The present invention relates to drying ceramic greenware, and in particular relates to systems and methods for controlling the drying of ceramic greenware during manufacture.
As used herein, ceramic greenware, or more briefly greenware, refers to bodies comprised of ceramic-forming components that, upon firing at high temperature, form ceramic bodies. The greenware may include ceramic components, such as a mixture of various ceramic-forming components and a ceramic component. The various components can be mixed together with a liquid vehicle, such as water or glycol, and extruded with a formed shape, such as a honeycomb body. Immediately after extrusion, the greenware possesses some liquid content, such as water content, and typically at least some of the liquid must be removed, i.e. the greenware must be dried, prior to firing at high temperature that forms a refractory material.
The drying process must be carried out in a manner that does not cause defects (e.g., a change in shape, cracks, etc.) to the greenware. Such defects tend to occur when the greenware is overheated during drying.
One aspect of the invention is a method of drying a piece of ceramic greenware comprising a liquid at an original liquid content. The method includes exposing the piece to electromagnetic radiation at a first frequency sufficient to remove a first portion of the liquid from the piece. The method also includes exposing the piece to electromagnetic radiation at a second frequency, the second frequency being different than the first frequency, sufficient to remove a second portion of the liquid from the piece.
Another aspect of the invention is a method of drying pieces of ceramic greenware each comprising a liquid at an original liquid content. The method includes exposing the pieces to microwave energy sufficient to remove a first portion of the liquid from the pieces and then exposing the pieces to radio-frequency (RF) energy sufficient to remove a second portion of the liquid from the pieces by passing a number of the pieces through an electrode region adjacent an electrode, wherein the electrode provides an amount of RF power in the electrode region based on the number of pieces in the electrode region.
Another aspect of the invention is a RF source for a RF applicator for controlling RF drying of pieces of ceramic greenware. The RF source comprises a power supply having three source lines that initially carry respective alternating current (AC) source voltages V1, V2 and V3. The RF source also includes at least one silicon-controlled rectifier (SCR) operably connected to at least one of the power supply source lines and adapted to regulate at least one of the source voltages. A step-up transformer is operably coupled to the power supply and/or the SCR and is configured to receive the source voltages, including the at least one regulated source voltage, and is configured to generate therefrom a stepped-up AC transformer voltage VT. A rectifier is configured to receive the AC transformer voltage and form a direct current (DC) rectified plate voltage VR. A high-frequency DC/AC converter is configured to receive the DC rectified voltage and form a high-frequency AC RF voltage VRF. An electrode is configured to receive the RF voltage and to generate RF energy in an electrode region wherein the pieces are subject to an amount of the RF energy that corresponds to the RF voltage. A programmable logic controller (PLC) is operably coupled to the SCR and is configured to cause the SCR to control at least one of the source voltages based on a number of pieces within the electrode region so as to control the plate voltage in order to control the RF voltage.
Another aspect of the invention is a method of drying pieces of ceramic greenware. The method includes partially drying the pieces. The method then includes substantially drying the pieces with RF energy from a RF source by passing the pieces through an electrode region of the RF source and varying the amount of RF energy in the electrode region based on the number of pieces in the electrode region. The RF source includes an electrode electrically coupled to a control unit configured to change an amount of a plate voltage provided to the electrode as a RF voltage based on the number of pieces in the electrode region.
These and other advantages of the invention will be further understood and appreciated by those skilled in the art by reference to the following written specification, claims and appended drawings.
Reference is now made in detail to the present preferred embodiments of the invention, examples of which are illustrated in the accompanying drawings. Whenever possible, the same reference numbers and symbols are used throughout the drawings to refer to the same or like parts.
Ceramic greenware can be formed by extruding a plasticized batch comprising ceramic-forming components, or ceramic precursors, through a die, such as a die that produces a honeycomb structure, to form a formed extrudate of the ceramic-forming material. The extrudate exiting the extruder is cut transversely to the direction of extrusion to form a piece. The piece may itself be transversely cut into shorter pieces; in some cases the longer piece is referred to as a “log.” Extruded pieces of greenware contain a liquid vehicle such as water or glycol, which may be for example 10-25% by weight, and the greenware needs to be dried (i.e., the liquid vehicle removed) on the way to forming the final product.
