Patent Application
20230126790
The present disclosure relates generally to technology for particle therapy and, for example, to systems and methods that generate a beam of charged particles by applying energy to a target.
Commercial particle therapy centers are currently rare due to disadvantages in existing particle therapy systems, which generate particle beams by using large and costly particle accelerators. Accelerator-based systems can be massive and are not scalable. The energy requirements and maintenance costs inherent in operating an accelerator-based system are also immense. Taken together, these disadvantages lead to exorbitant construction and maintenance costs associated with particle therapy. In addition to the extravagant costs associated with accelerator-based particle beam generation, adjusting certain properties of the particle beam (e.g., the beam energy and beam flux) can be cumbersome and time-consuming in such systems. This leads to longer treatment times and low patient throughput, further increasing the cost of individual treatments as fewer patients share the cost burden. Accordingly, few particle therapy centers currently exist, and patients often receive inferior treatments due, in part, to unavailability of particle therapy.
The systems and methods of the present disclosure are directed towards improving performance of particle therapy systems. Although the embodiments disclosed herein contemplate the medical application of particle beam therapy, a person of ordinary skill in the art would understand that the novel particle beam generating methods and systems described below can be used in any application where such a particle beam is desired.
Embodiments consistent with the present disclosure provide systems, methods, and devices for particle therapy. Consistent with the disclosed embodiments, an exemplary system may generate and direct an electromagnetic radiation beam for irradiating a target to produce a beam of charged particles. The exemplary system may deliver the beam of charged particles to tumor within a patient’s body.
In one embodiment, a particle therapy system is provided. The particle therapy system may include an interaction chamber for containing a target and an electromagnetic radiation source configured to generate a pulsed electromagnetic radiation beam of at least 100 terawatts and at a repetition rate of at least 20 Hz. The particle therapy system may include optics configured to direct the pulsed electromagnetic radiation beam along a path towards a target in the interaction chamber. The particle therapy system may include at least one actuator configured to cause relative movement between the target and the electromagnetic radiation beam at a speed associated with the repetition rate of the electromagnetic radiation source, to thereby vary a location of interaction of the pulsed electromagnetic radiation beam on a surface of the target and thereby cause a resultant emission from the target of at least 3×106 charged particles per pulse.
In another embodiment, a particle therapy system may include an interaction chamber configured to contain a target that emits charged particles in response to energy application. The particle therapy system may include an energy source for applying energy to the target and a magnetic beam line for directing a beam of charged particles from the target to a tumor of a patient in a manner that enables charged particles to strike the tumor at differing tumor locations. The particle therapy system may include at least one processor configured to selectively direct energy from the energy source to differing locations on the target. Additionally or alternatively, the at least one processor may selectively control a relative movement between the beam of charged particles and the patient to strike the tumor with charged particles at differing tumor locations.
In another embodiment, a particle therapy system may include an interaction chamber configured to contain a target having a surface with a plurality of regions thereon. The particle therapy system may also include at least one energy source and at least one processor. The at least one processor may be configured to cause the at least one energy source to deliver energy to the target in a manner causing formation of an electron cloud with a density of between 1015 cm-3 and 1021 cm-3 in a vicinity of at least some plurality of regions. The at least one processor may be configured to cause the at least one energy source to irradiate the target while the electron cloud is in the vicinity of the at least some of the plurality of regions, to thereby cause a plurality of charged particles to emanate from the target. The particle therapy system may include a beamline configured to deliver the plurality of charged particles to a patient.
In another embodiment, a particle therapy system may include an interaction chamber configured to contain a target. The particle therapy system may include at least one electromagnetic radiation source and at least one processor. The at least one processor may be configured to cause a pulsed beam of charged particles to be emitted from the target by regulating the at least one electromagnetic radiation source to irradiate the target with a plurality of pulse chains, each pulse chain including a preliminary pulse and a main pulse, wherein the preliminary pulse may exceed an energy flux threshold and has an energy flux on target of between 0.1 and 15 J/cm2. The main pulse may have an intensity on target of at least 1018 w/cm2, and a time separation between the preliminary pulse and the main pulse may be between 0.5 ns and 50 ns, such that during the time separation the target is free from irradiation exceeding the energy flux threshold.
In another embodiment, a particle therapy system may include an interaction chamber configured to contain a target and an electromagnetic radiation source configured to generate a pulsed electromagnetic radiation beam for irradiating the target and to thereby produce a polyenergetic particle beam containing multiple energy levels spanning at least 5 MeV. The particle therapy system may include a data interface configured to receive data associated with a treatment plan for a tumor and at least one processor configured to enable selection of a subset of the multiple energy levels that conforms with a treatment plan for the tumor. The particle therapy system may include a magnetic beamline configured to deliver to the tumor a portion of the polyenergetic particle beam associated with the selected subset of multiple energy levels.
