The present embodiment relates to an apparatus for performing an electroplating process in a surface treatment. It should be noted that the apparatus of the present embodiment is not limited in use to an electroplating process, but can be used to perform a process that requires energization (electric action) in a surface treatment. Examples of such a process include a composite plating process, an anion electrodeposition coating process, a cation electrodeposition coating process, an acid electrolytic process, and an electropolishing process.
The treatment cell 2 is formed by a conductive base plate 23, a nonconductive bottom plate 24, an electrode ring 21 and a cover 25, which are superposed in this order from the bottom and are combined with bolts 26 that pass through the electrode ring 21, and has a flow-out means for flowing out the plating solution 4 from the inside of the treatment cell 2 to the outside thereof. The electrode ring 21 can be energized through the vertical rotation shaft 3, the base plate 23 and the bolts 26. In other words, in the present embodiment, the vertical rotation shaft 3, the base plate 23 and the bolts 26 constitute an energization means for energizing the electrode ring 21. Further, the plating process apparatus 1 is formed so as to energize the plating solution 4 within the treatment cell 2 from an electrode 45 while bringing small objects 100 into contact with the electrode ring 21 and circulating the plating solution 4 from the inside of the treatment cell 2 to the outside thereof through the flow-out means by rotating the treatment cell 2 containing the small objects 100, thereby performing a plating process on the small objects 100. In the plating process apparatus 1, the plating solution 4 is repeatedly used while being cycled by the cyclic means 40. Specifically, the plating solution 4 is discharged from a nozzle 41 to the inside of the treatment cell 2, flowed out and scattered from the treatment cell 2 through the flow-out means, received and collected by a case 42, and discharged from the nozzle 41 by a pump 43.
Sheet members 61, made of resin and having the same size, are arranged circumferentially at appropriate intervals between the bottom plate 24 and the electrode ring 21, and the sheet members 61 are sandwiched between the bottom plate 24 and the electrode ring 21, thus forming the gap channels 51 between the adjacent sheet members 61. In
The sheet members 61 each have an annular shape. Further, as shown in
A height dimension H (
It should be noted that, specifically, the sheet members 61 are formed by punching out a sheet, made of fluorine-contained resin such as PTFE, PFA or FEP, into a desired shape with a punch. The sheet made of such fluorine-contained resin is suitable for the sheet members 61 because it has the following properties (i) through (iii):
(i) It will not be thicken due to thermal expansion. Furthermore, it will not be thinned even when pressed from both sides.
(ii) It will not react with a plating solution.
(iii) It will not be damaged even if a mechanical stress exceeding the disruptive strength of this material is applied.
In the plating process apparatus 1 having the above-described structure, the plating solution 4 within the treatment cell 2 flows out through the gap channels 51 due to a centrifugal force caused by the rotation of the treatment cell 2. On the other-hand, since the height dimension H of each gap channel 51 is smaller than the minimum dimension of each small object 100, the gap channels 51 do not allow the small objects 100 to pass therethrough. Accordingly, the gap channels 51 each function as a filter that prevents the small objects 100 from passing therethrough but allows the plating solution 4 to pass therethrough. Therefore, the plating process apparatus 1 having the above-described structure can plate the small objects 100 without losing the small objects 100, and enables the cyclic use of the plating solution 4.
Furthermore, the plating process apparatus 1 of the present embodiment can solve the conventional problems as described below.
(1) Since a conventional porous ring made of sintered resin is not used, the breakage of the small objects 100 due to the collision thereof against the surface irregularities of the porous ring can be completely prevented. It should be noted that the small objects 100 might collide against inner inlet edges of the gap channels 51, whereas the impact applied to the small objects 100 due to this collision is believed to be extremely smaller than the case where the small objects 100 collide against the surface irregularities of the porous ring. Accordingly, the breakage of the small objects 100 can be suppressed.
(2) Since the breakage of the small objects 100 can be suppressed, the clogging of the gap channels 51 by broken pieces of the small objects 100 can be suppressed. In addition, the structure of the gap channels 51 is not as complicated as that of openings of a conventional porous ring, and therefore, the clogging is unlikely to occur. Accordingly, it is possible to suppress the unfavorable performance of a plating process resulting from the clogging of the gap channels 51.