The greenware can be placed on trays or supports and then sent through an oven or “applicator.” Microwave (MW) applicators apply microwave radiation, as used herein corresponding to electromagnetic radiation in the frequency range of 900-2500 MHz. RF applicators apply RF (radio-frequency) radiation, as used herein corresponding to electromagnetic radiation in the frequency range of 20 to 40 MHz. Both MW and RF radiation is absorbed by the greenware. The liquid can thus be driven off by the radiation, leaving a dry (or drier) piece of greenware.
The greenware can be made up of material(s) transparent to MW and RF radiation, as well other materials that are not, i.e. MW susceptible materials such as graphite, as found, for example, in at least some batches and greenware that form aluminum titanate or “AT”. Greenware containing MW susceptible material is more prone to the occurrence of hot spots during drying.
The systems and methods disclosed herein reduce the occurrence and/or intensity of any undesired localized heating, or hot spots, that result from drying greenware to the extent that is sufficient for preparing the greenware to be fired at high temperature, unlike known methods which provide drying by, for example, microwave drying to the fully dried state in which the greenware is ready to be fired at high temperature, wherein even if the overall moisture content of a piece of greenware is reduced to an acceptably dry level, the already-dried areas in the piece continue to heat up, possibly leading to cracking of the piece.
The greenware 20 can be manufactured by extruding ceramic-forming material via extruder 6, cutting the extrudate into pieces 22, and then performing drying and firing steps. After firing, the greenware piece transforms into a body comprising ceramic material, such as cordierite, and has a honeycomb structure with thin interconnecting porous walls that form parallel cell channels longitudinally extending between end faces, as disclosed in U.S. Pat. No. 2,884,091, U.S. Pat. No. 2,952,333, U.S. Pat. No. 3,242,649, U.S. Pat. No. 3,885,997 and U.S. Pat. No. 5,403,787 which patents are incorporated by reference herein. Exemplary inorganic batch component mixtures suitable for forming cordierite-based bodies are disclosed in U.S. Pat. No. 5,258,150; U.S. Pat. Pubs. No. 2004/0261384 and 2004/0029707; and U.S. Pat. No. RE 38,888, all of which are incorporated by reference herein.
Other exemplary ceramic bodies comprised of AT-based ceramic materials are discussed in U.S. Pat. No. 7,001,861, U.S. Pat. No. 6,942,713, U.S. Pat. No. 6,620,751, and U.S. Pat. No. 7,259,120, which patents are incorporated by reference herein. Such AT-based bodies are used as an alternative to cordierite and silicon carbide (SiC) bodies for high-temperature applications, such as automotive emissions control applications. The systems and methods disclosed herein apply to any type of greenware 20 amenable to RF drying techniques.
With continuing reference to
MW applicator 40 includes a housing 44 with input and output ends 46 and 48, an interior 50, and a MW source 56 that generates microwave radiation (“microwaves”) 58. In an example embodiment, microwaves (or “microwave energy” or “microwave radiation”) 58 have a frequency fMW in the frequency range from about 900-2500 MHz. RF applicator 70 includes a housing 74 with input and output ends 76 and 78, an interior 80, and a RF source 86 that generates radio waves (or “RF energy” or “RF radiation”) 88. In an example embodiment, radio waves 88 have a frequency fRF in the frequency range from about 20 to 40 MHz. In an example embodiment, the MW radiation and RF radiation have frequencies that differ by more than 800 MHz, while in another example embodiment the frequencies differ by more than 800 MHz and not more than 3000 MHz.
In the general operation of drying system 10, cut pieces 22 of greenware 20 extruded from extruder 6 (
Pieces 22 are then conveyed to input end 76 of RF applicator 70 via central conveyor section 30C and enter interior 80 where they are exposed to RF energy 88 as they pass underneath RF source 86. The partially dried pieces 22 are substantially (i.e., completely or nearly completely) dried when they exit RF applicator at exit end 78 via output conveyor section 30O by removing a second portion of the liquid. In an example embodiment, pieces 22 contain less than 2 wt % water upon exiting RF applicator 70. In an example embodiment, the second portion of the liquid removed is greater than 0% and less than 60% of the original liquid content. In another example embodiment, the second portion of the liquid removed is between 10% and 40% of the original liquid content.
