Patent Application
20230416560
The present disclosure relates to a surface treatment agent, and a method of producing a substrate having a surface-treated layer.
The fluorine-containing compound exhibits high lubricity, water and oil repellency, and the like. In a case in which a fluorine-containing compound is applied to a surface of a substrate to form a surface-treated layer, water and oil repellency, and the like are imparted to the surface of the substrate. Accordingly, fouling on the surface of the substrate may be easily wiped off, and fouling removability is improved. Among fluorine-containing compounds, a fluorine-containing ether compound having a poly(oxyperfluoroalkylene) chain in which an ether bond (—O—) is present within a perfluoroalkylene chain is excellent in removability against fouling such as oil or fat fouling.
Examples of a fluorine-containing ether compound that may be used as a component for imparting surface water and oil repellency or the like include a compound having a perfluoropolyether group and a curable site described in International Publication (WO) 2018/181936.
Examples of a method of applying a fluorine-containing compound to a surface of a substrate include vacuum deposition methods such as the physical vapor deposition (PVD) method and the chemical vapor deposition (CVD) method. The other methods include wet coating methods in which a surface treatment agent containing a fluorine-containing compound is applied to a surface of a substrate by dipping, spraying or the like, and is dried.
However, the flatness of a surface-treated layer may decline depending on the type of fluorine-containing compound and the method of applying a fluorine-containing compound to a surface of a substrate. When the flatness of a surface-treated layer declines, it may cause deterioration of appearance, decrease in light transmittance, and the like.
The present disclosure has been made in consideration of the above-described circumstances. An object of the present disclosure is to provide a surface treatment agent capable of forming a surface-treated layer having excellent flatness, and a method of producing a substrate having a surface-treated layer using the surface treatment agent.
Specific embodiments for achieving the above object are as follows.
<1> A surface treatment agent, including:
a fluorine-containing compound (A) having a reactive silyl group; and
at least one compound (B) selected from the group consisting of a fluorine-containing ketone compound (B1) represented by the following Formula (B1), a fluorine-containing cyclic ketone compound (B2) represented by the following Formula (B2), and a fluorine-containing polyether compound (B3) represented by the following Formula (B3):
R1COR2 (B1)
R4—[OR5]q—R6 (B3)
in which in Formula (B1), each of R1 and R2 independently represents a linear, branched, or cyclic fluorine-containing alkyl group having from 1 to 5 carbon atoms,
in Formula (B2), R3 represents a residue that forms a 3- to 5-membered ring structure with a carbon atom of a carbonyl group and that has a fluorine atom, and R3 may be substituted with a fluorine-containing alkyl group having from 1 to 2 carbon atoms,
in Formula (B3), each of R4 and R6 independently represents a fluorine-containing alkyl group having from 1 to 3 carbon atoms, q represents an integer of 1 or more, R5 represents a perfluoroalkylene group having from 1 to 6 carbon atoms, and in a case in which q is an integer of 2 or more, plural R5s may be the same or different.
<2> The surface treatment agent according to <1>, in which a total content of the compound (B) is from 50% to 99.999% by mass.
<3> The surface treatment agent according to <1> or <2>, in which at least one fluorine-containing alkyl group represented by R1 or R2 in Formula (B1) is a branched fluorine-containing alkyl group.
<4> The surface treatment agent according to <3>, in which both fluorine-containing alkyl groups represented by R1 and R2 in Formula (B1) are branched fluorine-containing alkyl groups.
<5> The surface treatment agent according to <3> or <4>, in which the branched fluorine-containing alkyl group has a branched structure at α-carbon.
<6> The surface treatment agent according to any one of <1> to <5>, in which a boiling point of the fluorine-containing polyether compound (B3) is from 50 to 220° C.
<7> The surface treatment agent according to any one of <1> to <6>, in which a number average molecular weight of the fluorine-containing polyether compound (B3) is from 300 to 1,000.
<8> The surface treatment agent according to any one of <1> to <7>, in which the fluorine-containing polyether compound (B3) includes a perfluoropolyether compound.
<9> The surface treatment agent according to any one of <1> to <8>, in which the fluorine-containing ketone compound (B1) includes a perfluoroketone compound.
<10> The surface treatment agent according to any one of <1> to <9>, in which the fluorine-containing cyclic ketone compound (B2) includes a perfluorocyclic ketone compound.
<11> A method of producing a substrate having a surface-treated layer, including: coating a surface of a substrate with the surface treatment agent according to any one of <1> to <10>; and drying the surface treatment agent.
<12> The method of producing a substrate having a surface-treated layer according to <11>, in which a surface material of the substrate is a metal, a resin, a glass, a ceramic, or a composite material thereof.
According to the present disclosure, it is possible to provide a surface treatment agent capable of forming a surface-treated layer having excellent flatness, and a method of producing a substrate having a surface-treated layer using the surface treatment agent.
A detailed description will be given below of embodiments for implementing the present disclosure. However, the present disclosure is not limited to the following embodiments. In the following embodiments, the constituent elements (including element steps and the like) are not essential unless otherwise specified. The same applies to numerical values and their ranges, which do not limit the present disclosure.
In the present disclosure, the numerical range indicated using “to” includes the numerical values before and after “to” as the minimum and maximum values, respectively.
In the present disclosure, atmospheric pressure refers to 101.3 kPa.
In the present disclosure, an unit represented by Formula (1) is referred to as “unit (1).” Units represented by other formulas are similarly described. A group represented by Formula (2) is referred to as “Group (2).” Groups represented by other formulas are similarly described. A compound represented by Formula (3) is referred to as “Compound (3).” Compounds represented by other formulas are similarly described.
In the present disclosure, in a case in which an “alkylene group may have a group A,” the alkylene group may have a group A between carbon-carbon atoms therein, or may have a group A at the end thereof as represented by “alkylene group—group A—.”
The terms used in the present disclosure have the following meanings.
The term “divalent organopolysiloxane residue” refers to a group represented by the following formula. In the following formula, each of Rx is independently an alkyl group (preferably having from 1 to 10 carbon atoms) or a phenyl group. In addition, g1 is an integer of 1 or more, preferably an integer from 1 to 9, more preferably an integer from 1 to 4.
The term “silphenylene structure group” refers to a group represented by —Si(Ry)2PhSi(Ry)2—, in which Ph is a phenylene group, each of Ry is independently a monovalent organic group. Ry is preferably an alkyl group (preferably having from 1 to 10 carbon atoms).
The term “dialkylsilylene group” refers to a group represented by —Si(Rz)2—, in which each of Rz is independently an alkyl group (preferably having from 1 to 10 carbon atoms).
The “number average molecular weight” (Mn) of a compound is calculated by 1H-NMR and 19F-NMR to determine the number (average value) of oxyfluoroalkylene groups based on the terminal group.
In the present disclosure, a number of carbon atoms means a total number of carbon atoms contained in a group as a whole. In a case in which the group does not have a substituent, it denotes a number of carbon atoms forming the structure of the group. In a case in which the group has a substituent, it denotes a total number of carbon atoms forming the structure of the group plus a number of carbon atoms in the substituent.
[Surface Treatment Agent]
The surface treatment agent in the present disclosure contains a fluorine-containing compound (A) having a reactive silyl group and at least one compound (B) selected from the group consisting of a fluorine-containing ketone compound (B1) represented by Formula (B1), a fluorine-containing cyclic ketone compound (B2) represented by Formula (B2), and a fluorine-containing polyether compound (B3) represented by Formula (B3).
Hereinafter, the fluorine-containing compound (A) having a reactive silyl group is also referred to as “compound (A).”
The surface treatment agent in the present disclosure is suitably used as an antifoulant for exerting water and oil repellency.
According to the present disclosure, a surface treatment agent capable of forming a surface-treated layer having excellent flatness is obtained. Although the reason why the surface treatment agent in the present disclosure can form a surface-treated layer having excellent flatness is unclear, it is presumed as follows.
The surface treatment agent contains a compound (A) and a compound (B) as a solvent for dissolving the compound (A).
To synthesize a compound (A), a metal element compound containing a representative element such as Sn, a transition metal such as Pt and the like may be used. Such metal elements may be contained as impurities in the compound (A). In addition, unreacted raw materials, by-products, and the like used in the synthesis of the compound (A) may remain as impurities in the compound (A). These impurities may be one of the causes of declined flatness of the surface-treated layer.
It is speculated that the use of the compound (B) as a solvent improves the solubility of various impurities that may be contained in the surface treatment agent, and thus the generation of aggregates derived from impurities is likely to be suppressed. As a result, it is presumed that the generation of unevenness due to the aggregates of impurities in the surface-treated layer is suppressed, and thus a surface-treated layer having excellent flatness can be formed.
The surface treatment agent in the present disclosure contains the compound (A) and the compound (B), and may contain other components, if necessary.
Each component of the surface treatment agent in the present disclosure will be described in detail below.
<Compound (A)>
The compound (A) is a fluorine-containing compound having a reactive silyl group, which is preferably a fluorine-containing ether compound having a reactive silyl group and a poly(oxyfluoroalkylene) chain, from the viewpoint that the surface-treated layer has more excellent water and oil repellency.
The poly(oxyfluoroalkylene) chain contains plural units represented by Formula (1).
(OX) (1)
X is a fluoroalkylene group having one or more fluorine atoms.
A number of carbon atoms of the fluoroalkylene group is preferably from 2 to 6, more preferably from 2 to 4, from the viewpoint that the surface-treated layer has more excellent weather resistance and corrosion resistance.
The fluoroalkylene group may be linear or branched. From the viewpoint that the surface-treated layer has excellent abrasion resistance, a linear fluoroalkylene group is preferable. From the viewpoint that the surface-treated layer has an excellent low abrasion property, a branched fluoroalkylene group is preferable. A linear fluoroalkylene group, a branched fluoroalkylene group, and any combination thereof may be selected depending on the desired properties, if appropriate.
A number of fluorine atoms of the fluoroalkylene group is preferably from 1 to 2 times, more preferably from 1.7 to 2 times, the number of carbon atoms from the viewpoint that the surface-treated layer has more excellent corrosion resistance.
The fluoroalkylene group may be a group in which all hydrogen atoms in a fluoroalkylene group are substituted with fluorine atoms (perfluoroalkylene group).
Specific examples of unit (1) include —OCHF—, —OCF2CHF—, —OCHFCF2—, —OCF2CH2—, —OCH2CF2—, —OCF2CF2CHF—, —OCHFCF2CF2—, —OCF2CF2CH2—, —OCH2CF2CF2—, —OCF2CF2CF2CH2—, —OCH2CF2CF2CF2—, —OCF2CF2CF2CF2CH2—, —OCH2CF2CF2CF2CF2—, —OCF2CF2CF2CF2CF2CH2—, —OCH2CF2CF2CF2CF2CF2—, —OCF2—, —OCF2CF2—, —OCF2CF2CF2—, —OCF(CF3)CF2—, —OCF2CF2CF2CF2—, —OCF(CF3)CF2CF2—, —OCF2CF2CF2CF2CF2—, —OCF2CF2CF2CF2CF2CF2—.
