Example embodiments provide a method of synthesizing a fused heteroaromatic compound, a fused heteroaromatic compound, and an intermediate thereof.
A flat panel display (e.g., a liquid crystal display (LCD) or an organic light emitting diode (OLED) display) includes a thin film transistor (TFT) that is a three-terminal element as a switch. Research on an organic thin film transistor (OTFT) including an organic semiconductor (e.g., a low molecular semiconductor or polymer semiconductor) instead of an inorganic semiconductor (e.g., a silicon (Si) semiconductor) as one type of thin film transistor is being actively conducted. The organic thin film transistor may be made into a fiber or a film due to characteristics of an organic material, and thus is drawing attention as a core element for a flexible display device. The organic thin film transistor may be manufactured using a solution process (e.g., inkjet printing), and may be more easily applied to a large area flat panel display where a deposition process has a limit.
Example embodiments provide a method of synthesizing a fused heteroaromatic compound that is applicable as an organic semiconductor.
Example embodiments also provide an intermediate of the fused heteroaromatic compound.
Example embodiments also provide a fused heteroaromatic compound prepared by the method.
Example embodiments also provide an electronic device including the fused heteroaromatic compound.
According to example embodiments, a method of synthesizing a fused heteroaromatic compound includes obtaining a first intermediate from a first compound represented by Chemical Formula 1 and a second compound represented by Chemical Formula 2, obtaining a second intermediate including a ring having a chalcogen element from the first intermediate, and obtaining a fused heteroaromatic compound by a cyclization reaction of the second intermediate:
In Chemical Formula 1 or 2,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element,
each of R1 and R2 are independently one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof,
L1 is one of an ethenyl group and an ethynyl group, and
Y1 is a halogen.
The process of obtaining the first intermediate may include providing a halogen salt.
The process of obtaining the first intermediate may include providing one of potassium iodide, copper iodide, and a combination thereof.
The first compound may be represented by Chemical Formula 1a:
In Chemical Formula 1a,
Ar1 is one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element,
each of R1 and R3 to R7 are independently one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof,
n is 0, 1, or 2, and
m is an integer ranging from 0 to 10.
The first compound may be represented by Chemical Formula 1aa.
In Chemical Formula 1aa,
Ar1 is one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element, and
R1 is one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof.
The process of obtaining the second intermediate may include providing a halogen molecule.
The process of obtaining the fused heteroaromatic compound may include providing a chalcogen element.
The first intermediate may be represented by Chemical Formula 3:
In Chemical Formula 3,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element,
R1 is independently one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof,
Z is one of an ethene group and an ethyne group, and
Y1 is a halogen.
The second intermediate may be represented by Chemical Formula 4.
In Chemical Formula 4,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element, and
each of Y1 and Y2 are independently a halogen.
The fused heteroaromatic compound may be represented by Chemical Formula 5.
In Chemical Formula 5,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom, and
each of X1 and X2 are independently a chalcogen element.
The Ar1 and Ar2 may independently be one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom.
According to example embodiments, a fused heteroaromatic compound is prepared by the method of example embodiments.
According to example embodiments, an electronic device includes the fused heteroaromatic compound.
According to example embodiments, an intermediate is represented by Chemical Formula 3.
In Chemical Formula 3,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element,
R1 is one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof,
Z is one of an ethene group and an ethyne group, and
Y1 is a halogen.
The Ar1 and Ar2 of Chemical Formula 3 may independently be one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom.
The intermediate represented by Chemical Formula 3 may be represented by Chemical Formula 3a.
In Chemical Formula 3a,
each of Ar1 and Ar2 are independently one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element, and
R1 is one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof.
According to example embodiments, a method of synthesizing an intermediate includes obtaining an intermediate represented by Chemical Formula 3 from a first compound represented by Chemical Formula 1 and a second compound represented by Chemical Formula 2.
In Chemical Formula 1 or 2,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element,
each of R1 and R2 are independently one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof,
L1 is one of an ethenyl group and an ethynyl group, and
Y1 is a halogen,
In Chemical Formula 3,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element,
R1 is independently one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof,
Z is one of an ethene group and an ethyne group, and
Y1 is a halogen.
According to example embodiments, an intermediate is represented by Chemical Formula 4.
In Chemical Formula 4,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element, and
each of Y1 and Y2 are independently a halogen.
The Ar1 and Ar2 of Chemical Formula 4 may independently be one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom.
The intermediate represented by Chemical Formula 4 may be represented by Chemical Formula 4a.
In Chemical Formula 4a,
each of Ar1 and Ar2 are independently one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom, and
X1 is a chalcogen element.
According to example embodiments, a method of synthesizing an intermediate includes obtaining a first intermediate from a first compound represented by Chemical Formula 1 and a second compound represented by Chemical Formula 2 and obtaining a second intermediate represented by Chemical Formula 4 from the first intermediate and a halogen molecule:
In Chemical Formulae 1 or 2,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element,
each of R1 and R2 are independently one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof,
L1 is one of an ethenyl group and an ethynyl group, and
Y1 is a halogen, and
In Chemical Formula 4,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element, and
each of Y1 and Y2 are independently a halogen.
The FIGURE is a cross-sectional view of an organic thin film transistor according to example embodiments.
Example embodiments will hereinafter be described in detail, and may be more easily performed by those who have common knowledge in the related art. However, this disclosure may be embodied in many different forms and is not to be construed as limited to the example embodiments set forth herein.
It should be understood that, although the terms first, second, third, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers, and/or sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer, or section from another region, layer, or section. Thus, a first element, component, region, layer, or section discussed below could be termed a second element, component, region, layer, or section without departing from the teachings of example embodiments.
Spatially relative terms (e.g., “beneath,” “below,” “lower,” “above,” “upper,” and the like) may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. It should be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as “below” or “beneath” other elements or features would then be oriented “above” the other elements or features. Thus, the term “below” may encompass both an orientation of above and below. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
The terminology used herein is for the purpose of describing various embodiments only and is not intended to be limiting of example embodiments. As used herein, the singular forms “a,” “an,” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “includes,” “including,” “comprises,” and/or “comprising,” when used in this specification, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
Example embodiments are described herein with reference to cross-sectional illustrations that are schematic illustrations of idealized embodiments (and intermediate structures) of example embodiments. As such, variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances, are to be expected. Thus, example embodiments should not be construed as limited to the shapes of regions illustrated herein but are to include deviations in shapes that result, for example, from manufacturing.
Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which example embodiments belong. It will be further understood that terms, including those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
As used herein, when a definition is not otherwise provided, the term ‘substituted’ refers to replacement by a substituent selected from a halogen atom, a hydroxy group, an alkoxy group, a nitro group, a cyano group, an amino group, an azido group, an amidino group, a hydrazino group, a hydrazono group, a carbonyl group, a carbamyl group, a thiol group, an ester group, a carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid group or a salt thereof, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C6 to C30 aryl group, a C7 to C30 arylalkyl group, a C1 to C30 alkoxy group, a C1 to C20 heteroalkyl group, a C3 to C20 heteroarylalkyl group, a C3 to C30 cycloalkyl group, a C3 to C15 cycloalkenyl group, a C6 to C15 cycloalkynyl group, a C3 to C30 heterocycloalkyl group, and a combination thereof, instead of hydrogen of a compound.
As used herein, when a definition is not otherwise provided, the term “hetero” refers to one including 1 to 4 heteroatoms selected from N, O, S, Se, Si, and P.
Hereinafter, a method of synthesizing a fused heteroaromatic compound according to example embodiments is described.
In a method of synthesizing a fused heteroaromatic compound according to example embodiments, an intermediate is obtained from novel reactants with a relatively high yield, and a fused heteroaromatic compound having a chalcogen element may be obtained from the intermediate with the relatively high yield.
A method of synthesizing a fused heteroaromatic compound according to example embodiments includes obtaining a first intermediate from an aromatic compound substituted with a chalcogen-containing group, obtaining a second intermediate including a ring having a chalcogen element from the first intermediate, and obtaining a fused heteroaromatic compound by a cyclization reaction of the second intermediate.
The process of obtaining the first intermediate may include reacting a first compound represented by Chemical Formula 1 with a second compound represented by Chemical Formula 2.
In Chemical Formula 1 or 2,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element,
each of R1 and R2 are independently one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof,
L1 is one of an ethenyl group and an ethynyl group, and,
Y1 is a halogen.
The Ar1 and Ar2 may independently be one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom.
The Ar1 and Ar2 may be the same or different and may be, for example independently a fused ring of two or more, for example, a fused ring of three or more.
The Ar1 and Ar2 may independently be one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom.
The X1 may be, for example, one of sulfur (S), selenium (Se), tellurium (Te), and oxygen (O).
The Y1 may be, for example, one of fluorine (F), chlorine (Cl), bromine (Br), and iodine (I).
The first compound may include a chalcogen-containing group and a sulfonate group at ortho-positions to provide the first intermediate effectively.
The first compound may be a compound represented by Chemical Formula 1a.
In Chemical Formula 1a,
Ar1 is one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element,
each of R1 and R3 to R7 are independently one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof,
n is 0, 1, or 2, and
m is an integer of 0 to 10.
The first compound may be a compound represented by Chemical Formula 1aa.
In Chemical Formula 1aa, Ar1, X1, and R1 are the same as described above.
The second compound may be, for example represented by Chemical Formula 2a.
In Chemical Formula 2a,
Ar2 is independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom, and
Y1 is a halogen.
The second compound may be, for example represented by Chemical Formula 2aa.
In Chemical Formula 2aa, Ar2 is independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom.
The first compound and the second compound may be, for example, provided in a mole ratio of about 1:9 to 9:1, in a mole ratio of about 2:8 to 8:2, in a mole ratio of about 3:7 to 7:3, in a mole ratio of about 4:6 to 6:4, or in a mole ratio of about 5:5.
In the process of reacting the first compound with the second compound, a halogen salt may be provided, and the halogen salt may be, for example, potassium iodide, but is not limited thereto. The halogen salt may help eliminate a sulfonate group from the first compound, and thus, may promote a reaction.
In the process of reacting the first compound with the second compound, at least one catalyst may be provided, and for example the catalyst may be a metal catalyst, for example, a copper catalyst, e.g., copper iodide and/or a palladium catalyst, e.g., palladium (0) bis(triphenylphosphine)dichloride(bis(triphenylphosphine)dichloride), but is not limited thereto.
In the process of reacting the first compound with the second compound, a base compound may be provided, for example an amine, an amine derivative and/or a cesium carbonate. The amine derivative may be a primary amine, a secondary amine, and/or a tertiary amine, for example, trimethylamine, but is not limited thereto.
The process of reacting the first compound with the second compound may be performed in a solvent, and the solvent may be, for example, at least one selected from an aliphatic hydrocarbon solvent, e.g., hexane and heptane; an aromatic hydrocarbon solvent, e.g., toluene, pyridine, quinoline, anisole, mesitylene, and xylene; a ketone-based solvent, e.g., methyl isobutyl ketone, 1-methyl-2-pyrrolidinone (NMP), cyclohexanone, and acetone; an ether-based solvent, e.g., tetrahydrofuran and isopropyl ether; an acetate-based solvent, e.g., ethyl acetate, butyl acetate, and propylene glycol methyl ether acetate; an amide-based solvent, e.g., dimethyl acetamide and dimethyl formamide (DMF); a nitrile-based solvent, e.g., acetonitrile and benzonitrile; and a mixture of the solvents, but is not limited thereto.
The first intermediate obtained by reacting the first compound with the second compound may be an asymmetric ethylene derivative or asymmetric acetylene derivative and may be, for example, represented by Chemical Formula 3.
In Chemical Formula 3,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element,
R1 is independently one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof,
Z is one of an ethene group and an ethyne group, and
Y1 is a halogen.
The Ar1 and Ar2 of Chemical Formula 3 may independently be, for example one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom.
The first intermediate may be, for example represented by Chemical Formula 3a.
In Chemical Formula 3a,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom, for example one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element, and
R1 is one of hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 fluoroalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a halogen, and a combination thereof.
