Structurally controlled deposition of silicon onto nanowires

Information

  • Patent Grant
  • 11855279
  • Patent Number
    11,855,279
  • Date Filed
    Thursday, November 11, 2021
    2 years ago
  • Date Issued
    Tuesday, December 26, 2023
    4 months ago
Abstract
Provided herein are nanostructures for lithium ion battery electrodes and methods of fabrication. In some embodiments, a nanostructure template coated with a silicon coating is provided. The silicon coating may include a non-conformal, more porous layer and a conformal, denser layer on the non-conformal, more porous layer. In some embodiments, two different deposition processes, e.g., a PECVD layer to deposit the non-conformal layer and a thermal CVD process to deposit the conformal layer, are used. Anodes including the nanostructures have longer cycle lifetimes than anodes made using either a PECVD or thermal CVD method alone.
Description
INCORPORATION BY REFERENCE

An Application Data Sheet is filed concurrently with this specification as part of the present application. Each application that the present application claims benefit of or priority to as identified in the concurrently filed Application Data Sheet is incorporated by reference herein in its entirety and for all purposes.


BACKGROUND OF THE INVENTION
Field of the Invention

This invention relates generally to nanostructures, and, more specifically, to multilayered silicon nanowire structures that are useful in battery anodes.


Much work has been done to find a way to use silicon in lithium battery anodes. Silicon holds much promise as it has ten times the lithium capacity as currently-used graphite. But, unfortunately, in absorbing so much lithium, silicon swells by 400%, which usually results in crumbling of the silicon and a short battery lifetime.


SUMMARY

In one aspect an anode for a lithium battery is provided, the anode including a substrate; a nanowire template rooted to the substrate; a first silicon layer substantially coating the nanowire template, the first silicon layer having a first density; and a second silicon layer over the first silicon layer and any exposed nanowire template, the second silicon layer having a density higher than the density of the first silicon layer. According to various embodiments, the first density may be less than 2.2 g/cm3, 2.1 g/cm3, 2.0 g/cm3, 1.9 g/cm3, 1.8 g/cm3, or 1.7 g/cm3. The second silicon layer may have a density greater than 2.25 g/cm3 in some embodiments. In some embodiments, the second silicon layer has a density at least 0.05 g/cm3 greater or 0.15 g/cm3 than that of the first silicon layer.


The first silicon layer may be non-conformal to the nanowire template. In some embodiments, the second silicon layer is conformal to the underlying surface. In some embodiments, the hydrogen content of the first silicon layer is at least 10%. In the same or other embodiments, the hydrogen content of the second silicon layer may be no more than 5%. According to various embodiments, the nanowire template may be conductive and can include silicide nanowires. An example is a nickel silicide nanowire template.


In some embodiments, the first silicon layer is between about 5 and 20 microns thick at its maximum diameter. In some embodiments, the second silicon layer is between about 5 and 500 nanometers thick, e.g., between about 5 and 100 nanometers thick.


Another aspect of the disclosure relates to a lithium battery including an anode as described above, a lithium-containing cathode, and an electrolyte in ionic communication with both the anode and the cathode.


Another aspect of the disclosure relates to a nanostructure including a first silicon layer having a first density; and a second silicon layer over the first silicon layer, the second silicon layer having a density higher than the density of the first silicon layer. According to various embodiments, the first density may be less than 2.2 g/cm3, 2.1 g/cm3, 2.0 g/cm3, 1.9 g/cm3, 1.8 g/cm3, or 1.7 g/cm3. The second silicon layer may have a density greater than 2.25 g/cm3 in some embodiments. In some embodiments, the second silicon layer has a density at least 0.05 g/cm3 greater or 0.15 g/cm3 than that of the first silicon layer. In some embodiments, the nanostructure includes a nanowire within the first silicon wire. The nanowire may be growth-rooted to the substrate.


Yet another aspect of the disclosure relates to method of making an anode for a lithium battery, including providing a substrate; growing nanowires from the substrate, depositing a first silicon layer over the nanowires using a PECVD method; and depositing a second silicon layer over the first silicon layer, the nanowires, and the substrate using a thermal CVD method. In some embodiments, the nanowires are silicide nanowires. In some embodiments, the PECVD method is an expanding thermal plasma (ETP) method.


These and other aspects are described further below with reference to the figures.





BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing aspects and others will be readily appreciated by the skilled artisan from the following description of illustrative embodiments when read in conjunction with the accompanying drawings.



FIG. 1 is a schematic illustration of nanowires over which a silicon layer has been deposited using thermal CVD (chemical vapor deposition).



FIG. 2 is a schematic illustration of nanowires over which a silicon layer has been deposited using PECVD (plasma enhanced chemical vapor deposition).



FIG. 3 is a schematic illustration of nanowires over which a first silicon layer has been deposited using PECVD and then a second silicon layer has been deposited using thermal CVD, according to an embodiment of the invention.



FIG. 4 is a SEM (scanning electron microscope) top-view image of nanowires over which a silicon layer has been deposited using PECVD.



FIG. 5 is a SEM top-view image of nanowires over which a first silicon layer has been deposited using PECVD and then a second silicon layer has been deposited using thermal CVD, according to an embodiment of the invention.



FIG. 6 is a SEM cross-section view image of a nanostructure that has an inner core of PECVD silicon and an outer layer of thermal CVD silicon, according to an embodiment of the invention.



FIG. 7 shows a schematic depiction of a representation of a non-conformal silicon coating on a template nanowire.



FIGS. 8A and 8B are graphs shown capacity vs. cycle number and capacity retention vs. cycle number for electrodes having templated PECVD+thermal CVD (TCVD) Si layers, templated PECVD-only Si layers, and templated TCVD-only layers.



FIG. 9A is schematic representation of a plan view of a partially-assembled electrochemical cell that uses electrodes described herein, according to certain embodiments.



FIG. 9B is schematic representation of a cross-sectional view of an electrode stack of a partially-assembled electrochemical cell that uses electrodes described herein, according to certain embodiments.



FIGS. 10A-10C are schematic representations of various views of electrodes wound together with two sheets of separator to form a cell according to certain embodiments.



FIGS. 11A and 11B are schematic representations of cross-sectional and perspective views of a stacked cell that includes a plurality of cells according to certain embodiments.



FIG. 12 is schematic representation of cross-sectional view of a wound cylindrical cell, in accordance with certain embodiments.





DETAILED DESCRIPTION

Certain embodiments are illustrated in the context of silicon deposition onto silicide nanowires. The skilled artisan will readily appreciate, however, that the materials and methods disclosed herein will have application in a number of other contexts where it is useful to adjust deposition to produce layers with specific characteristics. For example, various embodiments are described herein with reference to nanowires. It should be understood, however, that unless otherwise stated, the references herein to nanowires include other types of nanostructures as described in U.S. Pat. No. 8,257,866, incorporated by reference herein, such as nanotubes, nanoparticles, nanospheres, nanorods, nanowhiskers, and the like.


Generally, the term “nanostructures” refers to structures having at least one dimension that is less than about 1 micron. This dimension could be, for example, a diameter of the nanostructure (e.g., a silicide template nanowire), a thickness of the shell formed over a template (e.g., a thickness of the amorphous silicon layers), or some other nanostructure dimension. It should be understood that any of the overall dimensions (length and diameter) of the final coated structure do not have to be at a nanoscale. For example, a final structure may include a layer that is about 10 microns in thickness at its greatest diameter and coated over a template that is about 100 nanometers in diameter and 20 microns in length. While this overall structure is about 10.1 microns at its greatest diameter and 20 microns in length, it could be generally referred to as a “nanostructure” because of the dimensions of the template. In specific embodiments, the term “nanowire” refers to structures with nano-scaled shells positioned over elongated template structures.


Nanowires (as a specific case of nanostructures) have an aspect ratio of greater than one, typically at least about two and more frequently at least about four. In specific embodiments, nanowires have an aspect ratio of at least about 10 and even at least about 100 or 500. Nanowires may make use of their one larger dimension to connect to other electrode components (e.g., a conductive substrate, other active material structures, or conductive additives). For example, nanowires may be substrate rooted such that one end (or some other part) of the majority of the nanowires is in contact with the substrate. Because the two other dimensions are small and there is an adjacent void volume available for expansion, the internal stress built up in the nanowires during lithiation (e.g., expansion of the nano-shells positioned over the silicide templates) is also small and does not break apart the nanowires (as happens with larger structures). Certain dimensions of the nanowires (e.g., an overall diameter and/or a shell thickness) are kept below the corresponding fracture levels of the active material used. Nanowires also permit a relatively high capacity per unit area of the electrode surface due to their elongated structure, which corresponds to the height of the template structure. This results from their relatively high aspect ratio and terminal connection to the substrate.


Silicon nanostructures can be made by first growing a nanowire template structure that is not pure silicon and then coating the template with silicon. Thermal CVD (chemical vapor deposition), HWCVD (hot-wire CVD), and/or PECVD (plasma enhanced chemical vapor deposition) may be used to deposit the silicon.


Various deposition processes produce different profiles when depositing silicon onto nanowires. For example, thermal CVD creates a conformal amorphous Si coating. HWCVD (also known as catalytic CVD) makes a high density, non-conformal amorphous Si coating that is thicker at the tips of the nanowires and thinner at the roots of the nanowires near the substrate. PECVD also produces non-conformal amorphous Si coating that is thicker at the ends of the nanowires and thinner at the roots of the nanowires near the substrate, but the coating has a low density with many small voids.



FIG. 1 is a schematic illustration of nanowires over which a conformal silicon layer has been deposited using thermal CVD. A nanowire template 110 is grown from a substrate 120. A silicon layer 130 is deposited onto the nanowire template 110. Note that the silicon layer 130 coats both the nanowire template 110 and the substrate 120, and that the coating has approximately the same thickness everywhere.


One advantage for the structure shown in FIG. 1 is that its structure is very dense. When an anode made using such a structure is cycled in a battery, the solid electrolyte interface (SEI) layer that forms on the silicon is very thin as the silicon formed by thermal CVD is very dense. One of the disadvantages for the structure shown in FIG. 1 is the thick layer of silicon at the roots of the nanowires. When an anode made using such a structure is cycled in a battery, there is great expansion and contraction in the silicon layer. Expansion in the root area can induce wrinkling of the Si layer and delamination of the nanowires, causing battery failure. Another disadvantage occurs because the nanowires in the template may not be exactly parallel as shown in FIG. 1. Instead, they grow at different angles and very often grow in clusters. The nanowires do not all have the same length. When coated by thermal CVD, the root area of the clusters, together with some short nanowires, can form a continuous silicon layer, which also can lead to delamination.



FIG. 2 is a schematic illustration of nanowires over which a silicon layer has been deposited using PECVD. Initially, PECVD may deposit a very thin layer (less than 1 micron and typically much less than 1 micron, such as 0.1-0.4 microns) of silicon on the substrate and at the roots of the nanowires. However, these areas are quickly shadowed by subsequent deposition at the tips of the nanowires. Depending on nanowire uniformity across the substrate surface, the very thin layer on the substrate may or may not be continuous. Under ideal surface and deposition conditions, a uniform thin layer may be expected but in practical cases, at the substrate-nanowire interface, there may be a discontinuity due to non-uniform distribution of nanowires on the surface.


In FIG. 2, a nanowire template 210 is grown from a substrate 220. A silicon layer 240 is deposited onto the nanowire template 210. Note that the silicon layer 240 is thickest at the tips of the nanowires of the nanowire template 210 and tapers off until there is essentially no silicon at the roots of nanowires. There is essentially no silicon on the substrate 220 either.


