This application is a national stage of international application No. PCT/JP2008/061854, filed on Jun. 30, 2008, and claims the benefit of priority under 35 USC 119 to Japanese Patent Application No. 2007-194327, filed on Jul. 26, 2007 and Japanese Patent Application No. 2007-316788, filed on Dec. 7, 2007, the entire contents of all of which are incorporated herein by reference.
The present invention relates to a surface acoustic wave device including a surface acoustic wave filter and a surface acoustic wave resonator etc. used in a mobile phone or other mobile communication device, for example, and a communication device provided with this.
Conventionally, as a frequency selection filter (below, also referred to as a “filter”) used in an RF (radio frequency) stage of a mobile phone, car phone, or other mobile communication device, a SAW filter has been widely used. In general, as the characteristics required for a frequency selection filter, there can be mentioned a broad pass band, low loss, high amount of attenuation, and other characteristics.
In this way, by cascade-connecting resonator electrode patterns in two stages, interference of standing waves of the first stage and the second stage occurs. This enables a high attenuation of an amount of out-of-band attenuation, and the amount of out-of-band attenuation of the filter characteristic can be improved. Namely, by employing a configuration in which SAW filters having the same characteristics are cascade-connected in two stages, the signal attenuated in the first stage is further attenuated in the second stage, so the amount of out-of-band attenuation can be improved about two-fold.
In the case of the conventional SAW filter shown in
The present invention provides a surface acoustic wave device capable of responding to the above needs and a communication device using the same.
A surface acoustic wave device according to an embodiment of the present invention is provided with a piezoelectric substrate having a first region and having second and third regions arranged adjoining both sides of the first region; a first surface acoustic wave element which is arranged in the second region on the piezoelectric substrate, in which first, second, and third IDT electrodes are sequentially arranged along a direction of propagation of the surface acoustic wave propagated on the piezoelectric substrate and in which the second IDT electrode arranged at the center among the first, second, and third IDT electrodes includes first split bus bar electrodes arranged on the first region side on the piezoelectric substrate and split into two and a non-split bus bar electrode arranged in the second region on the piezoelectric substrate and connected to a reference potential electrode arranged in the second region; a second surface acoustic wave element which is arranged in the third region on the piezoelectric substrate, in which fourth, fifth, and sixth IDT electrodes are sequentially arranged along the direction of propagation of the surface acoustic wave propagated on the piezoelectric substrate and in which the fifth IDT electrode arranged at the center among the fourth, fifth, and sixth IDT electrodes includes second split bus bar electrodes arranged on the first region side so as to adjoin the first split bus bar electrodes and a non-split bus bar electrode arranged at the third region side on the piezoelectric substrate; balanced signal lines arranged in the first region and connecting the first split bus bar electrodes and the second split bus bar electrodes to thereby cascade-connect first and second surface acoustic wave elements; a first unbalanced signal terminal connected to the first and third IDT electrodes of the first surface acoustic wave element and arranged in the second region; and a second unbalanced signal terminal connected to the fourth and sixth IDT electrodes of the second surface acoustic wave element and arranged in the third region.
Further, a communication device according to an embodiment of the present invention is provided with at least one of a reception circuit and a transmission circuit having the above surface acoustic wave device.
According to the SAW device according to an embodiment of the present invention, charges generated at the center IDT electrode can be released to the reference potential electrode. Thus, a SAW device having a large amount of out-of-band attenuation and excellent in electric characteristics can be obtained.
Further, it becomes unnecessary to provide a reference terminal electrode between the first and second SAW elements, therefore there is almost no generation of a capacitive component between the reference potential electrodes as in the conventional device. As a result, a SAW device in which the amount of out-of-band attenuation of the SAW filter becomes large and which is excellent in electric characteristics can be achieved.
Further, by the first SAW element and the second SAW element being connected by the balanced signal lines, even when the non-split bus bar electrode of the center IDT electrode and the bus bar electrodes connected to the reference potential electrodes of the IDT electrodes at the two ends are connected to the reference potential electrode through an inductance component, the potential of the non-split bus bar electrode of the center IDT electrode matches with the reference potential of the balanced signal and is constant. For this reason, impedance matching of the SAW filter can be sufficiently performed without obstructing matching of impedance with respect to the unbalanced signal terminal.
According to the communication device according to an embodiment of the present invention, a communication device having a good sensitivity can be realized.
Below, a SAW device in an embodiment of the present invention is explained in detail with reference to the drawings. Further, in the present embodiment, as the SAW device, a resonator type SAW filter is explained as an example. Note that, in the drawings explained below, parts of the same configuration are assigned the same notations. Further, the sizes of the electrodes, distance between electrodes, numbers and interval of electrode fingers, etc. are diagrammatically shown for explanation.