As disclosed herein, only partial drying of the piece is performed by exposing the piece to MW radiation. The pieces are not completely dried using MW applicator 40 because microwave drying can cause “hot spots” on the greenware that can damage the piece, particularly for greenware that contains a microwave-susceptible material, such as graphite. There is also the potential for overheating the pieces when an applicator is partially loaded versus fully loaded because the amount of energy available in the applicator tends to be a function of the load presented by greenwares. Partial loading conditions occur regularly when, for example, pieces are removed from the queue into the applicator, for example if they fail to meet specification. Partial loading conditions also lead to “excessive energy absorption” to the pieces adjacent to the gap, so that if a piece is missing, the excessive energy absorption does occur, resulting in greater radiation (or a different distribution of radiation) incident on the piece. MW radiation also does not penetrate ceramic-based greenwares 20 as deep as RF radiation. Consequently, we have found it beneficial to use a two-step drying process wherein pieces 22 are only partially dried by removing a first portion of the liquid (e.g., using MW radiation 58) and then completely dried by removing substantially all of the remaining (second) portion of the liquid using RF radiation 88.
We also discovered that when using a prior art RF applicator 70 in a two-step drying system 10, the partially dried pieces 22 that exited from the MW applicator 40 would often overheat when subsequently further dried in RF applicator 70. Overheating occurred most often when the load on RF generator 86 changed due to transient conditions within RF applicator interior 80, and in particular when pieces 22 were missing from greenware queue 26, as indicated by missing piece position PM in RF interior 80 (see also
RF Source with Plate Voltage Control
The above RF overheating problems led the inventors to develop a RF source 86 with voltage control so that RF applicator 70 can provide a more consistent power per greenware 20 for more consistent drying.
In an example embodiment, electrode 130 has a length LE=15 feet and a width WE=4 feet. A portion of bottom 103 of housing 74 directly beneath electrode 130 is electrically grounded via electrical ground GR and serves as a “bottom electrode” that forms with electrode 130 a large parallel-plate capacitor in central region 120. Electrode 130 is electrically connected to a control unit 150 that controls the operation of RF applicator 70 and in particular provides the voltage control capability for RF source 86. An example control unit 150 is shown in
Control unit 150 provides a RF-frequency AC voltage signal VRF (“RF voltage”) to electrode 130. This results in a RF-varying electric field that is substantially contained within a sub-region 122 (“electrode region”) of central region 120 underneath electrode 130. Electrode region 122 has a length essentially the same as electrode length LE as indicated by vertical dashed lines 123. Electrode region 122 is where the RF drying of greenwares 20 takes place.
Control unit 150 is configured to control a DC “plate voltage” VR, which directly controls the amount (amplitude) of (AC) RF voltage VRF applied to electrode 130 to account for the load placed on the electrode based on the number of pieces 22 in electrode region 122 at any given time. In an example embodiment, the number of pieces 22 in electrode region 122 is determined by a sensor 160 (e.g., an optical sensor) arranged at RF applicator entrance and operably connected to control unit 150 via a communication link 166, which is shown schematically as a wire link but can also be a wireless link. Sensor 160 uses signals 170 (e.g., optical signals) to determine the number of pieces 22 in greenware queue 26 as they enter entrance vestibule 106 and make their way to electrode region 122. In an example embodiment, control unit 150 is operably coupled to and controls the operation of central conveyor section 30C and so knows the speed of the conveyor and the distance pieces 22 need to travel from RF applicator entrance 76 to electrode region 122. Control unit 150 also knows the length of electrode region 122 and thus the amount of time it takes for each piece 22 to transit the electrode region 122.
RF Source Control Unit
Without RF power control, the plate voltage VR (and thus the RF Voltage VRF applied to electrode 130) is constant regardless of the number of pieces 22 in electrode region 122. During transient conditions (applicator load, unload, tray gaps, etc.), there is less mass in electrode region 122 to absorb the set amount of RF energy 88 in the region so that pieces 22 overheat.
