Claims
- 1. A method for welding of biological tissue comprising:
(a) applying an RF voltage during a first stage to electrodes of a tissue welding tool; (b) monitoring tissue impedance, and determining a minimum tissue impedance value during the first stage; (c) determining relative tissue impedance, the relative tissue impedance being equal to the ratio of tissue impedance to the minimum tissue impedance value; (d) detecting when the relative tissue impedance reaches a predetermined relative tissue impedance value; (e) starting a second stage when the relative tissue impedance reaches the predetermined relative tissue impedance value; (f) calculating the duration of the second stage as a function of the duration of the first stage; and (g) applying the RF voltage during the second stage to the electrodes of the tissue welding tool.
- 2. The method of claim 1 wherein the amplitude of the RF voltage applied during the first stage increases according to the following equation:
- 3. The method of claim 1 wherein monitoring tissue impedance of step (b) comprises measuring the RF voltage and electric current between the electrodes of the tissue welding tool and calculating tissue impedance by dividing the voltage by the electric current.
- 4. The method of claim 1 wherein the predetermined relative tissue impedance value is calculated as a function of the RF voltage during the first stage.
- 5. The method of claim 1 wherein the predetermined relative tissue impedance value is within the range of about 1-1.5.
- 6. The method of claim 1 wherein the RF voltage applied during the second stage is calculated as a function of the value of the RF voltage applied during the first stage when the relative tissue impedance reaches the predetermined relative tissue impedance value.
- 7. The method of claim 1 wherein the RF voltage applied during the second stage is between about 50-100% of the value of the RF voltage applied at the end of the first stage.
- 8. The method of claim 1 wherein applying the RF voltage during the second stage comprises substantially stabilizing the RF voltage applied during the second stage.
- 9. The method of claim 1 further comprising modulating the RF voltages applied during the first and second stages by pulses.
- 10. The method of claim 9 wherein the pulses have a frequency of between about 100 Hz-60 kHz and a duty cycle of between about 10-90%.
- 11. The method of claim 9 wherein the frequency of the pulses is varied during the first and second stages.
- 12. The method of claim 1 further comprising modulating the RF voltages applied during the first and second stages with pulses having a frequency of between about 100 Hz-60 kHz, and further modulating the RF voltage applied during the second stage with low frequency pulses.
- 13. The method of claim 12 further comprising substantially stabilizing the amplitude of the RF voltage applied during the second stage, wherein the amplitude of the RF voltage is calculated as a function of the value of the RF voltage at the end of the first stage.
- 14. The method of claim 12 wherein the frequency of the low frequency pulses is defined as a function of the duration of the first stage.
- 15. The method of claim 12 wherein the frequency of the low frequency pulses is defined such that there are between about 5-10 pulses during the second stage.
- 16. The method of claim 1 wherein applying the RF voltage during the second stage comprises varying the RF voltage as a function of the relative tissue impedance.
- 17. The method of claim 16 further comprising substantially stabilizing the relative tissue impedance at a relative tissue impedance level reached at the end of the first stage.
- 18. The method of claim 16 wherein the RF voltage applied during the second stage is varied as a function of the relative tissue impedance by reducing the RF voltage when the relative tissue impedance is greater than the predetermined relative tissue impedance value and increasing the RF voltage when the relative tissue impedance is less than the predetermined relative tissue impedance value.
- 19. The method of claim 1 wherein applying the RF voltage during the second stage comprises varying the RF voltage to vary the relative tissue impedance according to a preset program.
- 20. The method of claim 1 further comprising modulating the RF voltages applied during the first and second stages with pulses having a frequency of between about 100 Hz-60 kHz, and further modulating the RF voltage applied during the second stage with low frequency pulses, and further comprising substantially stabilizing the relative tissue impedance at a relative tissue impedance level reached at the end of the first stage.
- 21. The method of claim 20 wherein the frequency of the low frequency pulses is defined as a function of the duration of the first stage.
- 22. The method of claim 20 wherein the frequency of the low frequency pulses is defined such that there are between about 5-10 pulses during the second stage.
