Claims
- 1. A process for preparing a compound of formula I:
- 2. The process of claim 1 wherein said compound of formula XI in step (i) is converted to the compound of formula XII:
- 3. The process of claim 1 wherein substituent A is Br.
- 4. The process of claim 1 wherein G represents a protecting group selected from the group consisting of: silylating reagents and esters.
- 5. The process of claim 1 wherein the acid in said compound of formula XI is selected from the group consisting of: sulfonic acids, tartaric acids, H2SO4, HCl, H3PO4, HBr, and carboxylic acids, and mixtures thereof.
- 6. The process of claim 1 wherein step (a) comprises reacting said compound of formula II with a suitable acid chloride in a suitable solvent at a suitable temperature, and then reacting the resulting reaction mixture with dimethylamine.
- 7. The process of claim 1, wherein step (b) comprises making a mixture of said compound of formula IV, a hydrogenation catalyst, and a suitable base, and pressurizing the mixture under H2 pressure.
- 8. The process of claim 1 wherein step (c) comprises adding 3,4-dialkoxy-3-cyclobutene-1,2-dione to said compound of formula IV(i) from step (b), adjusting the temperature to about 0° C. to about 80° C. to yield a compound of formula V.
- 9. The process of claim 1 wherein step (d) comprises mixing a solution of R-2-(−)-phenylglycinol with said compound of formula III, and heating the resulting solution at reflux with azeotropic removal of water to provide the imine compound of Formula VI.
- 10. The process of claim 1 wherein step (e) comprises mixing an acid and a silylating reagent with the compound of formula VI from step (d), and heating the solution at reflux to provide a protected imine compound of formula VII.
- 11. The process of claim 1 wherein the organometallic reagent, in step (f), is in a suitable solvent, and said organometallic reagent is selected from the group consisting of: diethyl zinc, ethylzinc bromide, ethylzinc chloride, ethylmagnesium bromide, ethylmagnesium chloride and ethylithium.
- 12. The process of claim 1 wherein step (g) comprises deprotecting the imine compound of formula VIII from step (f) with an acid, followed by treatment with a base to form said compound of formula IX.
- 13. The process of claim 1 wherein step (h) comprises dissolving the compound of formula IX in a suitable solvent, adding R4NH2, and, following the addition of said R4NH2, adding an additional agent selected from the group consisting of: NaIO4, Pb(OAc)4, H5IO6, and mixtures thereof, wherein R4 is selected from the group consisting of alkyl, cycloalkyl, heterocycloalkyl, aryl, heteroaryl, and aralkyl, to provide the intermediate compound of formula X.
- 14. The process of claim 1 wherein step (i) comprises (1) dissolving said intermediate compound of formula X from step (h) in a suitable solvent, and (2) adding a suitable acid to provide a compound of formula XI.
- 15. The process of claim 1 wherein step (j) comprises combining the compound of formula XI from step (i), the compound of formula V from step (c), a suitable base and a suitable solvent, and heating the resulting reaction mixture to produce the compound of formula I.
- 16. The process of claim 1 wherein in step (k) a catalytic amount of base is used in the reaction of the compound of formula V with the compound of formula XII.
- 17. The process of claim 1 wherein:
(1) Substituent A is Br; (2) G represents a protecting group selected from the group consisting of: silylating reagents and esters; (3) Step (a) comprises reacting said compound of formula II with a suitable acid chloride in a suitable solvent at a suitable temperature, and then reacting the resulting reaction mixture with dimethylamine; (4) Step (b) comprises making a mixture of said compound of formula IV, a hydrogenation catalyst, and a suitable base, and pressurizing the mixture under H2 pressure; (5) Step (c) comprises adding 3,4-dialkoxy-3-cyclobutene-1,2-dione to said compound of formula IV(i) from step (b), adjusting the temperature to about 0° C. to about 80° C. to yield a compound of formula V; (6) Step (d) comprises mixing a solution of R-2-(−)-phenylglycinol with said compound of formula II, and heating the resulting solution at reflux with azeotropic removal of water to provide the imine compound of Formula VI; (7) Step (e) comprises mixing an acid and a silylating reagent with the compound of formula VI from step (d), and heating the solution at reflux to provide a protected imine compound of formula VII; (8) The organometallic reagent, in step (f), is in a suitable solvent, and said organometallic reagent is selected from the group consisting of: diethyl zinc, ethylzinc bromide, ethylzinc chloride, ethylmagnesium bromide, ethylmagnesium chloride and ethylithium; (9) Step (g) comprises deprotecting the imine compound of formula VIII from step (f) with an acid, followed by treatment with a base to form said compound of formula IX; (10) Step (h) comprises dissolving the compound of formula IX in a suitable solvent, adding R4NH2, and, following the addition of said R4NH2, adding an additional agent selected from the group consisting of: NaIO4, Pb(OAc)4, H5IO6, and mixtures thereof, wherein R4 is selected from the group consisting of alkyl, cycloalkyl, heterocycloalkyl, aryl, heteroaryl, and aralkyl, to provide the intermediate compound of formula X; (11) Step (i) comprises (1) dissolving said intermediate compound of formula X from step (h) in a suitable solvent, and (2) adding a suitable acid to provide a compound of formula XI; (12) Step (j) comprises combining the compound of formula XI from step (i), the compound of formula V from step (c), a suitable base and a suitable solvent, and heating the resulting reaction mixture to produce the compound of formula I; and (13) Step (k) comprises using a catalytic amount of base in the reaction of the compound of formula V with the compound of formula XII.
