Claims
- 1. A synthetic crystalline material characterized by an X-ray diffraction pattern exhibiting interplanar d-spacing values including those at 15.4.+-.0.23; 9.03.+-.0.14; 6.62.+-.0.10; 4.99.+-.0.07; 4.04.+-.0.05; 3.31.+-.0.04; and 2.00.+-.0.03 Angstroms.
- 2. The crystalline material of claim 1 having a composition comprising the molar relationship
- X.sub.2 O.sub.3 :(n)YO.sub.2
- wherein n is at least about 30, X is a trivalent element and Y is a tetravalent element.
- 3. The crystalline material of claim 1 having an as-synthesized composition on an anhydrous basis and in terms of moles of oxides per n moles of YO.sub.2, expressed by the formula:
- (0.1 to 0.8)M.sub.2 O:(0.5 to 4)R.sub.2 O:X.sub.2 O.sub.3 :nYO.sub.2
- wherein R is an organic, M is an alkali metal cation, n is at least about 30, X is a trivalent element and Y is a tetravalent element.
- 4. The crystalline material of claim 2 wherein n is from about 40 to about 200.
- 5. The crystalline material of claim 3 wherein said R is hexamethyleneimine.
- 6. The crystalline material comprising the crystalline material of claim 3 having original cations replaced, at least in part, with a cation or a mixture of cations selected from the group consisting of hydrogen and hydrogen precursors, rare earth metals, and metals of Groups IIA, IIIA, IVA, IB, IIB, IIIB, IVB, VIB and VIII of the Periodic Table of the Elements.
- 7. The crystalline material resulting from thermal treatment of the crystalline material of claim 3.
- 8. The crystalline material resulting from thermal treatment of the crystalline material of claim 6.
- 9. The crystalline material of claim 4 wherein X is aluminum and Y is silicon.
- 10. The crystalline material of claim 3 wherein n is from about 40 to about 200, X is aluminum and Y is silicon.
- 11. A method for preparing the synthetic crystalline material of claim 3, said method comprising preparing a reaction mixture capable of forming said material upon crystallization, said reaction mixture containing sufficient amounts of alkali metal cations (M), trivalent element (X) oxide, tetravalent element (Y) oxide, hexamethyleneimine (R) and water, said trivalent element being selected from the group consisting of aluminum, boron, iron and gallium, said tetravalent element being selected from the group consisting of silicon and germanium, said reaction mixture having a composition in terms of mole ratios within the following ranges:
- ______________________________________YO.sub.2 /X.sub.2 O.sub.3 = 30 to 200H.sub.2 O/YO.sub.2 = 10 to 100OH.sup.- /YO.sub.2 = 0.01 to 0.2M/YO.sub.2 = 0.01 to 1.0R/YO.sub.2 = 0.1 to 1.0______________________________________
- and maintaining said reaction mixture under sufficient crystallization conditions until crystals of said material are formed.
- 12. The method of claim 11 wherein said reaction mixture has a composition in terms of mole ratios within the following ranges:
- ______________________________________YO.sub.2 /X.sub.2 O.sub.3 = 50 to 150H.sub.2 O/YO.sub.2 = 15 to 40OH.sup.- /YO.sub.2 = 0.02 to 0.1M/YO.sub.2 = 0.05 to 0.3R/YO.sub.2 = 0.1 to 0.5______________________________________
- 13. The method of claim 11 wherein said reaction mixture further comprises a sufficient amount of crystal formation enhancing seed crystals.
- 14. The crystalline material of claim 6 wherein said replacing cations comprise hydrogen or a hydrogen precursor.
- 15. The crystalline material of claim 6 wherein said replacing cations comprise metals.
- 16. A composition comprising the crystalline material of claim 1 and a matrix.
- 17. The composition of claim 16 wherein said matrix comprises alumina.
- 18. The composition of claim 16 wherein said matrix comprises silica.
- 19. The composition of claim 16 wherein said matrix comprises magnesia, zirconia, thoria, beryllia or titania.
CROSS-REFERENCE TO RELATED APPLICATIONS
This is a continuation-in-part of application Ser. No. 191,528, filed May 9, 1988, now abandoned.
US Referenced Citations (11)
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
191528 |
May 1988 |
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