Moreover, even if broken pieces of the small objects 100, broken pieces of the electrode, or dusts in air, for example, have clogged the gap channels 51, the treatment cell 2 can be easily disassembled and cleaned by detaching the bolts 26, and therefore, the clogging can be easily removed. Furthermore, since the treatment cell 2 can be used over and over by easily removing the clogging thereof, it does not have to be replaced with a new one unlike a conventional porous ring, and therefore, cost reduction can be achieved.
(3) Since a conventional porous ring made of sintered resin is not used, a cutting work operation for sintered resin is unnecessary. Accordingly, a reduction in the function of the flow-out means due to the heat generated during a cutting work never occurs in the present embodiment.
(4) If the small objects 100 are replaced with ones having smaller minimum dimensions, the height dimension H of each gap channel 51 must be set to be smaller; however, in that case, it is only necessary to replace the sheet members 61 with thinner ones. On the other hand, if the small objects 100 are replaced with ones having larger minimum dimensions, the height dimension H of each gap channel 51 is preferably set to be greater; however, in that case, it is only necessary to replace the sheet members 61 with thicker ones. It is easy to prepare the sheet members 61 having various thicknesses. Accordingly, even if the small objects 100 are replaced with ones having different dimensions, the gap channels 51 having correspondingly appropriate height dimensions H can be formed easily and economically. It should be noted that, in order to set the height dimension H of each gap channel 51 to be greater, a plurality of the sheet members 61 may be stacked as shown in
Further, if the circulation amount of the plating solution 4 per unit time (which will hereinafter be simply called a “circulation amount”) is desired to be adjusted, it is only necessary to change a width B of each gap channel 51, i.e., a distance B between the adjacent sheet members 61 (
(5) Since the thickness and the outer diameter D of each sheet member 61 can be set with accuracy, the height H and width B of each gap channel 51 can be set with accuracy. Accordingly, the functions of the gap channels 51 can be properly achieved, and therefore, the circulation amount of the plating solution 4 can be set with accuracy.
Moreover, the plating process apparatus 1 of the present embodiment can achieve the following effects:
(1) Since the sheet members 61 are made of resin, the cost is low.
(2) Since the sheet members 61 are made of resin, the plating is unlikely to be attached. Accordingly, the operation of removing the plating attached to an inner face of the treatment cell 2 can be simplified.
(3) Since the annular sheet members 61 are arranged to surround the through holes 211 for the bolts 26, the plating solution 4 will not be brought into contact with the bolts 26. Accordingly, the plating can be prevented from being attached to the bolts 26. Therefore, the operation of removing the plating can be simplified similarly to the above-mentioned effect (2).
(4) Since the outer shape of each sheet member 61 is circular, the size of each gap channel 51 between the adjacent sheet members 61 can be kept constant even if the sheet members 61 are arranged to face any direction. Accordingly, the functions of the gap channels 51 can be properly achieved.
(5) Since the outer diameter D of each sheet member 61 is equal to or smaller than the ring width W of the electrode ring 21, the sheet members 61 will not protrude into the inside of the treatment cell 2. If the sheet members 61 are protruded, the small objects 100 collide against the protruded portions, which is feared to cause the breakage of the small objects 100 and/or cause troubles in performing a plating process on the small objects 100; however, in the present embodiment, such fears can be dispelled because the sheet members 61 are not protruded.
It should be noted that, in the present embodiment, the following modified structures may further be adopted.
(1) The two or more sheet members 61 are provided so as to be stacked. For example, the two sheet members 61 are provided so as to be stacked as shown in
(2) As shown in
(3) In the case where the electrode ring 21 has a multilayer structure, the sheet members 61 are provided between electrode ring layers. In such a structure, since the gap channels 51 are formed between the electrode ring layers, the number of the gap channels 51 can be correspondingly increased with ease, and accordingly, the circulation amount of the plating solution 4 can be easily increased. For example, in the case where the electrode ring 21 has a two-layer structure as shown in
Furthermore, to the contrary, if the sheet members 61 are removed arbitrarily from between the bottom plate 24 and the electrode ring 21, and/or between the electrode ring 21 and the cover 25, and/or between the electrode ring layers, the number of the gap channels 51 can be correspondingly reduced easily, and accordingly, the circulation amount of the plating solution 4 can be easily reduced.