- 18. The process of claim 17 wherein:
(1) said solvent used with said acid chloride in step (a) is selected from the group consisting of: acetonitrile, THF, t-butylmethylether, methylenechloride, toluene, ethylacetate, diethylether, and chloroform; (2) said acid chloride in step (a) is selected from the group consisting of: thionyl chloride and oxalyl chloride; (3) said dimethylamine in step (a) is a solution of dimethylamine wherein the solvent used in said dimethylamine solution is selected from the group consisting of: acetonitrile, THF, t-butylmethylether, methylenechloride, toluene, ethylacetate, diethylether, and chloroform; (4) said suitable base in step (b) is selected from the group consisting of: KOH, NaOH, Na2CO3, K2CO3, NaHCO3, KHCO3, tetramethylguanidine, DBU, diisopropylethylamine and mixtures thereof; (5) said hydrogenation catalyst in step (b) is selected from the group consisting of: Pd/C, Pt/C, PdOH, and raney nickel; (6) said 3,4-dialkoxy-3-cyclobutene-1,2-dione in step (c) is 3,4-diethoxy-3-cyclobutene-1,2-dione; (7) said acid in step (e) is selected from the group consisting of: ammonium sulphate, ammonium nitrate, ammonium chloride, H2SO4, HCl, H3PO4, citric acid, mesylchloride, paratoluenesulfonic acid, paratoluenesulfonic acid pyridium salt, alkylsulfonic acid, and mixtures thereof; (8) said silylating reagent in step (e) is selected from the group consisting of: hexamethyldisilazane, TMS chloride, and TMSOTF, wherein said TMS chloride is used in combination with triethylamine, and said TMSOTF is used in combination with triethylamine; (9) said suitable solvent in step (f) is selected from the group consisting of: benzene, toluene, TBME, THF, DME, dimethoxyethane, and mixtures thereof; (10) said acid in step (g) is selected from the group consisting of: H2SO4, HCl, H3PO4, citric acid, ammonium chloride, and mixtures thereof; (11) said base in step (g) is selected from the group consisting of: ammonium hydroxide, metal hydroxide, metal oxide, metal carbonate, metal bicarbonate, and mixtures thereof, wherein said metal is selected from the group consisting of: lithium, sodium, potassium, rubidium, cesium, beryllium, magnesium, calcium, strontium, barium, aluminum, indium, thallium, titanium, zirconium, cobalt, copper, silver, zinc cadmium, mercury and cerium; (12) said acid in step (i) is selected from the group consisting of: sulfonic acids, tartaric acids, H2SO4, HCl, H3PO4, HBr, and carboxylic acids and mixtures thereof; and (14) said base in step (k) is selected from the group consisting of: pyridine and N(R3)3, wherein each R3 is independently selected from the group consisting of: alkyl, aryl and arylalkyl.
- 19. The Process of claim 18 wherein said acid in step (i) is a sulfonic acid selected from the group consisting of: paratoluene sulfonic acid and alkylsulfonic acid;
- 20. The process of claim 19 wherein said acid is paratoluene sulfonic acid.
- 21. The process of claim 18 wherein:
(1) said acid chloride in step (a) is thionyl chloride; (2) said solvent used with said acid chloride in step (a) is acetonitrile; (3) said hydrogenation catalyst in step (b) is Pd/C; (4) said acid in step (i) is paratoluene sulfonic acid; and (5) said base in step (k) is diisopropylethylamine;
- 22. The process of claim 18 wherein step (c) further comprises adding a base to the compound of formula IV(i), wherein said base is selected from the group consisting of: KOH, NaOH, Na2CO3, K2CO3, NaHCO3, KHCO3, tetramethylguanidine, DBU, diisopropylethylamine and mixtures thereof.
- 23. The process of claim 20 wherein step (c) further comprises adding a base to the compound of formula IV(i), wherein said base is selected from the group consisting of: KOH, NaOH, Na2CO3, K2CO3, NaHCO3, KHCO3, tetramethylguanidine, DBU, diisopropylethylamine and mixtures thereof.
- 24. The process of claim 21 wherein step (c) further comprises adding a base to the compound of formula IV(i), wherein said base is selected from the group consisting of: KOH, NaOH, Na2CO3, K2CO3, NaHCO3, KHCO3, tetramethylguanidine, DBU, diisopropylethylamine and mixtures thereof.
- 25. The process of claim 18 wherein:
(1) said dimethlyamine in step (a) is at a concentration of at least 1 molar equivalent with respect to said compound of formula 11; (2) said H2 pressure in step (b) is from about 10 to about 500 psi; (3) said 3,4-diethalkoxy-3-cyclobutene-1,2-dione in step (c) is at least 1 molar equivalent with respect to the compound of formula IV(i); (4) said R-2-(−)-phenylglycinol in step (d) is at least about 0.01 molar equivalent with respect to said compound of formula III; (5) said acid in step (e) is at least about 0.2 molar equivalent with respect to the compound of formula VI; and (6) said organometallic reagent in step (f) is from about 0.1 to about 5 molar equivalents with respect to said compound of formula VII.
- 26. The process of claim 21 wherein:
(1) said dimethlyamine in step (a) is at a concentration of at least 1 molar equivalent with respect to said compound of formula II; (2) said H2 pressure in step (b) is from about 10 to about 500 psi; (3) said 3,4-diethalkoxy-3-cyclobutene-1,2-dione in step (c) is at least 1 molar equivalent with respect to the compound of formula IV(i); (4) said R-2-(−)-phenylglycinol in step (d) is at least about 0.01 molar equivalent with respect to said compound of formula III; (5) said acid in step (e) is at least about 0.2 molar equivalent with respect to the compound of formula VI; and (6) said organometallic reagent in step (f) is from about 0.1 to about 5 molar equivalents with respect to said compound of formula VII.