The SAW device shown in
The second IDT electrode 5 located at the center of the first SAW element 2 has first split bus, bar electrodes 17 and 17 split into two and arranged in the first region side. On the other hand, the fifth IDT electrode 8 located at the center of the second SAW element 3 has second split bus bar electrodes 17′ and 17′ split into two and arranged in the first region side. These split first and second bus bar electrodes 17, 17, 17′, and 17′ are arranged so as to planarly face each other via the balanced signal lines 16. The fifth IDT electrode 5 located at the center of the first SAW element 2 further has a non-split bus bar electrode 18. The non-split bus bar electrode 18 is connected to a reference potential electrode 18S arranged in the second region.
The non-split bus bar electrode 18 of the first SAW element 2 is connected to the reference potential electrode 18S, therefore charges generated in the IDT electrode 5 can be released to the reference potential electrode 18S, so the effect of charges generated at the IDT electrodes 5 and 8 exerted between the first SAW element 2 and the second SAW element 3 can be reduced. As a result, the amount of out-of-band attenuation becomes large.
Further, it becomes unnecessary to provide a reference potential electrode between the first and second SAW elements 2 and 3, therefore a capacitive component generated between the reference potential electrodes can be made smaller. As a result, the amount of out-of-band attenuation of the SAW filter becomes large, so a SAW device excellent in electric characteristics can be obtained.
Further, the space between the first and second SAW elements 2 and 3 can be made smaller, therefore there is also the advantage that the SAW device can be made smaller in size. For example, in the case of the SAW device of
Further, the interval between the first and second SAW elements 2 and 3 is preferably about 10 to 70 μm. Accordingly, electromagnetic interference can be reduced between the first and second SAW elements 2 and 3, and the SAW device can be made smaller in size.
Further, by connecting between first SAW element 2 and the second SAW element 3 by the balanced signal lines 16, even in a case where an inductance of the line is included in the connection path of the non-split bus bar electrode 18 of the IDT electrode 5 and the reference potential electrode, impedance matching of the SAW filter can be sufficiently performed.
In the SAW device shown in
Note that, in the configuration of
In the case of the SAW device shown in
Further, in the SAW device shown in
In this case, the reference potential electrodes 10S, 11S, 12S, 13S, 18S, and 19S are not arranged between the first SAW element 2 and the second SAW element 3, therefore the first SAW element 2 and the second SAW element 3 can be arranged closer, so the SAW device can be made smaller in size.
This can greatly increase the amount of out-of-band attenuation. Further, by having an electrode structure in which several sets of the first and second SAW elements 31 to 36 are connected in parallel, the power applied to the SAW elements 31 to 36 can be dispersed, so the power handling capacity of the SAW filter can be improved.
Further, in the SAW device of
In the case of the SAW device shown in
The three-dimensional lines are formed as follows.
First, on the piezoelectric substrate 1, the first to sixth IDT electrodes 4 to 9 are formed so as to have a thickness of, for example, about 0.1 μm to 0.5 μm. By setting the thickness as above, the SAW elements 2 and 3 can be preferably excited. Simultaneously with the formation of the IDT electrodes, the first to fourth reflector electrodes 10 to 13, signal lead lines 53 and 54, and first and second unbalanced signal terminals 14 and 15 etc. are formed as well.
Next, protective films for covering and protecting the IDT electrodes 4 to 9 etc. are formed. As the material of the protective films, Si, SiO2, SiNx, Al2O3, etc. can be used. As the film formation method, a sputtering method, a CVD (chemical vapor deposition) method, an electron beam vapor deposition method, or the like can be used.
Next, first and second insulators 21 are formed at portions in the first and second signal lead lines 53 and 54, where the first and second reference potential use lead lines 51 and 52 are to cross. As the material of the first and second insulators 21, a photosensitive polyimide resin, non-photosensitive polyimide resin, SiO2, SiNx, Al2O3, etc. can be used. As the method of formation of the first and second insulators 21, a method of forming a resin film by a spin coating method, then performing photolithography to obtain a desired pattern can be employed. Further, as the method of formation where SiO2, SiNx, Al2O3, or the like is used as the material of the first and second insulators 21, a sputtering method, a CVD (chemical vapor deposition) method, or the like can be used.
After forming the first and second insulators 21, the first and second reference potential use lead lines 51 and 52 are formed by patterning a film formed according to the sputtering method or the like. The three-dimensional lines are formed in this way.