- 23. The method of claim 20 wherein stabilizing the relative tissue impedance is performed by a regulatory system.
- 24. The method of claim 23 wherein the regulatory system stabilizes the relative tissue impedance by varying the RF voltage by a predetermined amount, the RF voltage being varied based on the direction of change of the relative tissue impedance.
- 25. The method of claim 1 further comprising modulating the RF voltages applied during the first and second stages with pulses having a frequency of between about 100 Hz-60 kHz, and further modulating the RF voltage applied during the second stage with low frequency pulses, and further comprising varying the RF voltage to vary the relative tissue impedance according to a preset program.
- 26. The method according to claim 25 wherein varying the relative tissue impedance is performed by a regulatory system.
- 27. The method of claim 1 further comprising monitoring tissue welding, and stopping tissue welding and providing a signal to a user if the RF voltage applied during the first stage reaches a preset RF voltage level and/or if the relative tissue impedance fails to reach the predetermined relative tissue impedance value.
- 28. The method of claim 1 further comprising monitoring tissue welding and stopping tissue welding and providing a signal to a user when the tissue impedance reaches a short circuit impedance of the electrodes of the tissue welding tool.
- 29. The method of claim 1 further comprising monitoring tissue welding and providing a signal to a user after tissue welding is completed at the end of the second stage and the welded tissue has sufficiently cooled.
- 30. A control method for welding of biological tissue comprising:
(a) applying an increasing RF voltage to the electrodes of a tissue welding tool during a first stage; (b) measuring the values of the RF voltage and electric current passing through the tissue, and the duration of the first stage; (c) calculating tissue impedance values by dividing the RF voltage values by the electric current values; (d) determining a minimum tissue impedance value; (e) storing the minimum tissue impedance value; (f) calculating relative tissue impedance values by dividing of the tissue impedance values by the minimum tissue impedance value; (g) stopping the first stage when the relative tissue impedance reaches an endpoint relative tissue impedance value calculated as a function of the relative tissue impedance; (h) storing the duration of the first stage and a value of the RF voltage at the end of the first stage; (i) calculating an RF voltage level for a second stage as a function of the value of the RF voltage at the end of the first stage; (j) calculating the duration of the second stage as a function of the duration of the first stage; and (k) applying an RF voltage during the second stage at the RF voltage level calculated in step (i).
- 31. A control method for welding of biological tissue comprising:
(a) applying an increasing RF voltage to the electrodes of a tissue welding tool during a first stage; (b) measuring the values of the RF voltage and electric current passing through the tissue, and the duration of the first stage; (c) calculating tissue impedance values by dividing the RF voltage values by the electric current values; (d) determining a minimum tissue impedance value; (e) storing the minimum tissue impedance value; (f) calculating relative tissue impedance values by dividing the tissue impedance values by the minimum tissue impedance value; (g) stopping the RF voltage increase when the relative tissue impedance reaches an endpoint relative tissue impedance value calculated as a function of the relative tissue impedance; (h) storing the duration of the first stage and the RF voltage at the end of the first stage; (i) calculating an RF voltage level for a second stage as a function of the value of the RF voltage at the end of the first stage; (j) calculating the duration of the second stage as a function of the duration of the first stage; (k) calculating a modulation frequency as a function of the duration of the first stage; and (l) applying an RF voltage at the RF voltage level calculated in step (i) for the duration of the second stage calculated in step (j), and modulating the RF voltage by pulses at the modulation frequency calculated in step (k).
- 32. A control method for welding of biological tissue comprising:
(a) applying an increasing RF voltage to the electrodes of a tissue welding tool during a first stage; (b) measuring the values of the RF voltage and electric current passing through the tissue, and the duration of the first stage; (c) calculating tissue impedance values by dividing the RF voltage values by the electric current values; (d) determining a minimum tissue impedance value; (e) storing the minimum tissue impedance value; (f) calculating relative tissue impedance values by dividing the tissue impedance values by the minimum tissue impedance value; (g) stopping the first stage when the relative tissue impedance reaches an endpoint relative tissue impedance value calculated as a function of the relative tissue impedance; (h) storing the duration of the first stage and value of the RF voltage at the end of the first stage; (i) calculating the duration of the second stage as a function of the duration of the first stage; and (j) applying the RF voltage during the second stage, wherein the RF voltage is varied as a function of the relative tissue impedance during the second stage.