Consistent with other disclosed embodiments, non-transitory computer-readable storage media may store program instructions, which are executed by at least one processor and perform any of the methods described herein.
The foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the claims.
The accompanying drawings, which are incorporated in and constitute a part of this disclosure, illustrate various disclosed embodiments. In the drawings:
The following detailed description includes references to the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or similar parts. While several illustrative embodiments are described herein, modifications, adaptations and other implementations are possible. For example, substitutions, additions, or modifications may be made to the components illustrated in the drawings, and the illustrative methods described herein may be modified by substituting, reordering, removing, or adding steps to the disclosed methods. Accordingly, the following detailed description is not limited to the disclosed embodiments and examples. Instead, the proper scope is defined by the appended claims.
Disclosed embodiments involve a particle therapy system. As used herein, the term “particle therapy” refers to a particle therapy medical procedure that uses a beam of particles to irradiate diseased tissue, most often in the treatment of cancer. While this description refers to this therapeutic procedure, it is to be understood that the intended scope of the innovations herein are not limited to therapy or medical procedures. Rather, it may apply any time such a particle beam is generated for any purpose. In addition, while the present disclosure generally describes a particle therapy system designed to irradiate a patient with a beam of positively charged particles (e.g., ions or protons), it may be modified easily to irradiate a patient with a beam of negatively charged particles (e.g., electrons) in the therapy medical procedure.
A particle therapy system in accordance with the present disclosure may include one or more sources for generating electromagnetic radiation. The term “electromagnetic radiation,” as used in the present disclosure, may refer to any form of electromagnetic radiation having any wavelength, frequency, energy, power, polarization, and/or spatial or temporal profile. In some embodiments, electromagnetic radiation may propagate in the form of a beam. For example, an electromagnetic radiation beam may be any form of electromagnetic radiation suitable for irradiating a desired location. In some embodiments, the particle therapy system may be configured to provide an electromagnetic radiation beam along a trajectory. An electromagnetic radiation beam may be configured for irradiating a target for generating charged particles (described in further detail below). As an example, an electromagnetic radiation source may provide a laser beam having traits tailored based on properties of a target. The electromagnetic radiation source may generate a pulsed electromagnetic beam to thereby cause a pulsed particle beam, or it may generate a continuous electromagnetic beam to thereby cause a continuous particle beam. Additional details on the electromagnetic radiation source are described below with reference to
A particle therapy system in accordance with the present disclosure may include optics components interacting with the electromagnetic radiation beam. As used in the present disclosure, the term “optics components,” or simply “optics,” may refer to any one or more components for controlling and manipulating an electromagnetic radiation beam in any manner, including, for example, shaping, directing, filtering, splitting, delaying, modulating, absorbing, amplifying, focusing, chopping, and/or reflecting an electromagnetic radiation beam. By way of example only, the optics components may include, light sources, lenses, mirrors, prisms, beam splitters, collimators, polarizing optics, optical modulators, optical switches, optical amplifiers, optical detectors, optical sensors, fiber optics, and/or semiconductor optic components. While each of the components listed above may not necessarily be required, they may be part of the particle therapy system. In addition to the one or more optical components, the particle therapy system may include non-optical components, such as electrical components, mechanical components, chemical reaction components, and semiconductor components. Such non-optical components may cooperate with optical components of the particle therapy system. For example, the optics components may include adaptive optics, such as an adaptive mirror connected to an actuator. In some embodiments, the electromagnetic radiation source may include one or more optics components to facilitate formation of the electromagnetic radiation beam. Additional details on optics components are described below with reference to
A particle therapy system in accordance with the present disclosure may include an interaction chamber configured to contain a target. As used in the present disclosure, the term “interaction chamber” may refer to any structure configured to isolate the target from ambient conditions and to provide an appropriate environment for particle generation. The interaction chamber may include one or more components for temperature adjustment, one or more components for pressure adjustment, one or more sensors for monitoring the conditions inside the interaction chamber, one or more sensors for monitoring properties associated with an interaction between an electromagnetic radiation beam and the target, one or more components for directing an electromagnetic radiation beam to the target, one or more particle beam adjustment components for directing charged particles, and more. Additional details on the interaction chamber are described below with reference to