- 27. The process of claim 22 wherein:
(1) said dimethlyamine in step (a) is at a concentration of at least 1 molar equivalent with respect to said compound of formula II; (2) said H2 pressure in step (b) is from about 10 to about 500 psi; (3) said 3,4-diethalkoxy-3-cyclobutene-1,2-dione in step (c) is at least 1 molar equivalent with respect to the compound of formula IV(i); (4) said R-2-(−)-phenylglycinol in step (d) is at least about 0.01 molar equivalent with respect to said compound of formula III; (5) said acid in step (e) is at least about 0.2 molar equivalent with respect to the compound of formula VI; and (6) said organometallic reagent in step (f) is from about 0.1 to about 5 molar equivalents with respect to said compound of formula VII.
- 28. The process of claim 21 wherein the compound of formula I is produced in step (k) by reacting the compound of formula XII with the compound of formula V.
- 29. The process of claim 25 wherein the compound of formula I is produced in step (k) by reacting the compound of formula XII with the compound of formula V.
- 30. The process of claim 26 wherein the compound of formula I is produced in step (k) by reacting the compound of formula XII with the compound of formula V.
- 31. The process of claim 27 wherein the compound of formula I is produced in step (k) by reacting the compound of formula XII with the compound of formula V.
- 32. A process for making a compound of formula V:
- 33. The process of claim 32 wherein substituent A is Br.
- 34. The process of claim 32 wherein step (a) comprises reacting said compound of formula II with a suitable acid chloride in a suitable solvent at a suitable temperature, and then reacting the resulting reaction mixture with dimethylamine.
- 35. The process of claim 32, wherein step (b) comprises making a mixture of said compound of formula IV, a hydrogenation catalyst, and a suitable base, and pressurizing the mixture under H2 pressure.
- 36. The process of claim 32 wherein step (c) comprises adding 3,4-dialkoxy-3-cyclobutene-1,2-dione to said compound of formula IV(i) from step (b), adjusting the temperature to about 0° C. to about 80° C. to yield a compound of formula V.
- 37. The process of claim 32 wherein step (c) further comprises adding a base to the compound of formula IV(i), wherein said base is selected from the group consisting of: KOH, NaOH, Na2CO3, K2CO3, NaHCO3, KHCO3, tetramethylguanidine, DBU, diisopropylethylamine and mixtures thereof.
- 38. The process of claim 32 wherein:
(1) said substituent A is Br; (2) step (a) comprises reacting said compound of formula II with a suitable acid chloride in a suitable solvent at a suitable temperature, and then reacting the resulting reaction mixture with dimethylamine; said solvent used with said acid chloride is selected from the group consisting of: acetonitrile, THF, t-butylmethylether, methylenechloride, toluene, ethylacetate, diethylether, and chloroform; said acid chloride is selected from the group consisting of: thionyl chloride and oxalyl chloride; and said dimethylamine is dimethylamine gas or a solution of dimethylamine wherein the solvent used in said dimethylamine solution is selected from the group consisting of: acetonitrile, THF, t-butylmethylether, methylenechloride, toluene, ethylacetate, diethylether, and chloroform; (3) step (b) comprises making a mixture of said compound of formula IV, a hydrogenation catalyst, and a suitable base, and pressurizing the mixture under H2 pressure; said suitable base is selected from the group consisting of: KOH, NaOH, Na2CO3, K2CO3, NaHCO3, KHCO3, tetramethylguanidine, DBU, diisopropylethylamine and mixtures thereof; and said hydrogenation catalyst is selected from the group consisting of: Pd/C, Pt/C, PdOH, and raney nickel; and (4) step (c) comprises adding 3,4-dialkoxy-3-cyclobutene-1,2-dione to said compound of formula IV(i) from step (b), adjusting the temperature to about 0° C. to about 80° C. to yield a compound of formula V; said 3,4-dialkoxy-3-cyclobutene-1,2-dione is 3,4-diethoxy-3-cyclobutene-1,2-dione.
- 39. The process of claim 38 wherein:
(1) said acid chloride in step (a) is thionyl chloride; (2) said solvent used with said acid chloride in step (a) is acetonitrile; and (3) said hydrogenation catalyst in step (b) is Pd/C
- 40. The process of claim 39 wherein step (c) further comprises adding a base to the compound of formula IV(i), wherein said base is selected from the group consisting of: KOH, NaOH, Na2CO3, K2CO3, NaHCO3, KHCO3, tetramethylguanidine, DBU, diisopropylethylamine and mixtures thereof.
- 41. The process of claim 40 wherein:
(1) said dimethlyamine in step (a) is at a concentration of at least 1 molar equivalent with respect to said compound of formula II; (2) said H2 pressure in step (b) is from about 10 to about 500 psi; and (3) said 3,4-diethalkoxy-3-cyclobutene-1,2-dione in step (c) is at least 1 molar equivalent with respect to the compound of formula IV(i).
- 42. The process of claim 41 wherein step (c) further comprises adding a base to the compound of formula IV(i), wherein said base is selected from the group consisting of: KOH, NaOH, Na2CO3, K2CO3, NaHCO3, KHCO3, tetramethylguanidine, DBU, diisopropylethylamine and mixtures thereof.
- 43. A process for making a compound of formula XI or XII:
- 44. The process of claim 43 wherein G represents a protecting group selected from the group consisting of: silylating reagents and esters.
