Claims
- 1. A method of manufacturing a surface discharge type plasma display panel comprising steps of:(a) providing a second substrate which specifies a plurality of discharge spaces filled with discharge gas along with a first substrate, said second substrate comprising a plurality of address electrodes extending along a second direction; (b) on said second substrate, at the same time, forming a plurality of barrier ribs of a first type extending in parallel with each other at first intervals along said second direction so that each of said plurality of address electrodes is located between adjacent barrier ribs of the first type out of said plurality of barrier ribs of the first type, and a plurality of barrier ribs of a second type extending in parallel with each other at second intervals along a first direction orthogonal to said second direction so as to intersect with said plurality of barrier ribs of the first type; and (c) adhering phosphors to said second substrate sandwiched between adjacent barrier ribs of the first type out of said plurality of barrier ribs of the first type, a first side surface poriton of one of said adjacent barrier ribs of the first type, and a second side surface portion of the other of said adjacent barrier ribs of the first type facing to said first side surface portion.
- 2. A method of manufacturing a surface discharge type plasma display panel comprising steps of:(a) providing a second substrate which specifies a plurality of discharge spaces filled with discharge gas along with a first substrate, said second substrate comprising a plurality of address electrodes extending along a second direction; (b) on said second substrate, forming a plurality of barrier ribs of a first type extending in parallel with each other at first intervals along said second direction so that each of said plurality of address electrodes is located between adjacent barrier ribs of the first type out of said plurality of barrier ribs of the first type, and a plurality of barrier ribs of a second type extending in parallel with each other at second intervals along a first direction orthogonal to said second direction so as to intersect with said plurality of barrier ribs of the first type; and (c) adhering phosphors to said second substrate sandwiched between adjacent barrier ribs of the first type out of said plurality of barrier ribs of the first type, a first side surface portion of one of said adjacent barrier ribs of the first type, and a second side surface portion of the other of said adjacent barrier ribs of the first type facing to said first side surface portion, whereinsaid step (a) comprises a step of: (a-1) preparing a member utilized when a mask is generated, said mask comprising a reticulated pattern specified by said first and second intervals; and in said step (b), said mask is made from said member, and said plurality of barrier ribs of the first type and said plurality of barrier ribs of the second type are formed at the same time on the basis of said mask.
- 3. The method of manufacturing a surface discharge type plasma display panel according to claim 2, wherein step (b) includes forming a glass layer on said second substrate, forming a photo-sensitive pattern on said glass layer, and removing portions of said glass layer according to said photo-sensitive pattern.
- 4. The method of manufacturing a surface discharge type plasma display panel according to claim 3, wherein said step of removing portions of said glass layer includes using sand-blasting.
- 5. The method of manufacturing a surface discharge type plasma display panel according to claim 3, wherein said step of forming a photo-sensitive pattern includes forming two photo-sensitive mask portions having different thicknesses.
- 6. The method of manufacturing a surface discharge type plasma display panel according to claim 2, wherein step (b) includes forming a first photo-sensitive pattern on said second substrate, forming a second photo-sensitive pattern on said first photo-sensitive pattern, and forming a glass layer on said second photo-sensitive pattern.
- 7. The method according to claim 2, whereinthe step (a-1) further comprises steps of: (a-1-2) preparing a glass paste; and (a-1-3) preparing a predetermined photosensitive film as the member, and the step (b) comprises steps of: (b-1) forming the glass paste of a predetermined thickness on the whole surface of the second substrate; and (b-2) sticking the photosensitive film on the surface of the glass paste to form a dry film resist comprising the reticulated pattern as the mask by lithography method, and continuing to bore a hole in the glass paste by sand blast method from an exposed surface of the glass paste through a reticulated aperture of the dry film resist until the hole reaches the second substrate.
- 8. The method according to claim 7, whereinthe dry film resist comprises a first mask portion of a first mask width extending along the second direction, and a second mask portion of a second mask width extending along the first direction so as to be orthogonal to the first mask portion, the first mask width is not less than the second mask width; and the first and second mask widths are set on the basis of the first and second intervals, respectively.