A particle therapy system in accordance with the present disclosure may include a target for generating charged particles in response to electromagnetic irradiation. As used in the present disclosure, the term “target” may refer to any material, apparatus, or combination of elements configured for generating charged particles in response to energy application. As described below, the target may be configured for generating a proton beam; however, protons serve only as an example to the generated charged particles. In some embodiments, the target may be provided with a plurality of patterned features or microstructure elements. For example, the target may include a plurality of protrusions extending from a surface of the target. In some embodiments, the target may be patterned with one or more knife edges. For example, a knife edge of the target may include one or more narrow edges, similar to an arête or the edge of a blade. Consistent with the present disclosure, the particle therapy system may raster the electromagnetic radiation beam over the target. As used in the present disclosure, rastering may refer to a pattern of sequential scanning over a surface or volume having any shape. Rastering may be achieved by one or more motors configured to cause an electromagnetic radiation beam to sequentially scan a surface or volume. In some embodiments, an electromagnetic radiation beam may be rastered over individual patterned features of target, individual microstructure elements of target, or a knife edge of target. In some embodiments, an adaptive mirror may be configured to direct an electromagnetic radiation beam to strike individual features or individual microstructure elements of the target. Additional details on the target are described below with reference to
A particle therapy system in accordance with the present disclosure may include a beamline for delivering the generated charged particles to a patient. As used in the present disclosure, the term “beamline” may refer to any one or more components for manipulating and/or controlling a particle beam in any manner, including, for example, accelerating, analyzing, directing, shaping, filtering, splitting, delaying, modulating, absorbing, amplifying, focusing, chopping, and/or reflecting a particle beam. For example, a beamline may include one or more collimators, energy degraders, time-of-flight control units, magnetic dipoles, magnetic multipoles, solenoids or any other component suitable for manipulating charged particles. In some embodiments, the beamline may include a movable gantry for steering the beam of charged particles relative to the patient. A gantry may refer to any apparatus configured to assist in directing radiation toward a treatment volume. The treatment volume may include a group of cells or an area of tissue. For example, the treatment volume may be a tumor within a patient’s body. As mentioned above, a particle therapy system is merely one application of the disclosed systems; thus, the beamline may also be used to direct a particle beam toward different locations. Additional details on the beamline are described below with reference to
Consistent with disclosed embodiments, the particle therapy system may include or communicate with at least one processor configured to execute certain functions. The at least one processor may constitute any physical device having an electric circuit that performs a logic operation on an input or inputs. For example, the at least one processor may include one or more integrated circuits (ICs), including application-specific integrated circuits (ASICs), microchips, microcontrollers, microprocessors, all or part of a central processing unit (CPU), graphics processing unit (GPU), digital signal processor (DSP), field-programmable gate array (FPGA), or other circuits suitable for executing instructions or performing logic operations. Instructions executed by the at least one processor may be pre-loaded into a memory integrated with or embedded into the controller or may be stored in a separate memory. The memory may comprise a Random-Access Memory (RAM), a Read-Only Memory (ROM), a hard disk, an optical disk, a magnetic medium, a flash memory, other permanent, fixed, or volatile memory, or any other mechanism capable of storing such instructions. In some embodiments, the memory is configured to store information representative data about a scheduled treatment plan of a patient. In some embodiments, the at least one processor may include more than one processor. Each processor may have a similar construction, or the processors may be of differing constructions that are electrically connected or disconnected from each other. For example, the processors may be separate circuits or integrated in a single circuit. When more than one processor is used, the processors may be configured to operate independently or collaboratively. The processors may be coupled electrically, magnetically, optically, acoustically, mechanically or by other means that permit them to interact. Additional details on the processing unit and the at least one processor are described below with reference to
Consistent with the present disclosure, electromagnetic radiation source 102 may generate electromagnetic radiation beam 104 for applying energy to target 110. In some embodiments, electromagnetic radiation source 102 may comprise one or more gas lasers (e.g., CO2 lasers), diode pumped solid state (DPSS) lasers (e.g., yitterbium lasers, neodymium-doped yttrium aluminum garnet lasers (Nd:YAG), or titanium-sapphire lasers (Ti:Sapphire)), and/or flashlamp-pumped solid-state lasers (e.g., Nd:YAG or neodymium glass). In a broader sense, any radiation source capable of causing a release of particles from target 110 may be employed. Electromagnetic radiation source 102 may be selected based on its intensity, i.e., the energy divided by the temporal duration of the pulse and the spot size of the laser on target 110. A variety of combinations of spatial profile (e.g., spot size, shape, and distribution), wavelength, temporal duration, and energy may be used while still providing the same intensity. For example, in some embodiments, electromagnetic radiation beam 104 may be within an energy range of 1 J to about 25,000 J, and a wavelength range of about 400 nm to about 10,000 nm. Electromagnetic radiation beam 104 may be pulsed, for example with a pulse width range of about 10 fs to 100 ns. Unless indicated otherwise, the term “about” with regards to a numeric value refers to a variance of up to approximately 5% with respect to the stated value. Electromagnetic radiation beam 104 may have various spot sizes. In some embodiments, a spot size between about 1 µm2 and about 1 cm2 may be used. Although spatial profiles of electromagnetic radiation beam 104 may have any beam profile, in some embodiments the spatial profile may include a Gaussian, super-Gaussian, Top Hat, Bessel, or annular beam profile.