That is, the circulation amount of the plating solution 4 can be easily increased or decreased in a wide range.
(4) The sheet members 61 are not provided between the bottom plate 24 and the electrode ring 21, but provided between the electrode ring 21 and the cover 25 and/or between the electrode ring layers. In such a structure, the height position of each gap channel 51 can be easily changed. Even if the size and number of the formed gap channels 51 are the same, it is harder for the plating solution 4 to pass through the gap channels 51 located at high positions than to pass through the gap channels 51 located at low positions. Accordingly, the circulation amount of the plating solution 4 can be easily adjusted by changing the height position of each gap channel 51.
(5) As shown in
(6) As shown in
(7) The sheet members 61 made of metal are used. For example, titanium and/or stainless steel may be used as the metal. In such a structure, the working accuracy for the sheet members 61 is improved, and therefore, the gap channels 51 having more accurate sizes can be formed.
(8) Instead of the sheet members 61, adhesive tape members 62 are used. For example, as shown in
(9) In the case where the electrode ring 21 has a multilayer structure, the electrode ring layer(s) except any one of the electrode ring layers is/are made of resin. In such a structure, the working cost and material cost can be reduced. It should be noted that, even in such a structure, a plating process is performed because at least one of the electrode ring layers is conductive.
(10) The sheet members 61 are arranged circumferentially not at regular intervals but at appropriate intervals. In such a structure, the treatment cell 2 can be easily assembled, thus enabling cost reduction.
(11) The sheet members 61 having different sizes are arranged. In such a structure, it is possible to easily produce the sheet members 61 without concerning about accurate dimensions, thus enabling a reduction in the material cost.
(12) An arbitrary number of the sheet members 61 are provided. In such a structure, the number of the gap channels 51 can be easily changed. Accordingly, the circulation amount of the plating solution 4 can be easily adjusted.
(13) As shown in
(i) Since the peripheral edge portion 243 of the bottom plate 24 is protuberant, the amount of the small objects 100 contained in the treatment cell 2 can be correspondingly increased. Accordingly, the throughput of the plating process can be increased.
(ii) Since the inner face 2431 of the protuberant peripheral edge portion 243 of the bottom plate 24 is inclined downward and inward, it is easy to allow the small objects 100 to reach the electrode ring 21. Accordingly, the efficiency of the plating process can be improved. In addition, since the small objects 100 move along the inclined inner face 2431, it is possible to reduce the impact caused when the small objects 100 collide against the electrode ring 21. Accordingly, the breakage of the small objects 100 can be suppressed.
(iii) Since the bottom plate 24 is made of resin, the material cost is low, and a working process for making the peripheral edge portion 243 protuberant can be easily performed; in addition, the inclination angle of the peripheral edge portion 243 can be easily changed in accordance with the type of the small objects 100.
(iv) Since the inclination is formed on the nonconductive bottom plate 24, the change and/or concentration of the current distribution due to the inclination can be prevented.
(v) When the treatment cell 2 is rotated, the small objects 100 go up along the inner face 2431 due to a centrifugal force, and when the treatment cell 2 is stopped, the small objects 100 go down along the inner face 2431 due to gravity. That is, if the treatment cell 2 is rotated and stopped repeatedly, the small objects 100 go up and down along the inner face 2431. Accordingly, by repeatedly rotating and stopping the treatment cell 2, the agitation of the small objects 100 can be promoted, and a plating process can be uniformly performed on the small objects 100.
(14) As shown in
(15) As shown in
(16) The sheet members 61 are provided so as to be located distant from an inner circumferential face of the treatment cell 2. In such a structure, since a large inlet channel, communicated with the gap channels 51, is formed at the inner circumferential face of the treatment cell 2, the collision of the small objects 100 against the inlet peripheral edges of the gap channels 51 can be suppressed, and accordingly, the breakage of the small objects 100 can be suppressed.