The process of obtaining the second intermediate may include providing a halogen molecule with the first intermediate. The halogen molecule may be, for example an iodine molecule (I2), but is not limited thereto.
The process of obtaining the second intermediate may be performed in a solvent, and the solvent may be, for example at least one selected from an aliphatic hydrocarbon solvent such as hexane and heptane; an aromatic hydrocarbon solvent such as toluene, pyridine, quinoline, anisole, mesitylene, and xylene; a ketone-based solvent such as methyl isobutyl ketone, 1-methyl-2-pyrrolidinone (NMP), cyclohexanone, and acetone; t an ether-based solvent such as tetrahydrofuran and isopropyl ether; ethyl acetate, butyl acetate, propylene glycol methyl ether acetate and the like acetate based solvent; an acetate-based solvent such as ethyl acetate, butyl acetate, and propylene glycol methyl ether acetate; an amide-based solvent such as dimethyl acetamide and dimethyl formamide (DMF); a nitrile-based solvent such as acetonitrile and benzonitrile; and a mixture of the solvents, but is not limited thereto.
In the process of obtaining the second intermediate, a ring including a chalcogen element may be formed by a ring closure reaction of the first intermediate, and for example the second intermediate may include one of a thiophene ring, a selenophene ring, a tellurophene ring and a furan ring.
The second intermediate may be, for example, represented by Chemical Formula 4.
In Chemical Formula 4,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom,
X1 is a chalcogen element, and
each of Y1 and Y2 are independently a halogen.
The Ar1 and Ar2 of Chemical Formula 4 may independently be one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom.
The second intermediate may be, for example, represented by Chemical Formula 4a.
In Chemical Formula 4a,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom, for example one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom, and
X1 may be a chalcogen element.
The second intermediate may be produced as a fused heteroaromatic compound having chalcogen elements by providing a chalcogen element and catalytic cyclization reaction.
The chalcogen element may be the same as or different from the chalcogen element of the first compound, and may be, for example, one of sulfur (S), selenium (Se), tellurium (Te), and oxygen (O).
In the process of obtaining the fused heteroaromatic compound, for example, a copper reagent (e.g., copper iodide and/or Cu(OTf) (copper trifluoromethanesulfonate), a palladium reagent (e.g., Pd(PPh3)4, and/or Pd2(dba)3 (tris(dibenzylideneacetone)dipalladium (0)) and/or a catalyst combined with a phosphine ligand (e.g., 1,1′-bis(diphenylphosphino)ferrocene (dppf) or bis[2-(diphenylphosphino)phenyl]ether (DPEPhos), may be provided but is not limited thereto.
In the process of obtaining the fused heteroaromatic compound, for example an inorganic base (e.g., potassium carbonate (K2CO3) or an organic base (e.g., triisopropylamine) may be provided, but is not limited thereto.
The process of obtaining the fused heteroaromatic compound may be performed in a solvent, and the solvent may be, for example, at least one selected from an aliphatic hydrocarbon solvent (e.g., hexane and heptane); an aromatic hydrocarbon solvent (e.g., toluene, pyridine, quinoline, anisole, mesitylene, and xylene); a ketone-based solvent (e.g., methyl isobutyl ketone, 1-methyl-2-pyrrolidinone (NMP), cyclohexanone, and acetone); an ether-based solvent (e.g., tetrahydrofuran and isopropyl ether); an acetate-based solvent (e.g., ethyl acetate, butyl acetate, and propylene glycol methyl ether acetate); an amide-based solvent (e.g., dimethyl acetamide and dimethyl formamide (DMF)); a nitrile-based solvent (e.g., acetonitrile and benzonitrile); and a mixture of the solvents, but is not limited thereto.
The fused heteroaromatic compound may be, for example, represented by Chemical Formula 5.
In Chemical Formula 5,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom, and
each of X1 and X2 may independently be a chalcogen element.
For example, the fused heteroaromatic compound may be represented by one of Chemical Formulae 5a to 5f, but is not limited thereto.
In Chemical Formulae 5a to 5f,
each of Ar1 and Ar2 are independently one of a substituted or unsubstituted aromatic ring, a substituted or unsubstituted heteroaromatic ring, and a fused ring of two or more rings therefrom, for example one of a phenyl group, a naphthyl group, an anthracenyl group, a tetracenyl group, a pentacenyl group, a thiophenyl group, a selenophenyl group, a tellurophenyl group, a furanyl group, a pyrrolyl group, and a fused ring of two or more rings therefrom.
The fused heteroaromatic compound has, for example, a structure where four or more aromatic rings and/or heteroaromatic rings are fused, and has a uniform and stable oxidation potential when applied to an electronic device (e.g., an organic thin film transistor) due to a compact planar molecular structure, and shows relatively high charge mobility because the intermolecular packing and stacking are improved. Therefore, the fused heteroaromatic compound may be effectively used as a charge transporting material (e.g., a semiconductor).
The fused heteroaromatic compound may have, for example a structure where five or more aromatic rings and/or heteroaromatic rings are fused, six or more aromatic rings and/or heteroaromatic rings are fused, seven or more aromatic rings and/or heteroaromatic rings are fused, or eight or more aromatic rings and/or heteroaromatic rings are fused.
The fused heteroaromatic compound may have, for example, a molecular weight of about 300 to about 3,000, or about 300 to about 1,500.
The fused heteroaromatic compound may be, for example, a compound represented by one of Chemical Formulae (1) to (16), but is not limited thereto.
In Chemical Formulae (1) to (16),
each of X1 and X2 are independently one of sulfur (S), selenium (Se), tellurium (Te), and oxygen (O),
each of X3 to X6 are independently one of sulfur (S), selenium (Se), tellurium (Te), oxygen (O), and NR7, wherein R7 is hydrogen, a C1 to C10 alkyl group, or a C6 to C30 aryl group.
In Chemical Formulae (1) to (16), each aromatic ring and/or heteroaromatic ring may be, for example substituted with at least one substituent, for example, a C1 to C10 alkyl group or a C6 to C30 aryl group.
The fused heteroaromatic compound may be, for example, one of the compounds of Group 1, but is not limited thereto.