- 45. The process of claim 43 wherein the acid in said compound of formula XI is selected from the group consisting of: sulfonic acids, tartaric acids, H2SO4, HCl, H3PO4, HBr, and carboxylic acids, and mixtures thereof.
- 46. The process of claim 43 wherein step (a) comprises mixing a solution of R-2-(−)-phenylglycinol with said compound of formula III, and heating the resulting solution at reflux with azeotropic removal of water to provide the imine compound of Formula VI.
- 47. The process of claim 43 wherein step (b) comprises mixing an acid and a silylating reagent with the compound of formula VI from step (a), and heating the solution at reflux to provide a protected imine compound of formula VII.
- 48. The process of claim 43 wherein the organometallic reagent, in step (c), is in a suitable solvent, and said organometallic reagent is selected from the group consisting of: diethyl zinc, ethylzinc bromide, ethylzinc chloride, ethylmagnesium bromide, ethylmagnesium chloride and ethylithium.
- 49. The process of claim 43 wherein step (d) comprises deprotecting the imine compound of formula VIII from step (c) with an acid, followed by treatment with a base to form said compound of formula IX.
- 50. The process of claim 43 wherein step (e) comprises dissolving the compound of formula IX in a suitable solvent, adding R4NH2, and, following the addition of said R4NH2, adding an additional agent selected from the group consisting of: NaIO4, Pb(OAc)4, H5IO6, and mixtures thereof, wherein R4 is selected from the group consisting of alkyl, cycloalkyl, heterocycloalkyl, aryl, heteroaryl, and aralkyl, to provide the intermediate compound of formula X.
- 51. The process of claim 43 wherein step (f) comprises (1) dissolving said intermediate compound of formula X from step (e) in a suitable solvent, and (2) adding a suitable acid to provide a compound of formula XI.
- 52. The process of claim 43 wherein:
(1) Step (a) comprises mixing a solution of R-2-(−)-phenylglycinol with said compound of formula III, and heating the resulting solution at reflux with azeotropic removal of water to provide the imine compound of Formula VI; (2) Step (b) comprises mixing an acid and a silylating reagent with the compound of formula VI from step (a), and heating the solution at reflux to provide a protected imine compound of formula VII; (3) The organometallic reagent, in step (c), is in a suitable solvent, and said organometallic reagent is selected from the group consisting of: diethyl zinc, ethylzinc bromide, ethylzinc chloride, ethylmagnesium bromide, ethylmagnesium chloride and ethylithium; (4) Step (d) comprises deprotecting the imine compound of formula VIII from step (c) with an acid, followed by treatment with a base to form said compound of formula IX; (5) Step (e) comprises dissolving the compound of formula IX in a suitable solvent, adding R4NH2, and, following the addition of said R4NH2, adding an additional agent selected from the group consisting of: NaIO4, Pb(OAc)4, H5IO6, and mixtures thereof, wherein R4 is selected from the group consisting of alkyl, cycloalkyl, heterocycloalkyl, aryl, heteroaryl, and aralkyl, to provide the intermediate compound of formula X; and (6) Step (f) comprises (1) dissolving said intermediate compound of formula X from step (e) in a suitable solvent, and (2) adding a suitable acid to provide a compound of formula XI.
- 53. The process of claim 52 wherein:
(1) said acid in step (b) is selected from the group consisting of: ammonium sulphate, ammonium nitrate, ammonium chloride, H2SO4, HCl, H3PO4, citric acid, mesylchloride, paratoluenesulfonic acid, paratoluenesulfonic acid pyridium salt, alkylsulfonic acid, and mixtures thereof; (2) said silylating reagent in step (b) is selected from the group consisting of: hexamethyldisilazane, TMS chloride, and TMSOTF, wherein said TMS chloride is used in combination with triethylamine, and said TMSOTF is used in combination with triethylamine; (3) said suitable solvent in step (c) is selected from the group consisting of: benzene, toluene, TBME, THF, DME, dimethoxyethane, and mixtures thereof; (4) said acid in step (d) is selected from the group consisting of: H2SO4, HCl, H3PO4, citric acid, ammonium chloride, and mixtures thereof; (5) said base in step (d) is selected from the group consisting of: ammonium hydroxide, metal hydroxide, metal oxide, metal carbonate, metal bicarbonate, and mixtures thereof, wherein said metal is selected from the group consisting of: lithium, sodium, potassium, rubidium, cesium, beryllium, magnesium, calcium, strontium, barium, aluminum, indium, thallium, titanium, zirconium, cobalt, copper, silver, zinc cadmium, mercury and cerium; and (6) said acid in step (f) is selected from the group consisting of: sulfonic acids, tartaric acids, H2SO4, HCl, H3PO4, HBr, and carboxylic acids, and mixtures thereof; and
- 54. The process of claim 53 wherein:
(1) said R-2-(−)-phenylglycinol in step (a) is at least about 0.01 molar equivalent with respect to said compound of formula III; (2) said acid in step (b) is at least about 0.2 molar equivalent with respect to the compound of formula VI; (3) said organometallic reagent in step (c) is from about 0.1 to about 5 molar equivalents with respect to said compound of formula VII; and (4) said acid in step (d) is paratoluene sulfonic acid.
- 55. A process for making a compound of the formula:
- 56. The process of claim 55 wherein substituent A is Br.
- 57. The process of claim 55 comprising reacting said compound of formula II with a suitable acid chloride in a suitable solvent at a suitable temperature, and then reacting the resulting reaction mixture with dimethylamine.