The present embodiment relates to an apparatus for performing an electroplating process in a surface treatment. It should be noted that the apparatus of the present embodiment is not limited in use to an electroplating process, but can be used to perform a process that requires energization in a surface treatment. Examples of such a process include a composite plating process, an anion electrodeposition coating process, a cation electrodeposition coating process, an acid electrolytic process, and an electropolishing process.
In the present embodiment, a peripheral edge portion 243 of the bottom plate 24 is protuberant, and the abutment face 242 serves as an upper face of the peripheral edge portion 243. Further, an inner face 2431 of the peripheral edge portion 243 is inclined downward and inward.
In the bottom plate 24, the groove channels 521 with the same size are formed between adjacent through holes 241 and arranged circumferentially at regular intervals. The groove channels 521 are formed so as to traverse the upper face of the peripheral edge portion 243 of the bottom plate 24 from inside to outside. Accordingly, in the state where the electrode ring 21 is superposed on the bottom plate 24, the groove channels 521 constitute the gap channels 52 that pass through the treatment cell 2 from inside to outside.
The height dimension H (
The groove channels 521 can be formed by milling using a milling cutter, for example.
In the plating process apparatus 1 having the above-described structure, a plating solution 4 within the treatment cell 2 flows out through the gap channels 52 due to a centrifugal force caused by the rotation of the treatment cell 2. On the other hand, since the height dimension H of each gap channel 52 is smaller than the minimum dimension of each small object 100, the gap channels 52 do not allow the small objects 100 to pass therethrough. Accordingly, the gap channels 52 each function as a filter that prevents the small objects 100 from passing therethrough but allows the plating solution 4 to pass therethrough. Therefore, the plating process apparatus 1 having the above-described structure can perform a plating process on the small objects 100 without losing the small objects 100, and enables the cyclic use of the plating solution 4.
Furthermore, the plating process apparatus 1 of the present embodiment can solve the conventional problems as described below.
(1) Since a conventional porous ring made of sintered resin is not used, the breakage of the small objects 100 due to the collision thereof against the surface irregularities of the porous ring can be completely prevented. It should be noted that the small objects 100 might collide against inner inlet edges of the gap channels 52, whereas the impact applied to the small objects 100 due to the collision is believed to be extremely smaller than the case where the small objects 100 collide against the surface irregularities of the porous ring. Accordingly, the breakage of the small objects 100 can be suppressed.
(2) Since the breakage of the small objects 100 can be suppressed, the clogging of the gap channels 52 by broken pieces of the small objects 100 can be suppressed. In addition, the structure of the gap channels 52 is not as complicated as that of openings of a conventional porous ring, and therefore, the clogging is unlikely to occur. Accordingly, it is possible to suppress the unfavorable performance of a plating process resulting from the clogging of the gap channels 52.
Moreover, even if broken pieces of the small objects 100, broken pieces of the electrode, or dusts in air, for example, have clogged the gap channels 52, the treatment cell 2 can be easily disassembled and cleaned by detaching bolts 26, and therefore, the clogging can be easily removed. Furthermore, since the treatment cell 2 can be used over and over by easily removing the clogging thereof, it does not have to be replaced with a new one unlike a conventional porous ring, and therefore, cost reduction can be achieved.
(3) Since a conventional porous ring made of sintered resin is not used, a cutting work operation for sintered resin is unnecessary. Accordingly, a reduction in the function of the flow-out means due to the heat generated during a cutting work never occurs in the present embodiment.
(4) If the small objects 100 are replaced with ones having larger minimum dimensions, the height dimension H of each gap channel 52 is preferably set to be larger; however, in that case, it is only necessary to form the deeper groove channels 521. In other words, as long as the small objects 100 are gradually replaced with ones having larger minimum dimensions, the depth of each groove channel 521 is gradually increased, thus enabling the reuse of the flow-out means. Accordingly, the present embodiment is economical.