In Group 1,
each of Ra1 to Ra4, Ra9 to Ra12, Ra17 to Ra20, and Ra25 to Ra28 are independently one of hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, and a substituted or unsubstituted C6 to C30 aryl group.
The method of synthesizing a fused heteroaromatic compound may be relatively simple, and may provide a product with a relatively high yield. The synthetic method may be performed at a relatively low temperature of, for example about 40° C. to about 200° C., for example, about 40° C. to about 100° C. The synthetic method may be performed in a relatively short time, and may shorten a time of a conventional method by a half or more. The synthetic method may provide intermediates and a final product with a relatively high yield, and for example each intermediate and final product may be produced with a yield of about 70% or more, for example, about 80% or more.
The fused heteroaromatic compound may be implemented into an organic thin film by a deposition or solution process. The organic thin film may be applied to various devices including an organic semiconductor. For example, the fused heteroaromatic compound may be applied to an organic thin film transistor, and may be applied to a charge transport layer and/or an active layer of an electronic device (e.g., a solar cell, an organic light emitting diode (OLED) display, and an organic sensor).
Hereinafter, one example of an organic thin film transistor including the fused heteroaromatic compound is described referring to the drawing.
In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Like reference numerals designate like elements throughout the specification. It will be understood that when an element such as a layer, film, region, or substrate is referred to as being “on” another element, it can be directly on the other element or intervening elements may also be present. In contrast, when an element is referred to as being “directly on” another element, there are no intervening elements present.
The FIGURE is a cross-sectional view of an organic thin film transistor according to example embodiments.
A gate electrode 124 is formed on a substrate 110 made of transparent glass, silicon, or plastic. The gate electrode 124 is connected to a gate line (not shown) transferring a gate signal. The gate electrode 124 may be made of gold (Au), copper (Cu), nickel (Ni), aluminum (Al), molybdenum (Mo), chromium (Cr), tantalum (Ta), titanium (Ti), an alloy thereof, or a combination thereof.
A gate insulating layer 140 is formed on the gate electrode 124. The gate insulating layer 140 may be made of an organic material or an inorganic material. Examples of the organic material may include a soluble polymer compound (e.g., a polyvinyl alcohol-based compound, a polyimide-based compound, a polyacryl-based compound, a polystyrene-based compound, and benzocyclobutane (BCB)), and examples of the inorganic material may include a silicon nitride (SiNx) and a silicon oxide (SiO2).
A source electrode 173 and a drain electrode 175 are formed on the gate insulating layer 140. The source electrode 173 and the drain electrode 175 face each other with the gate electrode 124 therebetween. The source electrode 173 is electrically connected to the data line (not shown) transferring the data signal. The source electrode 173 and the drain electrode 175 may include at least one metal selected from gold (Au), copper (Cu), nickel (Ni), aluminum (Al), molybdenum (Mo), chromium (Cr), tantalum (Ta), titanium (Ti), an alloy thereof, or a combination thereof.
An organic semiconductor 154 is formed on the source electrode 173 and the drain electrode 175. The organic semiconductor 154 may include the fused heteroaromatic compound. The organic semiconductor 154 may be formed in a solution process such as spin coating, slit coating, or inkjet printing by preparing the fused heteroaromatic compound as a solution. However, the fused heteroaromatic compound may be formed using a dry process (e.g., deposition).
Although the bottom gate structured organic thin film transistor is illustrated as an organic thin film transistor, it is not limited thereto, and it may be applied to all organic thin film transistors, e.g., a top gate structured organic thin film transistor.
The organic thin film transistor may be applied to a switching or driving device of various electronic devices, and the electronic device may be, for example, a liquid crystal display (LCD), an organic light emitting diode (OLED) display, an electrophoretic display device, or an organic sensor.
Hereinafter, the present disclosure is illustrated in more detail with reference to examples. However, these are examples, and the present disclosure is not limited thereto.
Synthesis of Fused Heteroaromatic Compound
Synthesis of Compound 2:
10.0 g (40.6 mmol) of the compound 1 is put in a flask and dissolved in 500 mL of dichloromethane (CH2Cl2). Subsequently, 15 mL (0.11 mol) triethylamine (NEt3) is added thereto, 8.9 mL (53 mmol) of trifluoromethansulfonic anhydride (Tf2O) is added thereto at 0° C., and the obtained mixture is additionally stirred overnight. Then, a saturated ammonium chloride solution and water are added thereto. Subsequently, a water layer is separated and the extraction is performed with dichloromethane. Then, an organic layer therefrom is washed with a saturated saline solution, dried and concentrated with anhydrous magnesium sulfate, and purified through column chromatography to obtain 15 g of a compound 2.
NMR (CDCl3, 300 MHz) 7.43 (d, 1H, J=5.7 Hz), 7.57 (d, 1H, J=5.7 Hz), 7.73 (s, 1H), 7.86 (s, 1H), 8.29 (s, 1H), 8.32 (s, 1H).
MS (EI-MS, m/z) 378 (M+)
Synthesis of Compound 4:
5.0 g (15 mmol) of the compound 3 is put in a flask and dissolved in 250 mL of dichloromethane (CH2Cl2). Subsequently, 6.0 mL (0.042 mol) of triethylamine (NEt3) is added thereto, 3.4 mL (20 mmol) of trifluoromethansulfonic anhydride (Tf2O) is added thereto at 0° C., and the obtained mixture is additionally stirred overnight. Then, a saturated ammonium chloride solution and water are added thereto. Subsequently, a water layer is separated and the extraction is performed with dichloromethane. Subsequently, an organic layer therefrom is washed with a saturated saline solution, dried and concentrated with anhydrous magnesium sulfate, and purified through column chromatography to obtain 6.6 g of a compound 4. The yield of the compound is 94%.
NMR (CDCl3, 300 MHz) 7.45 (d, 1H, J=5.7 Hz), 7.63 (d, 1H, J=5.7 Hz), 7.95 (s, 1H), 8.26 (s, 1H), 8.34 (s, 1H), 8.34 (s, 1H).