One advantage for the structure shown in FIG. 2 is that the root areas of the nanowires are coated only with only this very thin silicon layer. When an anode made using such a structure is cycled in a battery, the possibility of failure caused by expansion at the nanowire root area is greatly reduced. Another advantage is that PECVD coatings are not as dense as thermal CVD coatings; they can contain a large volume of voids and pores. Such defects can be very helpful in providing space into which the silicon can expand as it absorbs lithium.


One of the disadvantages of the structure shown in FIG. 2 is that the root area of the nanowires is not coated effectively. When an anode made using such a structure is cycled in a battery, the regions around the roots cannot participate electrochemically, thus causing a reduction in volumetric energy density of the battery. If more silicon were deposited onto the nanowires, the silicon layer at the tips of the nanowires would be too thick, causing fracturing of the silicon during cycling and subsequent anode failure. Another disadvantage is that the presence of voids can lead to large surface area of the coated nanowires and water absorption within the layer or at the surface. Very thick SEI layers can form as the battery is cycled, thus reducing the columbic efficiency and shortening the cycle life of the battery.


In one embodiment of the invention, the deposition methods discussed above are combined to provide optimum Si coatings as shown in FIG. 3 which is a schematic illustration of nanowires over which two silicon layers have been deposited. A nanowire template 310 is grown from a substrate 320. A first silicon layer 340 with a tapered profile is deposited onto the nanowire template 310 using PECVD. The first silicon layer 340 may be between about, for example, 0.5 and 10 microns thick at the top of the nanowire. In some embodiments, the first silicon layer may be thicker, e.g., between about 10 to 50 microns, or 10-20 microns. A second silicon layer 330 with a conformal profile is deposited onto the top of first silicon layer 340 using thermal CVD. The second silicon layer 330 may be, for example, between about 10 and 500 nm thick. The resulting structure has much more silicon at the tips of the nanowires than at the root ends. In more particular embodiments, the second silicon layer may be between 5 and 200 nm thick, or 10 to 90 nm thick. The second silicon layer 330 is conformal to the underlying surface, which includes the first silicon layer 340, the substrate 320, and any exposed portions of the nanowire template 310. As noted above, it has approximately uniform thickness.


According to various embodiments, the layer on the substrate surface may or may not be continuous. High performance may be achieved unless the layer on the substrate is too thick (e.g., greater than 2 microns) and continuous.



FIG. 4 is a SEM (scanning electron microscope) top-view image of nanowires over which a silicon layer has been deposited using PECVD.



FIG. 5 is a SEM top-view image of nanowires over which a first silicon layer has been deposited using PECVD and then a second silicon layer has been deposited using thermal CVD.


The novel structures described herein have many advantages. In some embodiments, there is more silicon near the tip of the nanowire than at the root, but there is still some silicon at the root. Having such a thin silicon layer at the root ensures that delamination does not occur during cycling. In some embodiments, there may also be electrochemical participation throughout the entire length of the nanowire. Further, SEI layer formation may be stabilized.


In some embodiments, the first silicon layer deposited is amorphous and has a low density, such as a density of about 1.70 g/cm3 or less, or 2.10 g/cm3 or less, or 2.2 g/cm3 or less, or less than 2.25 g/cm3 and may include many small voids. The second silicon layer deposited is amorphous and has a high density, such as a density of about 2.25 g/cm3 or more. The density of each layer is less than that of crystalline silicon.


According to various embodiments, the nanostructures may be characterized by a second silicon layer over a first silicon layer, the second silicon layer having a density higher than the density of the first silicon layer. As discussed above, in some embodiments, the first silicon layer provides space into which the silicon can expand as it absorbs lithium, while the second silicon layer reduces SEI layer formation. As such, the densities of each layer may be adjusted depending on the electrolyte, capacity of the battery, nanowire template density, etc. Accordingly, in some embodiments, the densities may be characterized in terms of a difference between densities of the layers, rather than or in addition to by absolute density. In some embodiments, the second silicon layer may have a density of at least 0.05 g/cm3 greater than the first silicon layer, or at least 0.1 g/cm3 greater than the first silicon layer, or at least 0.2 g/cm3 than the first silicon layer, or at least 0.3 g/cm3 greater than the first silicon layer.



FIG. 6 is a SEM cross-section view image of a nanostructure that has an inner core of PECVD silicon 640 and an outer layer of thermal CVD silicon 630, according to an embodiment of the invention. The porous morphology of the PECVD silicon 640 can be seen clearly as can the non-porous morphology of the thermal CVD silicon 630.


Aspects of the methods and structures disclosed herein may be implemented with other high capacity active materials, in addition to or instead of silicon. An electrochemically active material may have a theoretical lithiation capacity of at least about 500 mAh/g or, more specifically, of at least about 1000 mAh/g. Active materials with such capacities may be referred to as “high capacity active materials.” In addition to amorphous silicon, examples of high capacity active materials include silicon-containing compounds, tin and tin-containing compounds, germanium and germanium-containing compounds. For example, in some embodiments, an electrode may include a dual density germanium layer including a first inner layer having a lower density and second outer layer having a higher density.


In certain embodiments, high capacity active materials or templates are formed as substrate rooted nanostructures. These nanostructures may be physically and conductively attached to a conductive substrate, which may serve as a current collector for this electrode. The physical attachment may be more than a simple mechanical contact, which might result, for example, from coating a binder with discrete nanostructures onto the substrate. In some embodiments, the physical attachment results from fusion of the nanostructures to the substrate or deposition of the nanostructures or some portion of the nanostructures directly onto the substrate, for example, using CVD techniques or, even more, specifically using vapor-liquid-solid CVD growth. In yet another example, physical attachment results from ballistic impalement of the nanostructures onto the substrate. In certain embodiments, physical attachment includes certain forms of metallurgical bonds, such as a formation of alloys of two bonded materials (e.g., silicides).


In many embodiments, the nanowire template is a conductive material, with examples of conductive templates including metal templates and metal silicide templates. In some embodiments, a conductive template may include an oxide. As used herein, the term “conductive” refers broadly to electrical conductors, as distinct from semiconductors and insulators. The nanowire template may have conductivity of at least about 103 S/m, or more specifically at least about 106 S/m or even at least about 107 S/m. Conductive templates can be useful to provide a transport path from the silicon electrochemically active material to a current collector as well as mechanically supporting the silicon layers. In some embodiments, however, the nanowire template may be a semiconductor or insulator (e.g., an oxide) that provides mechanical support to the silicon. Silicon nanowires may also be used as a template, with one or more coatings of a-Si deposited over the silicon nanowires as described herein. Silicon nanowire anodes are described in U.S. Pat. No. 7,816,031, incorporated by reference herein.


Nanowires of the nanowire template may be non-branched linear nanowires or branched nanowires. An electrode may include a combination of non-branched and branched nanowires, or only include only one of these types. While the templates may generally be elongated template structures, as described above, nanospheres, nanorods, nanowhiskers, nanoparticles, and the like may be employed. A nanowire template may be part of or include a multidimensional structure. One example of such a structure is a central core to which multiple nanowires are attached, forming “fuzzy ball-like” or “snowball-like” structures. An example of such a structure is shown in U.S. patent application Ser. No. 13/277,821, incorporated by reference herein.


In certain embodiments, nanowires in a nanowire template are between about 10 nanometers and 100 nanometers in diameter and between about 10 microns and 100 microns in length. In one example, a structure may include nanowires ranging from 5 to 40 microns. However, nanowires having other dimensions may be used.


Nanowire density can depend on the length of the nanowires, the desired capacity, the expansion ratio of the active material, and the particular application. If spacing between template structures is less than the coating thickness, it can cause significant interconnections of the active material layer. Interconnections near the roots can create agglomerated or continuous film like structures, which impede good cycle performance. The nanowires may be randomly distributed, with a variety of lengths and randomly-oriented. In some implementations, however, templated or guided methods of growth that produce uniform densities and/or orientations may be used. In one example, nanowires of a template structure may be grouped into various size bins, e.g., short, medium, and long sizes. Long nanowires may be identified as being visible in a top-down SEM image as depicted above. Example densities may be 0.5 to 20 long nanowires per 100 micron squared and 2 to 400 total nanowires per 100 microns squared. In some embodiments, a nanowire density may be determined for a particular mass loading. For example, for a mass loading between 2.5 and 2.9 mg/cm2, a top diameter of the Si coating of 4 to 6 microns and a bottom diameter of 0.2 to 0.3 microns, a top nanowire density may be 2×106 to 6×106 long nanowires per centimeter squared.


The substrate is generally a conductive material having a conductivity of at least about 103 S/m, or more specifically at least about 106 S/m or even at least about 10'S/m, particularly if the nanowire template is rooted to the substrate, and may be used as a current collector in the battery. This may be desirable when the substrate rooted structure is employed as a fully fabricated electrode for a battery or fuel cell. Examples of conductive substrate materials include copper, copper coated with metal oxides, stainless steel, titanium, aluminum, nickel, chromium, tungsten, other metals, metal silicides and other conductive metal compounds, carbon, carbon fiber, graphite, graphene, carbon mesh, conductive polymers, doped silicon or combinations of above including multi-layer structures. The substrate may be formed as a foil, film, mesh, foam, laminate, wires, tubes, particles, multi-layer structure, or any other suitable configuration. In certain embodiments, a substrate is a metallic foil with a thickness of between about 1 micron and 50 microns or more specifically between about 5 microns and 30 microns.


According to various embodiments, a silicon coating may be characterized by one or more of shape (also referred to as morphology), density, and bulk and surface composition. In terms of morphology, the first silicon layer may be generally characterized as non-conformal, having a thickness that is variable in the direction vertical to the substrate.


In some embodiments, a silicon layer has a generally circular symmetry. See, e.g., the top view SEM image in FIG. 4. It should be noted that an array of nanowires having generally circular symmetry includes arrays in which asymmetries may be introduced due to two nanowires being close enough that their coatings abut one another.



FIG. 7 shows a schematic depiction of a representation of a coating as a water drop or a conical frustum. The dimensions d1, d2 and h are labeled, with d1 being the largest diameter of the coating, d2 being the bottom diameter of the coating, and h being the height of the anode after coating. The non-conformal coating (porous non-conformal coating alone, or porous non-conformal coating conformally coated with the dense coating) may be characterized in some embodiments by the following ratios: d1/h of 1/2 to 1/9, d2/h of 1/400 to 1/70 and a d1/d2 ratio of 50:1 to 1.5:1.


In an example, d1 may be between 4 and 15 microns, or 4 and 12 microns, d2 may be between about 0.2 and 2 microns, and height may be between about 20 and 50 microns, e.g., between about 30 and 40 microns. The coating may extend between 10 and 20 microns above the height of the nanowire in some embodiments. The non-conformal layer substantially coats the nanowire, with the non-conformal coating extending at least most of the length of the nanowires, and in some embodiments, coating the entire template. As described above, there may be discontinuities near or at the root of the nanowire template.


In one example, a nanowire having a diameter of about 10 to 50 nm and a length of between about 10 to 25 microns is coated with silicon, such that after coating the diameter of the nanostructure at the root is 100 to 400 nm, the maximum diameter is 2 to 20 microns, and the total height of the anode is 20 to 40 microns.


In some embodiments, a non-conformal layer may be characterized by a hydrogen (H) content of at least 10%. In some embodiments, a conformal, dense layer may be characterized by a bulk H content of no more than 7%, or no more than 5%.


The non-conformal, porous silicon layers may be deposited by a method such as evaporation or other physical vapor deposition (PVD) method or HWCVD instead of or in addition to PECVD.