Control unit 150 includes three-phase power supply 200 (e.g., 480V AC) with three lines 202A, 202B and 202C that carry initial AC source voltages V1, V2 and V3. In an example embodiment, two of the lines 202A and 202B are provided directly to a step-up transformer 210, while the remaining line 202C includes a silicon-controlled rectifier (SCR) 216. A programmable logic controller (PLC) 220 that includes a PLC register 221 is operably connected to SCR 216 and controls the SCR to regulate (i.e., change or vary) the amount of voltage V3 carried by line 202C, which also is provided to step-up transformer 210. Step-up transformer 210 steps up the voltage provided thereto by transformer voltages V1, V2 and V3REG to form an AC transformer output voltage VT. The transformer output voltage VT is fed to a rectifier 240, which rectifies the AC voltage VT to form DC plate voltage VR. In an example embodiment, plate voltage VR is in the range from 8 KV to 15 KV. Plate voltage VR is shown in
Plate voltage VR is provided to a DC/AC converter 250, which converts this DC voltage into a high-frequency AC RF voltage VRF. In an example embodiment, DC/AC converter 250 is an oscillator circuit that includes an oscillator tube (not shown). It is noted here that one or more of the components of controller unit 150 can reside outside of the unit and are shown as included within the unit for the sake of illustration. In a preferred embodiment, DC/AC converter 250 is a high-frequency DC/AC converter.
In a typical three-phase power supply, the source voltages V1, V2 and V3 are equal and the output voltage is cycled between output lines 202A, 202B and 202C. In control unit 150, PLC 220 controls the SCR output voltage V3 via a control signal SC, thereby controlling the total (three-phase) voltage reaching step-up transformer 210. This in turn ultimately controls the amount of plate voltage VR and thus the amount of RF voltage VRF, which controls the overall amount of RF energy 88 provided by electrode 130 in electrode region 122.
In order to control RF voltage VRF, the number of pieces 22 in electrode region 122 at any given time must be determined. As discussed above, sensor 160 uses signals 170 to determine the number of pieces 22 in greenware queue 26 as the pieces enter entrance vestibule 106 and make their way to electrode region 122. Before entering RF applicator 70, each applicator tray 24 and piece 22 (if present) is captured when exiting input conveyor section 30I and is aligned by central conveyor section 30C at applicator entrance 76. When tray 24 is released to move into RF applicator 70, piece 22 (or lack thereof) is detected and counted as it enters entrance vestibule 106 by sensor 160 sending a sensor signal Ss to PLC 220. PLC 220 receives sensor signal SS and in response thereto changes a bit in PLC register 221 in the control code for the RF applicator, which causes PLC control signal SC to make SCR 216 increase or decrease output voltage V3. Conveyor speeds of the input and central conveyor sections 30I and 30C are known and are used to calculate the position of piece 22 over time. Example conveyor speeds are 10 to 35 inches per minute, so that in an example embodiment pieces 22 can reside in electrode region 122 for a time ranging from about 5 to about 15 minutes.
As tray 24 is moved by central conveyor section 30C in the X-direction, the bit in PLC register 221 indicating the position of piece 22 is incremented, allowing the piece's position to be tracked as it transits RF applicator interior 80. This process is repeated for every piece 22 that enters RF applicator 70 so that the number NP of pieces 22 and their corresponding positions in the RF applicator interior 80 are known at any given time. In particular, the positions of pieces 22 within electrode region 122 are tracked so that the plate voltage VR can be adjusted to provide an appropriate amount of RF energy to electrode region 122 via electrode 130. In an example embodiment, each piece 22 presents a select load to electrode 130, and the plate voltage VR is changed in corresponding select increments ΔVR based on the select load.
Set Points and Parameters
A number of set points and parameters are used to control the amount of RF power P provided by electrode 130, which is determined by the RF voltage VRF, which is in turn determined by the plate voltage VR. It is assumed here that P=ε(VR)(iR) where iR is the plate current and ε is an efficiency factor. In an example embodiment, the plate current iR ranges from 1 to 10 Amperes (depending on the load), and the efficiency factor ε ranges from 60% to 80%.
There are four main operator-controlled set points, which are as follows:
PMIN=the minimum RF power, which is the power applied when electrode region 122 is empty and until the number of pieces NP reaches a minimum number NMIN of pieces in the electrode region;
PMAX=the maximum RF power, which is the power applied when the number of pieces NP in the electrode region is equal to or greater than a maximum number NMAX of pieces in the electrode region;
NMIN=the minimum number of pieces in the electrode region required to start the power ramp sequence to generate an increase in RF power P; and
NMAX=the maximum number of pieces needed in the electrode region before the maximum RF power PMAX is applied.