- 33. A control method for welding of biological tissue comprising:
(a) applying an increasing RF voltage to the electrodes of a tissue welding tool during a first stage; (b) measuring the values of the RF voltage and electric current passing through the tissue, and the duration of the first stage; (c) calculating tissue impedance values by dividing the RF voltage values by the electric current values; (d) determining a minimum tissue impedance value; (e) storing the minimum tissue impedance value; (f) calculating relative tissue impedance values by dividing the tissue impedance values by the minimum tissue impedance value; (g) stopping the first stage when the relative tissue impedance reaches an endpoint relative tissue impedance value calculated as a function of the relative tissue impedance; (h) storing the duration of the first stage and a value of the RF voltage at the end of the first stage; (i) calculating an initial RF voltage level for a second stage as a function of the value of the RF voltage at the end of the first stage; (j) calculating the duration of the second stage as a function of the duration of the first stage; (k) calculating a modulation frequency as a function of the duration of the first stage; and (l) applying an RF voltage for the duration of the second stage calculated in step (j), initially setting the amplitude of the RF voltage to the initial RF voltage level calculated in step (i), modulating the RF voltage by pulses at the modulation frequency calculated in step (k), and varying the amplitude of the RF voltage as a function of the relative tissue impedance.
- 34. The method of claim 33 further comprising stabilizing the relative tissue impedance at the endpoint relative tissue impedance value.
- 35. The method of claim 34 wherein stabilizing the relative tissue impedance is performed by a regulatory system which stabilizes the relative tissue impedance by varying the amplitude of the RF voltage by a predetermined amount, the RF voltage being varied based on the direction of change of the relative tissue impedance.
- 36. The method of claim 33 wherein varying the RF voltage of step (l) comprises varying the RF voltage to vary the relative tissue impedance according to a preset program.
- 37. An apparatus for tissue welding comprising:
a surgical instrument having electrodes adapted to engage tissue to be welded; a power source coupled to the electrodes for providing RF voltage, the power source including one or more sensors for sensing the RF voltage and current between the electrodes; and a control device coupled to the power source; wherein the control device: controls the power source to provide an RF voltage to the electrodes during a first stage; monitors tissue impedance; determines a minimum tissue impedance value; determines relative tissue impedance as a ratio of the measured tissue impedance and the minimum tissue impedance value; detects when the relative tissue impedance reaches a predetermined relative tissue impedance value; and controls the power source to provide an RF voltage during a second stage, the duration of the second stage being calculated by the control device as a function of the duration of the first stage.
- 38. The apparatus of claim 37 wherein the control device controls the power source to provide the RF voltage during the first stage such that the RF voltage increases according to the following equation:
- 39. The apparatus of claim 37 wherein the control device calculates tissue impedance as a function of time by dividing the RF voltage by the electric current.
- 40. The apparatus of claim 37 wherein the predetermined relative tissue impedance value is calculated as a function of the RF voltage variation during the first stage.
- 41. The apparatus of claim 37 wherein the predetermined relative tissue impedance value is within the range of about 1-1.5.
- 42. The apparatus of claim 37 wherein control device calculates the RF voltage provided during the second stage as a function of the value of the RF voltage provided during the first stage when the relative tissue impedance reaches the predetermined relative tissue impedance value.
- 43. The apparatus of claim 37 wherein the RF voltage provided during the second stage is between about 50-100% of the value of the RF voltage provided during the first stage when the relative tissue impedance reaches the predetermined relative tissue impedance value.
- 44. The apparatus of claim 37 wherein the control device controls the power source to substantially stabilize the RF voltage provided during the second stage.