In PECVD processes, according to various implementations, a plasma may be generated in a chamber in which the substrate is disposed or upstream of the chamber and fed into the chamber. Any type of plasma, including capacitively-coupled plasmas, inductively-coupled plasmas, and conductive coupled plasmas may be used. Any appropriate plasma source may be used, including DC, AC, RF and microwave sources may be used.


PECVD process conditions can vary according to the particular process and tool used. A fairly wide range of temperatures, e.g., 180° C. to 600° C., may be used. Pressures are generally low for plasma processes, e.g., ranging from 50 mTorr to 400 Torr, or 200 mTorr to 10 Torr, depending on the process.


In some implementations, the PECVD process is an expanding thermal plasma chemical vapor deposition (ETP-CVD) process. In such a process, a plasma generating gas is passed through a direct current arc plasma generator to form a plasma, with a web or other substrate including the nanowire template in an adjoining vacuum chamber. A silicon source gas is injected into the plasma, with radicals generated. The plasma is expanded via a diverging nozzle and injected into the vacuum chamber and toward the substrate, with a non-conformal layer of amorphous silicon formed on the nanowire template. An example of a plasma generating gas is argon (Ar). In some embodiments, the ionized argon species in the plasma collide with silicon source molecules to form radical species of the silicon source, resulting in deposition on the nanowire template. Example ranges for voltages and currents for the DC plasma source are 60 to 80 volts and 50 to 70 amperes, respectively.


The conformal, dense silicon layers may be deposited by a method as atomic layer deposition (ALD) instead of or in addition to thermal CVD. Any appropriate thermal CVD process may be used, such as low pressure CVD (LPCVD). Temperatures may go as high as the thermal budget allows in some embodiments, as long as no metal silicide is formed around nanowire-substrate interface due to the increase of temperature when using a metal substrate.


Any appropriate silicon source may be used for the non-conformal and conformal silicon layers, including silane (SiH4), dichlorosilane (H2SiCl2), monochlorosilane (H3SiCl), trichlorosilane (HSiCl3), and silicon tetrachloride (SiCl4) to form the silicon layers. Depending on the gas used, the amorphous silicon layer may be formed by decomposition or a reaction with another compound, such as by hydrogen reduction. According to various embodiments, the same or a different silicon source may be used for the each of the layers.


According to various embodiments, the PECVD processes result in non-conformal coatings due to gas phase radical generation of the silicon precursor and gas phase nucleation and condensation on the surfaces of the template. By contrast, the thermal CVD reactions are run at conditions that result in surface reactions. High energy and mobility at the surface results in a conformal layer. In some embodiments, chamber pressure during a thermal CVD process is kept low, e.g., 100 mTorr to 2 Torr to prevent gas phase reactions and non-conformal deposition. Higher pressures, e.g., higher than 2 Torr or 500 Torr can result in non-conformal deposition.


Additional description of depositing active material layers having controlled densities may be found in U.S. patent application Ser. No. 13/277,821, incorporated by reference herein.


As indicated above, the nanostructures may be characterized by a second silicon layer over a first silicon layer, the second silicon layer having a density higher than the density of the first silicon layer. In some embodiments, the first silicon layer may be deposited directly on the nanowire template, with the second silicon layer being the outermost shell of the coated template. However, in some embodiments, other layers may be present. For example, a thin dense silicon layer may be deposited on a nanowire template, followed by a thicker porous layer, and a second thin dense layer.


Still further, a non-Si layer may be the outermost shell of the nanostructure in some embodiments. Examples of layers include metal oxides such as aluminum oxide, titanium oxide, cobalt oxide, and zirconium oxide, metal nitrides, and silicon nitrides. In some embodiments, a thin layer of any of these may be deposited in addition to or instead of the dense Si layer described above.


According to various embodiments, each of the first and second silicon layers may have a uniform density. However, in some embodiments, deposition conditions may be tuned during deposition to provide a density gradient in one or both layers. For example, either layer may get denser toward the outer part of the layer. In such embodiments, an average density of the layer may be used to characterize the density of layer as described above.


In some embodiments, silicon may be deposited by HWCVD. In some such implementations, a single Si layer having a density between that typically deposited by PECVD and that typically deposited by TCVD may be deposited. It can also be used to coat both the first and the second Si coatings by tuning the deposition process.


EXPERIMENTAL

Cycling data from nanowires with two layers of Si as described herein, shows that such structures have increased cycle lifetimes over structures that are made using only PECVD or only thermal CVD. FIGS. 8A and 8B are graphs shown capacity vs. cycle number and capacity retention vs. cycle number for electrodes having templated PECVD+thermal CVD (TCVD) Si layers, templated PECVD only Si layers, and template TCVD only layers. Capacity and capacity retention is highest for the PECVD+TCVD Si layers. As described above, the PECVD layer is a more porous, less dense internal layer and the TCVD layer is a denser external layer.


Assembly



FIG. 9A is a plan view of a partially-assembled electrochemical cell that uses electrodes described herein, according to certain embodiments. The cell has a positive electrode active layer 902 that is shown covering a major portion of a positive current collector 903. The cell also has a negative electrode active layer 904 that is shown covering a major portion of a negative current collector 905. Separator 906 is between the positive electrode active layer 902 and the negative electrode active layer 904.


In one embodiment, the negative electrode active layer 904 is slightly larger than the positive electrode active layer 902 to ensure trapping of the lithium ions released from the positive electrode active layer 902 by the active material of the negative electrode active layer 904. In one embodiment, the negative electrode active layer 904 extends at least between about 0.25 millimeters and 7 millimeters beyond the positive electrode active layer 902 in one or more directions. In a more specific embodiment, the negative electrode active layer 904 extends beyond the positive electrode active layer 902 by between about 1 millimeter and 2 millimeters in one or more directions. In certain embodiments, the edges of the separator 906 extend beyond the outer edges of at least the negative electrode active layer 904 to provide the complete electronic insulation of the negative electrode from the other battery components.



FIG. 9B is a cross-sectional view of an electrode stack 900 of the partially-assembled electrochemical cell that uses electrodes described herein, according to certain embodiments. There is a positive current collector 903 that has a positive electrode active layer 902a on one side and a positive electrode active layer 902b on the opposite side. There is a negative current collector 905 that has a negative electrode active layer 904a on one side and a negative electrode active layer 904b on the opposite side. There is a separator 906a between the positive electrode active layer 902a and the negative electrode active layer 904a. The separator sheets 906a and 906b serves to maintain mechanical separation between the positive electrode active layer 902a and the negative electrode active layer 904a and acts as a sponge to soak up the liquid electrolyte (not shown) that will be added later. The ends of the current collectors 903, 905, on which there is no active material, can be used for connecting to the appropriate terminal of a cell (not shown).


Together, the electrode layers 902a, 904a, the current collectors 903, 905, and the separator 906a can be said to form one electrochemical cell unit. The complete stack 900 shown in FIG. 9B, includes the electrode layers 902b, 904b and the additional separator 906b. The current collectors 903, 905 can be shared between adjacent cells. When such stacks are repeated, the result is a cell or battery with larger capacity than that of a single cell unit.


Another way to make a battery or cell with large capacity is to make one very large cell unit and wind it in upon itself to make multiple stacks. The cross-section schematic illustration in FIG. 10A shows how long and narrow electrodes can be wound together with two sheets of separator to form a battery or cell, sometimes referred to as a jellyroll 1000. The jellyroll is shaped and sized to fit the internal dimensions of a curved, often cylindrical, case 1002. The jellyroll 1000 has a positive electrode 1006 and a negative electrode 1004. The white spaces between the electrodes are the separator sheets. The jelly roll can be inserted into the case 1002. In some embodiments, the jellyroll 1000 may have a mandrel 1008 in the center that establishes an initial winding diameter and prevents the inner winds from occupying the center axial region. The mandrel 1008 may be made of conductive material, and, in some embodiments, it may be a part of a cell terminal. FIG. 10B shows a perspective view of the jelly roll 1000 with a positive tab 1012 and a negative tab 1014 extending from the positive current collector (not shown) and the negative current collector (not shown), respectively. The tabs may be welded to the current collectors.


The length and width of the electrodes depend on the overall dimensions of the cell and thicknesses of the active layers and the current collectors. For example, a conventional 18650-type cell with 18 mm diameter and 85 mm length may have electrodes that are between about 300 and 1000 mm long. Shorter electrodes corresponding to lower rate/higher capacity applications are thicker and have fewer winds.


A cylindrical design may be used for some lithium ion cells especially when the electrodes can swell during cycling and thus exert pressure on the casing. It is useful to use a cylindrical casing that is as thin as possible while still being able to maintain sufficient pressure on the cell (with a good safety margin). Prismatic (flat) cells may be similarly wound, but their case may be flexible so that they can bend along the longer sides to accommodate the internal pressure. Moreover, the pressure may not be the same within different parts of the cell, and the corners of the prismatic cell may be left empty. Empty pockets may be avoided within lithium ions cells because electrodes tend to be unevenly pushed into these pockets during electrode swelling. Moreover, the electrolyte may aggregate in empty pockets and leave dry areas between the electrodes, negatively affecting lithium ion transport between the electrodes. Nevertheless, for certain applications, such as those dictated by rectangular form factors, prismatic cells are appropriate. In some embodiments, prismatic cells employ stacks of rectangular electrodes and separator sheets to avoid some of the difficulties encountered with wound prismatic cells.



FIG. 10C illustrates a top view of a wound prismatic jellyroll 1020. The jellyroll 1020 includes a positive electrode 1024 and a negative electrode 1026. The white space between the electrodes is the separator sheet. The jelly roll 1020 is enclosed in a rectangular prismatic case 1022. Unlike the cylindrical jellyroll shown in FIG. 12, the winding of the prismatic jellyroll starts with a flat extended section in the middle of the jelly roll. In one embodiment, the jelly roll may include a mandrel (not shown) in the middle of the jellyroll onto which the electrodes and separator are wound.



FIG. 11A illustrates a cross-section of a stacked cell that includes a plurality of cells (1101a, 1101b, 1101c, 1101d, and 1101e), each having a positive electrode (e.g., 1103a, 1103b), a positive current collector (e.g., 1102), a negative electrode (e.g., 1105a, 1105b), a negative current collector (e.g., 1104), and a separator (e.g., 1106a, 1106b) between the electrodes. Each current collector is shared by adjacent cells. A stacked cell can be made in almost any shape, which is particularly suitable for prismatic batteries. The current collector tabs typically extend from the stack and lead to a battery terminal. FIG. 11B shows a perspective view of a stacked cell that includes a plurality of cells.


Once the electrodes are arranged as described above, the cell is filled with electrolyte. The electrolyte in lithium ions cells may be liquid, solid, or gel. The lithium ion cells with the solid electrolyte are referred to as a lithium polymer cells.


A typical liquid electrolyte comprises one or more solvents and one or more salts, at least one of which includes lithium. During the first charge cycle (sometimes referred to as a formation cycle), the organic solvent in the electrolyte can partially decompose on the negative electrode surface to form a SEI layer. The interphase is generally electrically insulating but ionically conductive, thereby allowing lithium ions to pass through. The interphase also prevents decomposition of the electrolyte in the later charging sub-cycles.