MS (EI-MS, m/z) 412 (M+)
Synthesis of Compound 5:
6.0 g (13 mmol) of the compound 4, 60 mL of dimethyl formamide (DMF), and 11 mL (0.080 mol) of triethylamine (NEt3) are put in a flask. Subsequently, 2.0 mL (14 mmol) of trimethylsilylacetylene (TMSA), 74 mg (0.39 mmol) of copper iodide, palladium bis(triphenylphosphine)dichloride, and 270 mg (0.39 mmol) of Pd(PPh3)2Cl2) are added thereto, and the mixture is stirred overnight. Then, a saturated ammonium chloride solution and water are added thereto, and a water layer is extracted with dichloromethane. Subsequently, an organic layer therefrom is washed with a saline solution, dried with anhydrous magnesium sulfate, and purified through column chromatography to obtain a crude product. The crude product is suspended in 250 mL of methanol (MeOH), 1.3 g (24 mmol) of potassium hydroxide (KOH) is added thereto. Subsequently, the mixture is stirred for 4 hours, and water is added thereto to precipitate 3.2 g of a solid compound 5. The yield of the compound is 94%.
NMR (CDCl3, 300 MHz) 7.43 (d, 1H, J=5.7 Hz), 7.57 (d, 1H, J=5.7 Hz), 8.17 (s, 1H), 8.22 (s, 1H), 8.25 (s, 1H), 8.26 (s, 1H).
MS (EI-MS, m/z) 286 (M+)
Synthesis of Compound 6 (First Intermediate):
2.0 g (5.2 mmol) of the compound 2, 128 mg (0.78 mmol) of copper iodide (Cul), 92 mg (0.13 mmol) of palladium (0) bis(triphenylphosphine)dichloride (Pd(PPh3)2Cl2), 1.3 g (7.8 mmol) of potassium iodide (KI), 6 mL of triethylamine (NEt3), and 30 mL of dimethyl formamide (DMF) are put in a flask and stirred for 15 minutes. Subsequently, 1.5 g (5.2 mmol) of the compound 5 is added thereto, the obtained mixture is stirred at 70° C. overnight to precipitate 2.6 g of a solid compound 6. The yield of the compound is 96%.
NMR (CDCl3, 300 MHz) 2.69 (s, 3H), 7.42-7.58 (m, 5H), 8.20 (s, 1H), 8.28-8.31 (m, 5H), 8.35 (s, 1H).
MS (LC-TOF-MS, m/z) 515.61 (M+)
Synthesis of Compound 7 (Second Intermediate):
2.6 g (5.0 mmol) of the compound 6 and 400 mL of tetrahydrofuran (THF) are put in a flask. Subsequently, 2.5 g (10 mmol) of iodine (12) is added thereto, and the mixture is stirred overnight. Then, methanol is added thereto, and a precipitate therefrom is filtered to obtain 2.7 g of a compound 7. The yield of the compound is 87%.
NMR (CDCl3, 300 MHz) 7.46-7.49 (m, 2H), 7.54 (d, 1H, J=5.4 Hz), 7.60 (d, 1H, J=5.7 Hz), 8.11 (s, 1H), 8.33 (s, 1H), 8.37 (s, 1H), 8.39 (s, 1H), 8.41 (s, 1H), 8.49 (s, 1H), 8.50 (s, 1H), 8.60 (s, 1H).
MS (MALDI-TOF-MS, m/z) 625.69 (M+)
Synthesis of Compound 8 (Final Compound):
2.7 g (4.4 mmol) of the compound 7, 165 mg (0.87 mmol) of copper iodide (Cul), 0.42 g (13 mmol) of sulfur powder (S), and potassium 1.8 g (13 mmol) of carbonate (K2CO3) are put in a flask. Subsequently, 250 mL of dimethyl formamide (DMF) is added thereto, and the mixture is stirred at 110° C. overnight. Then, the resultant is cooled down to 0° C. to obtain a crude product as a precipitate. The crude product is suspended in a mixed solvent of dimethyl acetamide and water, filtered, and washed with water, acetone, and tetrahydrofuran (THF) to obtain 1.8 g of a compound 8. The yield of the compound is 90%.
MS (MALDI-TOF-MS, m/z) 452.04 (M+)
Synthesis of Compounds 2, 4, 5, 6, and 7:
The compounds 2, 4, 5, 6, and 7 are respectively synthesized according to the same method as Synthesis Example 1.
Synthesis of Compound 9 (Final Compound):
20 mg (0.032 mmol) of the compound 7, 0.9 mg (0.006 mmol) of copper iodide (Cul), 7.6 mg (0.0096 mmol) of selenium powder (Se), and 13 mg (0.0096 mmol) of potassium carbonate (K2CO3) are put in a flask, 2 mL of N-methylpyrrolidone (NMP) is added thereto, and the mixture is stirred at 120° C. overnight. Subsequently, the resultant is cooled down to 0° C. to precipitate a solid. The precipitated solid is suspended in a mixed solvent of dimethyl acetamide and water, filtered, and washed with water, acetone, and tetrahydrofuran (THF) to obtain 12 mg of a compound 9. The yield of the compound is 75%.
MS (MALDI-TOF-MS, m/z) 500.02 (M+)
Synthesis of Compound 2:
2.0 g (4.2 mmol) of the compound 1 is put in a flask and dissolved in 200 mL of dichloromethane (CH2Cl2). Subsequently, after cooling, 4.2 mL (4.2 mmol) of 1M tribromoboron (BBr3) solution is added thereto, and the obtained mixture is additionally stirred for 4 hours. Then, a saturated ammonium chloride solution is added thereto and then the extraction is performed with chloroform. Then, the resultant is dried with anhydrous magnesium sulfate, filtered and removed remaining solvent to obtain a compound 2 of yellow solid. The yield is 99%.
NMR(CDCl3, 300 MHz) 0.88 (t, 3H), 1.27 (m, 14H), 1.75 (m, 2H), 2.94 (t, 2H), 5.55 (s, 1H), 7.18 (s, 1H), 7.44 (s, 1H), 7.96 (s, 1H), 8.01 (s, 1H), 8.10 (s, 1H).