- 45. The apparatus of claim 37 wherein the control device controls the power source to modulate the RF voltages provided during the first and second stages by pulses.
- 46. The apparatus of claim 45 wherein the pulses have a frequency of between about 100 Hz-60 kHz and a duty cycle of between about 10-90%.
- 47. The apparatus of claim 45 wherein the frequency of the pulses is varied during the first and second stages.
- 48. The apparatus of claim 37 wherein the control device controls the power source to modulate the RF voltages applied during the first and second stages with pulses having a frequency of between about 100 Hz-60 kHz, and further modulate the RF voltage applied during the second stage with low frequency pulses.
- 49. The apparatus of claim 48 wherein the control device controls the power source to substantially stabilizing the RF voltage applied during the second stage, wherein the amplitude of the RF voltage is calculated as a function of the value of the RF voltage applied during the first stage when the relative tissue impedance reaches the predetermined relative tissue impedance value.
- 50. The apparatus of claim 48 wherein the frequency of the low frequency pulses is defined as a function of the duration of the first stage.
- 51. The apparatus of claim 48 wherein the frequency of the low frequency pulses is defined such that there are between about 5-10 pulses during the second stage.
- 52. The apparatus of claim 37 wherein the control device controls the power source to vary the RF voltage provided during the second stage as a function of the relative tissue impedance.
- 53. The apparatus of claim 52 wherein the control device controls the power source to vary the RF voltage during the second stage to substantially stabilize the relative tissue impedance at a relative tissue impedance level reached at the end of the first stage.
- 54. The apparatus of claim 52 wherein the control device controls the power source to vary the RF voltage provided during the second stage as a function of the relative tissue impedance by reducing the RF voltage when the relative tissue impedance is greater than the predetermined relative tissue impedance value and increasing the RF voltage when the relative tissue impedance is less than the predetermined relative tissue impedance value.
- 55. The apparatus of claim 37 wherein the control device controls the power source to provide the RF voltage during the second stage to regulate the relative tissue impedance.
- 56. The apparatus of claim 37 wherein the control device controls the power source to modulate the RF voltage provided during the first and second stages with pulses having a frequency of between about 100 Hz-60 kHz, and further modulate the RF voltage provided during the second stage with low frequency pulses, and wherein the control device controls the power source to provide an RF voltage during the second stage which substantially stabilizes the relative tissue impedance at a relative tissue impedance level reached at the end of the first stage.
- 57. The apparatus of claim 56 wherein the frequency of the low frequency pulses is defined as a function of the duration of the first stage.
- 58. The apparatus of claim 56 wherein the frequency of the low frequency pulses is defined such that there are between about 5-10 pulses during the second stage.
- 59. The apparatus of claim 56 wherein the control device further comprises a regulatory system for stabilizing the relative tissue impedance.
- 60. The apparatus of claim 59 wherein the regulatory system stabilizes the relative tissue impedance by varying the RF voltage by a predetermined amount, the RF voltage being varied based on the direction of change of the relative tissue impedance.
- 61. The apparatus of claim 37 wherein the control device controls the power source to modulate the RF voltage provided during the first and second stages with pulses having a frequency of between about 100 Hz-60 kHz, and further modulate the RF voltage provided during the second stage with low frequency pulses, and wherein the control device controls the power source to provide an RF voltage during the second stage to regulate the relative tissue impedance.
- 62. The apparatus of claim 37 further comprising a regulatory system for regulating the relative tissue impedance by varying the RF voltage by a predetermined amount, the RF voltage being varied based on the direction of change of the relative tissue impedance.
- 63. The apparatus of claim 37 wherein the control device further comprises apparatus for monitoring tissue welding, and stopping tissue welding and providing a signal to a user if the RF voltage applied during the first stage reaches a preset RF voltage level and/or if the relative tissue impedance fails to reach the predetermined relative tissue impedance value.
- 64. The apparatus of claim 37 wherein the control device further comprises apparatus for monitoring tissue welding and stopping tissue welding and providing a signal to a user when the tissue impedance reaches a short circuit impedance of the electrodes of the tissue welding tool.