- 58. The process of claim 55 wherein:
(1) said substituent A is Br; (2) said compound of formula II is reacted with a suitable acid chloride in a suitable solvent at a suitable temperature, and then the resulting reaction mixture is reacted with dimethylamine; said solvent used with said acid chloride is selected from the group consisting of: acetonitrile, THF, t-butylmethylether, methylenechloride, toluene, ethylacetate, diethylether, and chloroform; said acid chloride is selected from the group consisting of: thionyl chloride and oxalyl chloride; and said dimethylamine is dimethylamine gas or a solution of dimethylamine wherein the solvent used in said dimethylamine solution is selected from the group consisting of: acetonitrile, THF, t-butylmethylether, methylenechloride, toluene, ethylacetate, diethylether, and chloroform.
- 59. The process of claim 58 wherein:
(1) said acid chloride in step (a) is thionyl chloride; (2) said solvent used with said acid chloride in step (a) is acetonitrile; and (3) said dimethlyamine in step (a) is at a concentration of at least 1 molar equivalent with respect to said compound of formula II.
- 60. A process for making a compound of formula IV(i):
- 61. The process of claim 60 wherein substituent A is Br.
- 62. The process of claim 60 wherein step (a) comprises reacting said compound of formula II with a suitable acid chloride in a suitable solvent at a suitable temperature, and then reacting the resulting reaction mixture with dimethylamine.
- 63. The process of claim 60, wherein step (b) comprises making a mixture of said compound of formula IV, a hydrogenation catalyst, and a suitable base, and pressurizing the mixture under H2 pressure.
- 64. The process of claim 60 wherein:
(1) said substituent A is Br; (2) step (a) comprises reacting said compound of formula II with a suitable acid chloride in a suitable solvent at a suitable temperature, and then reacting the resulting reaction mixture with dimethylamine; said solvent used with said acid chloride is selected from the group consisting of: acetonitrile, THF, t-butylmethylether, methylenechloride, toluene, ethylacetate, diethylether, and chloroform; said acid chloride is selected from the group consisting of: thionyl chloride and oxalyl chloride; and said dimethylamine is dimethylamine gas or a solution of dimethylamine wherein the solvent used in said dimethylamine solution is selected from the group consisting of: acetonitrile, THF, t-butylmethylether, methylenechloride, toluene, ethylacetate, diethylether, and chloroform; and (3) step (b) comprises making a mixture of said compound of formula IV, a hydrogenation catalyst, and a suitable base, and pressurizing the mixture under H2 pressure; said suitable base is selected from the group consisting of: KOH, NaOH, Na2CO3, K2CO3, NaHCO3, KHCO3, tetramethylguanidine, DBU, diisopropylethylamine and mixtures thereof; and said hydrogenation catalyst is selected from the group consisting of: Pd/C, Pt/C, PdOH, and raney nickel.
- 65. The process of claim 64 wherein:
(1) said acid chloride in step (a) is thionyl chloride; (2) said solvent used with said acid chloride in step (a) is acetonitrile; (3) said dimethlyamine in step (a) is at a concentration of at least 1 molar equivalent with respect to said compound of formula II; (4) said hydrogenation catalyst in step (b) is Pd/C (5) said H2 pressure in step (b) is from about 10 to about 500 psi.
- 66. A process for preparing a compound of the formula XIII:
- 67. The process of claim 66 wherein:
(1) Step (a) comprises mixing a solution of R-2-(−)-phenylglycinol with said compound of formula III, and heating the resulting solution at reflux with azeotropic removal of water to provide the imine compound of Formula VI; (2) Step (b) comprises mixing an acid and a silylating reagent with the compound of formula VI from step (a), and heating the solution at reflux to provide a protected imine compound of formula VII; (3) The organometallic reagent, in step (c), is in a suitable solvent, and said organometallic reagent is selected from the group consisting of: diethyl zinc, ethylzinc bromide, ethylzinc chloride, ethylmagnesium bromide, ethylmagnesium chloride and ethylithium; (4) Step (d) comprises deprotecting the imine compound of formula VIII from step (c) with an acid, followed by treatment with a base to form said compound of formula IX; (5) Step (e) comprises dissolving the compound of formula IX in a suitable solvent, adding R4NH2, and, following the addition of said R4NH2, adding an additional agent selected from the group consisting of: NaIO4, Pb(OAc)4, H5IO6, and mixtures thereof, wherein R4 is selected from the group consisting of alkyl, cycloalkyl, heterocycloalkyl, aryl, heteroaryl, and aralkyl, to provide the intermediate compound of formula X; (6) Step (f) comprises (1) dissolving said intermediate compound of formula X from step (e) in a suitable solvent, and (2) adding a suitable acid to provide a compound of formula XI, and then adding 3,4-dialkoxy-3-cyclobutene-1,2-dione to said compound of formula XI, adjusting the temperature to about 0° C. to about 80° C. to yield a compound of formula XIII; and (7) Step (g) comprises reacting the compound of formula XII, in a suitable solvent with a catalytic amount of a suitable base, with a 3,4-dialkoxy-3-cyclobutene-1,2-dione to yield a compound formula XIII.