A number of repetitions “m” of unit (1) contained in the poly(oxyfluoroalkylene) chain is 2 or more, preferably an integer from 2 to 200, more preferably an integer from 5 to 150, still more preferably an integer from 5 to 100, and particularly preferably an integer from to 50. The number of repetitions “m” of the unit (1) may be 10 or more.
The poly(oxyfluoroalkylene) chain may include two or more kinds of units (1). Examples of two or more kinds of units (1) include two or more kinds of units (1) with different numbers of carbon atoms, two or more kinds of units (1) with a difference in the presence or absence of a side chain or type of a side chain, two or more kinds of units (1) with different numbers of fluorine atoms, two or more kinds of units (1) with a difference in conformation (linear/branched), and any combination thereof.
The binding order of two or more kinds of (OX) is not limited and may be arranged randomly, alternately, or in blocks.
It is preferable that the poly(oxyfluoroalkylene) chain is a poly(oxyfluoroalkylene) chain mainly containing units (1) that are oxyperfluoroalkylene groups from the viewpoint of forming a film having excellent water and oil repellency. In a poly(oxyfluoroalkylene) chain represented by (OX)m, a proportion of the number of units (1) that are oxyperfluoroalkylene groups with respect to a total number m of units (1) is preferably from 50 to 100%, more preferably from 80 to 100%, and still more preferably from 90 to 100%.
As the poly(oxyfluoroalkylene) chain, a poly(oxyperfluoroalkylene) chain and a poly(oxyperfluoroalkylene) chain having one or two oxyfluoroalkylene units having a hydrogen atom at one of or each of the ends are more preferable.
As (OX)m that represents a poly(oxyfluoroalkylene) chain, (OCHmaF(2-ma))m11(OC2HmbF(4-mb))m12(OC3HmcF(6-mc))m13(OC4HmdF(8-md))m14(OC5HmeF(10-me))m15(OC6HmfF(12-mf))m16 is preferable.
ma is 0 or 1, mb is an integer from 0 to 3, mc is an integer from 0 to 5, and is an integer from 0 to 7, me is an integer from 0 to 9, and mf is an integer from 0 to 11.
Each of m11, m12, m13, m14, m15, and m16 are independently an integer of 0 or more, preferably 100 or less.
m11+m12+m13+m14+m15+m16 is an integer of 2 or more, preferably an integer from 2 to 200, more preferably an integer from 5 to 150, still more preferably an integer from 5 to 100, and particularly preferably an integer from 5 to 50. m11+m12+m13+m14+m15+m16 may be 10 or more.
Among them, m12 is preferably an integer of 2 or more, more preferably an integer from 2 to 200.
In addition, C3HmcF(6-mc), C4HmdF(8-md), C5HmeF(10-me), and C6HmfF(12-mf) may be a linear or branched group or any combination of a linear group and a branched group. From the viewpoint that the surface-treated layer has more excellent abrasion resistance, a linear group is preferable. From the viewpoint that the surface-treated layer has a more excellent low abrasion property, a branched group is preferable.
The above formula represents the type and number of units, not the arrangement of the units. In other words, m11 to m16 each represent the number of units. For example, (OCHmaF(2-ma))m11 does not represent a block of (OCHmaF(2-ma)) with m11 consecutive units. Similarly, the order in which (OCHmaF(2-ma)) to (OC6HmfF(12-mf)) are described does not mean that they are arranged in that order.
In the above formula, in a case in which two or more of m11 to m16 are not 0 (i.e., a case in which (OX)m is composed of two or more kinds of units), the arrangement of different units may be any of random arrangement, alternating arrangement, block arrangement, and any combination of these arrangements.
Each of the above-described units may also be different in a case in which two or more units thereof are contained. For example, in a case in which m11 is 2 or more, plural (OCHmaF(2-ma)) may be the same or different.
As the reactive silyl group, a group represented by Formula (2) is preferable.
—Si(R)nL3-n (2)
A number of Group (2) contained in the compound (A) is 1 or more, and from the viewpoint that the surface-treated layer has more excellent abrasion resistance, it is preferably 2 or more, more preferably from 2 to 10, still more preferably from 2 to 5, and particularly preferably 2 or 3.
In a case in which plural Groups (2) are present in one molecule, plural Groups (2) may be the same or different. It is preferable that the Groups (2) are the same from the viewpoint of the availability of raw materials and the ease of producing a compound (A).
R is a monovalent hydrocarbon group, preferably a monovalent saturated hydrocarbon group. A number of carbon atoms of R is preferably from 1 to 6, more preferably from 1 to 3, and still more preferably from 1 to 2.
L is a hydrolyzable group or a hydroxyl group.
A hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction. In other words, a hydrolyzable silyl group represented by Si-L becomes a silanol group represented by Si—OH through a hydrolysis reaction. The silanol group further reacts between silanol groups to form an Si—O—Si bond. Furthermore, the silanol group undergoes a dehydration condensation reaction with a hydroxyl group present on a surface of a substrate such that a substrate-O—Si bond may be formed.
Specific examples of a hydrolyzable group include an alkoxy group, an aryloxy group, a halogen atom, an acyl group, an acyloxy group, and an isocyanate group (—NCO). The alkoxy group is preferably an alkoxy group having from 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having from 3 to 10 carbon atoms. Note that a heteroaryl group is included as the aryl group of the aryloxy group. The halogen atom is preferably chlorine atom. The acyl group is preferably an acyl group having from 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having from 1 to 6 carbon atoms.
L is preferably an alkoxy group having from 1 to 4 carbon atoms or a halogen atom from the viewpoint of the ease of producing compound (A). L is preferably an alkoxy group having from 1 to 4 carbon atoms from the viewpoint that the compound (A) has more excellent storage stability and less outgassing during coating, more preferably an ethoxy group in a case in which long-term storage stability of compound (A) is required, and more preferably a methoxy group in a case in which a short reaction time after coating is required.
n is an integer from 0 to 2.
n is preferably 0 or 1, more preferably 0. The presence of plural Ls further improves adhesiveness of a substrate to a surface-treated layer.
In a case in which n is 1 or less, plural Ls present in one molecule may be the same or different. It is preferable that plural Ls are the same from the viewpoint of the availability of raw materials and the ease of producting compound (A). In a case in which n is 2, plural Rs present in one molecule may be the same or different. It is preferable that plural Rs are the same from the viewpoint of the availability of raw materials and the ease of producting compound (A).
The compound (A) is preferably a compound represented by Formula (3) from the viewpoint that the surface-treated layer has more excellent water and oil repellency and abrasion resistance.
[A-(OX)m—O—]iZ[—Si(R)nL3-n]g (3)
A is a perfluoroalkyl group or -Q[—Si(R)nL3-n]k.
A number of carbon atoms in a perfluoroalkyl group is preferably from 1 to 20, more preferably from 1 to 10, still more preferably from 1 to 6, and particularly preferably from 1 to 3 from the viewpoint that the surface-treated layer becomes more excellent abrasion resistance.
The perfluoroalkyl group may be linear or branched.
Note that in a case in which A is -Q[—Si(R)nL3-n]k, j is 1.
Example of the perfluoroalkyl group includes CF3—, CF3CF2—, CF3CF2CF2—, CF3CF2CF2CF2—, CF3CF2CF2CF2CF2—, CF3CF2CF2CF2CF2CF2—, CF3CF(CF3)—, or the like.
The perfluoroalkyl group is preferably CF3—, CF3CF2—, or CF3CF2CF2—, from the viewpoint that the surface-treated layer has more excellent water and oil repellency
Q is a (k+1)-valent linking group. As described later, k is an integer from 1 to 10. Thus, Q may be a 2- to 11-valent linking group.
Q is not limited as long as it does not impair the abrasion resistance of the surface-treated layer, for example, includes an alkylene group that may have an etheric oxygen atom or a divalent organopolysiloxane residue, a carbon atom, a nitrogen atom, a silicon atom, a 2 to 8-valent organopolysiloxane residue, Groups (g2-1) to (g2-9), and Groups (g3-1) to (g3-9).
The definitions of R, L, n, X and m are given above.
Z is a (j+g)-valent linking group.
Z is not limited as long as it does not impair the abrasion resistance of the surface-treated layer, for example, includes an alkylene group that may have an etheric oxygen atom or a divalent organopolysiloxane residue, a carbon atom, a nitrogen atom, a silicon atom, a 2 to 8-valent organopolysiloxane residue, Groups (g2-1) to (g2-9), and Groups (g3-1) to (g3-9).
j is an integer 1 or more, preferably an integer from 1 to 5 from the viewpoint that the surface-treated layer has more excellent water and oil repellency, and more preferably 1 from the viewpoint of the ease of producting Compound (3).
g is an integer 1 or more, preferably an integer from 2 to 4, more preferably 2 or 3, and still more preferably 3, from the viewpoint that the surface-treated layer becomes more excellent abrasion resistance.
Compound (3) is preferably Compound (3-11), Compound (3-21) and Compound (3-31), from the viewpoint that the surface-treated layer has more excellent initial water contact angle and excellent abrasion resistance. Among them, Compound (3-11) and Compound (3-21) are particularly excellent in initial water contact angle, and Compound (3-31) is particularly excellent in abrasion resistance.
Rf1—(OX)m—O—Y11[—Si(R)nL3-n]g1 (3-11)
[Rf2—(OX)m—O—]j2Y21[—Si(R)nL3-n]g2 (3-21)
[L3-n(R)nSi—]k3Y32—(OX)m—O—Y31 [—Si(R)nL3-n]g3 (3-31)
In Formula (3-11), X, m, R, n and L have the same definitions as X, m, R, n and L in Formula (3).
Rf1 is perfluoroalkyl group, and preferred embodiments and specific examples of perfluoroalkyl groups are as described above.
Y11 is a (g1+1)-valent linking group, and specific example thereof is the same as Z in Formula (3).
g1 is an integer 2 or more, preferably an integer from 2 to 15, more preferably an integer from 2 to 4, still more preferably 2 or 3, and particularly preferably 3, from the viewpoint that the surface-treated layer becomes more excellent abrasion resistance.
In Formula (3-21), X, m, R, n and L have the same definitions as X, m, R, n and L in Formula (3).
Rf2 is perfluoroalkyl group, and preferred embodiments and specific examples of perfluoroalkyl groups are as described above.
j2 is an integer 2 or more, preferably an integer from 2 to 6, and more preferably an integer from 2 to 4.