Some examples of non-aqueous solvents suitable for some lithium ion cells include the following: cyclic carbonates (e.g., ethylene carbonate (EC), propylene carbonate (PC), butylene carbonate (BC) and vinylethylene carbonate (VEC)), vinylene carbonate (VC), lactones (e.g., gamma-butyrolactone (GBL), gamma-valerolactone (GVL) and alpha-angelica lactone (AGL)), linear carbonates (e.g., dimethyl carbonate (DMC), methyl ethyl carbonate (MEC), diethyl carbonate (DEC), methyl propyl carbonate (MPC), dipropyl carbonate (DPC), methyl butyl carbonate (NBC) and dibutyl carbonate (DBC)), ethers (e.g., tetrahydrofuran (THF), 2-methyltetrahydrofuran, 1,4-dioxane, 1,2-dimethoxyethane (DME), 1,2-diethoxyethane and 1,2-dibutoxyethane), nitrites (e.g., acetonitrile and adiponitrile) linear esters (e.g., methyl propionate, methyl pivalate, butyl pivalate and octyl pivalate), amides (e.g., dimethyl formamide), organic phosphates (e.g., trimethyl phosphate and trioctyl phosphate), organic compounds containing an S═O group (e.g., dimethyl sulfone and divinyl sulfone), and combinations thereof.


Non-aqueous liquid solvents can be employed in combination. Examples of these combinations include combinations of cyclic carbonate-linear carbonate, cyclic carbonate-lactone, cyclic carbonate-lactone-linear carbonate, cyclic carbonate-linear carbonate-lactone, cyclic carbonate-linear carbonate-ether, and cyclic carbonate-linear carbonate-linear ester. In one embodiment, a cyclic carbonate may be combined with a linear ester. Moreover, a cyclic carbonate may be combined with a lactone and a linear ester. In a specific embodiment, the ratio of a cyclic carbonate to a linear ester is between about 1:9 to 10:0, preferably 2:8 to 7:3, by volume.


A salt for liquid electrolytes may include one or more of the following: LiPF6, LiBF4, LiClO4 LiAsF6, LiN(CF3SO2)2, LiN(C2F5SO2)2, LiCF3SO3, LiC(CF3SO2)3, LiPF4(CF3)2, LiPF3(C2F5)3, LiPF3(CF3)3, LiPF3(iso-C3F7)3, LiPF5(iso-C3F7), lithium salts having cyclic alkyl groups (e.g., (CF2)2(SO2)2xLi and (CF2)3(SO2)2xLi), and combinations thereof. Common combinations include LiPF6 and LiBF4, LiPF6 and LiN(CF3 SO2)2, LiBF4 and LiN(CF3 SO2)2.


In one embodiment, the total concentration of salt in a liquid nonaqueous solvent (or combination of solvents) is at least about 0.3 M; in a more specific embodiment, the salt concentration is at least about 0.7M. The upper concentration limit may be driven by a solubility limit or may be no greater than about 2.5 M; in a more specific embodiment, it may be no more than about 1.5 M.


A solid electrolyte is typically used without the separator because it serves as the separator itself. It is electrically insulating, ionically conductive, and electrochemically stable. In the solid electrolyte configuration, a lithium containing salt, which could be the same as for the liquid electrolyte cells described above, is employed but rather than being dissolved in an organic solvent, it is held in a solid polymer composite. Examples of solid polymer electrolytes may be ionically conductive polymers prepared from monomers containing atoms having lone pairs of electrons available for the lithium ions of electrolyte salts to attach to and move between during conduction, such as polyvinylidene fluoride (PVDF) or chloride or copolymer of their derivatives, poly(chlorotrifluoroethylene), poly(ethylene-chlorotrifluoro-ethylene), or poly(fluorinated ethylene-propylene), polyethylene oxide (PEO) and oxymethylene linked PEO, PEO-PPO-PEO crosslinked with trifunctional urethane, poly(bis(methoxy-ethoxy-ethoxide))-phosphazene (MEEP), triol-type PEO crosslinked with difunctional urethane, poly((oligo)oxyethylene)methacrylate-co-alkali metal methacrylate, polyacrylonitrile (PAN), polymethylmethacrylate (PNMA), polymethylacrylonitrile (PMAN), polysiloxanes and their copolymers and derivatives, acrylate-based polymer, other similar solvent-free polymers, combinations of the foregoing polymers either condensed or cross-linked to form a different polymer, and physical mixtures of any of the foregoing polymers. Other less conductive polymers that may be used in combination with the above polymers to improve the strength of thin laminates include: polyester (PET), polypropylene (PP), polyethylene napthalate (PEN), polyvinylidene fluoride (PVDF), polycarbonate (PC), polyphenylene sulfide (PPS), and polytetrafluoroethylene (PTFE).



FIG. 12 illustrates a cross-section view of a wound cylindrical cell, in accordance with one embodiment. A jelly roll comprises a spirally wound positive electrode 1202, a negative electrode 1204, and two sheets of the separator 1206. The jelly roll is inserted into a cell case 1216, and a cap 1218 and gasket 1220 are used to seal the cell. It should be noted that in certain embodiments a cell is not sealed until after subsequent operations. In some cases, cap 1218 or cell case 1216 includes a safety device. For example, a safety vent or burst valve may be employed to open if excessive pressure builds up in the battery. In certain embodiments, a one-way gas release valve is included to release oxygen that has been released during activation of the positive material. Also, a positive thermal coefficient (PTC) device may be incorporated into the conductive pathway of cap 1218 to reduce the damage that might result if the cell suffered a short circuit. The external surface of the cap 1218 may be used as the positive terminal, while the external surface of the cell case 1216 may serve as the negative terminal. In an alternative embodiment, the polarity of the battery is reversed and the external surface of the cap 1218 is used as the negative terminal, while the external surface of the cell case 1216 serves as the positive terminal. Tabs 1208 and 1210 may be used to establish a connection between the positive and negative electrodes and the corresponding terminals. Appropriate insulating gaskets 1214 and 1212 may be inserted to prevent the possibility of internal shorting. For example, a Kapton™ film may be used for internal insulation. During fabrication, the cap 1218 may be crimped to the cell case 1216 in order to seal the cell. However, prior to this operation, electrolyte (not shown) is added to fill the porous spaces of the jelly roll.


A rigid case is typically used for lithium ion cells, while lithium polymer cells may be packed into flexible, foil-type (polymer laminate) cases. A variety of materials can be chosen for the cases. For lithium-ion batteries, Ti-6-4, other Ti alloys, Al, Al alloys, and 300 series stainless steels may be suitable for the positive conductive case portions and end caps, and commercially pure Ti, Ti alloys, Cu, Al, Al alloys, Ni, Pb, and stainless steels may be suitable for the negative conductive case portions and end caps.


In addition to the battery applications described above, the nanostructures may be used in fuel cells (e.g., for anodes, cathodes, and electrolytes), hetero-junction solar cell active materials, various forms of current collectors, and/or absorption coatings.


This invention has been described herein in considerable detail to provide those skilled in the art with information relevant to apply the novel principles and to construct and use such specialized components as are required. However, it is to be understood that the invention can be carried out by different equipment, materials and devices, and that various modifications, both as to the equipment and operating procedures, can be accomplished without departing from the scope of the invention itself.

Claims
  • 1. An anode for a lithium battery, comprising: a substrate;a nanowire template rooted to the substrate;a first layer of an electrochemically active material substantially coating the nanowire template, the first layer having a first density; anda second layer of the electrochemically active material over the first layer and any exposed nanowire template, the second layer having a density higher than the density of the first layer, wherein the first layer is non-conformal to the nanowire template.
  • 2. The anode of claim 1, wherein the first density is less than 2.2 g/cm3.
  • 3. The anode of claim 1, wherein the first density is less than 2.1 g/cm3.
  • 4. The anode of claim 1, wherein the second layer has a density greater than 2.25 g/cm3.
  • 5. The anode of claim 1, wherein the second layer has a density at least 0.05 g/cm3 greater than that of the first layer.
  • 6. The anode of claim 1, wherein the second layer has a density at least 0.15 g/cm3 greater than that of the first layer.
  • 7. The anode of claim 1, wherein the second layer is conformal to an underlying surface.
  • 8. The anode of claim 1, wherein the nanowire template comprises silicide nanowires.
  • 9. The anode of claim 1, wherein the first layer is between about 5 and 20 microns thick at its maximum diameter.
  • 10. The anode of claim 1, wherein the second layer is between about 5 and 500 nanometers thick.
  • 11. The anode of claim 1, wherein the second layer is about 5 and 100 nanometers thick.
  • 12. The anode of claim 1, wherein the electrochemically active material comprises germanium.
  • 13. The anode of claim 1, wherein the electrochemically active material comprises tin.
  • 14. The anode of claim 1, wherein the electrochemically active material comprises silicon.
  • 15. The anode of claim 1, wherein the electrochemically active material has theoretical lithiation capacity of at least 500 mAh/g.
  • 16. The anode of claim 15, wherein the electrochemically active material comprises germanium.
  • 17. An anode for a lithium battery, comprising: a substrate;a nanowire template rooted to the substrate;a first layer of an electrochemically active material substantially coating the nanowire template, the first layer having a first density; anda second layer of the electrochemically active material over the first layer and any exposed nanowire template, the second layer having a density higher than the density of the first layer, wherein the second layer has a density at least 0.15 g/cm3 greater than the density of the first layer.
  • 18. The anode of claim 17, wherein the first density is less than 2.2 g/cm3.
  • 19. The anode of claim 17, wherein the electrochemically active material comprises tin.
  • 20. The anode of claim 17, wherein the electrochemically active material silicon-containing compound.
  • 21. An anode for a lithium battery, comprising: a substrate;a nanowire template rooted to the substrate;a first layer of an electrochemically active material substantially coating the nanowire template, the first layer having a first density; anda second layer of the electrochemically active material over the first layer and any exposed nanowire template, the second layer having a density higher than the density of the first layer, wherein the first density is less than 2.1 g/cm3.
  • 22. The anode of claim 21, wherein the second layer is conformal to the first layer.
  • 23. The anode of claim 21, wherein the nanowire template comprises silicide nanowires.
  • 24. The anode of claim 21, wherein the second layer is between about 5 and 20 microns thick at its maximum diameter.
  • 25. The anode of claim 24, wherein the second layer is between about 5 and 500 nanometers thick.
  • 26. The anode of claim 21, wherein the electrochemically active material comprises germanium.
  • 27. The anode of claim 21, wherein the electrochemically active material comprises tin.
  • 28. The anode of claim 21, wherein the electrochemically active material is a silicon-containing compound.
STATEMENT OF GOVERNMENT SUPPORT

The invention described and claimed herein was made in part utilizing funds supplied by the U.S. Department of Energy under Contract No. DE-EE0005474. The Government has certain rights in this invention.