Further, if the circulation amount of the plating solution 4 is desired to be increased, it is only necessary to increase the widths B (
(5) Since the depth H and width B of each groove channel 521 can be set with accuracy, the height dimension H and width B (
Moreover, the plating process apparatus 1 of the present embodiment can achieve the following effects:
(1) Since the groove channels 521 are formed in the bottom plate 24 made of resin, the working cost for forming the groove channels 521 and the working cost for further deepening and/or widening the groove channels 521 are low.
(2) Since the groove channels 521 are formed between the adjacent through holes 241, the bolts 26 will not be exposed to the gap channels 52, and therefore, the plating solution 4 will not be brought into contact with the bolts 26. Accordingly, the plating can be prevented from being attached to the bolts 26. Therefore, the operation of removing the plating attached to the inside of the treatment cell 2 can be simplified.
(3) Since the groove channels 521 are formed between the adjacent through holes 241, a change in the height dimension H of each gap channel 52 associated with a change in the fastening force of the bolts 26 can be prevented.
(4) Since the peripheral edge portion 243 of the bottom plate 24 is protuberant and the inner face 2431 of the peripheral edge portion 243 is inclined downward and inward, the following effects can be achieved:
(i) Since the peripheral edge portion 243 of the bottom plate 24 is protuberant, the amount of the small objects 100 contained in the treatment cell 2 can be correspondingly increased. Accordingly, the throughput of the plating process can be increased.
(ii) Since the inner face 2431 of the protuberant peripheral edge portion 243 of the bottom plate 24 is inclined downward and inward, it becomes easy to allow the small objects 100 to reach the electrode ring 21. Accordingly, the efficiency of the plating process can be improved. In addition, since the small objects 100 move along the inclined inner face 2431, it is possible to reduce the impact caused when the small objects 100 collide against the electrode ring 21. Accordingly, the breakage of the small objects 100 can be suppressed.
(iii) Since the bottom plate 24 is made of resin, the material cost is low, and a working process for making the peripheral edge portion 243 protuberant can be easily performed; in addition, the inclination angle of the peripheral edge portion 243 can be easily changed in accordance with the type of the small objects 100.
(iv) Since the inclination is formed on the nonconductive bottom plate 24, the change and/or concentration of the current distribution due to the inclination can be prevented.
(v) When the treatment cell 2 is rotated, the small objects 100 go up along the inner face 2431 due to a centrifugal force, and when the treatment cell 2 is stopped, the small objects 100 go down along the inner face 2431 due to gravity. That is, if the treatment cell 2 is rotated and stopped repeatedly, the small objects 100 go up and down along the inner face 2431. Accordingly, by repeatedly rotating and stopping the treatment cell 2, the agitation of the small objects 100 can be promoted, and a plating process can be uniformly performed on the small objects 100.
It should be noted that, in the present embodiment, the following modified structures may further be adopted.
(1) As shown in
It should be noted that the groove channels 521 maybe formed at only one of the upper face and lower face of the electrode ring 21. In that case, the groove channels 521 are preferably formed at the abutment face 215 serving as the lower face. This is because, due to the influence of gravity, it is easier for the plating solution 4 to circulate through the gap channels 52 between the bottom plate 24 and the electrode ring 21, than to circulate through the gap channels 52 between the cover 25 and the electrode ring 21.
(2) The groove channels are formed at least at any one of the abutment faces of electrode ring layers of the electrode ring 21 having a multilayer structure. In such a structure, since the gap channels 52 are formed between the electrode ring layers, the number of the gap channels 52 can be correspondingly increased with ease, and accordingly, the circulation amount of the plating solution 4 can be easily increased. For example, as shown in
(3) As shown in
(4) A component whose peripheral edge portion 243 is not protuberant, i.e., a flat plate, is used as the bottom plate 24. In this case, the groove channels 521 are preferably formed in the electrode ring 21, and as shown in
(5)
(6) The groove channels 521 are formed so as to traverse the through holes 241, the through holes 211, or the through holes 251.
(7) In the case where the electrode ring 21 has a multilayer structure, the electrode ring layer(s) except any one of the electrode ring layers is/are made of resin. In such a structure, the working cost and material cost can be reduced. It should be noted that, even in such a structure, a plating process is performed because at least one of the electrode ring layers is conductive.