- 68. The process of claim 67 wherein:
(1) said acid in step (b) is selected from the group consisting of: ammonium sulphate, ammonium nitrate, ammonium chloride, H2SO4, HCl, H3PO4, citric acid, mesylchloride, paratoluenesulfonic acid, paratoluenesulfonic acid pyridium salt, alkylsulfonic acid, and mixtures thereof; (2) said silylating reagent in step (b) is selected from the group consisting of: hexamethyldisilazane, TMS chloride, and TMSOTF, wherein said TMS chloride is used in combination with triethylamine, and said TMSOTF is used in combination with triethylamine; (3) said suitable solvent in step (c) is selected from the group consisting of: benzene, toluene, TBME, THF, DME, dimethoxyethane, and mixtures thereof; (4) said acid in step (d) is selected from the group consisting of: H2SO4, HCl, H3PO4, citric acid, ammonium chloride, and mixtures thereof; (5) said base in step (d) is selected from the group consisting of: ammonium hydroxide, metal hydroxide, metal oxide, metal carbonate, metal bicarbonate, and mixtures thereof, wherein said metal is selected from the group consisting of: lithium, sodium, potassium, rubidium, cesium, beryllium, magnesium, calcium, strontium, barium, aluminum, indium, thallium, titanium, zirconium, cobalt, copper, silver, zinc cadmium, mercury and cerium; and (6) said acid in step (f) is selected from the group consisting of: sulfonic acids, tartaric acids, H2SO4, HCl, H3PO4, HBr, and carboxylic acids, and mixtures thereof; and (7) said base in step (g) is selected from the group consisting of: pyridine and N(R3)3, wherein each R3 is independently selected from the group consisting of: alkyl, aryl and arylalkyl.
- 69. The process of claim 68 wherein:
(1) said R-2-(−)-phenylglycinol in step (a) is at least about 0.01 molar equivalent with respect to said compound of formula III; (2) said acid in step (b) is at least about 0.2 molar equivalent with respect to the compound of formula VI; (3) said organometallic reagent in step (c) is from about 0.1 to about 5 molar equivalents with respect to said compound of formula VII; (4) said acid in step (d) is paratoluene sulfonic acid; and (5) said base in step (g) is diisopropylethylamine.
- 70. A process for producing a compound of the formula I:
- 71. The process of claim 70 wherein:
(1) Step (a) comprises mixing a solution of R-2-(−)-phenylglycinol with said compound of formula III, and heating the resulting solution at reflux with azeotropic removal of water to provide the imine compound of Formula VI; (2) Step (b) comprises mixing an acid and a silylating reagent with the compound of formula VI from step (a), and heating the solution at reflux to provide a protected imine compound of formula VII; (3) The organometallic reagent, in step (c), is in a suitable solvent, and said organometallic reagent is selected from the group consisting of: diethyl zinc, ethylzinc bromide, ethylzinc chloride, ethylmagnesium bromide, ethylmagnesium chloride and ethylithium; (4) Step (d) comprises deprotecting the imine compound of formula VIII from step (c) with an acid, followed by treatment with a base to form said compound of formula IX; (5) Step (e) comprises dissolving the compound of formula IX in a suitable solvent, adding R4NH2, and, following the addition of said R4NH2, adding an additional agent selected from the group consisting of: NaIO4, Pb(OAc)4, H5IO6, and mixtures thereof, wherein R4 is selected from the group consisting of alkyl, cycloalkyl, heterocycloalkyl, aryl, heteroaryl, and aralkyl, to provide the intermediate compound of formula X; (6) Step (f) comprises (1) dissolving said intermediate compound of formula X from step (e) in a suitable solvent, and (2) adding a suitable acid to provide a compound of formula XI, and then adding 3,4-dialkoxy-3-cyclobutene-1,2-dione to said compound of formula XI, adjusting the temperature to about 0° C. to about 80° C. to yield a compound of formula XIII; (7) Step (g) comprises reacting the compound of formula XII, in a suitable solvent with a catalytic amount of a suitable base, with a 3,4-dialkoxy-3-cyclobutene-1,2-dione to yield a compound formula XIII; (8) Substituent A is Br in step (i); (9) Step (i) comprises reacting said compound of formula II with a suitable acid chloride in a suitable solvent at a suitable temperature, and then reacting the resulting reaction mixture with dimethylamine; (10) step (j) comprises making a mixture of said compound of formula IV, a hydrogenation catalyst, and a suitable base, and pressurizing the mixture under H2 pressure; (11) Step (k) comprises reacting the compound of formula XIII with the compound of formula IV(i) at a suitable temperature to yield the compound of formula I.
- 72. The process of claim 71 wherein:
(1) said acid in step (b) is selected from the group consisting of: ammonium sulphate, ammonium nitrate, ammonium chloride, H2SO4, HCl, H3PO4, citric acid, mesylchloride, paratoluenesulfonic acid, paratoluenesulfonic acid pyridium salt, alkylsulfonic acid, and mixtures thereof; (2) said silylating reagent in step (b) is selected from the group consisting of: hexamethyldisilazane, TMS chloride, and TMSOTF, wherein said TMS chloride is used in combination with triethylamine, and said TMSOTF is used in combination with triethylamine; (3) said organometallic reagent in step (c) is in a suitable solvent, said organometallic reagent is selected from the group consisting of: diethyl zinc, ethylzinc bromide, ethylzinc chloride, ethylmagnesium bromide, ethylmagnesium chloride and ethylithium, and said suitable solvent in step (c) is selected from the group consisting of: benzene, toluene, TBME, THF, DME, dimethoxyethane, and mixtures thereof; (4) said acid in step (d) is selected from the group consisting of: H2SO4, HCl, H3PO4, citric acid, ammonium chloride, and mixtures thereof; (5) said base in step (d) is selected from the group consisting of: ammonium hydroxide, metal hydroxide, metal oxide, metal carbonate, metal bicarbonate, and mixtures thereof, wherein said metal is selected from the group consisting of: lithium, sodium, potassium, rubidium, cesium, beryllium, magnesium, calcium, strontium, barium, aluminum, indium, thallium, titanium, zirconium, cobalt, copper, silver, zinc cadmium, mercury and cerium; and (6) said acid in step (f) is selected from the group consisting of: sulfonic acids, tartaric acids, H2SO4, HCl, H3PO4, HBr, and carboxylic acids, and mixtures thereof; (7) said solvent used with said acid chloride in step (i) is selected from the group consisting of: acetonitrile, THF, t-butylmethylether, methylenechloride, toluene, ethylacetate, diethylether, and chloroform; (8) said acid chloride in step (i) is selected from the group consisting of: thionyl chloride and oxalyl chloride; (9) said dimethylamine in step (i) is dimethylamine gas or a solution of dimethylamine wherein the solvent used in said dimethylamine solution is selected from the group consisting of: acetonitrile, THF, t-butylmethylether, methylenechloride, toluene, ethylacetate, diethylether, and chloroform; (10) a suitable base is used in step (j) and said base is selected from the group consisting of: KOH, NaOH, Na2CO3, K2CO3, NaHCO3, KHCO3, tetramethylguanidine, DBU, diisopropylethylamine and mixtures thereof; and (11) said hydrogenation catalyst in step (j) is selected from the group consisting of: Pd/C, Pt/C, PdOH, and raney nickel.