US Referenced Citations (200)
Number Name Date Kind
4366215 Coetzer et al. Dec 1982 A
4436796 Huggins et al. Mar 1984 A
5426006 Delnick et al. Jun 1995 A
5457343 Ajayan Oct 1995 A
5702845 Kawakami et al. Dec 1997 A
5855860 Nishimine Jan 1999 A
5997832 Lieber Dec 1999 A
6025094 Visco et al. Feb 2000 A
6083644 Watanabe et al. Jul 2000 A
6090505 Shimamura et al. Jul 2000 A
6238821 Mukherjee et al. May 2001 B1
6334939 Zhou Jan 2002 B1
6355377 Sheem et al. Mar 2002 B1
6423453 Noda Jul 2002 B1
6514395 Zhou Feb 2003 B2
6667099 Greiner et al. Dec 2003 B1
7189476 Macklin et al. Mar 2007 B1
7402829 Green Jul 2008 B2
7408829 Kuang et al. Aug 2008 B2
7438759 Zhang et al. Oct 2008 B2
7682750 Chen Mar 2010 B2
7704480 Jiang et al. Apr 2010 B2
7794840 Grigorian et al. Jun 2010 B2
7816031 Cui et al. Oct 2010 B2
7816709 Balzano et al. Oct 2010 B2
7951489 Kim et al. May 2011 B2
8017272 Feng et al. Sep 2011 B2
8202568 Lin et al. Jun 2012 B2
8206569 Lopatin et al. Jun 2012 B2
8241372 Cheng et al. Aug 2012 B2
8252245 Tonkovich et al. Aug 2012 B2
8257866 Loveness et al. Sep 2012 B2
8263258 Nakazato et al. Sep 2012 B2
8367240 Honda Feb 2013 B2
8420258 Rojeski Apr 2013 B2
8450012 Cui et al. May 2013 B2
8481214 Rojeski Jul 2013 B2
8491718 Chaudhari Jul 2013 B2
8556996 Loveness et al. Oct 2013 B2
8568914 Pol et al. Oct 2013 B2
8652683 Rojeski Feb 2014 B2
8658310 Rojeski Feb 2014 B2
8709654 Takeuchi et al. Apr 2014 B2
8828481 Burton et al. Sep 2014 B2
8877374 Cui et al. Nov 2014 B2
8900748 Cho Dec 2014 B2
9172088 Loveness et al. Oct 2015 B2
9172094 Loveness et al. Oct 2015 B2
9209456 Fasching et al. Dec 2015 B2
9231243 Cui et al. Jan 2016 B2
9412998 Rojeski et al. Aug 2016 B2
9431181 Rojeski Aug 2016 B2
9698410 Fasching et al. Jul 2017 B2
9780365 Liu et al. Oct 2017 B2
9917300 Rojeski Mar 2018 B2
9923201 Wang et al. Mar 2018 B2
9979017 Rojeski May 2018 B2
10090512 Cui et al. Oct 2018 B2
10096817 Loveness et al. Oct 2018 B2
10230101 Loveness et al. Mar 2019 B2
10461359 Cui et al. Oct 2019 B2
10707484 Wang et al. Jul 2020 B2
10811675 Cui et al. Oct 2020 B2
11024841 Loveness et al. Jun 2021 B2
11289701 Wang et al. Mar 2022 B2
20020028384 Krasnov et al. Mar 2002 A1
20020102461 Baker et al. Aug 2002 A1
20020137334 Watanabe et al. Sep 2002 A1
20020148727 Zhou et al. Oct 2002 A1
20030175589 Kaminaka et al. Sep 2003 A1
20030178104 Sekine Sep 2003 A1
20030203139 Ren et al. Oct 2003 A1
20040023111 Ohshita et al. Feb 2004 A1
20040126653 Visco et al. Jul 2004 A1
20040126659 Graetz Jul 2004 A1
20040197641 Visco et al. Oct 2004 A1
20040258984 Ariel et al. Dec 2004 A1
20050100793 Jonghe et al. May 2005 A1
20050153208 Konishiike et al. Jul 2005 A1
20050175901 Kawakami et al. Aug 2005 A1
20050238810 Scaringe et al. Oct 2005 A1
20050279274 Nui et al. Dec 2005 A1
20060040182 Kawakami et al. Feb 2006 A1
20060066201 Ra et al. Mar 2006 A1
20060097691 Green May 2006 A1
20060147797 Wu et al. Jul 2006 A1
20060154141 Salot et al. Jul 2006 A1
20060165988 Chinag et al. Jul 2006 A1
20060204853 Chen Sep 2006 A1
20060216603 Choi Sep 2006 A1
20060258133 Georgiev et al. Nov 2006 A1
20060261134 Ho Nov 2006 A1
20070065720 Hasegawa et al. Mar 2007 A1
20070095276 Sunkara et al. May 2007 A1
20070117007 Visco et al. May 2007 A1
20070148544 Le Jul 2007 A1
20070154808 Konishiike et al. Jul 2007 A1
20070190422 Morris Aug 2007 A1
20070212538 Niu Sep 2007 A1
20070298168 Ajayan et al. Dec 2007 A1
20080008844 Bettge et al. Jan 2008 A1
20080038638 Zhang et al. Feb 2008 A1
20080044732 Salot et al. Feb 2008 A1
20080057399 Visco et al. Mar 2008 A1
20080087314 Xiao et al. Apr 2008 A1
20080110486 Tsakalokos et al. May 2008 A1
20080145762 Adachi et al. Jun 2008 A1
20080161746 Visco et al. Jul 2008 A1
20080206641 Christensen et al. Aug 2008 A1
20080213603 Kobayashi et al. Sep 2008 A1
20080261116 Burton et al. Oct 2008 A1
20080274403 Kim et al. Nov 2008 A1
20080280169 Niu et al. Nov 2008 A1
20080280207 Patoux et al. Nov 2008 A1
20090004566 Shirane et al. Jan 2009 A1
20090029256 Mah Jan 2009 A1
20090042102 Cui et al. Feb 2009 A1
20090061319 Kim et al. Mar 2009 A1
20090068553 Firsich et al. Mar 2009 A1
20090117472 Iwamoto May 2009 A1
20090162746 Honda Jun 2009 A1
20090169996 Zhamu et al. Jul 2009 A1
20090176159 Zhamu et al. Jul 2009 A1
20090186267 Tiegs Jul 2009 A1
20090188544 Kobayashi et al. Jul 2009 A1
20090202908 Sumihara et al. Aug 2009 A1
20090202915 Modeki et al. Aug 2009 A1
20090214942 Frank et al. Aug 2009 A1
20090214944 Rojeski Aug 2009 A1
20090246628 Adachi et al. Oct 2009 A1
20090269511 Zhamu et al. Oct 2009 A1
20090291371 Konishiike et al. Nov 2009 A1
20090305131 Kumar et al. Dec 2009 A1
20090305135 Shi et al. Dec 2009 A1
20090311605 Visco et al. Dec 2009 A1
20090316335 Simon et al. Dec 2009 A1
20100043877 Wang et al. Feb 2010 A1
20100119948 Hasegawa et al. May 2010 A1
20100122725 Buchine et al. May 2010 A1
20100159337 Matsumoto et al. Jun 2010 A1
20100176337 Zhamu et al. Jul 2010 A1
20100209775 Kim et al. Aug 2010 A1
20100237272 Chaudhari Sep 2010 A1
20100266897 Lee et al. Oct 2010 A1
20100285358 Cui et al. Nov 2010 A1
20100291441 Ugaji et al. Nov 2010 A1
20100297502 Zhu et al. Nov 2010 A1
20100310941 Kumta et al. Dec 2010 A1
20100330421 Cui et al. Dec 2010 A1
20100330423 Cui et al. Dec 2010 A1
20110008233 Miyanaga Jan 2011 A1
20110027655 Rojeski Feb 2011 A1
20110111294 Lopez et al. May 2011 A1
20110111300 DelHagen et al. May 2011 A1
20110111304 Cui et al. May 2011 A1
20110135925 Zhamu et al. Jun 2011 A1
20110143019 Mosso et al. Jun 2011 A1
20110143263 Shirvanian et al. Jun 2011 A1
20110151290 Cui et al. Jun 2011 A1
20110159365 Loveness et al. Jun 2011 A1
20110159367 Kim et al. Jun 2011 A1
20110189510 Caracciolo et al. Aug 2011 A1
20110205688 Ray et al. Aug 2011 A1
20110229761 Cui et al. Sep 2011 A1
20110269025 Sun et al. Nov 2011 A1
20110287318 Loveness et al. Nov 2011 A1
20120028123 Asari et al. Feb 2012 A1
20120034524 Caracciolo et al. Feb 2012 A1
20120070741 Liu et al. Mar 2012 A1
20120094192 Jun et al. Apr 2012 A1
20120183856 Cui et al. Jul 2012 A1
20120292586 Yamauchi et al. Nov 2012 A1
20120301785 Buchine et al. Nov 2012 A1
20120301789 Loveness et al. Nov 2012 A1
20120328942 Thomas-Alyea et al. Dec 2012 A1
20130004657 Xu et al. Jan 2013 A1
20130011736 Loveness et al. Jan 2013 A1
20130069601 Coowar et al. Mar 2013 A1
20130078523 Rojeski Mar 2013 A1
20130143124 Lee et al. Jun 2013 A1
20130247966 Buchine et al. Sep 2013 A1
20130320582 Cui et al. Dec 2013 A1
20130344383 Loveness et al. Dec 2013 A1
20140096819 Kirkengen et al. Apr 2014 A1
20150140333 Niu May 2015 A1
20150325852 Wang et al. Nov 2015 A1
20160013483 Loveness et al. Jan 2016 A1
20160190600 Cui et al. Jun 2016 A1
20170098819 Loveness et al. Apr 2017 A9
20170187070 Park et al. Jun 2017 A1
20170338464 Fasching et al. Nov 2017 A1
20180090755 Liu et al. Mar 2018 A1
20190058186 Cui et al. Feb 2019 A1
20190088939 Wang et al. Mar 2019 A1
20190273252 Loveness et al. Sep 2019 A1
20200274151 Yu et al. Aug 2020 A1
20200274156 Wang et al. Aug 2020 A1
20210104730 Cui et al. Apr 2021 A1
20220020979 Loveness et al. Jan 2022 A1
20220149379 Liu et al. May 2022 A1
Foreign Referenced Citations (104)
Number Date Country
1891668 Jan 2004 CN
1476645 Feb 2004 CN
1705148 Dec 2005 CN
1705418 Dec 2005 CN
1979828 Jun 2007 CN
101346834 Jan 2009 CN
101346836 Jan 2009 CN
101356666 Jan 2009 CN
101356670 Jan 2009 CN
101453013 Jun 2009 CN
101527357 Sep 2009 CN
101560694 Oct 2009 CN
101689628 Mar 2010 CN
101453016 Jun 2010 CN
101356666 Oct 2010 CN
101953014 Jan 2011 CN
101953014 Jan 2011 CN
101986447 Mar 2011 CN
101989655 Mar 2011 CN
102460782 May 2012 CN
101689628 Jun 2012 CN
102959775 Mar 2013 CN
883199 Dec 1998 EP
1205989 May 2002 EP
845828 Oct 2002 EP
1494302 Jan 2005 EP
1873846 Jan 2008 EP
2219250 Aug 2010 EP
2427928 Mar 2012 EP
2549567 Jan 2013 EP
2880198 Jun 2006 FR
2470056 Nov 2010 GB
2000-036323 Feb 2000 JP
2002-216751 Aug 2002 JP
2003-303588 Oct 2003 JP
2005-259697 Sep 2005 JP
2005-310759 Nov 2005 JP
2006-269306 Oct 2006 JP
2007-061945 Mar 2007 JP
2007-123100 May 2007 JP
2008-026595 Feb 2008 JP
2008-192594 Aug 2008 JP
2008-235258 Oct 2008 JP
2008-269827 Nov 2008 JP
2008-305781 Dec 2008 JP
2009-021226 Jan 2009 JP
2009-032693 Feb 2009 JP
2009-117165 May 2009 JP
2009-164137 Jul 2009 JP
2010-525549 Jul 2010 JP
2010-262752 Nov 2010 JP
2010-538444 Dec 2010 JP
2011-108639 Jun 2011 JP
2012-526364 Oct 2012 JP
2012-527735 Nov 2012 JP
2013-65547 Apr 2013 JP
2012-556203 Jun 2013 JP
2013-521621 Jun 2013 JP
2013-521621 Jun 2013 JP
2015020921 Feb 2015 JP
2005-071655 Mar 2016 JP
2017521812 Aug 2017 JP
6250538 Dec 2017 JP
2006-0047424 May 2006 KR
2007-0043950 Apr 2007 KR
2008-0070769 Jul 2008 KR
2009-0019339 Feb 2009 KR
2010-0113433 Oct 2010 KR
WO 2006123049 Nov 2006 WO
WO 2007083152 Jan 2007 WO
WO 2007061945 May 2007 WO
WO 2007071778 Jun 2007 WO
WO 2007083152 Jul 2007 WO
WO 2007083155 Feb 2008 WO
WO 2008044449 Apr 2008 WO
WO 2007083155 Jul 2008 WO
WO 2008139157 Nov 2008 WO
WO 2009008558 Jan 2009 WO
WO 2009009206 Jan 2009 WO
WO 2009010757 Jan 2009 WO
WO 2009010758 Jan 2009 WO
WO 2009010759 Jan 2009 WO
WO 2009031715 Mar 2009 WO
WO 2009033015 Mar 2009 WO
WO 2009038897 Mar 2009 WO
WO 2009129490 Oct 2009 WO
WO 2010100599 Sep 2010 WO
WO 2010129910 Nov 2010 WO
WO 2010138617 Dec 2010 WO
WO 2010138619 Dec 2010 WO
WO 2011015174 Feb 2011 WO
WO 2011053553 May 2011 WO
WO 2011053736 May 2011 WO
WO 2011056847 May 2011 WO
WO 2011066818 Jun 2011 WO
WO 2011094642 Aug 2011 WO