- 65. The apparatus of claim 37 wherein the control device further comprises apparatus for monitoring tissue welding and providing a signal to a user after tissue welding is completed at the end of the second stage and the welded tissue has sufficiently cooled.
- 66. The apparatus of claim 37 wherein the control device further comprises apparatus for monitoring tissue welding, and if the tissue impedance exceeds a preset value and/or if the duration of the first stage exceeds a preset duration, the control device maintains the RF voltage at a steady level for a preset period and stops tissue welding and provides a signal to a user if the relative tissue impedance does not reach the predetermined relative tissue impedance value.
- 67. The apparatus of claim 37 wherein the control device controls the power source to provide an approximation of a gradually increasing RF voltage during the first stage by means of a plurality of linear segments.
- 68. The apparatus of claim 37 wherein the control device further comprises a filter for filtering the tissue impedance values.
- 69. The apparatus of claim 37 wherein the control device controls the duration of the first stage as a function of the relative tissue impedance.
- 70. The apparatus of claim 45 wherein the control device regulates the modulation pulse frequency within about 100 Hz-60 kHz to provide minimum tissue resistance.
- 71. The apparatus of claim 45 wherein the control device regulates the duty cycle of modulation pulses during tissue welding such that energy consumption for tissue breakdown and heating is minimized.
- 72. The apparatus of claim 37 wherein the control device further controls the power source to provide modulated pulse bursts of the RF voltage to the electrodes during the intervals between welding sessions, the duration of a pulse burst being within about 2-15 msec., the frequency of pulse bursts being within about 3-15 Hz, and wherein welding is actuated if the average resistance between the electrodes is less than a preset value.
- 73. The apparatus of claim 37 wherein the control device calculates during welding a temperature of the electrodes, a temperature of the tissue engaged between the electrode and a degree of tissue coagulation using a mathematical model and based on known values of the electric current and voltage.
- 74. The apparatus of claim 73 wherein the calculated values are used to adjust the voltage increase rate during the first stage and the duration of tissue welding.
- 75. An apparatus for welding of biological tissue comprising:
(a) means for applying an RF voltage during a first stage to electrodes of a tissue welding tool; (b) means for monitoring tissue impedance, and determining a minimum tissue impedance value during the first stage; (c) means for determining relative tissue impedance, the relative tissue impedance being equal to the ratio of tissue impedance to the minimum tissue impedance value; (d) means for detecting when the relative tissue impedance reaches a predetermined relative tissue impedance value; (e) means for starting a second stage when the relative tissue impedance reaches the predetermined relative tissue impedance value; (f) means for calculating the duration of the second stage as a function of the duration of the first stage; and (g) means for applying the RF voltage during the second stage to the electrodes of the tissue welding tool.
- 76. The apparatus of claim 75 wherein the amplitude of the RF voltage applied during the first stage increases according to the following equation:
- 77. The apparatus of claim 75 wherein the means for monitoring tissue impedance comprises means for measuring the RF voltage and electric current between the electrodes of the tissue welding tool and calculating tissue impedance by dividing the voltage by the electric current.
- 78. The apparatus of claim 75 wherein the predetermined relative tissue impedance value is calculated as a function of the RF voltage during the first stage.
- 79. The apparatus of claim 75 wherein the predetermined relative tissue impedance value is within the range of about 1-1.5.
- 80. The apparatus of claim 75 wherein the RF voltage applied during the second stage is calculated as a function of the value of the RF voltage applied during the first stage when the relative tissue impedance reaches the predetermined relative tissue impedance value.
- 81. The apparatus of claim 75 wherein the RF voltage applied during the second stage is between about 50-100% of the value of the RF voltage applied at the end of the first stage.
- 82. The apparatus of claim 75 wherein the means for applying the RF voltage during the second stage comprises means for substantially stabilizing the RF voltage applied during the second stage.
- 83. The apparatus of claim 75 further comprising means for modulating the RF voltages applied during the first and second stages by pulses.
