Claims
- 1. A method of forming a film on a substrate consisting essentially of applying to the substrate a nonaqueous composition comprising a solution of a free radical initiator having a hydroperoxide moiety in a liquid monomer containing one or more acrylate moieties and curing said composition by exposing same to sulfur dioxide gas.
- 2. A method according to claim 1, wherein the composition is exposed to sulfur dioxide gas for from about 1 to about 30 seconds.
- 3. A method according to claim 1, wherein the composition is exposed to sulfur dioxide gas for from about 2 to about 5 seconds.
- 4. A method according to claim 1, wherein the composition contains from about 0.001 part to about 0.2 part by weight of the free radical initiator for each part by weight of the monomer.
- 5. A method according to claim 1, wherein the composition contains from about 0.01 part to about 0.06 part by weight of the free radical initiator for each part by weight of the monomer.
- 6. A method according to claim 1, wherein the free radical initiator is selected from the group consisting of hydrogen peroxide, t-butylhydroperoxide, cumene hydroperoxide and 2,4-dimethyl-2,4-hexanedihydroperoxide.
- 7. A method according to claim 6, wherein the free radical initiator is t-butylhydroperoxide.
- 8. A method according to claim 1, wherein the monomer is selected from the group consisting of acrylic acid, methacrylic acid, acrylates and methacrylates containing one or more acrylate moieties.
- 9. A method according to claim 8, wherein the monomer is selected from the group consisting of methacrylic acid, hexamethylenediol dimethacrylate, trimethylolpropane trimethacrylate, polypropylene glycol, tetramethacrylate and allyl methacrylate.
- 10. A method according to claim 9, wherein the monomer is trimethylolpropane trimethacrylate.
- 11. A method according to claim 1, wherein the monomer is trimethylolpropane triacrylate and the free radical initiator is t-butylhydroperoxide.
- 12. A method according to claim 1, wherein the monomer is selected from the group consisting of acrylic acid, hexamethylenediol diacrylate, trimethylolpropane triacrylate, polypropylene glycol tetraacrylate and allyl acrylate.
- 13. A method according to claim 12, wherein the monomer is allyl acrylate.
- 14. A method according to claim 12, wherein the monomer is trimethylolpropane triacrylate.
CROSS-REFERENCE TO RELATED APPLICATION
This application is a continuation-in-part of copending U.S. patent application Ser. No. 212,810, filed Dec. 4, 1980, now abandoned.
US Referenced Citations (3)
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
212810 |
Dec 1980 |
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