WO 2011109477 Sep 2011 WO
WO 2011137446 Nov 2011 WO
WO 2011149958 Dec 2011 WO
WO 2012027360 Mar 2012 WO
WO 2012054767 Apr 2012 WO
WO 2013-096931 Jun 2013 WO
WO 2014008433 Jan 2014 WO
WO 2015175509 Nov 2015 WO
Non-Patent Literature Citations (284)
Entry
Lithium-silicon battery, available online at https://en.wikipedia.org/wiki/Lithium%E2%80%93silicon_battery, date unknown.
U.S. Appl. No. 12/437,529, Office Action dated May 13, 2011.
U.S. Appl. No. 12/437,529, Final Office Action dated Oct. 20, 2011.
U.S. Appl. No. 12/437,529, Office Action dated Dec. 22, 2011.
U.S. Appl. No. 13/427,681, Office Action dated Oct. 25, 2012.
U.S. Appl. No. 13/427,681, Office Action dated Jun. 11, 2013.
U.S. Appl. No. 13/427,681, Office Action dated Oct. 2, 2013.
U.S. Appl. No. 13/427,681, Office Action dated May 21, 2014.
U.S. Appl. No. 13/427,681, Final Office Action dated Feb. 6, 2015.
Examiner's Answer, dated Sep. 28, 2016, issued in U.S. Appl. No. 13/427,681.
Board of Appeal Decision, dated Nov. 15, 2017, issued in U.S. Appl. No. 13/427,681.
U.S. Notice of Allowance dated May 22, 2018, issued in U.S. Appl. No. 13/427,681.
Office Action dated Aug. 26, 2019 issued in U.S. Appl. No. 16/109,609.
U.S. Notice of Allowance dated May 21, 2020, issued in U.S. Appl. No. 16/109,609.
U.S. Appl. No. 12/787,168, Office Action dated Jan. 10, 2013.
U.S. Appl. No. 12/787,168, Office Action dated Sep. 10, 2013. .
U.S. Appl. No. 12/787,168, Office Action dated Feb. 26, 2014.
U.S. Appl. No. 12/787,168, Final Office Action dated Nov. 6, 2014.
U.S. Appl. No. 12/787,168, Non-Final Office Action dated Jul. 7, 2015.
U.S. Appl. No. 12/787,168, Final Office Action dated Apr. 11, 2016.
U.S. Appl. No. 12/787,168, Office Action dated Mar. 9, 2017.
U.S. Appl. No. 12/787,168, Final Office Action dated Dec. 20, 2017.
U.S. Office Action dated Apr. 5, 2012 for U.S. Appl. No. 13/039,031.
U.S. Notice of allowance dated Jul. 26, 2012 for U.S. Appl. No. 13/039,031.
US Pre-Issuance Submission by Third Party dated Jan. 15, 2014, received in U.S. Appl. No. 13/914,491.
U.S. Appl. No. 13/914,491, Notice of Allowance dated Jun. 19, 2015.
U.S. Office Action dated Jan. 2, 2018 for U.S. Appl. No. 14/859,125.
U.S. Final Office Action dated Jul. 16, 2018 for U.S. Appl. No. 14/859,125.
U.S. Notice of Allowance dated Oct. 24, 2018 for U.S. Appl. No. 14/859,125.
U.S. Office Action dated Sep. 20, 2020, issued in U.S. Appl. No. 16/264,456.
U.S. Notice of Allowance dated Jan. 25, 2021, issued in U.S. Appl. No. 16/264,456.
Office Action dated Apr. 26, 2012, issued in U.S. Appl. No. 12/787,138.
Final Office Action dated Oct. 11, 2012, issued in U.S. Appl. No. 12/787,138.
U.S. Appl. No. 12/787,138, Notice of Allowance dated Jan. 28, 2013.
U.S. Appl. No. 13/891,035, Office Action dated Jun. 19, 2014.
U.S. Appl. No. 13/891,035, Final Office Action dated Apr. 23, 2015.
U.S. Appl. No. 13/891,035, Notice of Allowance dated Aug. 26, 2015.
U.S. Office Action issued in issued in U.S. Appl. No. 14/952,744, dated Sep. 27, 2016.
U.S. Appl. No. 14/952,744, Final Office Action dated Aug. 25, 2017.
U.S. Office Action issued in U.S. Appl. No. 14/952,744, filed Mar. 21, 2018.
U.S. Appl. No. 14/952,744, Office Action dated Nov. 21, 2018.
Notice of Allowance dated Jun. 14, 2019 issued in U.S. Appl. No. 14/952,744.
U.S. Appl. No. 13/114,413, Office Action dated Jun. 19, 2014.
U.S. Appl. No. 13/114,413, Notice to Allowance dated Jan. 22, 2015.
U.S. Appl. No. 13/114,413, Notice of Allowance dated Jun. 24, 2015.
U.S. Appl. No. 13/277,821, Office Action dated Feb. 25, 2013.
U.S. Appl. No. 13/277,821, Office Action dated Oct. 11, 2013.
U.S. Appl. No. 13/277,821, Office Action dated Apr. 10, 2014.
U.S. Appl. No. 13/277,821, Final Office Action dated Nov. 20, 2014.
U.S. Appl. No. 13/277,821, Decision on Appeal dated Oct. 18, 2016.
U.S. Appl. No. 13/277,821, Notice of Allowance dated Jan. 4, 2017.
U.S. Appl. No. 13/277,821, Notice of Allowance dated Jun. 1, 2017.
U.S. Office Action dated Apr. 16, 2019, issued in U.S. Appl. No. 15/694,470.
U.S. Final Office Action dated Dec. 31, 2019, issued in U.S. Appl. No. 15/694,470.
U.S. Office Action dated Oct. 9, 2020, issued in U.S. Appl. No. 15/694,470.
U.S. Final Office Action dated Jul. 2, 2021, issued in U.S. Appl. No. 15/694,470.
Office Action dated Aug. 29, 2013 in U.S. Appl. No. 13/277,620
Final Office Action dated Mar. 28, 2014 in U.S. Appl. No. 13/277,620
Office Action dated Nov. 4, 2014 in U.S. Appl. No. 13/277,620.
Notice of Allowance dated Jul. 31, 2015 in U.S. Appl. No. 13/277,620.
Notice of Allowance dated Oct. 6, 2016 in U.S. Appl. No. 14/928,576.
Office Action dated Dec. 31, 2015 in U.S. Appl. No. 14/928,576.
Office Action dated Jun. 21, 2016 in U.S. Appl. No. 14/928,576.
U.S. Office Action dated May 16, 2018, issued inU.S. Appl. No. 15/608,829.
U.S. Final Office Action dated Dec. 21, 2018 issued in U.S. Appl. No. 15/608,829.
US Pre-Issuance Submission by Third Party dated Jan. 21, 2014, received in U.S. Appl. No. 13/540,484.
U.S. Appl. No. 13/914,491, Office Action dated Jan. 8, 2016.
U.S. Appl. No. 13/540,484, Notice of Allowance dated Feb. 12, 2018.
U.S. Appl. No. 14/710,103, Office Action dated May 22, 2017.
Notice of Allowance issued in U.S. Appl. No. 14/710,103, dated Oct. 27, 2017.
U.S. Office Action dated Oct. 22, 2019 in U.S. Appl. No. 15/887,809.
U.S. Notice of Allowance dated Feb. 10, 2020 in U.S. Appl. No. 15/887,809.
U.S. Notice of Allowance dated Jun. 9, 2020 in U.S. Appl. No. 15/887,809.
Office Action dated Sep. 21, 2020 issued in U.S. Appl. No. 15/931,470.
Final Office Action dated Feb. 19, 2021 issued in U.S. Appl. No. 15/931,470.
Notice of Allowance dated Jul. 14, 2021 issued in U.S. Appl. No. 15/931,470.
U.S. Notice of Allowance (Corrected) dated Jul. 27, 2021, issued in U.S. Appl. No. 15/931,470.
U.S. Appl. No. 11/837,291, Notice of Allowance dated Aug. 10, 2010.
U.S. Appl. No. 11/837,291, Office Action dated Apr. 22, 2010.
U.S. Appl. No. 11/837,291, Office Action dated Feb. 18, 2009.
U.S. Appl. No. 11/837,291, Office Action dated Jan. 7, 2010.
U.S. Appl. No. 11/837,291, Office Action dated Oct. 26, 2009.
CN patent application No. 201080026302.6, Chinese Office Action dated Nov. 10, 2015.
CN patent application No. 201080026302.6, Office Action dated Aug. 8, 2014.
CN patent application No. 201080026302.6, Office Action dated Mar. 23 2015.
CN patent application No. 201080026302.6, Office Action dated Oct. 23, 2013.
EP patent application No. 10772907.1, Supplemental European Search Report dated Jul. 4, 2013.
JP Application No. 2012-510025, Decision of Rejection dated Aug. 5, 2014.
JP patent application No. 2012-510025, Notice of Reasons for Rejection dated Jan. 7, 2014.
Israel Office Action dated May 4, 2015, IL patent application No. 216100.
IL patent application No. 216100, Office Action (Notification of Deficiencies Prior to Allowance of Patent Application) dated Jun. 22, 2016.
WO patent application No. PCT/US2010/034106, International Search Report and Written Opinion dated Feb. 7, 2011.
CN patent application No. 201080023345.9, Office Action dated Apr. 16, 2015.
CN patent application No. 201080023345.9, Office Action dated Dec. 27, 2013.
CN patent application No. 201080023345.9, Office Action dated Sep. 11, 2014.
EP patent application No. 10781151.5, Supplemental European Search Report dated Jun. 28, 2013.
JP patent application No. 2012-513225, Notification of Reasons for Rejection dated Dec. 17, 2013.
JP patent application No. 2012-513225, Decision for Grant and Allowed Claims.
Korean Notification of Provisional Rejection dated Aug. 19, 2015, KR patent application No. 10-2011-7031120.
Korean Notice of First Refusal Ruling dated Apr. 28, 2016, KR patent application No. 10-2011-7031120.
Israel Office Action dated Oct. 13, 2015, IL patent application No. 216248.
WO patent application No. PCT/US2010/036235, International Search Report and Written Opinion dated Jan. 28, 2011.
CN patent application No. 201180019460.3, Office Action dated Jul. 2, 2014.
CN patent application No. 201180019460.3, Office Action dated May 6, 2015.
CN patent application No. 201510674597.2, Office Action and Search Report dated Mar. 28, 2017.
EP patent application No. 11751259.0, Office Action dated Dec. 12, 2016.
EP patent application No. 11751259.0, Extended Search Report dated Mar. 16, 2017.
EP Office Action issued in Application No. 11751259.0 dated May 23, 2018.
JP patent application No. 2012-556203, Office Action dated Aug. 26, 2014.
JP patent application No. 2012-556203, Office Action dated Jul. 14, 2015.
JP patent application No. 2016-077671, Office Action dated Jul. 4, 2017.
JP patent application No. 2016-077671, Office Action dated May 29, 2018.
KR patent application No. 10-2012-7024928, Office Action dated Aug. 28, 2017.
KR Office Action dated Jan. 21, 2019 for application No. 10-2018-7028397.
TW patent publication No. 201238125, published Sep. 16, 2012, English Abstract.
TW patent application No. 100120247, Office Action dated Feb. 9, 2015.
WO patent application No. PCT/US2011/026816, International Search Report and Written Opinion dated Oct. 18, 2011.
CN patent application No. 201080023257.9, Chinese Office Action dated Dec. 12, 2013.
CN patent application No. 201080023257.9, Chinese Office Action dated Jun. 4, 2015.
CN patent application No. 201080023257.9, Chinese Office Action dated Oct. 21, 2014.