The main parameters used to establish the above-identified set point values are: the RF applicator feed rate, the RF applicator conveyor speed, the incoming piece dryness, and the measured piece temperatures. These parameters are inputted, provided to or otherwise detected by PLC 220.
There are two modes of applying RF power: a “power ramp-up mode” where the amount of applied RF power is incremented upward, and a “power ramp-down mode” where the amount of applied RF power P is decremented.
In power ramp-up mode, when NP=NMIN is reached as the RF applicator begins to be loaded with pieces 22, power ramp is applied incrementally as each additional piece enters the applicator. The incremental increase in RF power ΔPI is calculated as:
ΔPI=(PMAX−PMIN)/(NMAX−NMIN).
Once the piece count reaches NMAX and the RF power P=PMAX, the RF applicator continues to output PMAX as long as the piece count NP in the RF applicator is greater than or equal to the NMAX set point.
There are two forms of power ramp-down mode: small gap and large gap modes. During small gap mode, when the piece count NP in RF applicator 70 drops below the NMAX set point as the RF applicator is unloaded or during small gaps (e.g. missing pieces 22), the RF power P is decremented incrementally by ΔPI as previously defined. During large gap mode, which is when no pieces are loaded for at least 10 pieces or NP<Nmax and pieces are exiting the RF applicator, the plate voltage decrement ΔPD is calculated by:
ΔPD=[(PMAX−PMIN)Q]/(NMAX−NMIN).
where Q is the ramp down factor that is determined by process experimentation based on piece temperatures and dryness out of the RF Dryer, currently set at 0.5. The parameter Q is adjustable in the PLC code.
During the large gap mode, the RF power P is calculated by
P=(ΔPD)NP+PMIN
If the applicator begins to load during the ramp down sequence, one or more pieces 22 entering the RF applicator 70 will cause control unit 150 to switch the mode to the power ramp-up mode.
On the other hand, with control of plate voltage VR, the piece temperatures during the loading and unloading phases remained within a reasonable level (e.g., about +/−8° C. or so) as compared to the piece temperatures in the “steady load” phase. The ability to control the piece temperature during RF drying by controlling the RF power P via controlling the RF voltage VRF by controlling the plate voltage VR allows for consistent drying conditions for pieces 22, which translates into fewer overheated pieces and thus fewer damaged pieces.
Thus, in one aspect, a method is disclosed herein of drying a piece of ceramic greenware comprising a liquid at an original liquid content, the method comprising: exposing the piece to electromagnetic radiation at a first frequency sufficient to remove a first portion of the liquid from the piece; and then exposing the piece to electromagnetic radiation at a second frequency, the second frequency being different than the first frequency, sufficient to remove a second portion of the liquid from the piece. The piece preferably contains material susceptible to the electromagnetic radiation at the first frequency. Preferably, the first and second frequencies differ by more than 800 MHz; in some embodiments, the first and second frequencies differ by more than 800 MHz and not more than 3000 MHz; in some embodiments, the first frequency is in the range of 900 MHz to 2500 MHz; in some embodiments, the second frequency is in the range of 20 MHz to 40 MHz. In some embodiments, the first portion of the liquid removed is between 40% and 80% of the original liquid content. In some embodiments, the second portion of the liquid removed is greater than 0% and less than 60% of the original liquid content; in some of these embodiments, the second portion of the liquid removed is between 10% and 40% of the original liquid content.