- 9. The method according to claim 2, whereinthe step (a) further comprises steps of: (a-2) preparing a glass paste: and (a-3) preparing a photosensitive film of a predetermined thickness as the member, and the step (b) comprises steps of: (b-1) sticking the photosensitive film on the whole surface of the second substrate; (b-2) transferring the reticulated pattern to the photosensitive film by arranging a first mask comprising the reticulated pattern specified by the first and second intervals on the surface of the photosensitive film and by irradiating the photosensitive film with a predetermined light through the first mask to thereby expose the photosensitive film, and then developing the photosensitive film; and (b-3) coating the glass paste on the second substrate by using the photosensitive film with reticulated pattern transferred as the mask, drying the glass paste, and then stripping the photosensitive film.
- 10. The method according to claim 2, whereinthe step (a-1) comprises a step of preparing a first mask having mask widths each corresponding to the first and second intervals, and a second mask with a plurality of apertures extending along the first direction and having a width corresponding to the first intervals which are arranged at intervals corresponding to the width of the barrier ribs of the first type, the step (a) further comprises steps of: (a-2) preparing a glass paste; and (a-3) preparing a first photosensitive film of a first thickness and a second photosensitive film of a second thickness as the member, and the step (b) comprises steps of: (b-1) sticking the first photosensitive film on the while surface of the second substrate; (b-2) transferring a pattern of the first mask corresponding to the reticulated pattern to the first photosensitive film by arranging the first mask on the surface of the first photosensitive film and by irradiating the first photosensitive film with a predetermined light through the first mask to thereby expose the first photosensitive film, and then developing the first photosensitive film; (b-3) sticking the second photosensitive film on the surface of the developed first photosensitive film; (b-4) transferring a pattern of the second mask to the second photosensitive film by arranging the second mask on the surface of the second photosensitive film and by irradiating the second photosensitive film with the predetermined light through the second mask to thereby expose the second photosensitive film, and then developing the second photosensitive film; and (b-5) drying the glass paste after coating the glass paste on the second substrate by using the first and second photosensitive films remaining after the step (b-4) as the mask, and then stripping the first and second photosensitive films, wherein the sum of the first thickness and the second thickness corresponds to the height of the barrier ribs of the first type from the second substrate.
- 11. A method of manufacturing a surface discharge type plasma display panel comprising steps of:providing a first substrate and a second substrate which specifies a plurality of discharge spaces filled with discharge gas along with said first substrate; forming on said second substrate a plurality of barrier ribs of a first type extending in parallel with each other at first intervals along said second direction and a plurality of barrier ribs of a second type extending in parallel with each other at second intervals along a first direction orthogonal to said second direction so as to intersect with said plurality of barrier ribs of the first type; adhering phosphors to said second substrate sandwiched between adjacent barrier ribs of the first type; and providing a mask, wherein said mask comprises a reticulated pattern specified by said first and second intervals, and wherein said plurality of barrier ribs of the first type and said plurality of barrier ribs of the second type are formed at the same time on the basis of said mask.
- 12. A method of manufacturing a surface discharge type plasma display panel comprising steps of:(a) providing a second substrate which specifies a plurality of discharge spaces filled with discharge gas along with said first substrate, said second substrate comprising a plurality of address electrodes extending along a second direction; (b) on said second substrate, forming a plurality of barrier ribs of a first type extending in parallel with each other at first intervals along said second direction so that each of said plurality of address electrodes is located between adjacent barrier ribs of the first type out of said plurality of barrier ribs of the first type, and a plurality of barrier ribs of a second type extending in parrallel with each other at second intervals along a first direction orthogonal to said second direction so as to intersect with said plurality of barrier ribs of the first type; and (c) adhering phosphors to said second substrate sandwiched between adjacent barrier ribs of the first type out of said plurality of barrier ribs of the first type, a first side surface portion of one of said adjacent barrier ribs of the first type, and a second side surface portion of the other of said adjacent barrier ribs of the first type facing to said first side surface portion.
Priority Claims (1)
Number |
Date |
Country |
Kind |
10-014380 |
Jan 1998 |
JP |
|
Parent Case Info
This application is a division of Ser. No. 09/116,950, filed on Jul. 17, 1998, now U.S. Pat. No. 6,249,264.
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