Y21 is a (j2+g2)-valent linking group, and specific example thereof is the same as Z in Formula (3).
g2 is an integer 2 or more, preferably an integer from 2 to 15, more preferably an integer from 2 to 6, still more preferably from 2 to 4, and particularly preferably 4, from the viewpoint that the surface-treated layer becomes more excellent abrasion resistance.
In Formula (3-31), X, m, R, n and L have the same definitions as X, m, R, n and L in Formula (3).
k3 is an integer 1 or more, preferably an integer from 1 to 4, more preferably 2 or 3, and still more preferably 3.
Y32 is a (k3+1)-valent linking group, and specific example thereof is the same as Q in Formula (3).
Y31 is a (g3+1)-valent linking group, and specific example thereof is the same as Z in Formula (3).
g3 is an integer 1 or more, preferably an integer from 1 to 4, more preferably 2 or 3, and still more preferably 3.
Y11 in Formula (3-11) may be Group (g2-1) (note that d1+d3=1, i.e. d1 or d3 is 0, g1=d2+d4, and d2+d4≥2), Group (g2-2) (note that e1=1, g1=e2, and e2≥2), Group (g2-3) (note that g1=2), Group (g2-4) (note that h1=1, g1=h2, and h2≥2), Group (g2-5) (note that i1=1, g1=i2, and i2≥2), Group (g2-7) (note that g1=i3+1), Group (g2-8) (note that g1=i4, and i4≥2), or Group (g2-9) (note that g1=i5, and i5≥2).
Y21 in Formula (3-21) may be Group (g2-1)(note that j2=d1+d3, d1+d3≥2, g2=d2+d4, and d2+d4≥2), Group (g2-2) (note that j2=e1, e1=2, g2=e2, and e2=2), Group (g2-4) (note that j2=h1, h1≥2, g2=h2, and h2≥2), or Group (g2-5) (note that j2=i1, i1=2, g2=i2, and i2=2).
Each of Y31 and Y32 in Formula (3-31) may be independently Group (g2-1) (note that g3=d2+d4, and k3=d2+d4), Group (g2-2) (note that g3=e2, and k3=e2), Group (g2-3) (note that g3=2, and k3=2), Group (g2-4) (note that g3=h2, and k3=h2), Group (g2-5) (note that g3=i2, and k3=i2), Group (g2-6) (note that g3=1, and k3=1), Group (g2-7) (note that g3=i3+1, and k3=i3+1), Group (g2-8) (note that g3=i4, and k3=i4), or Group (g2-9) (note that g3=i5, and k3=i5).
(-A1-)e1C(Re2)4-e1-e2(-Q22-)e2 (g2-2)
-A1-N(-Q23-)2 (g2-3)
(-A1-)h1Z1(-Q24-)h2 (g2-4)
(-A1-)i1Si(Re3)4-i1-i2(-Q25-)i2 (g2-5)
-A1-Q26- (g2-6)
-A1-CH(-Q22-)—Si(Re3)3-i3(-Q25-)i3 (g2-7)
-A1-[CH2C(Re4)(-Q27-)]i4-Re5 (g2-8)
-A1-Za(-Q28-)i5 (g2-9)
Note that in Formulae (g2-1) to (g2-9), the A1 side connects to (OX)m, and Q22, Q23, Q24, Q25, Q26, Q27 and Q28 sides connect to [—Si(R)nL3-n].
A1 is: a single bond; an alkylene group; or a group in which —C(O)NR6—, —C(O)—, —OC(O)O—, —NHC(O)O—, —NHC(O)NR6—, —O—, or —SO2NR6— is present between carbon-carbon atoms of an alkylene group having two or more carbon atoms. In each formula, in a case in which two or more A1s are present, two or more A1s may be the same or different. The hydrogen atom of the alkylene group may be substituted with a fluorine atom.
Q22 is: an alkylene group; a group in which —C(O)NR6—, —C(O)—, —NR6—, or —O— is present between carbon-carbon atoms of an alkylene group having two or more carbon atoms; a group in which —C(O)NR6—, —C(O)—, —NR6—, or —O— is present at one end, being not connected to Si, of an alkylene group; or a group in which —C(O)NR6—, —C(O)—, —NR6—, or —O— is present between carbon-carbon atoms of an alkylene group having two or more carbon atoms and —C(O)NR6—, —C(O)—, —NR6—, or —O— is present at an end, being not connected to Si, of the alkylene group. In each formula, in a case in which two or more Q22s are present, two or more Q22s may be the same or different.
Q23 is: an alkylene group; or a group in which —C(O)NR6—, —C(O)—, —NR6—, or —O— is present between carbon-carbon atoms of an alkylene group having two or more carbon atoms. Two Q23s may be the same or different.
In a case in which the atom in Z1, to which Q24 binds, is a carbon atom, Q24 is Q22. In a case in which the atom in Z1, to which Q24 binds, is a nitrogen atom, Q24 is Q23. In each formula, in a case in which two or more Q24s are present, two or more Q24s may be the same or different.
Q25 is: an alkylene group; or a group in which —C(O)NR6—, —C(O)—, —NR6—, or —O— is present between carbon-carbon atoms of alkylene group having two or more carbon atoms. In each formula, in a case in which two or more Q25s are present, two or more Q25s may be the same or different.
Q26 is: an alkylene group; or a group in which —C(O)NR6—, —C(O)—, —NR6—, or —O— is present between carbon-carbon atoms of alkylene group having two or more carbon atoms.
R6 is a hydrogen atom, an alkyl group having from 1 to 6 carbon atoms, or a phenyl group.
Q27 is a single bond or an alkylene group.
Q28 is an alkylene group or a group in which an etheric oxygen atom or a divalent organopolysiloxane residue is present between carbon-carbon atoms of alkylene group having two or more carbon atoms.
Q11 is: a single bond; an alkylene group; or a group in which —C(O)NR6—, —C(O)—, —OC(O)O—, —NHC(O)O—, —NHC(O)NR6—, —O—, or —SO2NR6— is present between carbon-carbon atoms of alkylene group having two or more carbon atoms.
Z1 is a group that has a carbon or nitrogen atom to which A1 directly binds and that has a (h1+h2)-valent ring structure having a carbon or nitrogen atom to which Q24 directly binds.
Re1 is a hydrogen atom, or an alkyl group. In each formula, in a case in which two or more Re1s are present, two or more Re1s may be the same or different.
Re2 is a hydrogen atom, a hydroxy group, an alkyl group, or acyloxy group.
Re3 a is an alkyl group.
Re4 is a hydrogen atom, or an alkyl group, and preferably a hydrogen atom from the viewpoint of the ease of producing a compound. In each formula, in a case in which two or more Re4s are present, two or more Re4s may be the same or different.
Re5 is a hydrogen atom, or a halogen atom, and preferably a hydrogen atom from the viewpoint of the ease of producing a compound.
d1 is an integer from 0 to 3, and preferably 1 or 2. d2 is an integer from 0 to 3, and preferably 1 or 2. d1+d2 is an integer from 1 to 3.
d3 is an integer from 0 to 3, and preferably 0 or 1. d4 is an integer from 0 to 3, and preferably 2 or 3. d3+d4 is an integer from 1 to 3.
d1+d3 in Y21 is an integer from 1 to 5, and preferably 1 or 2. d1+d3 in Y31 or Y32 is 1.
d2+d4 in Y11 or Y21 is an integer from 2 to 5, and preferably 4 or 5. d2+d4 in Y31 or Y32 is an integer from 3 to 5, and preferably 4 or 5.
e1+e2 is 3 or 4. e1 in is 1. e1 in Y21 is an integer from 2 to 3, e1 in Y31 or Y32 is 1. e2 in or Y21 is an integer from 2 to 3, e2 in Y31 or Y32 is 2 or 3.
h1 in Y11 is 1. h1 in Y21 is an integer of 2 or more, and preferably 2. h1 in Y31 or Y32 is 1. h2 in or Y21 is an integer of 2 or more, and preferably 2 or 3. h2 in Y31 or Y32 is an integer of 1 or more, and preferably 2 or 3.
i1+i2 in Y11 is 3 or 4. i1+i2 in Y21 is 4. i1+i2 in Y31 or Y32 is 3 or 4. i1 in Y11 is 1. it in Y21 is 2. it in Y31 or Y32 is 1. i2 in Y11 is 2 or 3. i2 in Y21 is 2. i2 in Y31 or Y32 is 2 or 3.
i3 is 2 or 3.
i4 in Y11 is 2 or more, preferably 2 or 10, and more preferably 2 to 6. i4 in Y31 or Y32 is 1 or more, preferably 1 or 10, and more preferably 1 to 6.
i5 is 2 or more, preferably an integer from 2 to 7
A number of carbon atoms of alkylene groups of Q22, Q23, Q24, Q25, Q26, Q27, and Q28 are preferably from 1 to 10, more preferably from 1 to 6, and still more preferably from 1 to 4 from the viewpoint of the ease of producing Compound (3-11), Compound (3-21), and Compound (3-31) and the viewpoint of further excellent abrasion resistance, light resistance, and chemical resistance of the surface-treated layer. Note that a lower limit of the number of carbon atoms of an alkylene group having a specific bond between carbon-carbon atoms is 2.
Examples of the ring structure for Z1 include the ring structures described above, and preferred embodiments are also the same. Since A1 and Q24 directly bind to the ring structure for Z1, in a case in which, for example, an alkylene group is linked to the ring structure, A1 and Q24 do not bind to the alkylene group.
Za is an (i5+1)-valent organopolysiloxane residue, and preferably the following groups. Ra in the following formulas is an alkyl group (preferably having from 1 to 10 carbon atoms) or a phenyl group.
A number of carbon atoms of the alkyl group represented by Re1, Re2, Re3 or Re4 is preferably from 1 to 10, more preferably from 1 to 6, still more preferably from 1 to 3, and particularly preferably an integer from 1 to 2, from the viewpoint of the ease of producing Compound (3-11), Compound (3-21) and Compound (3-31).
A number of carbon atoms of an alkyl group portion in the acyloxy group represented by Re2 is preferably from 1 to 10, more preferably from 1 to 6, still more preferably from 1 to 3, and particularly preferably an integer from 1 to 2, from the viewpoint of the ease of producing Compound (3-11), Compound (3-21) and Compound (3-31).
h1 is preferably from 1 to 6, more preferably from 1 to 4, still more preferably 1 or 2, and particularly preferably 1, from the viewpoint of the ease of producing Compound (3-11), Compound (3-21) and Compound (3-31) and the viewpoint of excellent abrasion resistance and excellent water and oil repellency of the surface-treated layer.
h2 is preferably from 2 to 6, more preferably from 2 to 4, and still more preferably 2 or 3, from the viewpoint of the ease of producing Compound (3-11), Compound (3-21) and Compound (3-31) and the viewpoint of excellent abrasion resistance and excellent water and oil repellency of the surface-treated layer.