- 73. The process of claim 72 wherein:
(1) said R-2-(−)-phenylglycinol in step (a) is at least about 0.01 molar equivalent with respect to said compound of formula III; (2) said acid in step (b) is at least about 0.2 molar equivalent with respect to the compound of formula VI; (3) said organometallic reagent in step (c) is from about 0.1 to about 5 molar equivalents with respect to said compound of formula VII; (4) said acid in step (d) is paratoluene sulfonic acid; (5) said acid chloride in step (i) is thionyl chloride; (6) said solvent used with said acid chloride in step (i) is acetonitrile; (7) said dimethlyamine in step (i) is at a concentration of at least 1 molar equivalent with respect to said compound of formula II; (8) said hydrogenation catalyst in step (j) is Pd/C; and (9) said H2 pressure in step (j) is from about 10 to about 500 psi.
- 74. A process for preparing a compound of formula I:
- 75. The process of claim 74 wherein:
in step (a), the preparation of the compound of formula IV, the reaction the reaction mixture of said compound of formula II and said acid chloride is 40° C. to about 90° C., said dimethylamine is at a concentration of at least about 2 molar equivalents with respect to the compound of formula II, said temperature of said reaction mixture is about 0° C. to about 25° C., said reaction mixture is acidified to a pH of about 1 to about 5, said acid for said aqueous acid is is selected from the group consiting of: HCl, H2SO4, H3PO4, and mixtures thereof; in step (b), the hydrogenation of the compound of formula IV, said base is selected from the group consisting of: Na2CO3, K2CO3, and mixtures thereof, said base is used at a concentration of about 1.05 to about 1.5 molar equivalents, said catalyst is selected from the group consisting of Pd/C and PdOH, said solvent is selected from the group consisting of: methanol, ethanol, propanol, isopropanol, and mixtures thereof, and said hydrogen pressure is about 20 to about 200 psi psi; in step (c), the reaction of the compound of formual Q with the compound of formula IV(i), the compound of formula Q is used at a concentration of about about 1 to about 2 molar equivalents, said temperature is about 20° C. to about 50° C., and said optional base is selected from the group consisting of: Na2CO3, K2CO3 and mixtures thereof; in step (d1), the reaction of the compound of formula V with the compound of formula XI, said base is used in an amount of about 1 to about 2 molar equivalents with respect to the compound of formula V, said solvent is selected from the group consisting of alcohol and nitrile solvents, said temperature is about 40° C. to about 80° C., and said pH is about 3 to about 5; in step (d2), the reaction of the compound of formula V with the compound of formula XII:
said mixture with said compound of formula XI is basified with NaOH or KOH to a pH of about 10 to about 14 at a temperature of about 10° C. to about 40° C. to produce said compound of formula XII, said compound of formula V is dissolved in an alcohol solvent, said compound of formula XII being used at a concentration about 1 molar equivalent with respect to the compound of formula V, said catalytic base being selected from the group consisting of: pyridine and —N(R3)3 wherein each R3 is independently selected from the group consisting of ethyl, isopropyl, propyl, butyl, phenyl, tolyl and benzyl, and said temperature of said resulting solution with the compound of formula XII being about about 40° C. to about 80° C.; in step (e), in the reaction to produce the compound of formula VI from the compound of formula III, said R-2-(−)-phenylglycinol is in a concentration of about about 0.5 to about 1.5 molar equivalents, and said solvent for said R-2-(−)-phenylglycinol is selected from the group consisting of: benzene, toluene, dichloromethane, methylene chloride, chlorobenzene, methanol, ethanol, propanol, isopropanol, n-propanol, butanol, acetonitrile, THF and t-butylmethylether; in step (e) in the reaction to produce the compound of formula VII from the compound of formual VI, said silylating reagent is selected from the group consisting of: hexamethyldisilazane, TMS chloride, and TMSOTF, wherein the TMS chloride or TMSOTF is used in combination with triethylamine, and said acid is selected from the group consisting of: ammonium sulphate, ammonium nitrate and ammonium chloride, said acid at a concentration of at least about 0.4 molar equivalents with respect to the compound of formula VI; in step (e), in the reaction to produce the compound of formula VIII from the compound of formula VII, said organometallic reagent is used in a concentration of about 1 to about 5 molar equivalents with respect to the compound of formula VII, said solvent is selected from the group consisting of: THF, TBME, and mixtures thereof, and said temperature is about about 10° C. to about 50° C.; in step (e), in the reaction to produce the compound of formula IX from the compound of formula VIII, said cooled aqueous acid is at a temperature of about 0° C. to about 15° C., said acid is selected from the group consisting of: H2SO4, HCl, H3PO4, and mixtures thereof, said acid is in a concentration of about about about 2.5 to about 3 molar equivalents with respect to the compound of formula VIII, said cosolvent is selected from the group consisting of: methanol, ethanol, propanol, isopropanol, butanol, sec-butanol, pentanol, hexanol, heptanol, octanol, and mixtures thereof, said base is selected from the group consisting of: KOH, NaOH, NH4OH, LiOH and CsOH, and said pH is adjusted to about 10 to about 11, in step (e), in the reaction to produce the compound of formula X from the compound of formual IX, the resulting solution is cooled to about 0° C. to about 15° C., and said R4 is a (C1-C3)alkyl; and in step (e), in the reaction to produce the compound of formula XI from the compound of formula X, said compound of formula XI is dissolved in a solvent selected from the group consisting of: toluene, xylene, chlorobenzene, dichlorobenzene, diethyl ether, dipropyl ether and dibutyl ether, 1,2-dimethoxyethane, 1,2-diethoxyethane, diglyme, 1,4-dioxane, tetrahydrofuran and mixtures thereof, said acid in said acid solution is selected from the group consisting of: paratoluene sulfonic acid and alkylsulfonic acids, and said temperature is about −20° C. to about 20° C.