(8) An arbitrary number of the groove channels 521 are provided. In such a structure, the number of the gap channels 52 can be easily changed. Accordingly, the circulation amount of the plating solution 4 can be easily adjusted.
(9) The groove channels 521, each having an arbitrary width, are formed. In such a structure, the working cost can be reduced. Furthermore, the circulation amount of the plating solution 4 can be easily adjusted.
(10) As shown in
(11) As shown in
(12) As shown in
(13) As shown in
(14) As shown in
(15) As shown in
The present embodiment relates to an apparatus for performing a process that does not require energization to be carried out in a surface treatment. Examples of such a process include an immersion plating process, a chemical plating process, a chemical composite plating process, a degreasing process, a barrel polishing process, an alkaline immersion cleaning process, a pickling process, a chemical polishing process, a neutralization process, a draining-induced tarnish prevention process, a water-soluble resin process, and a chromate process. It should be noted that such a process may be performed using the apparatus of the first embodiment or second embodiment without carrying out energization.
The treatment cell 2 of the present embodiment is operated similarly to the treatment cell 2 of the first embodiment in performing a surface treatment on small objects 100 except that energization is not carried out. Specifically, a surface treatment solution within the treatment cell 2 flows out through the gap channels 51 due to a centrifugal force caused by the rotation of the treatment cell 2. On the other hand, since the height dimension of each gap channel 51 is smaller than the minimum dimension of each small object 100, the gap channels 51 do not allow the small objects 100 to pass therethrough. Accordingly, the gap channels 51 each function as a filter that prevents the small objects 100 from passing therethrough but allows the surface treatment solution to pass therethrough. Therefore, the surface treatment apparatus 1 having the above-described structure can perform a surface treatment on the small objects 100 without losing the small objects 100, and enables the cyclic use of the surface treatment solution.
The apparatus 1 of the present embodiment can also achieve the effects similar to those of the apparatus 1 of the first embodiment.
It should be noted that, as shown in
Furthermore, as shown in
The present embodiment relates to an apparatus for performing a process that does not require energization to be carried out in a surface treatment. Examples of such a process include an immersion plating process, a chemical plating process, a chemical composite plating process, a degreasing process, a barrel polishing process, an alkaline immersion cleaning process, a pickling process, a chemical polishing process, a neutralization process, a draining-induced tarnish prevention process, a water-soluble resin process, and a chromate process. It should be noted that such a process may be performed using the apparatus of the first embodiment or second embodiment without carrying out energization.
The treatment cell 2 of the present embodiment is operated similarly to the treatment cell 2 of the second embodiment in performing a surface treatment on small objects 100 except that energization is not carried out. Specifically, a surface treatment solution within the treatment cell 2 flows out through the gap channels 52 due to a centrifugal force caused by the rotation of the treatment cell 2. On the other hand, since the height dimension of each gap channel 52 is smaller than the minimum dimension of each small object 100, the gap channels 52 do not allow the small objects 100 to pass therethrough. Accordingly, the gap channels 52 each function as a filter that prevents the small objects 100 from passing therethrough but allows the surface treatment solution to pass therethrough. Therefore, the surface treatment apparatus 1 having the above-described structure can perform a surface treatment on the small objects 100 without losing the small objects 100, and enables the cyclic use of the surface treatment solution.
The apparatus 1 of the present embodiment can also achieve the effects similar to those of the apparatus 1 of the second embodiment.
It should be noted that, as shown in
Furthermore, as shown in
In the apparatuses 1 to which the first embodiment through fourth embodiment are applied as a flow-out means, an attachment and detachment means described below may be adopted. It should be noted that, hereinafter, the description will be made about the case where the attachment and detachment means is adopted in the apparatus 1 to which the first embodiment is applied.