Examples of other embodiments of include Group (g3-1) (note that d1+d3=1 (i.e. d1 or d3 is 0), and g1=d2×r1+d4×r1), Group (g3-2) (note that e1=1, and g1=e2×r1), Group (g3-3) (note that g1=2×r1), Group (g3-4) (note that h1=1, and g1=h2×r1), Group (g3-5) (note that i1=1, and g1=i2×r1), Group (g3-6) (note that g1=r1), Group (g3-7) (note that g1=r1×(i3+1)), Group (g3-8) (note that g1=r1×i4), group (g3-9) (note that g1=r1×i5).
Examples of other embodiments of Y21 include Group (g3-1) (note that j2=d1+d3, d1+d32, and g2=d2×r1+d4×r1), Group (g3-2) (note that j2=e1, e1=2, g2=e2×r1, and e2=2), Group (g3-4) (note that j2=h1, h12, g2=h2×r1), Group (g3-5) (note that j2=i1, it is 2 or 3, g2=i2×r1, and i1+i2 is 3 or 4).
Examples of other embodiments of Y31 and Y32 include Group (g3-1) (note that g3=d2×r1+d4×r1, and k3=d2×r1+d4×r1), Group (g3-2) (note that g3=e2×r1, and k3=e2×r1), Group (g3-3) (note that g3=2×r1, and k3=2×r1), Group (g3-4) (note that g3=h2×r1, and k3=h2×r1), Group (g3-5) (note that g3=i2×r1, and k3=i2×r1), Group (g3-6) (note that g3=r1, and k3=r1), Group (g3-7) (note that g3=r1×(i3+1), and k3=r1×(i3+1)), Group (g3-8) (note that g3=r1×i4, and k3=r1×i4), Group (g3-9) (note that g3=r1×i5, and k3=r1×i5).
(-A1-)e1C(Re2)4-e1-e2(-Q22-G1)e2 (g3-2)
-A1-N(-Q23-G1)2 (g3-3)
(-A1-)h1Z1(Q24-G1)h2 (g3-4)
(-A1-)i1Si(Re3)4-i1-i2(-Q25-G1)i2 (g3-5)
A1-Q26-G1 (g3-6)
-A1-CH(-Q22-G1)-Si(Re3)3-i3(-Q25-G1)i3 (g3-7)
-A1-[CH2C(Re4)(-Q27-G1)]i4-Re5 (g3-8)
A1-Za(-Q28-G1)i5 (g3-9)
Note that in Formulae (g3-1) to (g3-9), the A1 side connects to (OX)m, and G1 side connect to [—Si(R)nL3-n].
G1 is a Group (g3). In a case in which in a case in which two or more G1s are present in each formula, two or more G1s may be the same or different. Reference symbols other than G1 are the same as those in Formulas (g2-1) to (g2-9).
—Si(R8)3-r1(-Q3-)r1 (g3)
In Formula (g3), the Si side is connected to Q22, Q23, Q24, Q25, Q26, Q27, and Q28, and the Q3 side is connected to [—Si(R)nL3-n]. R8 is an alkyl group. Q3 is: —O—; an alkylene group; a group in which —C(O)NR6—, —C(O)—, —NR6—, or —O— is present between carbon-carbon atoms of an alkylene group having two or more carbon atoms; or —(OSi(R9)2)p—O—. Two or more Q3s may be the same or different. r1 is 2 or 3. R6 is a hydrogen atom, an alkyl group having from 1 to 6 carbon atoms, or a phenyl group. R9 is an alkyl group, a phenyl group, or an alkoxy group. Two or more R9s may be the same or different. p is an integer from 0 to 5. In a case in which p is 2 or more, two or more of (OSi(R9)2) may be the same or different.
A number of carbon atoms of the alkylene group represented by Q3 is preferably from 1 to 10, more preferably from 1 to 6, and still more preferably from 1 to 4, from the viewpoint of the ease of producing Compound (3-11), Compound (3-21) and Compound (3-31) and the viewpoint of further excellent abrasion resistance, light resistance, and chemical resistance of the surface-treated layer. Note that a lower limit of the number of carbon atoms of an alkylene group having a specific bond between carbon-carbon atoms is 2.
A number of carbon atoms of the alkyl group represented by R8 is preferably from 1 to 10, more preferably from 1 to 6, still more preferably from 1 to 3, and particularly preferably 1 to 2, from the viewpoint of the ease of producing Compound (3-11), Compound (3-21) and Compound (3-31).
A number of carbon atoms of the alkyl group represented by R9 is preferably from 1 to 10, more preferably from 1 to 6, still more preferably from 1 to 3, and particularly preferably 1 to 2, from the viewpoint of the ease of producing Compound (3-11), Compound (3-21) and Compound (3-31).
A number of carbon atoms of the alkoxy group represented by R9 is preferably from 1 to 10, more preferably from 1 to 6, still more preferably from 1 to 3, and particularly preferably 1 to 2, from the viewpoint of the ease of producing Compound (3-11), Compound (3-21) and Compound (3-31).
p is preferably 0 or 1.
Examples of compounds (3-11), (3-21), and (3-31) include a compound of the following formula and a compound in which at least portion of the methoxy groups bonded to silicon atoms contained in the following compound are substituted with an ethoxy group. The compound of the following formula is preferable because it is industrially easy to produce and handle and is excellent in water and oil repellency, abrasion resistance, lubricity, light resistance, and chemical resistance of the surface-treated layer, particularly in light resistance. Rf in a compound of the following formula is the same as Rf1—(OX)m—O— in Formula (3-11) described above or Rf2—(OX)m—O— in Formula (3-21) described above, and preferred aspects are also the same. Q f in a compound of the following formula is the same as —(OX)m—O— in Formula (3-31), and preferred aspects are also the same. In a case in which there is a stereoisomer of a compound of the following formula, the compound may be any stereoisomer or a mixture of stereoisomers.
Examples of Compound (3-11) in which is Group (g2-1) include compounds of the following formulae.
Examples of Compound (3-11) in which is Group (g2-2) include compounds of the following formulae.
Examples of Compound (3-21) in which Y11 is Group (g2-2) include compounds of the following formulae.
Examples of Compound (3-11) in which is Group (g2-3) include compounds of the following formulae.
Examples of Compound (3-11) in which is Group (g2-4) include compounds of the following formulae.
Examples of Compound (3-11) in which is Group (g2-5) include compounds of the following formulae.
Examples of Compound (3-11) in which is Group (g2-7) include compounds of the following formulae.
Examples of Compound (3-11) in which is Group (g3-1) include compounds of the following formulae.
Examples of Compound (3-11) in which is Group (g3-2) include compounds of the following formulae.
Examples of Compound (3-11) in which Y11 is Group (g3-3) include compounds of the following formulae.
Examples of Compound (3-11) in which Y11 is Group (g3-4) include compounds of the following formulae.
Examples of Compound (3-11) in which is Group (g3-5) include compounds of the following formulae.
Examples of Compound (3-11) in which is Group (g3-6) include compounds of the following formulae.
Examples of Compound (3-11) in which Y11 is Group (g3-7) include compounds of the following formulae.
Examples of Compound (3-21) in which Y21 is Group (g2-1) include compounds of the following formulae.
Examples of Compound (3-31) in which Y31 and Y32 are Group (g2-1) include compound of the following formula.
Examples of Compound (3-31) in which Y31 and Y32 are Group (g2-2) include compounds of the following formulae.
Examples of Compound (3-31) in which Y31 and Y32 are Group (g2-3) include compound of the following formula.
Examples of Compound (3-31) in which Y31 and Y32 are Group (g2-4) include compound of the following formula.
Examples of Compound (3-31) in which Y31 and Y32 are Group (g2-5) include compound of the following formula.
Examples of Compound (3-31) in which Y31 and Y32 are Group (g2-6) include compound of the following formula.
Examples of Compound (3-31) in which Y31 and Y32 are Group (g2-7) include compound of the following formula.
Examples of Compound (3-31) in which Y31 and Y32 are Group (g3-2) include compounds of the following formulae.
Compound (A) is also preferably a compound represented by Formula (3X), from the viewpoint that the membrane has more excellent water and oil repellency and abrasion resistance.
[A-(OX)m]jZ′[—Si(R)nL3-n]g (3X)
In Formula (3X), A, X, m, j, g, R, L and n have the same definitions as each groups in Formula (3).
Compound (3X) is also preferably a compound represented by Formula (3-1), from the viewpoint that the surface-treated layer has more excellent water and oil repellency and abrasion resistance.
A-(OX)m—Z31 (3-1)
In Formula (3-1), A, X and m have the same definitions as each groups in Formula (3).
Z′ is a (j+g)-valent linking group.
Z′ is not limited as long as it does not impair the abrasion resistance of the surface-treated layer, for example, includes an alkylene group that may have an etheric oxygen atom or a divalent organopolysiloxane residue, an oxygen atom, a carbon atom, a nitrogen atom, a silicon atom, a divalent to octavalent organopolysiloxane residue, and groups resulting from excluding Si(R)nL3-n from Formulas (3-1A), (3-1B), or Formulas (3-1A-1) to (3-1A-6).
Z31 is group (3-1A) or group (3-1B).
-Qa-X31(-Qb-Si(R)nL3-n)h(—R31)i (3-1A)
-Qc-[CH2C(R32)(-Qd-Si(R)nL3-n]y-R33 (3-1B)
The definitions of R, n and L in Formulas (3-1A) and (3-1B) are the same as those of R, n and L in Formula (3), respectively.
Qa is a single bond or a divalent linking group.
Examples of a divalent linking group include a divalent hydrocarbon group, a divalent heterocyclic group, —O—, —S—, —SO2—, —N(Rd)—, —C(O)—, —Si(Ra)2—, and any combination of two or more of these. Ra is an alkyl group (preferably having from 1 to 10 carbon atoms) or a phenyl group. Rd is a hydrogen atom or an alkyl group (preferably having from 1 to 10 carbon atoms).
Examples of the divalent hydrocarbon group include a divalent saturated hydrocarbon group, a divalent aromatic hydrocarbon group, an alkenylene group, and an alkynylene group. The divalent saturated hydrocarbon group may be linear, branched, or cyclic. Examples of the divalent saturated hydrocarbon group include an alkylene group. A number of carbon atoms of the divalent saturated hydrocarbon group is preferably from 1 to 20. A number of carbon atoms of the divalent aromatic hydrocarbon group is preferably from 5 to 20. Examples of the divalent aromatic hydrocarbon group include a phenylene group. The alkenylene group is preferably an alkenylene group having from 2 to 20 carbon atoms. The alkynylene group is preferably an alkynylene group having from 2 to 20 carbon atoms.