Synthesis of Compound 3:
1.8 g (3.9 mmol) of the compound 2 is put in a flask and dissolved in 90 mL of dichloromethane (CH2Cl2). Subsequently, 1.5 mL (10.5 mmol) of triethylamine (NEt3) is added thereto, 0.86 mL (5.1 mmol) of trifluoromethansulfonic anhydride (Tf2O) is added thereto at 0° C., and the obtained mixture is additionally stirred overnight. Then, a saturated ammonium chloride solution and water are added thereto. Subsequently, a water layer is separated and the extraction is performed with dichloromethane. Subsequently, an organic layer therefrom is washed with a saturated saline solution, dried and concentrated with anhydrous magnesium sulfate, and purified through column chromatography to obtain a compound 3. The yield of the compound 3 is 100%.
NMR (CDCl3, 300 MHz) 0.89 (t, 3H), 1.27 (m, 14H), 1.76 (m, 2H), 2.97 (t, 2H), 7.25 (s, 1H), 7.86 (s, 1H), 8.09 (s, 1H), 8.15 (s, 1H), 8.21 (s, 1H).
Synthesis of Compounds 4 and 5:
2.3 g (3.8 mmol) of the compound 3, 50 mL of dimethyl formamide (DMF), and 3.2 mL (23 mmol) of triethylamine (NEt3) are put in a flask. Subsequently, 0.54 mL (3.8 mmol) of trimethylsilylacetylene (TMSA), 21 mg (0.11 mmol) of copper iodide, 77 mg (0.11 mmol) of palladium bis(triphenylphosphine)dichloride Pd(PPh3)2Cl2 are added thereto, and the mixture is stirred overnight. Then, a saturated ammonium chloride solution and water are added thereto, and a water layer is extracted with dichloromethane. Subsequently, an organic layer therefrom is washed with a saline solution, dried with anhydrous magnesium sulfate, and purified through column chromatography to obtain a crude product. The crude product is suspended in 100 mL of methanol (MeOH), 0.83 g (14.8 mmol) of potassium hydroxide (KOH) is added thereto. Subsequently, the mixture is stirred for 4 hours, and water is added thereto to precipitate 3.2 g of a solid compound 5. The yield of the compound is 81%.
NMR (CDCl3, 300 MHz) 0.87 (t, 3H), 1.27 (m, 14H), 1.75 (m, 2H), 2.95 (t, 2H), 3.40 (s, 1H), 7.23 (s, 1H), 8.02 (s, 1H), 8.07 (s, 1H), 8.14 (s, 1H), 8.16 (s, 1H).
Synthesis of Compound 6 (First Intermediate):
4.0 g (8.3 mmol) of the compound 1, 0.76 g (10.8 mmol) of sodium thiomethoxide (NaSMe), 1.5 g (10.8 mmol) of potassium carbonate (K2CO3), 0.76 g (0.8 mmol) of tris(dibenzylideneacetone)dipalladium(0), and 0.9 g (1.7 mmol) of bis[2-diphenylphosphino]phenyl]ether are put in a flask and added 200 ml of toluene, and then stirred for 24 hours at 110° C. After cooling, sodium hydrogen carbonate is added thereto, and the extraction is performed with toluene. Subsequently, the resultant is dried with anhydrous magnesium sulfate, filtered, and an organic solvent is removed under vacuum. Then, the resultant is purified through silica gel column chromatography (solvent: hexane and chloroform) to obtain a compound 6 of white solid. The yield of the compound 6 is 66%.
NMR (CDCl3, 300 MHz) 0.88 (t, 3H), 1.27 (m, 14H), 1.75 (m, 2H), 2.55 (s, 3H), 2.94 (t, 2H), 4.01 (s, 3H), 7.12 (s, 1H), 7.18 (s, 1H), 7.44 (s, 1H), 7.97 (s, 1H), 8.11 (s, 1H).
Synthesis of Compound 7
3.1 g (6.9 mmol) of the compound 6 and 300 mL of dichloromethane are put in a flask. After cooling, 10.3 ml (10.3 mmol) of tribromoboron (BBr3) solution is added thereto, and the mixture is stirred for 4 hours. Then, a saturated ammonium chloride solution is added thereto, and the extraction is performed with chloroform. Subsequently, an organic layer therefrom is dried with anhydrous magnesium sulfate, and filtered to obtain a compound 7 of yellow solid. The yield of the compound 7 is 99%.
NMR (CDCl3, 300 MHz) 0.88 (t, 3H), 1.27 (m, 14H), 1.75 (m, 2H), 2.44 (s, 3H), 2.94 (t, 2H), 6.56 (s, 1H), 7.18 (s, 1H), 7.37 (s, 1H), 7.95 (s, 1H), 8.00 (s, 1H), 8.13 (s, 1H).
Synthesis of Compound 8
3.03 g (7.0 mmol) of the compound 7 and 300 ml of dichloromethane (CH2Cl2) are put in a flask and the mixture is stirred. Subsequently, 2.6 mL (18.9 mmol) of triethylamine is added thereto, and then 1.8 mL (10.5 mmol) of trifluoromethansulfonic anhydride (Tf2O) is added thereto at 0° C., and the obtained mixture is additionally stirred overnight. Then, a saturated ammonium chloride solution and water are added thereto. Subsequently, a water layer is separated and the extraction is performed with dichloromethane. Subsequently, an organic layer therefrom is washed with a saturated saline solution, dried and concentrated with anhydrous magnesium sulfate, and purified through column chromatography to obtain a compound 8. The yield of the compound 8 is 93%.
NMR (CDCl3, 300 MHz) 0.88 (t, 3H), 1.27 (m, 14H), 1.76 (m, 2H), 2.60 (s, 3H), 2.96 (t, 2H), 7.22 (s, 1H), 7.66 (s, 1H), 7.78 (s, 1H), 8.05 (s, 1H), 8.21 (s, 1H).