Note that, as the piezoelectric substrate 1 for the SAW filter, preferably, a 36°±3° Y-cut X-propagation lithium tantalite single crystal, a 42°±3° Y-cut X-propagation lithium tantalite single crystal, a 64°±3° Y-cut X-propagation lithium niobate single crystal, a 41°±3° Y-cut X-propagation lithium niobate single crystal, or a 45°±3° X-cut Z-propagation lithium tetraborate single crystal is used. This is because, these have large electromechanical coupling coefficients and small frequency temperature coefficients. Further, among these pyroelectric piezoelectric single crystals, use of a pyroelectric piezoelectric single crystal having pyroelectricity remarkably reduced by oxygen defects or solid solution of Fe or the like is good for the reliability of the SAW device. The thickness of the piezoelectric substrate 1 is preferably about 0.1 to 0.5 mm. If it is less than 0.1 mm, the piezoelectric substrate 1 becomes brittle. If it exceeds 0.5 mm, the material costs and part dimension become large, so the result is not suitable for use.
Further, the IDT electrodes and reflector electrodes are composed of Al or an Al alloy (Al—Cu-based or Al—Ti-based) and are formed by a vapor deposition method, a sputtering method, a CVD method, or other thin film formation method. An electrode thickness set to about 0.1 to 0.5 μm is preferred for obtaining the desired characteristics of the SAW filter.
Further, by forming SiO2, SiNx, Si, and Al2O3 as the protective film at each electrode and propagation portion of the SAW on the piezoelectric substrate 1, conduction due to conductive foreign substances can be prevented and the power handling capacity can be improved.
Note that, in the SAW filter shown in
The SAW device of the present, invention can be applied to a mobile phone terminal or other communication device.
A high frequency signal transmitted at the communication device shown in
An embodiment of the SAW device of the present invention is explained below. An embodiment of specifically preparing a SAW device shown in
On the piezoelectric substrate (mother board for providing many units) 1 composed of a 38.7° Y-cut and X-direction propagation LiTaO3 single crystal, fine electrode patterns were formed as the IDT electrodes 4 to 9 and the reflector electrodes 10 to 13 composed of Al (99 vol %)-Cu (1 vol %) alloy.
Further, the electrodes were patterned using a sputtering apparatus, a reduced projection exposure apparatus (stepper), and an RIE (reactive ion etching) apparatus by a photolithography method.
First, the piezoelectric substrate 1 was ultrasonically cleaned by acetone, IPA (isopropyl alcohol), or the like to remove organic ingredients. Next, the piezoelectric substrate 1 was sufficiently dried by a clean oven, then a metal layer for forming the electrodes was formed by film formation. For the formation of the metal layer, a sputtering apparatus was used. Al (99 vol %)-Cu (1 vol %) alloy was used as the material of the metal layer. The thickness of the metal layer at this time was set to about 0.15 μm.
Next, a photo-resist layer was spin-coated on the metal layer to a thickness of about 0.5 μm, patterned to a desired shape by a reduced projection exposure apparatus (stepper), then stripped of the unrequired portions of the photo-resist layer by an alkali developer by a developer apparatus to expose the desired pattern. After that, the metal layer was etched by an RIE apparatus, the patterning was ended, and patterns of electrodes constituting the SAW device were obtained.
After this, a protective film was formed on a predetermined region of the electrode. Namely, a CVD (chemical vapor deposition) apparatus was used to form patterns of electrodes and the SiO2 layer on the piezoelectric substrate 1 to a thickness of about 0.02 μm.
After that, the photolithography method was used for patterning and an RIE apparatus etc. was used for, etching a flip-chip window opening. After that, the flip-chip window opening is formed with a pad electrode composed of a Cr layer, Ni layer, and Au layer using the sputtering apparatus. The thickness of the pad electrode at this time was controlled to about 1.0 μm. After that a printing method and a reflow furnace were used to form solder bumps on the pad electrodes for flip chip mounting of the SAW device on an external circuit board or the like.
Next, the piezoelectric substrate 1 was diced along separation lines to split it into the individual SAW devices (chips). After that, each chip was placed in an external package with the surface of formation of the pad electrodes facing down and bonded by a flip chip mounting apparatus. After that, each package was baked in an N2 gas atmosphere to complete a packaged SAW device. As the package, one with a 2.5×2.0 mm square laminate structure formed by stacking ceramic layers in multiple layers was used.
Further, as the sample of Comparative Example 1, in the configuration of
Next, the characteristics of the SAW devices according to the present embodiment and comparative example were found by computer simulation. The operation frequency of the SAW device was 700 to 6000 MHz.
A graph of the frequency characteristics in the vicinity of the pass band is shown in
Further, as the sample of Comparative Example 2, a SAW device having the configuration of
In this way, according to the present embodiment, the amount of out-of-band attenuation was greatly increased, and a small-sized SAW device was realized.
Number | Date | Country | Kind |
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2007-194327 | Jul 2007 | JP | national |
2007-316788 | Dec 2007 | JP | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/JP2008/061854 | 6/30/2008 | WO | 00 | 5/18/2010 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO2009/013974 | 1/29/2009 | WO | A |
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Entry |
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Number | Date | Country | |
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20100219912 A1 | Sep 2010 | US |