed on the support, wherein the masking film comprises a water-insoluble polymer containing tertiary amino groups, wherein said polymer is one which can be made soluble in water or an aqueous solution upon contacting with an acid; and
- removing the resulting patternwise reaction product by using water or an aqueous solution.
- 2. The method as claimed in claim 1, wherein the water-insoluble polymer containing tertiary amino groups is a polymer selected from the group consisting of:
- polyester, polyether, polyamide and polyurethane, each containing tertiary amino groups, tertiary aminoalkyl acrylate polymer; and
- homopolymers and copolymers of vinylpyridine.
- 3. The method as claimed in claim 2, wherein the water-insoluble polymer containing tertiary amino groups is selected from the group consisting of:
- an esterification product of a diol containing a tertiary amino group and a dicarboxylic acid;
- a polycondensate of a diol containing a tertiary amino group;
- a polycondensate of a diamine containing a tertiary amino group and a dicarboxylic acid;
- a polymerizate of a glycol containing a tertiary amino group and a diisocyanate;
- a homopolymer of tertiary aminoalkyl acrylate;
- a copolymer of tertiary aminoalkyl acrylate and a monoethylenic monomer;
- a homopolymer of 2-vinylpyridine;
- a homopolymer of 4-vinylpyridine;
- a copolymer of 4-vinylpyridine and a monoethylenic monomer;
- a copolymer of 2-vinylpyridine and a monoethylenic monomer; and
- a copolymer of 4-vinylpyridine, 2-vinylpyridine and monoethylenic monomer.
- 4. The method as claimed in claim 1, wherein the porous support is a support selected from the group consisting of Japanese paper, nylon cloth, polyester cloth, and nonwoven cloth.
- 5. The method as claimed in claim 1, wherein the porous support is about 20 to 1,500 .mu.m thick.
- 6. The method as claimed in claim 1, wherein the porous support has a porosity of about 25 to 80%.
- 7. The method as claimed in claim 1, wherein the water-insoluble polymer is present on the support in an amount in the range of 3 to 20 g/m.sup.2.
- 8. The method as claimed in claim 1, wherein the patternwise perforated stencil-making solution comprises an acid and a solvent, wherein the solvent is selected from the group consisting of water, alcohols, polyols and polyol ethers.
- 9. The method as claimed in claim 8, wherein the acid is an inorganic acid selected from the group consisting of hydrochloric acid, sulfuric acid, phosphoric acid, and an organic acid selected from the group consisting of formic acid, acetic acid, propionic acid, chloroacetic acid, dichloroacetic acid, trichloroacetic acid, glycolic acid, lactic acid, oxalic acid, malonic acid, succinic acid, fumaric acid, maleic acid, malic acid, tartaric acid, and citric acid.
- 10. A method as claimed in claim 8, wherein the acid is present in the patternwise perforated stencil-making solution in an amount of from 3% to 50%.
- 11. The method as claimed in claim 8, wherein the patternwise perforated stencil-making solution further comprises a surface active agent.
- 12. The method as claimed in claim 8, wherein the patternwise perforated stencil-making solution further comprises a dye.
- 13. The method as claimed in claim 8, wherein the patternwise perforated stencil-making solution further comprises a humectant.
- 14. The method as claimed in claim 1, wherein the aqueous solution for removing the resulting patternwise reaction product is a water-soluble printing ink.
- 15. The method as claimed in claim 1, wherein the pattern on the stencil is drawn by hand by using a writing tool containing the pattern wise perforated stencil-making solution.
- 16. The method as claimed in claim 1, wherein the pattern on the stencil is drawn by using a porous stamp filled with the patternwise perforated stencil-making solution or by using a stamp and a stamp pad filled with the patternwise perforated stencil-making solution.
- 17. The method as claimed in claim 1, wherein the pattern on the stencil is drawn by spraying the patternwise perforated stencil-making solution.
Priority Claims (2)
Number |
Date |
Country |
Kind |
57-176405 |
Oct 1982 |
JPX |
|
57-200779[U] |
Dec 1982 |
JPX |
|
CROSS REFERENCE TO RELATED APPLICATION
This is a continuation-in-part of U.S. patent application Ser. No. 601,880, filed Apr. 19, 1984, now abandoned, which is a divisional of U.S. patent application Ser. No. 540,979 filed Oct. 11, 1983, U.S. Pat. No. 4,550,660.
US Referenced Citations (4)
Divisions (1)
|
Number |
Date |
Country |
Parent |
540979 |
Oct 1983 |
|
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
601880 |
Apr 1984 |
|