Examples of a combination of two or more of the groups described above include —OC(O)—, —C(O)N(Rd)—, an alkylene group having an etheric oxygen atom, an alkylene group having —OC(O)—, and alkylene group —Si(Ra)2-phenylene group-Si(Ra)2—.
X31 is a single bond, an alkylene group, a carbon atom, a nitrogen atom, a silicon atom, or a divalent to octavalent organopolysiloxane residue.
The alkylene group may have —O—, a silphenylene structure group, a divalent organopolysiloxane residue, or a dialkyl silylene group. The alkylene group may have plural groups selected from the group consisting of —O—, a silphenylene structure group, a divalent organopolysiloxane residue, and a dialkyl silylene group.
A number of carbon atoms of an alkylene group represented by X31 is preferably from 1 to 20, and more preferably from 1 to 10.
Examples of the divalent to octavalent organopolysiloxane residue include a divalent organopolysiloxane residue and the above-described (i5+1)-valent organopolysiloxane residue.
Qb is a single bond or a divalent linking group.
The definition of a divalent linking group has the same meaning as the definition described for Qa above.
R31 is a hydroxyl group or an alkyl group.
A number of carbon atoms of an alkyl group is preferably from 1 to 5, more preferably from 1 to 3, and still more preferably 1.
In a case in which X31 is a single bond or an alkylene group, h is 1, and i is 0.
In a case in which X31 is a nitrogen atom, h is an integer from 1 to 2, i is an integer from 0 to 1, and h+i=2 is satisfied.
In a case in which X31 is a carbon atom or a silicon atom, h is an integer from 1 to 3, i is an integer from 0 to 2, and h+i=3 is satisfied.
In a case in which X31 is a divalent to octavalent organopolysiloxane residue, h is an integer from 1 to 7, i is an integer from 0 to 6, and h+i=1 to 7 is satisfied.
In a case in which there are two or more of (-Qb-Si(R)nL3-n), two or more of (-Qb-Si(R)nL3-n) may be the same or different. In a case in which there are two or more R31 s, two or more of (—R31) may be the same or different.
Qc is a single bond or an alkylene group that may have an etheric oxygen atom. Qc is preferably a single bond from the viewpoint of the ease of producing a compound.
A number of carbon atoms of the alkylene group that may have an etheric oxygen atom is preferably from 1 to 10, and more preferably from 2 to 6.
R32 is a hydrogen atom or an alkyl group having from 1 to 10 carbon atoms, and preferably a hydrogen atom from the viewpoint of the ease of producing a compound.
The alkyl group is preferably methyl group.
Qd is a single bond or an alkylene group. A number of carbon atoms of the alkylene group is preferably from 1 to 10, and more preferably from 1 to 6. Q d is preferably a single bond or —CH2— from the viewpoint of the ease of producing a compound.
R33 is a hydrogen atom or a halogen atom, and preferably a hydrogen atom from the viewpoint of the ease of producing a compound.
y is an integer from 1 to 10, and preferably an integer 1 to 6.
Two or more of [CH2C(R32)(-Qd-Si(R)nL3-n)] may be the same or different.
Group (3-1A) is preferably groups (3-1A-1) to (3-1A-6).
—(X32)s1-Qb1-Si(R)nL3-n (3-1A-1)
—(X33)s2-Qa2-N[-Qb2-Si(R)nL3-n]2 (3-1A-2)
-Qa3-G(Rg)[-Qb3-Si(R)nL3-n]2 (3-1A-3)
—[C(O)N(Rd)]s4-Qa4-(O)t4-C[—(O)u4-Qb4-Si(R)nLn-3]3 (3-1A-4)
-Qa5-Si[-Qb5-Si(R)nL3n]3 (3-1A-5)
—[C(O)N(Rd)]v-Qa6-Za′[-Qb6-Si(R)nL3-n]w (3-1A-6)
The definition of R, L and n in Formula (3-1A-1) to (3-1A-6) is as described above.
X32 is —O—, or —C(O)N(Rd)—, in which N in the formula connects to Qb1.
The definition of Rd is as described above.
s1 is 0 or 1.
Qb1 is an alkylene group. The alkylene group may have —O—, a silphenylene structure group, a divalent organopolysiloxane residue, or a dialkyl silylene group. The alkylene group may have plural groups selected from the group consisting of —O—, a silphenylene structure group, a divalent organopolysiloxane residue, and a dialkyl silylene group.
In a case in which the alkylene group has —O—, a silphenylene structure group, a divalent organopolysiloxane residue, or a dialkyl silylene group, it is preferable that the alkylene group has these groups between carbon-carbon atoms.
A number of carbon atoms of an alkylene group represented by Qb1 is preferably from 1 to 10, and more preferably from 2 to 6.
In a case in which s1 is 0, Qb1 is preferably —CH2OCH2CH2CH2—, —CH2OCH2CH2OCH2CH2CH2—, —CH2CH2—, —CH2CH2CH2—, or —CH2OCH2CH2CH2Si(CH3)2OSi(CH3)2CH2CH2—. In a case in which (X32)s1 is —O—, Qb1 is preferably —CH2CH2CH2—, -or CH2CH2OCH2CH2CH2. In a case in which (X32)s1 is —C(O)N(Rd)—, Qb1 is preferably an alkylene group having from 2 to 6 carbon atoms, in which N in the formula connects to Qb1. In a case in which Qb1 is one of these groups, the compound is easy to produce.
Example of Group (3-1A-1) include the following groups and groups in which at least a portion of methoxy groups bonded to silicon atoms contained in the following groups are substituted with ethoxy group(s). In the following formula, “*” represents a binding position with (OX)m.
X33 is —O—, —NH— or —C(O)N(Rd)—.
The definition of Rd is as described above.
Qa2 is a single bond, an alkylene group, —C(O)—, or a group in which an etheric oxygen atom, —C(O)—, —C(O)O—, —OC(O)— or —NH— is present between carbon-carbon atoms of alkylene group having two or more carbon atoms.
A number of carbon atoms of an alkylene group represented by Qa2 is preferably from 1 to 10, and more preferably from 1 to 6.
A number of carbon atoms of a group, in which an etheric oxygen atom, —C(O)—, —C(O)O—, —OC(O)— or —NH— is present between carbon-carbon atoms of alkylene group having two or more carbon atoms, represented by Qa2 is preferably from 2 to 10, and more preferably from 2 to 6.
Qa2 is preferably —CH2—, —CH2CH2—, —CH2CH2CH2—, —CH2OCH2CH2—, —CH2NHCH2CH2—, —CH2CH2OC(O)CH2CH2—, or —C(O)—, in which the right side connects to N, from the viewpoint of the ease of producing a compound.
s2 is 0 or 1 (in a case in which Qa2 is a single bond, s2 is 0), and preferably 0 from the viewpoint of the ease of producing a compound.
Qb2 is an alkylene group, or a group in which a divalent organopolysiloxane residue, an etheric oxygen atom or —NH— is present between carbon-carbon atoms of alkylene group having two or more carbon atoms.
A number of carbon atoms of an alkylene group represented by Qb2 is preferably from 1 to 10, and more preferably from 2 to 6.
A number of carbon atoms of a group, in which a divalent organopolysiloxane residue, an etheric oxygen atom or —NH— is present between carbon-carbon atoms of alkylene group having two or more carbon atoms, represented by Qb2 is preferably from 2 to 10, and more preferably from 2 to 6.
Qb2 is preferably —CH2CH2CH2— or —CH2CH2OCH2CH2CH2—, in which the right side connects to Si, from the viewpoint of the ease of producing a compound.
Two or more of [-Qb2-Si(R)nL3-n] may be the same or different.
Examples of Group (3-1A-2) include the following groups and groups in which at least a portion of methoxy groups bonded to silicon atoms contained in the following groups are substituted with ethoxy group(s). In the following formula, “*” represents a binding position with (OX)m.
Qa3 is a single bond or an alkylene group that may have an etheric oxygen atom. Qa3 is preferably a single bond from the viewpoint of the ease of producing a compound.
A number of carbon atoms of the alkylene group that may have an etheric oxygen atom is preferably from 1 to 10, and more preferably from 2 to 6.
G is carbon atom or silicon atom.
Rg is a hydrogen group or an alkyl group. A number of carbon atoms of the alkyl group represented by Rg is preferably from 1 to 4.
G(Rg) is preferably C(OH) or Si(Rga), in which Rga is alkyl group, a number of carbon atoms of the alkyl group is preferably from 1 to 10, and Rga is preferably methyl, from the viewpoint of the ease of producing a compound.
Qb3 is an alkylene group or a group in which an etheric oxygen atom or a divalent organopolysiloxane residue is present between carbon-carbon atoms of alkylene group having two or more carbon atoms.
A number of carbon atoms of the alkylene group represented by Qb3 is preferably from 1 to 10, and more preferably from 2 to 6.
A number of carbon atoms of a group, in which an etheric oxygen atom or a divalent organopolysiloxane residue is present between carbon-carbon atoms of alkylene group having two or more carbon atoms, represented by Qb3 is preferably from 2 to 10, and more preferably from 2 to 6.
Qb3 is preferably —CH2CH2—, —CH2CH2CH2— or —CH2CH2CH2CH2CH2CH2CH2CH2— from the viewpoint of the ease of producing a compound.
Two or more of [-Qb3-Si(R)nL3-n] may be the same or different.
Examples of Group (3-1A-3) include the following groups and groups in which at least a portion of methoxy groups bonded to silicon atoms contained in the following groups are substituted with ethoxy group(s). In the following formula, “*” represents a binding position with (OX)m.
The definition of Rd in Formula (3-1A-4) is as described above.
s4 is 0 or 1.
Qa4 is a single bond or an alkylene group that may have an etheric oxygen atom.
A number of carbon atoms of the alkylene group that may have an etheric oxygen atom is preferably from 1 to 10, and more preferably from 2 to 6.
t4 is 0 or 1 (note that t4 is 0 in a case in which Qa4 is a single bond).
In a case in which s4 is 0, it is preferable that -Qa4-(O)t4— is a single bond, —CH2O—, —CH2OCH2—, —CH2OCH2CH2O—, —CH2OCH2CH2OCH2—, or —CH2OCH2CH2CH2CH2OCH2— (note that the left side connects to (OX)m) from the viewpoint of the ease of producing a compound. In a case in which s4 is 1, single bond, —CH2—, or —CH2CH2— is preferable.
Qb4 is an alkylene group. The alkylene group may have —O—, —C(O)N(Rd)— (Rd is defined as above), a silphenylene structure group, a divalent organopolysiloxane residue, or a dialkyl silylene group.