Synthesis of Compound 9 (First Intermediate)
3.67 g (6.5 mmol) of the compound 8, 50 mL of dimethyl formamide (DMF), 180 mg (0.98 mmol) of copper iodide, 140 mg (0.2 mmol) of palladium(0) bis(triphenylphosphine)dichloride Pd(PPh3)2Cl2, 3.6 g (9.8 mmol) of tetrabutylammonium iodide Bu4NI, and 10 ml of triethylamine (NEt3) are put in a flask and the mixture is stirred for 15 minutes. Then, 3.08 g (6.5 mmol) of the compound 5 is added thereto and stirred at 70° C. overnight to obtain a compound 9. The yield of the compound 9 is 85%.
MS (MALDI-TOF-MS, m/z) 890.23 (M+)
Synthesis of Compound 10 (Second Intermediate)
4.1 g (4.6 mmol) of the compound 9 and 400 ml of tetrahydrofuran are put in a flask and the mixture is stirred. Then, 2.24 g (9.2 mmol) of iodine (I2) is added thereto and the mixture is stirred overnight. Subsequently, a methanol is added thereto and filtered to obtain a compound 10. The yield of the compound 10 is 75%.
MS (MALDI-TOF-MS, m/z) 1002.15 (M+)
Synthesis of Compound 11 (Final Product)
3.4 g (3.4 mmol) of the compound 10, 0.13 g (0.68 mmol) of copper iodide, 0.33 g (10.2 mmol) of sulfur powder and 0.59 g (4.3 mmol) of calcium carbonate (K2CO3) are put in a flask. Then, 300 ml of dimethylformamide is added thereto and the mixture is stirred at 110° C. overnight. Subsequently, after cooling to 0° C., the extraction is performed to obtain a crude product. Then, the crude product is suspended with a mixed solvent of dimethylacetamide and water, filtered, and washed with water, acetone, and tetrahydrofuran to obtain a compound 11. The yield is 93%.
MS (MALDI-TOF-MS, m/z) 828.11 (M+)
Synthesis of Compound 2:
2.0 g (5.5 mmol) of the compound 1 is put in a flask and dissolved in 1 L of dichloromethane (CH2Cl2). After cooling, 19 mL (19.3 mmol) of 1M tribromoboron (BBr3) solution is added thereto, and the obtained mixture is additionally stirred for 4 hours. Then, a saturated ammonium chloride solution is added thereto and then the extraction is performed with chloroform. Then, the resultant is dried with anhydrous magnesium sulfate, filtered and removed remaining solvent to obtain a compound 2 of yellow solid. The yield is 92%.
NMR (CDCl3, 300 MHz) 5.59 (s, 1H), 7.43 (m, 3H), 7.59 (s, 1H), 7.61 (s, 1H), 7.76 (m, 2H), 8.09 (s, 1H), 8.10 (s, 1H), 8.16 (s, 1H).
Synthesis of Compound 3:
1.78 g (5.0 mmol) of the compound 2 is put in a flask and dissolved in 1 L of dichloromethane (CH2Cl2). Subsequently, 1.9 mL (13.5 mmol) of triethylamine (NEt3) is added thereto, 1.3 mL (7.5 mmol) of trifluoromethansulfonic anhydride (Tf2O) is added thereto at 0° C., and the obtained mixture is additionally stirred overnight. Then, a saturated ammonium chloride solution and water are added thereto. Subsequently, a water layer is separated and the extraction is performed with dichloromethane. Subsequently, an organic layer therefrom is washed with a saturated saline solution, dried and concentrated with anhydrous magnesium sulfate, and purified through column chromatography to obtain a compound 3. The yield of the compound 3 is 60%.
NMR (CDCl3, 300 MHz) 7.46 (m, 3H), 7.65 (s, 1H), 7.78 (m, 2H), 7.93 (s, 1H), 8.23 (s, 1H), 8.26 (s, 1H), 8.28 (s, 1H).
Synthesis of Compounds 4 and 5:
1.47 g (3.0 mmol) of the compound 3, 190 mL of dimethyl formamide (DMF), and 40 mL (286 mmol) of triethylamine (NEt3) are put in a flask. Subsequently, 4.5 mL (0.65 mmol) of trimethylsilylacetylene (TMSA), 60 mg (0.3 mmol) of copper iodide and 110 mg (0.15 mmol) of palladium bis(triphenylphosphine)dichloride Pd(PPh3)2Cl2 are added thereto, and the mixture is stirred overnight. Then, a saturated ammonium chloride solution and water are added thereto, and a water layer is extracted with dichloromethane. Subsequently, an organic layer therefrom is washed with a saline solution, dried with anhydrous magnesium sulfate, and purified through column chromatography to obtain a crude product. The crude product is suspended in 100 mL of methanol (MeOH), 0.84 g (14.9 mmol) of potassium hydroxide (KOH) is added thereto. Subsequently, the mixture is stirred for 4 hours, and water is added thereto to precipitate a solid to obtain a compound 5. The yield of the compound 5 is 66%.
NMR (CDCl3, 300 MHz) 3.41 (s, 1H), 7.45 (m, 3H), 7.64 (s, 1H), 7.76 (m, 2H), 8.02 (s, 1H), 8.14 (s, 1H), 8.20 (d, 2H).
Synthesis of Compound 6:
9.1 g (24.6 mmol) of the compound 1, 2.3 g (31.9 mmol) of sodium thiomethoxide (NaSMe), 4.4 g (31.9 mmol) of potassium carbonate (K2CO3), 2.3 g (2.5 mmol) of tris(dibenzylideneacetone)dipalladium(0), and 2.7 g (4.9 mmol) of bis[2-(diphenylphosphino)phenyl]ether are put in a flask and added 1 L of toluene, and then stirred for 24 hours at 110° C. After cooling, sodium hydrogen carbonate is added thereto, and the extraction is performed with toluene. Subsequently, the resultant is dried with anhydrous magnesium sulfate, filtered, and an organic solvent is removed under vacuum. Then, the resultant is purified through silica gel column chromatography (solvent: hexane and chloroform) to obtain a compound 6 of white solid. The yield of the compound 6 is 99%.
NMR (CDCl3, 300 MHz) 2.57 (s, 3H), 4.03 (m, 3H), 7.16 (s, 1H), 7.43 (m, 3H), 7.60 (s, 1H), 7.76 (m, 2H), 8.11 (s, 1H), 8.16 (s, 1H).
