STTR Phase I: Improved Boron Nitride Materials for Enhanced Thermal Management

Information

  • NSF Award
  • 0512932
Owner
  • Award Id
    0512932
  • Award Effective Date
    7/1/2005 - 19 years ago
  • Award Expiration Date
    6/30/2006 - 18 years ago
  • Award Amount
    $ 100,000.00
  • Award Instrument
    Standard Grant

STTR Phase I: Improved Boron Nitride Materials for Enhanced Thermal Management

This Small Business Technology Transfer Phase I project provides for the manufacture<br/>of improved boron nitride (BN) filler materials for electronic thermal management applications.<br/>Novel Atomic Layer Deposition (ALD) nanocoating is used to selectively functionalize edges only or edges/basal planes to improve wetting of BN platelets with resin encapsulants. The improved wetting allows for significantly reduced viscosity (~ 5 times less) of BN/resin mixtures during processing and improved interfacial adhesion in the cured composite. These improvements are realized using an ultra-thin (nm thick), conformal, pin-hole free, chemically bonded alumina nanofilm on individual BN platelets that provides for an improvement in rheological properties without a significant reduction in thermal conductivity. Hence, higher BN loadings in filled composites will allow for significantly improved heat dissipation in electronic packaging materials, particularly in the case of glob top coatings and potting compounds. Individual fine sized BN platelet particles will be selectively nanocoated (edges only or edges/basal planes) with chemically bonded Al2O3 films of ~50, 25, 12.5, 6.3, 3.2, 1.6, and 0.8 nanometer thickness. The nanocoated BN will be blended at a 40 volume % loading in a liquid encapsulant mixture (will measure viscosity), cured, and tested for thermal conductivity and peel strength.<br/><br/>Commercially this addresses one of the most pressing problems in the electronics industry, namely the heat dissipation required by the use of faster and more powerful chips. Since boron nitride has one of the best thermal conductivities as a filler, any improvement in its performance can positively address this problem. Furthermore the potential impact of successful large scale processing extends far beyond this proposed microelectronics packaging application. Nanoscience will only achieve true "disruptive" technology status if the individual surfaces of ultrafine particles can be functionalized. ALD nanocoating of ultrafine particles provides such an opportunity. It is now possible to produce ultrafine particles with designed electrical, magnetic, optical, mechanical, rheological, or other properties. Markets for such functionalized ultra-fine powders include microelectronics, defense, hard metals, cosmetics, drug delivery, energetic materials, and polymer/ceramic nanocomposites, among others. A better understanding of the nanocoating of ultra-fine particles and its cost/performance value will be developed.

  • Program Officer
    TIMOTHY J. RUDD
  • Min Amd Letter Date
    6/13/2005 - 19 years ago
  • Max Amd Letter Date
    6/13/2005 - 19 years ago
  • ARRA Amount

Institutions

  • Name
    ALD NANOSOLUTIONS, INC.
  • City
    Broomfield
  • State
    CO
  • Country
    United States
  • Address
    580 Burbank St, Unit 100
  • Postal Code
    800207166
  • Phone Number
    3033184145

Investigators

  • First Name
    John
  • Last Name
    Ferguson
  • Email Address
    john.ferguson@aldnanosolutions.com
  • Start Date
    6/13/2005 12:00:00 AM

FOA Information

  • Name
    Industrial Technology
  • Code
    308000