- 76. The process of claim 75 wherein:
in step (a), the preparation of the compound of formula IV, said compound of formula II is dissolved in acetonitrile and thionyl chloride, said temperature is about 65° C. to about 75° C., said dimethylamine is dissolved in acetonitrile, said dimethylamine being at a concentration of about 2.5 molar equivalents with respect to the compound of formula II, said temperature of said reaction mixture is about 5° C. to about 10° C., said reaction mixture is acidified to a pH of about 2 to about 3, said aqueous acid is H2SO4, and said substituent A is Br; in step (b), the hydrogenation of the compound of formula IV, said base is K2CO3 used at a concentration of about 1.05 to about 1.1 molar equivalents, said catalyst is Pd/C, said solvent is ethanol, and said hydrogen pressure is about 100 to about 120 psi; in step (c), the reaction of the compound of formual Q with the compound of formula IV(i), the compound of formula Q is used at a concentration of about 1.3 to about 1.5 molar equivalents, said temperature is about 25° C. to about 35° C., R is ethyl, and said optional base is K2CO3; in step (d1), the reaction of the compound of formula V with the compound of formula XI, the compound of formula XI is used in an amount of about 1.1 molar equivalents, said base is triethylamine used in an amount of about 1.3 to about 1.5 molar equivalents with respect to the compound of formula V, said solvent is acetonitrile, said temperature is about 60° C. to about 70° C., and said pH is about 4; in step (d2), the reaction of the compound of formula V with the compound of formula XII, said solvent used with said compound of formula XI is t-butyl methyl ether, said mixture with said compound of formula XI is basified with NaOH to a pH of about 12.5 to about 13.5 at a temperature of about 20° C. to about 30° C. to produce said compound of formula XII, said compound of formula V is dissolved in the solvent n-propanol, said compound of formula XII being used at a concentration about 1.1 molar equivalents with respect to the compound of formula V, said catalytic base being diisopropylethylamine, said temperature of said resulting solution with the compound of formula XII being about 60° C. to about 70° C. in step (e), in the reaction to produce the compound of formula VI from the compound of formula III, said R-2-(−)-phenylglycinol is in a concentration of about 0.9 to about 1.1 molar equivalents, and said solvent for said R-2-(−)-phenylglycinol is THF; in step (e) in the reaction to produce the compound of formula VII from the compound of formual VI, said silylating reagent is hexamethyldisilazane, and said acid is ammonium sulphate at a concentration of at least about 0.5 molar equivalents with respect to the compound of formula VI; in step (e), in the reaction to produce the compound of formula VIII from the compound of formula VII, said organometallic reagent is ethylmagnesium bromide used in a concentration of about 2 to about 3 molar equivalents with respect to the compound of formula VII, said solvent is TBME, and said temperature is about 20° C. to about 35° C.; in step (e), in the reaction to produce the compound of formula IX from the compound of formula VII, said cooled aqueous acid is at a temperature of about 0° C. to about 10° C., said acid is H2SO4, said acid is in a concentration of about about 2.5 molar equivalents with respect to the compound of formula VIII, said cosolvent is sec-butanol, said base is NH4OH, and said pH is adjusted to about 11, in step (e), in the reaction to produce the compound of formula X from the compound of formual IX, said compound of formula IX is dissolved in ethanol and the resulting solution is cooled to about 0° C. to about 10° C., said R4 is methyl, and said agent is NaIO4; and in step (e), in the reaction to produce the compound of formula XI from the compound of formula X, said compound of formula XI is dissolved in THF, said acid in said acid solution is paratoluene sulfonic acid, and said temperature is about 0° C. to about 10° C.
- 77. A compound of the formula:
- 78. A compound of the formula:
- 79. A compound of the formula:
- 80. A compound of the formula:
- 81. A compound of the formula:
- 82. A compound of the formula:
- 83. A compound of the formula:
REFERENCE TO RELATED APPLICATION
[0001] This application claims the benefit of U.S. Provisional Application Serial No. 60/463,773 filed Apr. 18, 2003, the disclosure of which is incorporated herein by reference thereto.
Provisional Applications (1)
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Number |
Date |
Country |
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60463773 |
Apr 2003 |
US |