In a case in which the alkylene group has —O— or a silphenylene structure group, it is preferable that the alkylene group has —O— or a silphenylene structure group between carbon-carbon atoms. In a case in which the alkylene group has —C(O)N(Rd)—, a dialkyl silylene group, or a divalent organopolysiloxane residue, it is preferable that the alkylene group has these groups between carbon-carbon atoms or at an end that binds to (O)u4.
A number of carbon atoms of an alkylene group represented by is Qb4 preferably from 1 to 10, and more preferably from 2 to 6.
u4 is 0 or 1. —(O)u4-Qb4- is preferably —CH2CH2—, —CH2CH2CH2—, —CH2OCH2CH2CH2—, —CH2OCH2CH2CH2CH2CH2—, —OCH2CH2CH2—, —OSi(CH3)2CH2CH2CH2—, —OSi(CH3)20Si(CH3)2CH2CH2CH2—, —CH2CH2CH2Si(CH3)2PhSi(CH3)2CH2CH2—, in which the right side connects to Si, from the viewpoint of the ease of producing a compound.
Three of [—(O)u4-Qb4-Si(R)nL3-n] may be the same or different.
Examples of Group (3-1A-4) include the following groups and groups in which at least a portion of methoxy groups bonded to silicon atoms contained in the following groups are substituted with ethoxy group(s). In the following formula, “*” represents a binding position with (OX)m.
Qa5 is an alkylene group that may have an etheric oxygen atom.
A number of carbon atoms of the alkylene group that may have an etheric oxygen atom is preferably from 1 to 10, and more preferably from 2 to 6.
Qa5 is preferably —CH2OCH2CH2CH2—, —CH2OCH2CH2OCH2CH2CH2—, —CH2CH2—, —CH2CH2CH2—, in which the right side connects to Si, from the viewpoint of the ease of producing a compound.
Qb5 is an alkylene group or a group in which an etheric oxygen atom or a divalent organopolysiloxane residue is present between carbon-carbon atoms of alkylene group having two or more carbon atoms.
A number of carbon atoms of the alkylene group represented by Qb5 is preferably from 1 to 10, and more preferably from 2 to 6.
A number of carbon atoms of a group, in which an etheric oxygen atom or a divalent organopolysiloxane residue is present between carbon-carbon atoms of alkylene group having two or more carbon atoms, represented by Qb5 is preferably from 2 to 10, and more preferably from 2 to 6.
Qb5 is preferably —CH2CH2CH2— or —CH2CH2OCH2CH2CH2—, in which the right side connects to Si(R)nL3-n, from the viewpoint of the ease of producing a compound.
Three of [-Qb5-Si(R)nL3-n] may be the same or different.
Examples of Group (3-1A-5) include the following groups and groups in which at least a portion of methoxy groups bonded to silicon atoms contained in the following groups are substituted with ethoxy group(s). In the following formula, “*” represents a binding position with (OX)m.
The definition of Rd in Formula (3-1A-6) is as described above.
v is 0 or 1.
Qa6 is an alkylene group that may have an etheric oxygen atom.
A number of carbon atoms of the alkylene group that may have an etheric oxygen atom is preferably from 1 to 10, and more preferably from 2 to 6.
Qa6 is preferably —CH2OCH2CH2CH2—, —CH2OCH2CH2OCH2CH2CH2—, —CH2CH2—, —CH2CH2CH2—, in which the right side connects to Za′, from the viewpoint of the ease of producing a compound.
Za′ is an (w+1)-valent organopolysiloxane residue.
w is 2 or more, and preferably an integer from 2 to 7.
Examples of (w+1)-valent organopolysiloxane residue include the same groups as the (i5+1)-valent organopolysiloxane residue described above.
Qb6 is an alkylene group or a group in which an etheric oxygen atom or a divalent organopolysiloxane residue is present between carbon-carbon atoms of alkylene group having two or more carbon atoms.
A number of carbon atoms of the alkylene group represented by Qb6 is preferably from 1 to 10, and more preferably from 2 to 6.
A number of carbon atoms of a group, in which an etheric oxygen atom or a divalent organopolysiloxane residue is present between carbon-carbon atoms of alkylene group having Qb6 two or more carbon atoms, represented by is preferably from 2 to 10, and more preferably from 2 to 6.
Qb6 is preferably —CH2CH2— or —CH2CH2CH2— from the viewpoint of the ease of producing a compound.
Plural [-Qb6-Si(R)nL3-n] may be the same or different.
As Compound (3X), a compound represented by Formula (3-2) is also preferable because the water and oil repellency of the surface-treated layer is more excellent.
[A-(OX)m-Qa-]j32Z32[-Qb-Si(R)nL3-n]h32 (3-2)
In Formula (3-2), A, X, m, Qa, Qb, R and L have the same definitions as each groups in Formula (3-1) and Formula (3-1A).
Z32 is a (j32+h32)-valent hydrocarbon group; or a (j32+h32)-valent hydrocarbon group having two or more carbon atoms, in which one or more etheric oxygen atoms are present between carbon-carbon atoms of a hydrocarbon group.
Z32 is preferably a residue resulting from removing a hydroxyl group from a polyhydric alcohol having a primary hydroxyl group.
Z32 is preferably each of groups represented by Formulas (Z-1) to (Z-5) from the viewpoint of availability of raw materials. Note that R34 is an alkyl group, and preferably a methyl group or an ethyl group.
j32 is an integer of 2 or more, and preferably an integer from 2 to 5 from the viewpoint that the surface-treated layer has more excellent water and oil repellency of.
h32 is an integer of 1 or more, and preferably an integer from 2 to 4, and more preferably 2 or 3, from the viewpoint that the surface-treated layer has more excellent abrasion resistance
A number average molecular weight of compound (A) is preferably 1,000 to 20,000, more preferably 2,000 to 10,000, and still more preferably 2,500 to 6,000.
Specific examples of compound (A) include those described in the following documents.
perfluoropolyether-modified aminosilanes described in Japanese Patent Application Laid-Open (JP-A) No. 11-029585 and JP-A 2000-327772,
silicon-containing organic fluorine-containing polymers described in Japanese Patent No. 2874715,
organosilicon compounds described in JP-A No. 2000-144097,
fluorinated siloxanes described in Publication of Japanese Translation of PCT International Publication (JP-T) No. 2002-506887,
organic silicone compounds described in JP-T No. 2008-534696,
fluorinated modified hydrogen-containing polymers described in Japanese Patent No. 4138936,
compounds described in US Patent Application Publication No. 2010/0129672, WO 2014/126064, and JP-A No. 2014-070163,
organosilicon compounds described in WO 2011/060047 and WO 2011/059430,
fluorine-containing organosilane compounds described in WO 2012/064649,
fluorooxyalkylene group-containing polymers described in JP-A No. 2012-72272,
fluorine-containing ether compounds described WO 2013/042732, WO 2013/121984, WO 2013/121985, WO 2013/121986, WO 2014/163004, JP-A No. 2014-080473, WO 2015/087902, WO 2017/038830, WO 2017/038832, WO 2017/187775, WO 2018/216630, WO 2019/039186, WO 2019/039226, WO 2019/039341, WO 2019/044479, WO 2019/049753, WO 2019/163282 and JP-A No. 2019-044158,
perfluoro (poly) ether-containing silane compounds described in JP-A No. 2014-218639, WO 2017/022437, WO 2018/079743 and WO 2018/143433,
perfluoro(poly)ether group-containing silane compounds described in WO 2018/169002,
fluoro(poly)ether group-containing silane compounds described in WO 2019/151442,
(poly)ether group-containing silane compounds described in WO 2019/151445,
perfluoropolyether group-containing compounds described in WO 2019/098230,
fluoropolyether group-containing polymer-modified silanes described in JP-A No. 2015-199906, JP-A No. 2016-204656, JP-A No. 2016-210854 and JP-A No. 2016-222859,
fluorine-containing compounds described in WO 2019/039083 and WO 2019/049754.
Examples of commercial products of the compound (A) include KY-100 series (KY-178, KY-185, KY-195, or the like) manufactured by Shin-Etsu Chemical Co., Ltd., Afluid (registered trademark) 5550 manufactured by AGC Inc., OPTOOL (registered trademark), DSX, OPTOOL (registered trademark) AES, OPTOOL (registered trademark) UF503, OPTOOL (registered trademark) UD509 manufactured by Daikin Industries, Ltd.
A content of compound (A) in the surface treatment agent is preferably from 0.001 to 50% by mass, more preferably from 0.1 to 25% by mass, and still more preferably from 0.5 to 20% by mass. The content of compound (A) in the surface treatment agent may be 10% by mass or less, or may be 5% by mass or less.
<Compound (B)>
Compound (B) is at least one compound selected from the group consisting of compound (B1), compound (B2) and compound (B3).
A total content of compound (B) in the surface treatment agent is preferably from 50 to 99.999% by mass, more preferably from 75 to 99.9% by mass, and still more preferably from 80 to 99.5% by mass.
In one embodiment, a ratio of compound (B1) to compound (B) is preferably from 50 to 100% by mass, more preferably from 70 to 100% by mass, still more preferably from 90 to 100% by mass, and particularly preferably 100% by mass.
In another embodiment, a ratio of compound (B2) to compound (B) is preferably 50 to 100% by mass, more preferably 70 to 100% by mass, still more preferably 90 to 100% by mass, and particularly preferably 100% by mass.
In another embodiment, a ratio of compound (B3) to compound (B) is preferably 50 to 100% by mass, more preferably 70 to 100% by mass, still more preferably 90 to 100% by mass, and particularly preferably 100% by mass.
In one embodiment, a content of compound (B1) in the surface treatment agent is preferably from 50 to 99.999% by mass, more preferably from 75 to 99.9% by mass, and still more preferably from 80 to 99.5% by mass.
In another embodiment, the content of compound (B2) in the surface treatment agent is preferably from 50 to 99.999% by mass, more preferably from 75 to 99.9% by mass, and still more preferably from 80 to 99.5% by mass.
In another embodiment, a content of compound (B3) in the surface treatment agent is preferably from 50 to 99.999% by mass, more preferably from 75 to 99.9% by mass, and still more preferably from 80 to 99.5% by mass.
-Compound (B1)-
Compound (B1) is a fluorine-containing ketone compound represented by the following Formula (B1). Compound (B1) may be used singly, or in combination of two or more kinds thereof.
R1COR2 (B1)
In Formula (B1), each of R1 and R2 independently represents a linear, branched, or cyclic fluorine-containing alkyl group having from 1 to 5 carbon atoms.
A number of carbon atoms of the fluorine-containing alkyl group is preferably from 1 to 4, and more preferably from 1 to 3.