EP patent application No. 10781153.1, Supplemental Search Report and Written Opinion dated Jan. 30, 2018.
IL patent application No. 216246, Office Action dated Jun. 29, 2017.
Japanese Office Action dated Aug. 25, 2015, JP patent application No. 2012-513226.
JP patent application No. 2012-513226, Japanese Office Action dated Apr. 4, 2014.
IL patent application No. 216246, Office Action dated Jan. 20, 2016.
Israel Office Action dated Aug. 10, 2015, IL patent application No. 216246.
WO patent application No. PCT/W02010/036237, International Search Report and Written Opinion dated Feb. 1, 2011.
WO patent application No. PCT/US2011/037767, International Search Report and Written Opinion dated Jan. 16, 2012.
TW Office Action issue in Application No. 100138369, dated Dec. 22, 2015.
TW Office Action issue in Application No. 105142724, dated Nov. 13, 2017.
WO patent application No. PCT/US2011/057159, International Search Report and Written Opinion dated Jun. 11, 2012.
CN Office Action issued in Application No. 201180057806.9, dated Mar. 30, 2015.
Second Chinese Office Action issued in Application No. 201180057806.9, dated Nov. 19, 2015.
EP Extended Search Report dated Nov. 19, 2015, issued in Application No. 11835170.9.
JP Notice of Reasons for Rejection dated Sep. 8, 2015, in Application No. 2013-535103.
JP Notice of Reasons for Rejection dated Sep. 6, 2016, in Application No. 2013-535103.
KR Notification of Provisional Rejection dated Apr. 17, 2019 in Application No. 10-2018-7013041.
JP Office Action dated Oct. 2, 2018, issued in Application No. 2017-147013.
KR Notice of Reasons for Rejection dated Feb. 27, 2017 in Application No. 10-2013-7012809.
KR Notice of Reasons for Rejection dated Oct. 21, 2017 in Application No. 10-2013-7012809
TW Office Action dated Nov. 13, 2015, in Application No. 100138361.
WO International Search Report and Written Opinion dated Jun. 28, 2012, issued in Application No. PCT/US2011/057158.
CN Office Action issued in Application No. 201280038037.2 dated Aug. 5, 2015.
CN Office Action issued in application No. 201280038037.2, dated May 26, 2016.
CN Office Action issued in Application No. 201280038037.2 dated Feb. 6, 2017.
EP Search Report issued in Application No. 12807729.4 dated Feb. 5, 2015.
EP Search Report issued in Application No. 12807729.4 dated Jun. 2, 2015.
EP Search Report issued in Application No. 12807729.4 dated Jan. 11, 2017.
JP Office Action issued in application No. 2014-519238 , dated May 31, 2016.
JP Office Action issued in Application No. 2014-519238 dated Feb. 7, 2017.
KR patent application No. 10-2014-7002762, Office Action dated Jul. 27, 2018.
KR Search Report issued in Application No. 10-2014-7002762 dated May 9, 2019.
KR Notice of final Rejection issued in Application No. 10-2014-7002762 dated Sep. 17, 2019.
WO patent application no. PCT/US2012/045313, International Search Report and Written Opinion dated Jan. 21, 2013.
CN Office Action dated Aug. 31, 2018 for Application No. 201580032057.2.
CN Office Action issued in Application No. 201580032057.2 dated Mar. 20, 2019.
CN Office Action issued in Application No. 201580032057.2 dated Sep. 20, 2019.
European Extended Search Report dated Dec. 22, 2017, issued in Application No. 15791953.1.
JP Office Action issued in Application No. 2016-567613 dated May 28, 2019.
JP Office Action dated Apr. 7, 2020 issued in Application No. 2016-567613.
JP Examiner's Report dated Dec. 8, 2020 issued in Application No. 2016567613.
JP Written Statement dated Aug. 26, 2021 issued in Application No. 2016-567613.
KR Office Action dated Oct. 18, 2021 issued in Application No. 10-20167034189.
TW Office Action issued in Application No. 104115079 dated Nov. 19, 2018.
WO International Search report and Written Opinion dated Aug. 10, 2015, issued in Application No. PCT/US15/30336.
WO International Preliminary Report on Patentability dated Nov. 24, 2016, issued in Application No. PCT/US15/30336.
WO International Search report and Written Opinion dated Jun. 17, 2020, issued in Application No. PCT/US2020/019282.
WO International Preliminary Report on Patentability dated Sep. 2, 2021.
EP patent application No. 08831531.2, European Search Report dated Oct. 27, 2010.
Aifantis et al., “High energy density lithium batteries”, 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim (Chapter 6: Next—generation anodes for secondary Li-Ion batteries).
Baldwin, Richard K., et al. “Solution reduction synthesis of surface stabilized silicon nanoparticles,” The Royal Society of Chemistry 2002, Chem. Commun., 2002, 1822-1823.
Bierman, et al., “Potential applications of hierarchical branching nanowires in solar energy conversion,” Energy & Environmental Science, vol. 2, No. 10, Jan. 1, 2009 (Jan. 1, 2009), pp. 1050-1059.
Campbell et al., “Preparation of mesoporous silica templated metal nanowire films on foamed nickel substrates”, Microporous and Mesoporous Materials 97 (2006) 114-121.
Carbon nanofiber product sheet, Applied Science 2008, downloaded from http://www.apsci.com/ngm-pyrol.html on May 2011.
Chan, C.K., et al., “High Capacity Li Lon Battery Anodes Using Ge Nanowires”, Nano Letters, 2008, vol. 8, No. 1, 307-309.
Chan, Candace K. et al., “Structural and electrochemical study of the reaction of lithium with silicon nanowires,” Journal of Power Sources 189 (2009) 34-39.
Chan, Candace K. et al., “Surface chemistry and morphology of the solid electrolyte interphase on silicon nanowire lithium-ion battery anodes,” Journal of Power Sources 189 (2009) 1132-1140.
Chan, et al., “High-Performance Lithium Battery Anodes Using Silicon Nanowires,” Nature Nanotechnology, vol. 3, Jan. 2008, 5 pages.
Chaudhari, P. et al. “Heteroepitaxial silicon film growth at 600 degree C for an Al—Si eutectic melt,” Thin Solid Films 518 (2010) 5368-5371.
Che, G., et al., “Carbon Nanotubule Membranes for Electrochemical Energy Storage and Production”. Nature 393, 346-349 (1998).
Cheng Mu et al., “Silicon nanotube array/gold electrode for direct electrochemistry of cytochrome e,” J. Phys. Chem. B 2007, 111, 1491-1495, Nov. 21, 2006.
CN Notification of Intent to Grant dated Mar. 6, 2020, issued in Application No. 201580032057.2.
Cui, Li-Feng et al., “Carbon-silicon core-shell nanowires as high capacity electrode for lithium ion batteries,” Nano Letters, published on Aug. 5, 2009 on http://pubs.acs.org.
Cui, Li-Feng et al., “Crystalline-amorphous core-shell silicon nanowires for high capacity and high current battery electrodes,” Nano Letters, 2009, vol. 9, No. 1 491-495, Dec. 23, 2008.
Cui, Yi et al., “Doping and electrical transport in silicon nanowires”, The Journal of Physical Chemistry, vol. 104, No. 22, Jun. 8, 2000.
Dick, et al A New Understanding of Au-Assisted Growth of III-V Semiconductor Nanowires, Adv. Funct. Mater. 15, 1603-1610 (2005).
Doerk et al., “Growth of branching Si nanowires seeded by Au-Si surface migration,” Journal of Materials Chemistry, vol. 18, No. 44, Jan. 1, 2008 (Jan. 1, 2008), pp. 5376-5381.
Emmenegger, et al., “Carbon Nanotubes Synthesized on Metallic Substrates,” Applied Surface Science, Aug. 1, 2000, pp. 452-456.
Esmanski, Alexei et al., “Silicon inverse-opal-based macroporous materials as negative electrodes for lithium ion batteries,” Advanced Functional Materials, 2009, 1999-2010, May 7, 2009.
For high-performance anode material in lithium-ion batteries, After Gutenberg, downloaded from http://jcwinnie.biz/wordpress/?p=2864 on Dec. 25, 2009.
Frackowiak, E., et al., “Electrochemical Storage of Lithium Multiwalled Carbon Nanotubes,” Carbon 37, 1999, pp. 61-69.
Gao, et al., “Alloy formation in nanostructured silicon.” Adv. Mater. 13, 816-819 (2001).
Givargizov, “Fundamental aspects of VLS growth,” Journal of Crystal Growth 31, 20-30 (1975).
Goldstein et al., “Melting in semiconductor nanocrystals,” Science 256, 1425-1427 (Jun. 1992).
Green, M., et al Structured silicon anodes for lithium battery applications. Electrochem. Solid State Lett. 6, A75-A79 (2003).
Hertzberg et al., “Abstract SiC nanotubes Cu foil,” J. Am. Chem. Soc., 2010, 8548-8549.
Hu L., et al. “Si nanoparticle-decorated Si nanowire networks for Li-ion battery anodes,” The Royal Society of Chemistry, Chem. Commun., 2011, 47, pp. 367-369.
Huang et al., Catalytic Growth of Zinc Oxide Nanowires by Vapor Transport, Adv. Mater., 13, 113-116 (2001).
Huang et al., Fabrication of Silicon Nanowire Arrays with Controlled Diameter, Length, and Density, Adv. Mater., (2007), 19, 744-748.
Huggins, R.A. & Nix, W.D. Decrepitation Model for Capacity Loss During Cycling of Alloys in Rechargeable Electrochemical Systems, Ionics 6, 57-63 (2000).
Jie Xiao, et al., “Stabilization of silicon anode for Li-ion batteries,” Journal of the Electrochemical Society, 157 (10) A1047-A1051, Aug. 2, 2010.
Kang, Kibum et al., “The role of NiOx overlayers on spontaneous growth of NiSix nanowires from Ni seed layers,” Nano Letters 2008, vol. 8, No. 2 431-436, Jan. 12, 2008.
Kang, Kibum et al., Unconventional roles of metal catalysts in chemical-vapor syntheses of singel-crystalline nanowires,: Journal of Applied Physics 105, 122407 (2009).
Kasavajjula, et al., “Nano- and bulk-silicon-based insertion anodes for lithium-ion secondary cells,” J. Power Sources, 163, 2007, pp. 1003-1339.
Kim Hyesun, et al., “Superior Lithium Electroaactive Mesoporous Si@Carbon Core-Shell Nanowires for Lithium Battery Anode Material,” American Chemical Society, Nano Letters, 2008, vol. 8, No. 11, pp. 3688-3691.
