Claims
- 1. A compound of the formula: ##STR28## and the salts thereof of strong organic or inorganic acids, wherein:
- R is a metal cation or hydrogen;
- R.sub.2 is hydrogen, methyl or ethyl;
- R.sub.3 is isopropyl;
- R.sub.4 is hydrogen or fluoro;
- Y is hydrogen, trifluoromethyl, fluoro, chloro, bromo, lower alkoxy of one to four carbon atoms, lower alkylthio of one to three carbon atoms or lower alkyl of one to four carbon atoms;
- Z is lower alkyl of one to four carbon atoms, chloro, fluoro, bromo, trifluoromethyl, alkylthio having from one to four carbon atoms, lower alkylcarbonyl having one to four carbon atoms, lower haloalkylthio having from one to four carbon atoms, or cyclopropyl.
- 2. A compound according to claim 1 wherein R.sup.4 is hydrogen.
- 3. A compound according to claim 2 wherein Z and Y are individually chloro, fluoro, bromo, trifluoromethyl, or alkyl of one to four carbon atoms.
- 4. A compound according to claim 3 wherein Y is chloro or fluoro, and Z is chloro, bromo, fluoro, trifluoromethyl or lower alkyl of one to four carbon atoms.
- 5. A compound of the formula: ##STR29## wherein: R is a metal cation or hydrogen;
- Y is chloro, fluoro, bromo or alkyl having from one to four carbom atoms;
- Z is hydrogen, chloro, fluoro, bromo, haloalkyl, alkyl having from one to four carbon atoms, or alkylcarbonyl.
- 6. A compound according to claim 2 wherein Y is hydrogen, chloro, fluoro, methyl or methoxy;
- Z is chloro, fluoro, methyl, trifluoromethyl or methoxy.
- 7. A compound of the formula: ##STR30## wherein: R is a metal cation or hydrogen;
- R.sup.1 is phenyl substituted at the para position, or at the para and ortho positions with one or two substituents selected from the group consisting of lower alkyl, halogen, lower haloalkyl, lower alkoxy, lower alkylthio, or lower alkylcarbonyl.
- 8. A compound according to claim 7 wherein said phenyl is substituted at the para position, or para and ortho positions, with one or two lower alkyl, lower haloalkyl or halogen.
- 9. A compound according to claim 8 wherein said phenyl is substituted at the para position, or para and ortho positions with one or two chloro, fluoro, trifluoromethyl or methyl.
- 10. A compound according to claim 8 wherein said phenyl is substituted at the ortho and para positions with a substituent selected from the group consisting of lower alkyl, halogen or lower haloalkyl.
- 11. The compound according to claim 9:
- N-(2-fluoro-4-trifluoromethylphenyl) valine
- 12. The compound according to claim 9:
- N-(2-fluoro-4-chlorophenyl) valine
- 13. The compound according to claim 9:
- N-(4-trifluoromethylphenyl) valine
- 14. The compound according to claim 9:
- N-(4-chlorophenyl) valine
- 15. The compound according to claim 9:
- N-(4-methylphenyl) valine
- 16. A compound of the formula: ##STR31## and the salts thereof of strong organic or inorganic acids, wherein: R is a metal cation or hydrogen;
- R.sub.2 is hydrogen, methyl or ethyl;
- Y is hydrogen;
- Z is cyano, nitro, lower alkyl of one to four carbon atoms, chloro, fluoro, bromo, trifluoromethyl, alkoxy having from one to four carbon atoms, alkylthio having from one to four carbon atoms, lower alkylcarbonyl having from one to four carbon atoms, alkoxycarbonyl having from two to four carbon atoms or cyclopropyl.
- 17. A compound according to claim 16, wherein Z is trifluoromethyl.
- 18. A compound according to claim 16 wherein R is hydrogen, sodium or potassium; R.sup.2 is hydrogen; and Z is lower alkyl of one to four carbon atoms, chloro, fluoro, bromo, trifluoromethyl or cyclopropyl.
- 19. A compound of the formula: ##STR32## and the salts thereof of strong organic or inorganic acids; wherein: R is a metal cation or hydrogen;
- R.sub.2 is hydrogen, methyl or ethyl;
- Y is trifluoromethyl, fluoro, chloro, bromo, lower alkoxy having one to four carbon atoms, lower alkylthio of one to three carbon atoms or lower alkyl of one to four carbons;
- Z is lower alkyl having one to four carbon atoms, chloro, cyano, fluoro, nitro, bromo, trifluoromethyl, alkoxy having one to four carbon atoms, alkylthio having from one to four carbon atoms, lower alkylcarbonyl having one to four carbon atoms, or cyclopropyl.
- 20. A compound according to claim 19, wherein Z is trifluoromethyl.
- 21. A compound according to claim 19, wherein Y is fluoro;
- Z is chloro, bromo, fluoro, trifluoromethyl or lower alkyl of one to four carbon atoms.
- 22. A compound of the formula: ##STR33## wherein R.sub.2 is hydrogen, methyl or ethyl; Z is lower alkyl of one to four carbon atoms, chloro, fluoro, bromo, trifluoromethyl, lower alkylcarbonyl, lower haloalkylthio or cyclopropyl; Y is hydrogen, trifluoromethyl, fluoro, chloro, bromo, lower alkyl of one to four carbon atoms, lower alkoxy of one to four carbon atoms or lower alkylthio of one to three carbon atoms; and R is a metal cation or hydrogen, and the salts thereof of strong inorganic or organic acids.
- 23. A compound according to claim 22 wherein Y is fluoro.
- 24. A compound according to claim 23 wherein R.sup.2 is hydrogen.
- 25. A compound according to claim 24 wherein R is hydrogen, sodium or potassium.
- 26. A compound according to claim 25 wherein Z is bromo, chloro or trifluoromethyl.
- 27. A compound according to claim 22 wherein R is hydrogen, potassium or sodium; R.sup.2 is hydrogen; Y is chloro; and Z is trifluoromethyl.
- 28. A compound according to claim 26 wherein R is hydrogen.
- 29. A compound according to claim 27 wherein R is hydrogen.
Parent Case Info
This is a continuation-in-part of Ser. No. 824,947, filed Aug. 15, 1977, now abandoned which, in turn, is a continuation-in-part of Ser. No. 779,886, filed Mar. 21, 1977, now abandoned the entire disclosures of which are incorporated herein by reference.
US Referenced Citations (12)
Foreign Referenced Citations (9)
Number |
Date |
Country |
2350944 |
Oct 1973 |
DEX |
2349970 |
Apr 1974 |
DEX |
2753605 |
Jun 1978 |
DEX |
52-82724 |
Jul 1977 |
JPX |
52-91833 |
Aug 1977 |
JPX |
52-100431 |
Aug 1977 |
JPX |
860303 |
Feb 1961 |
GBX |
1122043 |
Jul 1968 |
GBX |
1289283 |
Sep 1972 |
GBX |
Non-Patent Literature Citations (2)
Entry |
Minoura et al., Chem. Absts., 58, 14130(d), 1963. |
Suter et al., J.A.C.S., 50, 2733-2739, 1928. |
Continuation in Parts (2)
|
Number |
Date |
Country |
Parent |
824947 |
Aug 1977 |
|
Parent |
779886 |
Mar 1977 |
|