A fluorine atom content of Compound (B1) is preferably 50% by mole or more, more preferably 75% by mole or more, and still more preferably 100% by mole (i.e. perfluoroketone compound). The “fluorine atom content” means a proportion of hydrogen atoms contained in Compound (B1) substituted with fluorine atoms.
A boiling point of Compound (B1) at the atmospheric pressure is preferably from 50 to 220° C., more preferably from 60 to 200° C., and still more preferably from 70 to 180° C.
Specific examples of fluorine-containing alkyl groups represented by R1 and R2 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, a cyclopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, a cyclobutyl group, an n-pentyl group, a neopentyl group an isopentyl group, a sec-pentyl group, a tert-pentyl group, a 1-ethylpropyl group, a 1,2-dimethylpropyl group, a cyclopentyl group, a cyclopropylmethyl group, a cyclobutylmethyl group, and a 2-cyclopropylethyl group, and at least a portion of the hydrogen atoms in these groups are fluorinated.
In a case in which the fluorine-containing alkyl group a cyclopropyl group, in which at least a portion of the hydrogen atoms are fluorinated, the cyclopropyl group may be substituted with one or two methyl group(s) or ethyl group(s) and at least a portion of the hydrogen atoms in methyl group(s) or ethyl group(s) are fluorinated.
In a case in which the fluorine-containing alkyl group is a cyclobutyl group, in which at least a portion of the hydrogen atoms are fluorinated, the cyclobutyl group may be substituted with one methyl group and at least a portion of the hydrogen atoms in the methyl group are fluorinated.
From the viewpoint of suppressing hydrolysis of Compound (B1), it is preferable that at least one fluorine-containing alkyl group represented by R1 or R2 in Formula (B1) is a branched fluorine-containing alkyl group, and it is more preferable that both of them are branched fluorine-containing alkyl groups.
In a case in which the fluorine-containing alkyl group is branched, the branching position of the fluorine-containing alkyl group is not particularly limited. From the viewpoint of suppressing hydrolysis of Compound (B1), it is preferable that the branched fluorine-containing alkyl group has a branched structure at α-carbon. In other words, from the viewpoint of further suppressing hydrolysis of Compound (B1), it is preferable that at least one fluorine-containing alkyl group represented by R1 or R2 in Formula (B1) is a fluorine-containing alkyl group having a branched structure at α-carbon, and it is more preferable that both of them are fluorine-containing alkyl groups having a branched structure at α-carbon.
As used herein, “α-carbon” of a fluorine-containing alkyl group refers to a carbon atom, which directly binds to a carbonyl group, among the carbon atoms contained in the fluorine-containing alkyl group. Examples of a fluorine-containing alkyl group having a branched structure at α-carbon include an isopropyl group, a sec-butyl group, and a tert-butyl group.
In a case in which two or more kinds of compounds (B1) are used in combination, the proportion of a compound (B1) in which at least one of R1 or R2 is a branched fluorine-containing alkyl group to all compounds (B1) is preferably from 50 to 100% by mass, more preferably from 80 to 100% by mass, and still more preferably from 90 to 100% by mass.
In a case in which two or more kinds of compounds (B1) are used in combination, the proportion of a compound (B1) in which both R1 and R2 are branched fluorine-containing alkyl groups to all compounds (B1) is preferably from 50 to 100% by mass, more preferably from 80 to 100% by mass, and still more preferably from 90 to 100% by mass.
Examples of a desired combination of fluorine-containing alkyl groups represented by R1 and R2 include any combination in which one of them is a fluorine-containing ethyl group, and the other is a fluorine-containing isopropyl group; any combination in which both of them are fluorine-containing isopropyl groups; any combination in which one of them is a fluorine-containing isopropyl group, and the other is a fluorine-containing n-propyl group; and any combination in which both of them are fluorine-containing sec-butyl groups from the viewpoint of suppressing hydrolysis and the viewpoint of solubility.
Specific examples of Compound (B1) are shown below.
-Compound (B2)-
Compound (B2) is a fluorine-containing cyclic ketone compound represented by the following Formula (B2). Compound (B2) may be used singly, or in combination of two or more kinds thereof.
In Formula (B2), R3 represents a residue that forms a 3- to 5-membered ring structure with a carbon atom of a carbonyl group and that has a fluorine atom. R3 may be substituted with a fluorine-containing alkyl group having from 1 to 2 carbon atoms.
Specific examples of R3 include a dimethylene group, a trimethylene group, and a tetramethylene group and at least a portion of the hydrogen atoms in these groups are fluorinated.
A fluorine atom content of Compound (B2) is preferably 50% by mole or more, more preferably 75% by mole or more, and still more preferably 100% by mole (i.e. perfluorocyclic ketone compound).
A boiling point of Compound (B2) at the atmospheric pressure is preferably from 50 to 220° C., more preferably from 60 to 200° C., and still more preferably from 70 to 180° C.
Specific examples of Compound (B2) are shown below.
-Compound (B3)-
Compound (B3) is a fluorine-containing polyether compound represented by the following Formula (B3). Compound (B3) may be a mixture in which R4, R5, and R6 are the same and q has a distribution.
Compound (B3) may be used singly, or in combination of two or more kinds thereof. Using two or more kinds of Compounds (B3) means using plural Compounds (B3) in which at least one of R4, R5, or R6 is different from each other.
R4—[OR5]q—R6 (B3)
In Formula (B3), each of R4 and R6 independently represents a fluorine-containing alkyl group having from 1 to 3 carbon atoms, q represents an integer of 1 or more, R5 represents a perfluoroalkylene group having from 1 to 6 carbon atoms, and in a case in which q is an integer of 2 or more, plural R5s may be the same or different. In a case in which plural R5s are different, the binding order of [OR5] is not limited and may be arranged randomly, alternately, or in blocks.
A fluorine atom content of Compound (B3) is preferably 50% by mole or more, more preferably 75% by mole or more, and still more preferably 100% by mole (i.e. perfluoropolyether compound).
A boiling point of Compound (B3) at the atmospheric pressure is preferably from 50 to 220° C., more preferably from 60 to 200° C., and still more preferably from 70 to 180° C. from the viewpoint of handleability of the surface treatment agent.
A number average molecular weight of Compound (B3) is preferably from 300 to 1,000, more preferably from 400 to 990, and still more preferably from 450 to 980 from the viewpoint of availability of the surface treatment agent.
A kinetic viscosity of Compound (B3) at 25° C. is preferably from 0.01 to 500 cSt (from 1×10−8 to 5×10−4 m2/s), more preferably from 0.05 to 100 cSt (from 5×10−8 to 1×10−4 m2/s), and still more preferably from 0.1 to 80 cSt (from 1×10−7 to 8×10−5 m2/s) from the viewpoint of handleability of the surface treatment agent. The kinetic viscosity in the present disclosure is measured in accordance with JIS K 2283:2000.
Specific examples of fluorine-containing alkyl groups represented by R4 and R6 include a methyl group, an ethyl group, an n-propyl group, and an isopropyl group and at least a portion of the hydrogen atoms in these groups are fluorinated.
Specific examples of a perfluoroalkylene group represented by R5 include a methylene group, ethylene group, trimethylene group, propylidene group, isopropylidene group and propylene group, and these groups are perfluorinated; —(CF2)4—, —(CF2)5—; and —(CF2)6—.
In a case in which q is an integer of 2 or more and plural R5s are the same in Formula (B3), R5 is preferably a perfluoropropylene group (—OCF(CF3)CF2— or —OCF2CF(CF3)— as [—OR5-]) or the like.
In a case in which q is an integer of 2 or more and plural R5s are different in Formula (B3), examples of a combination of R5s include any combination of a perfluoromethylene group and a perfluoroethylene group; any combination of a perfluoropropylene group and a perfluoromethylene group; any combination of a perfluoroethylene group and —(CF2)4—; and any combination of a perfluoroethylene group and —(CF2)6—.
Examples of a combination of R4, R5 and R6 in Formula (B3) include any combination in which both R4 and R6 are trifluoromethyl groups and R5s are a perfluoromethylene group and a perfluoropropylene group; any combination in which both R4 and R6 are difluoromethyl groups and R5s are a perfluoromethylene group and a perfluoropropylene group; any combination in which R4 is a perfluoro-n-propyl group, R5 is a perfluoropropylene group, and R6 is a tetrafluoroethyl group; any combination in which R4 is a perfluoro-n-propyl group, R5 is a perfluoropropylene group, and R6 is a perfluoroethyl group; and any combination in which both R4 and R6 are perfluoro-n-propyl groups and R5 is a perfluoropropylene group.
<Other Components>
The surface treatment agent in the present disclosure may contain components other than the compound (A) and the compound (B) within a scope in which the purpose of the present disclosure is not impaired, and stability, performance, appearance and the like are not adversely affected.
Examples of other components include other solvent components other than the compound (B), a pH adjuster for preventing coating surface corrosion, an anticorrosion agent, an antifungal agent, a dye, a pigment, a UV absorber, and an antistatic agent.
A contents of other components in the surface treatment agent is preferably 5% by mass or less, more preferably 1% by mass or less, and still more preferably 0.5% by mass or less.
[Method of Producing Substrate Having Surface-Treated Layer]
A method of producing a substrate having a surface-treated layer in the present disclosure is not particularly limited as long as a surface-treated layer is formed using the surface treatment agent in the present disclosure. Examples of a method of forming a surface-treated layer on a substrate include a dry coating method and a wet coating method.
(Substrate)
A substrate to be used in the present disclosure is not particularly limited as long as it is a substrate that requires water and oil repellency. A material of the substrate is not particularly limited. Examples of the surface material of the substrate include a metal, a resin, a glass, a ceramic, or a composite material thereof
(Dry Coating Method)
The surface treatment agent in the present disclosure may be used as is in a method of producing a substrate having a surface-treated layer by treating a surface of a substrate by a dry coating method. The surface treatment agent in the present disclosure is preferable for forming a surface-treated layer having excellent adhesiveness by the dry coating method.
Examples of the dry coating method include vacuum deposition, CVD, and sputtering methods. The vacuum deposition method may be preferably used from the viewpoint of suppressing the decomposition of the compound (A) contained in the surface treatment agent in the present disclosure and the viewpoint of the convenience of the system. The vacuum deposition method may be subdivided into the resistance heating method, the electron beam heating method, the high frequency induction heating method, the reactive vapor deposition, the molecular beam epitaxy method, the hot wall vapor deposition method, the ion plating method, and the cluster ion beam method, any of which may be applied. The resistance heating method may be preferably used from the viewpoint of suppressing the decomposition of the compound (A) contained in the surface treatment agent in the present disclosure and the viewpoint of the convenience of the system. The vacuum deposition system is not particularly limited, and a known system may be used.