The attachment and detachment means 7 is formed to include: a horizontal conductive receiving plate 71 fixed at an upper end of the vertical rotation shaft 3; a concave portion 72 formed at a rotational center of the receiving plate 71; a convex portion 73 provided at a rotational center of a lower face of a base plate 23 of the treatment cell 2; protrusive portions 74 provided at a plurality of positions of the receiving plate 71; and hole portions 75 formed at the base plate 23 and bottom plate 24 of the treatment cell 2. On the receiving plate 71, the treatment cell 2 is placeable. The concave portion 72 has a tapered form. The convex portion 73 is formed so as to be fitted into the concave portion 72. The protrusive portions 74 are each provided so as to be able to be protruded from an upper face of the receiving plate 71. The hole portions 75 are formed so that the protrusive portions 74, protruded from the upper face of the receiving plate 71, are fitted thereto. It should be noted that, at the receiving plate 71, the protrusive portions 74 are preferably located circumferentially at regular intervals, and the number of the protrusive portions 74 is preferably two, four, five, six or eight, for example. The number and location of the hole portions 75 correspond to those of the protrusive portions 74.
More specifically, the protrusive portions 74 are provided in the state where they are each urged upward by a spring 742 supported by a pin 743 within a recessed portion 741 provided at the receiving plate 71. An upper end face 740 of each protrusive portion 74 is spherical. Further, as shown in
Due to the above-described attachment and detachment means 7, the treatment cell 2 is fixed to the vertical rotation shaft 3 via the receiving plate 71 while the convex portion 73 is fitted into the concave portion 72 of the receiving plate 71 and the protrusive portions 74 of the receiving plate 71 are fitted into the hole portions 75. Furthermore, a rotational force of the vertical rotation shaft 3 is transmitted to the fixed treatment cell 2 via the receiving plate 71. Accordingly, the treatment cell 2 can be rotated together with the vertical rotation shaft 3 while being fixed to the vertical rotation shaft 3 via the receiving plate 71.
In the above-described attachment and detachment means 7, the convex portion 73 provided at the rotational center of the lower face of the base plate 23 of the treatment cell 2 is fitted into the concave portion 72 formed at the rotational center of the receiving plate 71, and therefore, the rotational center of the treatment cell 2 can be accurately positioned with respect to the vertical rotation shaft 3.
In addition, since the protrusive portions 74 are fitted into a plurality (in this embodiment, four) of the hole portions 75, a rotational force of the vertical rotation shaft 3 can be transmitted to the treatment cell 2 via the receiving plate 71 and the protrusive portions 74 with certainty.
Further, since the upper end face 740 of each protrusive portion 74 is spherical, the upper end of each protrusive portion 74 can be inserted into the hole portion 75 even before the protrusive portion 74 is completely opposed to the hole portion 75, as shown in
Moreover, no matter which direction the treatment cell 2 is oriented in, the treatment cell 2 can be placed onto the receiving plate 71 by only positioning the convex portion 73 with respect to the concave portion 72. This is because if the receiving plate 71, on which the treatment cell 2 is placed, is rotated, a slippage occurs between the receiving plate 71 and the base plate 23 to cause each protrusive portion 74 to slip into a position opposite to the hole portion 75, and then the protrusive portions 74 are fitted into the hole portions 75.
Furthermore, according to the present embodiment, the treatment cell 2 can be detached from the vertical rotation shaft 3 due to the attachment and detachment means 7, and therefore, it is possible to easily perform the removal of the small objects 100 within the treatment cell 2, and/or the disassembly, assembly, cleaning and the like of the treatment cell 2.
Also, in the state where the treatment cell 2 is placed onto the receiving plate 71, a most part of the conductive base plate 23 is abutted against the entire upper face of the conductive receiving plate 71, and therefore, energization can be stably carried out from the vertical rotation shaft 3 to the electrode ring 21.
It should be noted that the attachment and detachment means 7 is also naturally applicable to surface treatment apparatuses to which the first embodiment through fourth embodiment are not applied.
In the attachment and detachment means 7, the convex portion 73 may be provided on the receiving plate 71 and the concave portion 72 may be provided at the base plate 23. The protrusive portion 74 may be provided at the base plate 23 and the hole portion 75 may be provided on the receiving plate 71.
The plating process apparatuses for small objects according to the present invention can solve all the various conventional problems, and are thus industrially very valuable.
Number | Date | Country | Kind |
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2006-186569 | Jul 2006 | JP | national |