In another aspect, a method is disclosed herein of drying pieces of ceramic greenware each comprising a liquid at an original liquid content, the method comprising: exposing the pieces to microwave energy sufficient to remove a first portion of the liquid from the pieces, and then exposing the pieces to radio-frequency (RF) energy sufficient to remove a second portion of the liquid from the pieces by passing a number of the pieces through an electrode region adjacent an electrode, wherein the electrode provides an amount of RF power in the electrode region based on the number of pieces in the electrode region. In some embodiments, the exposing to the microwave energy reduces a liquid content of at least one of the pieces by more than 40%. In some embodiments, the exposing to the microwave energy reduces a liquid content of at least one of the pieces by more than 50%. In some embodiments, the exposing to the microwave energy reduces a liquid content of at least one of the pieces by more than 75%. In some embodiments, the method further includes tracking the number of pieces within the electrode region; in some of these embodiments, the method includes sensing the presence of each piece in the electrode region with a sensor prior to the piece entering the electrode region, and providing a sensor signal from the sensor to a controller for each sensed piece. In some embodiments, at least one of the pieces contains less than 2 wt % liquid after being exposed to the RF energy. In some embodiments, at least one of the pieces contains more than 10 wt % liquid prior to being exposed to the microwave energy and contains less than 2 wt % liquid after being exposed to the RF energy. In some embodiments, the method includes providing the amount of RF power by providing a rectified plate voltage (VR), converting the plate voltage into a RF voltage (VRF), and providing the RF voltage to the electrode; in some of these embodiments, each piece in the electrode region presents a respective load to the RF electrode, and including changing the plate voltage in one or more increments in response to the load; in other embodiments, the plate voltage is in the range between 8 kV and 15 kV; in some embodiments, the method further includes changing the plate voltage by regulating at least one source voltage from a three-phase power source to provide at least one regulated source voltage; in some of these embodiments, the at least one regulated source voltage is regulated by using a silicon-controlled rectifier (SCR) controlled by a programmable logic controller (PLC); in other of these embodiments, the method further includes providing a plurality of source voltages, including the at least one regulated source voltage, to a step-up transformer so as to form a stepped-up AC transformer voltage, providing the transformer voltage to a rectifier to form the plate voltage, and providing the rectified plate voltage to a high-frequency DC/AC converter so as to form the RF voltage. In some embodiments, the method includes passing the pieces through the electrode region by a conveyor having a speed, and providing the conveyor speed to the PLC to track the number of pieces in the electrode region at a given time.
In another aspect, a radio-frequency (RF) source is disclosed herein for an RF applicator for controlling RF drying of pieces of ceramic greenware, the source comprising: a power supply having three source lines that initially carry respective AC source voltages V1, V2 and V3; at least one silicon-controlled rectifier (SCR) operably connected to at least one of the source lines and adapted to regulate at least one of the source voltages to provide at least one regulated source voltage; a step-up transformer operably coupled to the power supply and/or the SCR and configured to receive the source voltages, including the at least one regulated source voltage, and configured to generate therefrom a stepped-up AC transformer voltage VT; a rectifier configured to receive the AC transformer voltage and form a DC rectified plate voltage VR; a high-frequency DC/AC converter configured to receive DC rectified voltage VR and form a high-frequency AC RF voltage VRF; an electrode configured to receive the RF voltage VRF to generate RF energy in an electrode region wherein the pieces are subject to an amount of the RF energy that corresponds to the RF voltage VRF; and a programmable logic controller (PLC) operably coupled to the SCR and configured to cause the SCR to control at least one of the input voltages based on a number of pieces within the electrode region so as to control the plate voltage VR, in order to control the RF voltage VRF. In some embodiments, the source further includes a sensor operably coupled to the PLC and configured to detect a number of pieces of greenware entering the electrode region and in response thereto generate a sensor signal received by the PLC. In some embodiments, the plate voltage ranges from 8 kV to 15 kV. In another aspect, an RF applicator is disclosed herein comprising such RF source and a housing having a top and bottom portion, with the electrode arranged adjacent the top portion and wherein the bottom portion is beneath the electrode and is electrically grounded.
In another aspect, a method is disclosed herein of drying pieces of ceramic greenware, comprising: partially drying the pieces; and then substantially drying the pieces with RF energy from a RF source by passing the pieces through an electrode region of the RF source and varying the amount of RF energy in the electrode region based on the number of pieces in the electrode region; wherein the RF source includes an electrode electrically coupled to a control unit configured to change an amount of a plate voltage provided to the electrode as a RF voltage based on the number of pieces in the electrode region. In some embodiments, the method further includes tracking a number of pieces within the electrode region as a function of time. In some embodiments, each piece creates a select load to the RF electrode, and the method further comprises changing the plate voltage so as to change the RF voltage in corresponding select increments in response to said select load; in some of these embodiments, changing the plate voltage comprises regulating at least one of multiple input voltages provided by a power supply; in some embodiments, changing the plate voltage and RF voltage further comprises providing source voltages including the at least one regulated source voltage to a step-up transformer so as to form a stepped-up AC transformer voltage, providing the stepped-up AC transformer voltage to a rectifier to form the plate voltage as a DC rectified voltage, and providing the plate voltage to a high-frequency DC/AC converter so as to form the RF voltage.