Kim, Cheol-Joo et al., “Spontaneous chemical vapor growth of NiSi nanowires and their metallic properties,” Advanced Materials, 2007, 19, 3637-3642, Oct. 16, 2007.
Kim, Hyunjung et al., “Three-dimensional porous silicon particles for use in high-performance lithium secondary batteries,” Angewandte Chemie, Int. Ed. 2008, 47, 10151-10154, Nov. 17, 2008.
Lee et al., “Anomalous growth and characterization of carbon-coated nickel silicide nanowires,” Chemical Physics Letters 384, 2004, pp. 215-218.
Lee, Y.M., et al. SEI layer formation on amorphous Si thin electrode during precycling. J. Electrochem. Soc. 154, A515-A519 (2007).
Levitt, “Whisker Technology.” Wiley Interscience, 1970.
Li et al., “A high capacity nano-Si composite anode material for lithium rechargeable batteries,” Electrochemical and Solid-State Letters, 2 (11) 547-549 (1999).
Li et al., “Freestanding mesoporous quasi-single-crystalline Co3O4 nanowire arrays,” J. Am. Chem. Soc. 2006, 128, 14258-14259, Oct. 18, 2006.
Li et al., “Rate capabilities of nanostructured LiMn2O4 electrodes in aqueous electrolyte.” J. Electrochem. Soc. 147, 2044-2049 (2000).
Low Pressure Chemical Vapor Deposition Systems, MKS Instruments, 2020, https://www.mksinst.com/n/lpcvd-systems (Year: 2020).
Magasinski et al., “Hierarchical botton-up approach for high-performance Si-based Li-ion battery anodes,” Abstract #16, IMLB 2010, the Electrochemical Society.
Magasinki, A. et al., “High-performance lithium-ion anodes using a hierarchical bottom-up approach,” Nature Materials, published online at www.nature.com/naturematerials Mar. 14, 2010.
Magasinski, A., et al., “High-Performance Lithium-ion anodes Using a Hierarchical Botton-up Approach,” Nature Material, www.nature.com/naturematerials, Mar. 14, 2010.
Magasinski et al., “Towards efficent binders for Li-ion batter Si-based anodes,” Abstract #64, IMLB 2010, The Electrochemical Society.
Marczak et al., “The individual core/shell silicon nanowire structure probed by Raman spectroscopy”, P hys. Status Solidi C 6, No. 9, 2053-2055 (2009).
Morales, et al., “A Laser Ablation Method for the Synthesis of Crystalline Semiconductor Nanowires,” Science vol. 279, Jan. 9, 1998.
Nickel Silicide Nanobelts and Sheets in Li-ion Anodes Capacity, Green Car Congress, Apr. 19, 2009, pp. 1-3.
Nishi, Yoshio, “Lithium ion secondary batteries; past 10 years and the future,” Journal of Power Sources, vol. 100, 2001, pp. 101-106.
Pan et al., Nanobelts of Semiconduction Oxides, Science Mar. 9, 2001: 1947-1949.
Park, M.S. et al., “Preparation and Electrochemical Properties of Sn02 Nanowires for Application in Lithium-ion Batteries” Angew. Chem. Int. Edn 46, 750-753 (2007).
Park, Mi-Hee et al., “Silicon nanotube battery anodes,” Nano Letters 2009, vol. 9, No. 11 3844 3847, Sep. 11, 2009.
Park, Mi-Hee et al., “Supporting information for silicon nanotube battery anodes,” Nano Letters 2009, vol. 9, No. 11 3844-3847, Sep. 11, 2009.
Ping-Ping, F., et al., Amorphous Silicon Film Anode for Lithium-ion Battery, Chinese Journal of Inorganic Chemistry, vol. 22, No. 10, Oct. 2006, 5 pages.
Quasi-2D Structures Make Better Batteries, Tyrell, James, Apr. 17, 2008, pp. 1-2.
Ryu, J.H., et al Failure modes of silicon powder negative electrode in lithium secondary batteries. Electrochem. Solid-State Lett. 7, A306-A309 (2004).
S.K. Samudrala and S. Bandyopadhyay: Hybrid Nanocomposite for Nanotechnology, 2009, p. 245.
Sharma et al., “Diameter control of Ti-catalyzed silicon nanowires,” Journal of Crystal Growth 267 (2004) 613-618, Apr. 20, 2004.
Sharma et al., “Structural characteristics and connection mechanism of gold-catalyzed bridging silicon nanowires,” Journal of Crystal Growth 280 (2005) 562-568.
Sharma et al., “Thermodynamic properties of the lithium-silicon system.” Journal of the Electrochemical Society 123, 1763-1768 (Dec. 1976).
Softpedia, “Silicon can improve lithium-ion batteries,” downloaded from http://news.softpedia.com/news/silicon-can-improve-lithium-ion-batteries-161142.shtml on Oct. 21, 2010.
Song et al., “Arrays of sealed silicon nanotubes as anodes for lithium ion batteries,” Nano Letters, American Chemical Society, Jan. 11, 2010.
Sun et al, Synthesis of Nickel Mono-Silicide Nanowire by Chemical Vapor Deposition on Nickel Film: Role of Surface Nickel Oxides, Japanese Journal of Applied Physics, vol. 48, No. 4, Apr. 1, 2009, p. 84C138, XP855323364.
“Sweet nanotech batteries: Nanotechnology could solve lithium battery charging problems,” PhysOrg.com, from http://phys.org/news127043619.html.
Uehara et al., “Thick vacuum deposited silicon films suitable for the anode of Li-ion battery,” Journal of Power Sources 146, 441-444 (2005).
Ulvestad, A., et al. “Long-term Cyclability of Substoichiometric Silicon Nitride thin Film Anodes for Li-ion Batteries,” Scientific Reports DOI:10.1038/s41598-017-13699-0, Oct. 17, 2017, pp. 1-10.
Wang, Y., et al. Epitaxial growth of silicon nanowires using an aluminum catalyst. Nature Naotech. 1, 186-189 (2006).
Westwater et al., “Growth of silicon nanowires via gold/silane vapor-liquid-solid reaction,” Journal Va. Sci. Technology B 15(3), 554-557 (May/Jun. 1997).
Westra, J.M., et al., “Formation of thin-film crystalline silicon on glass observed by in-situ XRD” Energy Procedia 2 (2010) pp. 235-241. (Year: 2010).
Wu, Y. et al. Controlled growth and structures of molecular-scale silicon nanowires. Nao Lett. 4, 433-436 (2004).
Yazawa et al., “Effect of one monolayer of surface gold atoms on the epitaxial growth of InAs nanowhiskers,” Appl. Phys. Lett. 61 (17), 2051-2053 (Oct. 1992).
Ying et al., “Characterization of Sn02 nanowires as anode materials for Li-ion batteries.” Applied Physics Letters 87(11), 2005 (Abstract only).
Zhang, Hong-Li et al., “The facile synthesis of nickel silicide nanobelts and nanosheets and their application in electrochemical energy storage,” Nanotechnology 19 (2008) 165606, (7 pp), Mar. 20, 2008.
Zhang, Y., et al., “Pyrolytic Carbon-Coated Silicon/Carbon Nanotube Composites: Promising Application for Li-ion Batteries,” Int. J. Nanomanufacturing, vol. 2, Nos. 1/2, 2008, pp. 4-15.
Zhou, Controlled Li Doping of Si Nanowires (Applied Physics Letters vol. 75, No. 16), Oct. 18, 1999.
U.S. Appl. No. 16/748,393, filed Jan. 21, 2020, Fasching et al.
U.S. Appl. No. 17/323,575, filed May 18, 2021, Loveness et al.
U.S. Appl. No. 17/493,740, filed Oct. 4, 2021, Lui et al.
EP patent application No. 10781153.1, Supplemental Search Report and Written Opinion dated Jul. 4, 2013.
Extended European search report dated Oct. 7, 2022, in Application No. EP20759398.9.
Hertzberg et al., “Deformations in Si—Li anodes upon electrochemical alloying in nano-confined space,” J. Am. Chem. Soc. 2010, 132, 8548-8549, Apr. 15, 2010.
JP Office Action dated Feb. 8, 2022, in Application No. JP2021-066099.
JP Office Action dated Mar. 22, 2022 issued in Application No. 2016-567613.
JP Office Action dated Nov. 15, 2022, in Application No. JP2021-066099 with English translation.
JP patent application No. 2012-513226, Japanese Office Action dated Feb. 10, 2015.
JP patent application No. 2012-513226, Japanese Office Action dated Feb. 4, 2014.
KR Office Action dated Aug. 17, 2022 in Application No. KR10-2016-7034189 with English translation.
Office Action dated Dec. 7, 2012 in U.S. Appl. No. 13/277,620.
U.S. Appl. No. 15/608,829, inventors Fasching et al., filed May 30, 2017.
U.S. Appl. No. 15/887,809, inventors Wang et al., filed Feb. 2, 2018.
U.S. Appl. No. 16/797,553, inventors Yu et al., filed on Feb. 21, 2020 .
U.S. Final Office Action dated Oct. 11, 2022, in U.S. Appl. No. 16/797,553.
U.S. Non-Final Office Action dated Feb. 23, 2023 in U.S. Appl. No. 17/323,575.
U.S. Non-Final Office Action dated Jun. 27, 2023, in U.S. Appl. No. 17/493,740.
U.S. Non-Final Office Action dated May 18, 2023, in U.S. Appl. No. 16/797,553.
U.S. Non-Final Office Action dated May 26, 2022, in U.S. Appl. No. 16/797,553.
U.S. Notice of Allowance dated Feb. 22, 2013 for U.S. Appl. No. 13/564,324.
U.S. Office Action dated Sep. 17, 2012 for U.S. Appl. No. 13/564,324.
U.S. Appl. No. 12/895,424, Final Office Action dated Aug. 3, 2011.
U.S. Appl. No. 12/895,424, Notice of Allowance dated Jun. 23, 2014.
U.S. Appl. No. 12/895,424, Office Action dated Nov. 17, 2010.
U.S. Appl. No. 12/895,424, Office Action dated Oct. 8, 2013.
U.S. Appl. No. 13/891,035, Supplemental Notice of Allowance dated Sep. 23, 2015.
U.S. Appl. No. 13/914,491, Office Action dated Dec. 3, 2014.
U.S. Restriction Requirement dated Mar. 1, 2022 for U.S. Appl. No. 16/797,553.
U.S. Restriction requirement dated May 12, 2023, in U.S. Appl. No. 16/949,201.
U.S. Corrected Notice of Allowance dated Oct. 5, 2023, in U.S. Appl. No. 17/323,575.
U.S. Non-Final Office Action dated Sep. 22, 2023, in U.S. Appl. No. 16/949,201.
U.S. Notice of Allowance dated Sep. 7, 2023, in U.S. Appl. No. 17/323,575.
U.S. Notice of Allowance dated Sep. 14, 2023 in U.S. Appl. No. 17/323,575.
JP Office Action dated Jun. 21, 2021 issued in Application No. 2016-567613 with English translation.
Related Publications (1)
Number Date Country
20220115650 A1 Apr 2022 US
Provisional Applications (1)
Number Date Country
61992121 May 2014 US
Divisions (1)
Number Date Country
Parent 15887809 Feb 2018 US
Child 15931470 US
Continuations (2)
Number Date Country
Parent 15931470 May 2020 US
Child 17524206 US
Parent 14710103 May 2015 US
Child 15887809 US