In a case in which the dry coating method is carried out using a vacuum deposition system, the surface treatment agent containing the compound (A) is placed in an appropriate container and heated to be evaporated. Examples of a preferable container include a porous material. A porous material is impregnated with the surface treatment agent and heated, which results in a moderate vapor deposition rate. Examples of a porous material that may be used include, but are not particularly limited to, a sintered filter made by sintering a metal powder having a high thermal conductivity, such as copper. By using the surface treatment agent in the present disclosure when forming a surface treatment layer by a dry coating method, an amount of evaporation of the compound (A) to be evaporated may be precisely adjusted, whereby it possible to control the film thickness of the surface-treated layer.
In a case in which the vacuum deposition method is used, film formation conditions vary depending on the type of the vacuum deposition method to be applied. In the case in which the resistance heating method is used, a degree of vacuum before vapor deposition is preferably 1×10−2 Pa or less, and more preferably 1×10−3 Pa or less. A heating temperature of an evaporation source is not particularly limited as long as the compound (A) is at a temperature at which the steam pressure is sufficient. Specifically, it is from 30 to 400° C., and more preferably from 50 to 300° C. In a case in which the heating temperature is equal to or more than the lower limit of this range, a film formation speed is favorable. In a case in which the heating temperature is equal to or less than the upper limit of this range, water and oil repellency and abrasion resistance may be imparted to a surface of a substrate without causing the decomposition of the compound (A). A substrate temperature is preferably in a range of from room temperature (25° C.) to 200° C. during vacuum deposition. In a case in which the substrate temperature is 200° C. or less, the film formation speed is favorable. An upper limit of the substrate temperature is more preferably 150° C. or less, and still more preferably 100° C. or less.
In a case in which a surface of a substrate is treated by the dry coating method using the surface treatment agent in the present disclosure, a film thickness of a surface-treated layer formed on the surface of the substrate by the treatment is preferably from 1 to 100 nm, and more preferably from 1 to 50 nm. In a case in which the film thickness of the surface-treated layer is equal to or more than the lower limit of this range, it is possible to easily obtain the sufficient effects of the surface treatment. In a case in which the film thickness of the surface-treated layer is equal to or less than the upper limit of the range, the utilization efficiency is high. The film thickness may be calculated from the oscillation period of interference patterns of reflected X-rays obtained by X-ray reflectometry using, for example, a X-ray diffractometer for thin film analysis ATX-G (manufactured by Rigaku Corporation).
In particular, in the vacuum deposition method, a surface-treated layer having excellent water and oil repellency and abrasion resistance may be formed as the content of the compound (A) is high while a content of impurities is low. This is considered to be due to suppressing the phenomenon that chemical bonding between the compound (A) responsible for the appearance of performance and the surface of the substrate is hindered because, according to the vacuum deposition method, a by-product having a small vapor pressure deposits on the surface of the substrate before the compound (A).
(Wet Coating Method)
The substrate having a surface-treated layer may be produced by coating a surface of a substrate with the surface treatment agent in the present disclosure, and drying the surface treatment agent.
As the method of coating with the surface treatment agent, a known method is used, if appropriate.
As the coating method, a spin coating method, a wipe coating method, a spray coating method, a squeegee coating method, a dip coating method, a die coating method, a inkjet method, a flow coating method, a roll coating method, a casting method, a Langmuir-Blodgett method, or a gravure coating method is preferable.
A drying method may be a method capable of removing the compound (B) contained in the surface treatment agent by drying, and a known method is used as appropriate. A drying temperature is preferably from 10 to 300° C., and more preferably from 20 to 200° C.
A film thickness of a surface-treated layer formed on the surface of the substrate after drying and removing the compound (B) is preferably from 1 to 100 nm, and more preferably from 1 to 50 nm. In a case in which the film thickness of the surface-treated layer is equal to or more than the lower limit of this range, it is possible to easily obtain the sufficient effects of the surface treatment. In a case in which the film thickness of the surface-treated layer is equal to or less than the upper limit of the range, the utilization efficiency is high. The film thickness may be measured in the same manner as the film thickness of a surface-treated layer formed by the dry coating method.
(Aftertreatment)
After forming a surface-treated layer on a surface of a substrate by the dry coating method or the wet coating method, an operation for promoting a reaction between the compound (A) and the substrate may be performed, if necessary, in order to improve abrasion resistance of the surface-treated layer. The operation includes heating, humidification, light irradiation, and the like. For example, by heating the substrate on which the surface-treated layer is formed in an atmosphere containing moisture, reactions, which are a hydrolysis reaction of hydrolyzable silyl groups to silanol groups, a reaction between hydroxyl groups and the like and silanol groups on the substrate surface, and a reaction such as the formation of siloxane bonds due to the condensation reaction of silanol groups, may be accelerated.
After the surface treatment, compounds in the surface-treated layer, which are not chemically bonded to the other compounds or the substrate, may be removed, if necessary. Examples of specific methods thereof include a method of pouring a solvent over the surface-treated layer and a method of wiping with a cloth soaked in a solvent.
A water contact angle of the surface-treated layer by the θ/2 method is preferably from 80 to 120°, more preferably from 100 to 120°, and still more preferably 105 to 120°.
Hereinafter, the above embodiments will be described in detail with reference to examples, but the above embodiments are not limited to these examples.
Examples 1, 8 and 15 are comparative examples, and Examples 2 to 7, 9 to 14 and 16 to 21 are examples.
<Preparation of Compound (A1)>
The following compound (A1) was obtained according to the method described in Example 15 of Japanese Patent No. 5761305.
CF3(OCF2CF2)15(OCF2)160CF2CH2OCH2CH2CH2Si[CH2CH2CH2Si(OCH3)3]3 (A1)
Mn of compound (A1): 3,600
<Preparation of Compound (A2)>
The following compound (A2) was obtained according to the method described in Example 16-3 of WO 2017/038830.
CF3CF2CF2—O—(CF2CF2O)(CF2CF2O)[(CF2O)x1(CF2CF2O)x2]—CF2—C(O)NH—CH2—C[CH2CH2CH2—Si(OCH3)3]3 (A2)
Mn of compound (A2): 4,500
<Preparation of Compound (A3)>
The following compound (A3) was obtained according to the method described in Example 1 of WO 2018/043166.
CF3O(CF2CF20CF2CF2CF2CF20)m25CF2CF2OCF2CF2CF2—C(═O)N[CH2CH2CH2Si(OCH3)3]2 (A3)
Mn of compound (A3): 4,500
<Preparation of Surface Treatment Agent>
The compound (A1) was diluted with each compound (B) listed in Table 1 such that the concentration of the compound (A1) resulted in 1% by mass, thereby preparing surface treatment agents of Examples 1 to 7. In addition, the compound (A2) or (A3) was diluted with each compound (B) listed in Table 2 such that the concentration of the compound (A2) or (A3) resulted in 1% by mass, thereby preparing surface treatment agents of Examples 8 to 21. The compounds (B) used in Examples 1 to 21 are as follows.
<Formation of Surface-Treated Layer>
The Si substrate was immersed in a mixed solution of concentrated sulfuric acid/hydrogen peroxide water (35% concentration aqueous solution) (3/1, v/v) at 90° C. for 30 minutes in a glass petri dish. Then, the Si substrate was taken out and washed with distilled water, thereby forming a chemical oxide film-formed Si substrate. Subsequently, the chemical oxide film-formed Si substrate was immersed in a surface treatment agent (a solid content concentration is 1% by mass, and the solid content concentration represents an evaporation residue when heated at 120° C., which is the percent (%) by mass with respect to the surface treatment agent before heating) at 25° C. for 1 hour in a stainless steel petri dish. Thereafter, the Si substrate was taken out and baked at 140° C. for 30 minutes using a hot plate. Lastly, the substrate was washed with a fluorine-based solvent ASAHIKLIN AE-3000 (1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether, manufactured by AGC Inc.), thereby forming a Si substrate having a surface-treated layer formed thereon.
<Evaluation>
Film formability and water contact angle were evaluated by the methods described below.
An appearance of the Si substrate on which the surface-treated layer was formed was visually confirmed according to the following criteria. The obtained results are shown in Tables 1 and 2.
Cloudiness is observed on the substrate by visual inspection: B; Cloudiness is not observed: A.
In addition, the film formability was confirmed using an optical microscope (DSX10-UZH, Olympus Corporation) and evaluated according to the following criteria. Measurements were taken using a reflection method at a magnification of five times. The obtained results are shown in Tables 1 and 2.
Radial unevenness is observed: B; Radial unevenness is not observed: A.
Mottled pattern is observed: B; Mottled pattern is not observed: A.
(Water Contact Angle)
First, the surface of the surface-treated layer of the Si substrate on which the surface-treated layer was formed was wiped off and cleaned with BEMCOT (registered trademark) impregnated with ethanol. Then, a contact angle of about 2 μL of distilled water placed on the surface of the surface-treated layer was measured at 20° C. using a contact angle measurement device (DM-701 manufactured by Kyowa Interface Science Co., Ltd). Measurements were taken at five different points on the surface of the surface-treated layer, and the average value of the measurements was calculated, thereby obtaining the water contact angle. The θ/2 method was used for calculating the water contact angle. The obtained results are shown in Tables 1 and 2.
As is clear from the evaluation results shown in Table 1, it is understood that the surface-treated layers of Examples 2 to 7 are superior to the surface-treated layer of Example 1 in the observation results of the surface properties by visual observation and optical microscope observation. From these results, it may be said that the surface-treated layers of Examples 2 to 7 are excellent in flatness.
As is clear from the evaluation results shown in Table 2, it is understood that the surface-treated layers of Examples 9 to 14 are superior to the surface-treated layer of Example 8 in the observation results of the surface properties by visual observation and optical microscope observation. The same is true for Examples 16 to 21 compared to Example 15. From these results, it may be said that the surface-treated layers of Examples 9 to 14 and 16 to 21 are excellent in flatness.
The entire contents of the disclosures by Japanese Patent Application No. 2021-044129 filed on Mar. 17, 2021 are incorporated herein by reference.
All publications, patent applications, and technical standards mentioned in this specification are herein incorporated by reference to the same extent as if each individual publication, patent application, or technical standard was specifically and individually indicated to be incorporated by reference.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2021-044129 | Mar 2021 | JP | national |
This application is a Continuation of International Application No. PCT/JP2022/010408, filed on Mar. 9, 2022, which claims priority to Japanese Patent Application No. 2021-044129, filed on Mar. 17, 2021. The entire disclosure of each of the above applications is incorporated herein by reference.
| Number | Date | Country | |
|---|---|---|---|
| Parent | PCT/JP22/10408 | Mar 2022 | US |
| Child | 18367663 | US |