It will be apparent to those skilled in the art that various modifications to the preferred embodiment of the invention as described herein can be made without departing from the spirit or scope of the invention as defined in the appended claims. Thus, it is intended that the present invention covers the modifications and variations of this invention provided they come within the scope of the appended claims and the equivalents thereto.
This application claims the benefit of priority to U.S. Provisional Application No. 61/130,505, filed on May 30, 2008.
Number | Name | Date | Kind |
---|---|---|---|
3446929 | Smith | May 1969 | A |
3452176 | Levinson | Jun 1969 | A |
3469053 | Levinson | Sep 1969 | A |
3569657 | Levinson | Mar 1971 | A |
3704523 | Guerga et al. | Dec 1972 | A |
4321042 | Scheicher | Mar 1982 | A |
4439929 | Kitagawa et al. | Apr 1984 | A |
4567340 | Latchum, Jr. | Jan 1986 | A |
4687895 | Chitre et al. | Aug 1987 | A |
4771153 | Fukushima et al. | Sep 1988 | A |
4806718 | Seaborne et al. | Feb 1989 | A |
4808780 | Seaborne | Feb 1989 | A |
4956530 | Koch | Sep 1990 | A |
4965427 | Seaborne | Oct 1990 | A |
4968865 | Seaborne et al. | Nov 1990 | A |
5098620 | Bradley et al. | Mar 1992 | A |
5110216 | Wickersheim et al. | May 1992 | A |
5183787 | Seaborne | Feb 1993 | A |
5194268 | Bradley et al. | Mar 1993 | A |
5227600 | Blake et al. | Jul 1993 | A |
5408074 | Warmbier et al. | Apr 1995 | A |
5560287 | Petelle et al. | Oct 1996 | A |
5808282 | Apte et al. | Sep 1998 | A |
5911941 | Rokhvarger et al. | Jun 1999 | A |
5961871 | Bible et al. | Oct 1999 | A |
6097019 | Lewis et al. | Aug 2000 | A |
6132671 | Beall et al. | Oct 2000 | A |
6157014 | Goranson | Dec 2000 | A |
6172346 | Wroe | Jan 2001 | B1 |
6222170 | Tucker et al. | Apr 2001 | B1 |
6246040 | Gunn | Jun 2001 | B1 |
6350973 | Wroe et al. | Feb 2002 | B2 |
6382964 | Sakamoto et al. | May 2002 | B2 |
6462320 | Fuls et al. | Oct 2002 | B1 |
6725567 | Yano et al. | Apr 2004 | B2 |
7017278 | Kato | Mar 2006 | B2 |
7087874 | Ishikawa et al. | Aug 2006 | B2 |
7197839 | Terazawa et al. | Apr 2007 | B2 |
7208710 | Gregoire et al. | Apr 2007 | B2 |
8207479 | Ben-Shmuel et al. | Jun 2012 | B2 |
8224892 | Bogatin et al. | Jul 2012 | B2 |
20020047009 | Flugstad et al. | Apr 2002 | A1 |
20020084555 | Araya et al. | Jul 2002 | A1 |
20020179596 | Tracy et al. | Dec 2002 | A1 |
20030205571 | Flugstad et al. | Nov 2003 | A1 |
20040240817 | Hawtof et al. | Dec 2004 | A1 |
20050187094 | Hayashi | Aug 2005 | A1 |
20050261795 | Ghosh et al. | Nov 2005 | A1 |
20070235450 | Quantrille et al. | Oct 2007 | A1 |
20070295716 | Quantrille et al. | Dec 2007 | A1 |
20080023886 | Adrian et al. | Jan 2008 | A1 |
20080303181 | Holand et al. | Dec 2008 | A1 |
20100043248 | Cervoni et al. | Feb 2010 | A1 |
Number | Date | Country | |
---|---|---|---|
20090294440 A1 | Dec 2009 | US |
Number | Date | Country | |
---|---|---|---|
61130505 | May 2008 | US |