- 84. The apparatus of claim 83 wherein the pulses have a frequency of between about 100 Hz-60 kHz and a duty cycle of between about 10-90%.
- 85. The apparatus of claim 83 wherein the frequency of the pulses is varied during the first and second stages.
- 86. The apparatus of claim 75 further comprising means for modulating the RF voltages applied during the first and second stages with pulses having a frequency of between about 100 Hz-60 kHz, and further modulating the RF voltage applied during the second stage with low frequency pulses.
- 87. The apparatus of claim 86 further comprising means for substantially stabilizing the amplitude of the RF voltage applied during the second stage, wherein the amplitude of the RF voltage is calculated as a function of the value of the RF voltage at the end of the first stage.
- 88. The apparatus of claim 86 wherein the frequency of the low frequency pulses is defined as a function of the duration of the first stage.
- 89. The apparatus of claim 86 wherein the frequency of the low frequency pulses is defined such that there are between about 5-10 pulses during the second stage.
- 90. The apparatus of claim 75 wherein the means for applying the RF voltage during the second stage comprises means for varying the RF voltage as a function of the relative tissue impedance.
- 91. The apparatus of claim 90 further comprising means for substantially stabilizing the relative tissue impedance at a relative tissue impedance level reached at the end of the first stage.
- 92. The apparatus of claim 90 wherein the RF voltage applied during the second stage is varied as a function of the relative tissue impedance by reducing the RF voltage when the relative tissue impedance is greater than the predetermined relative tissue impedance value and increasing the RF voltage when the relative tissue impedance is less than the predetermined relative tissue impedance value.
- 93. The apparatus of claim 75 wherein the means for applying the RF voltage during the second stage comprises means for varying the RF voltage to vary the relative tissue impedance according to a preset program.
- 94. The apparatus of claim 75 further comprising means for modulating the RF voltages applied during the first and second stages with pulses having a frequency of between about 100 Hz-60 kHz, and further modulating the RF voltage applied during the second stage with low frequency pulses, and further comprising means for substantially stabilizing the relative tissue impedance at a relative tissue impedance level reached at the end of the first stage.
- 95. The apparatus of claim 94 wherein the frequency of the low frequency pulses is defined as a function of the duration of the first stage.
- 96. The apparatus of claim 94 wherein the frequency of the low frequency pulses is defined such that there are between about 5-10 pulses during the second stage.
- 97. The apparatus of claim 94 wherein stabilizing the relative tissue impedance is performed by a regulatory system means.
- 98. The apparatus of claim 97 wherein the regulatory system means stabilizes the relative tissue impedance by varying the RF voltage by a predetermined amount, the RF voltage being varied based on the direction of change of the relative tissue impedance.
- 99. The apparatus of claim 75 further comprising means for modulating the RF voltages applied during the first and second stages with pulses having a frequency of between about 100 Hz-60 kHz, and further modulating the RF voltage applied during the second stage with low frequency pulses, and further comprising means for varying the RF voltage to vary the relative tissue impedance according to a preset program.
- 100. The apparatus according to claim 99 wherein varying the relative tissue impedance is performed by a regulatory system means.
- 101. The apparatus of claim 75 further comprising means for monitoring tissue welding, and stopping tissue welding and providing a signal to a user if the RF voltage applied during the first stage reaches a preset RF voltage level and/or if the relative tissue impedance fails to reach the predetermined relative tissue impedance value.
- 102. The apparatus of claim 75 further comprising means for monitoring tissue welding and stopping tissue welding and providing a signal to a user when the tissue impedance reaches a short circuit impedance of the electrodes of the tissue welding tool.
- 103. The apparatus of claim 75 further comprising means for monitoring tissue welding and providing a signal to a user after tissue welding is completed at the end of the second stage and the welded tissue has sufficiently cooled.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application is related to U.S. patent application No. 09/022,869, entitled “Bonding of Soft Biological Tissues by Passing High Frequency Electric Current Therethrough”, filed Feb. 12, 1998, the contents of which are incorporated herein by reference.