Synthesis of Compound 7
8.3 g (24.6 mmol) of the compound 6 and 1.5 L of dichloromethane are put in a flask. After cooling, 37 ml (37 mmol) of 1M tribromoboron (BBr3) solution is added thereto, and the mixture is stirred for 4 hours. Then, a saturated ammonium chloride solution is added thereto, and the extraction is performed with chloroform. Subsequently, an organic layer therefrom is dried with anhydrous magnesium sulfate, and filtered to obtain a compound 7 of yellow solid. The yield of the compound 7 is 86%.
NMR (CDCl3, 300 MHz) 2.47 (s, 3H), 6.56 (s, 1H), 7.43 (m, 3H), 7.59 (s, 1H), 7.76 (m, 2H), 8.06 (s, 1H), 8.10 (s, 1H), 8.18 (s, 1H).
Synthesis of Compound 8
6.8 g (21.1 mmol) of the compound 7 and 3 L of dichloromethane (CH2Cl2) are put in a flask and the mixture is stirred. Subsequently, 8.1 mL (56.8 mmol) of triethylamine is added thereto, and then 5.3 mL (31.6 mmol) of trifluoromethansulfonic anhydride (Tf2O) is added thereto at 0° C., and the obtained mixture is additionally stirred overnight. Then, a saturated ammonium chloride solution and water are added thereto. Subsequently, a water layer is separated and the extraction is performed with dichloromethane. Subsequently, an organic layer therefrom is washed with a saturated saline solution, dried and concentrated with anhydrous magnesium sulfate, and purified through column chromatography to obtain a compound 8. The yield of the compound 8 is 69%.
NMR (CDCl3, 300 MHz) 2.63 (s, 3H), 6.56 (s, 1H), 7.43 (m, 3H), 7.59 (s, 1H), 7.76 (m, 2H), 8.06 (s, 1H), 8.10 (s, 1H), 8.18 (s, 1H).
Synthesis of Compound 9 (First Intermediate)
3.3 g (7.3 mmol) of the compound 8, 425 mL of dimethyl formamide (DMF), 210 mg (1.1 mmol) of copper iodide, 160 mg (0.22 mmol) of palladium(0) bis(triphenylphosphine)dichloride (Pd(PPh3)2Cl2), 1.86 g (11.2 mmol) of potassium iodide (KI), 85 ml of triethylamine (NEt3) and 425 ml of dimethylformamide (DMF) are put in a flask and the mixture is stirred for 15 minutes. Then, 2.64 g (7.3 mmol) of the compound 5 is added thereto and stirred at 70° C. overnight to obtain a compound 9. The yield of the compound 9 is 83%.
MS (MALDI-TOF-MS, m/z) 665.95 (M+)
Synthesis of Compound 10 (Second Intermediate)
8.1 g (12.1 mmol) of the compound 9 and 800 ml of tetrahydrofuran are put in a flask and the mixture is stirred. Then, 9.2 g (36.4 mmol) of iodine (12) is added thereto and the mixture is stirred overnight. Subsequently, a methanol is added thereto and filtered to obtain a compound 10. The yield of the compound 10 is 87%.
MS (MALDI-TOF-MS, m/z) 777.83 (M+)
Synthesis of Compound 11 (Final Product)
8.2 g (10.5 mmol) of the compound 10, 0.4 g (2.1 mmol) of copper iodide, 1.01 g (31.6 mmol) of sulfur powder and 4.36 g (31.6 mmol) of calcium carbonate (K2CO3) are put in a flask. Then, 820 ml of N-methylpyrrolidone (NMP) is added thereto and the mixture is stirred at 130° C. overnight. Subsequently, after cooling to 0° C., the extraction is performed to obtain a crude product. Then, the crude product is suspended with a mixed solvent of dimethylacetamide and water, filtered, and washed with water, acetone, and tetrahydrofuran to obtain a compound 11. The yield is 75%.
MS (MALDI-TOF-MS, m/z) 603.98 (M+)
Manufacture of Organic Thin Film Transistor
A silicon wafer substrate coated with the cleaned SiO2 to be 3000 Å thick is exposed to O2 plasma and then, dipped in an octadecyl trichlorosilane solution diluted in hexane to a concentration of 5 mM to change the surface to be hydrophobic. Subsequently, the fused heteroaromatic compound according to Synthesis Example 1 is vacuum-vapor deposited to be 700 Å thick by heating the substrate from room temperature to 200° C. Then, source and drain electrodes are formed thereon by using a shadow mask and depositing Au to be 1000 Å thick to manufacture an organic thin film transistor.
Charge mobility of the organic thin film transistor is calculated.
The charge mobility of the organic thin film transistor is obtained by obtaining a graph having (ISD)1/2 and VG as variables from a saturation region current equation and a slope in the graph.
In the equations, ISD is a source-drain current, μ or μFET is charge mobility, C0 is electrostatic capacity of a gate insulating layer, W is a channel width, L is a channel length, VG is a gate voltage, and VT is a threshold voltage.
A cut-off leakage current (loff) is obtained as a minimum current in an off state as a current flowing in an off state. A current on-off ratio (lon/loff) is obtained as a ratio of a maximum current in an on state relative to a minimum current in the off state.
The charge mobility of the organic thin film transistor exhibits relatively high charge mobility of about 13 cm2/Vs.
While this disclosure has been described in connection with what is presently considered to be practical example embodiments, it is to be understood that the inventive concepts are not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims.
Number | Date | Country | Kind |
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10-2016-0043689 | Apr 2016 | KR | national |
This application is a divisional of U.S. application Ser. No. 15/392,816, filed on Dec. 28, 2016, which claims priority to the benefit of Korean Patent Application No. 10-2016-0043689, filed in the Korean Intellectual Property Office on Apr. 8, 2016, the entire contents of each of the above-referenced applications are hereby incorporated by reference.
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Number | Date | Country | |
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20180323381 A1 | Nov 2018 | US |
Number | Date | Country | |
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Parent | 15392816 | Dec 2016 | US |
Child | 16033574 | US |