As a more specific example, electromagnetic radiation source 102 may be a Ti:Sapphire laser. In the example of the Ti:Sapphire laser, electromagnetic radiation beam 104 may be within an energy range of about 1 J to 25 J and have a wavelength of about 800 nm. In this example, electromagnetic radiation beam 104 may have a pulse width range of about 10 fs to 400 fs, a spot size between about 2 µm2 and 1 mm2, and a Gaussian or Top Hat spatial profile. These properties are merely exemplary, and other configurations may be employed. Additional details on electromagnetic radiation source 102 are disclosed below with reference to
Consistent with the present disclosure, electromagnetic radiation beam 104 may be directed to target 110 by one or more optics 106 disposed, for example, along a trajectory between electromagnetic radiation source 102 and target 110. Electromagnetic radiation beam 104 may include a defined energy, wavelength, power, energy, polarization (or it may not be polarized), spatial profile, and/or temporal profile. Any of the properties of electromagnetic radiation beam 104 may be fixed or may vary. Optics 106 may include one or more optical and/or mechanical components configured to alter properties of electromagnetic radiation beam 104, including spectral properties, spatial properties, temporal properties, energy, polarization, contrast ratio, or other properties. Optics 106 may include a wide variety of optical elements, such as lenses, mirrors, laser crystals and other lasing materials, piezo-activated mirrors, plates, prisms, beam splitters, filters, light pipes, windows, blanks, optical fibers, frequency shifters, optical amplifiers, gratings, pulse shapers, XPW, Mazzler (or Dazzler) filters, polarizers, Pockels cells, optical modulators, apertures, saturable absorbers, and other optical elements. Additional example and details on optics 106 are disclosed below with reference to
Consistent with the present disclosure, electromagnetic radiation beam 104 may strike target 110 disposed within interaction chamber 108 configured to isolate target 110 from the outside environment. In a first example, interaction chamber 108 may contain a hydrogen-rich target, and the generated charged particles may be protons. In a second example, interaction chamber 108 may contain a carbon-rich target, and the generated charged particles may be carbon ions. In some embodiments, target 110 may have a surface on which microstructured elements are disposed. Such microstructured elements may be composed of one or more suitable materials, including ice (also referred to as “snow”), plastic, silicon, stainless steel, a variety of metals, carbon and/or any other material from which the particle beam may be generated. Such microstructured elements may be randomly arranged, arranged as defined by a growth or deposition process, and/or arranged in a patterned array. The microstructured elements may be configured based on one or more attributes of electromagnetic radiation beam 104. For example, such microstructured elements may have a dimension smaller than a wavelength of electromagnetic radiation beam 104, such less than third of the wavelength of electromagnetic radiation beam 104.
When target 110 is struck by electromagnetic radiation beam 104, it may emit a variety of particles, including electrons, protons, x-rays, and other particles. The emitted particles are used to form particle beam 112. Target 110 may be configured such that it includes one or more individual microstructured elements configured to interact with electromagnetic radiation beam 104. Alternatively or additionally, target 110 may include a continuous surface or texture formed from a material favorable for interaction with electromagnetic radiation beam 104. Those of skill in the art will understand that there are numerous configurations that may be employed to emit particles upon interaction with an electromagnetic radiation beam and that the disclosed details are merely exemplary.
Consistent with the present disclosure, beamline 114 is designed for forming a particle beam 112 from the particles emitted by target 110 and for directing particle beam 112 to treatment volume 120. Beamline 114 may be configured to be manipulated in one or more ways to influence the path of particle beam 112. Specifically, beamline 114 may include any equipment capable of manipulating charged particles, such as protons. For example, beamline 114 may include electromagnetic components. More specifically, beamline 114 may include one or more electromagnetic constituents, such as a quadrupole lens, cylindrical mirror lens/analyzer (CMA), spherical mirror lens/analyzer (SMA), collimator, energy degrader, time-of-flight control unit, magnetic dipole, or any other component suitable for manipulating charged particles. Beamline 114 may be used to adjust one or more properties of the particle beam 112. For example, beamline 114 may manipulate properties such as flux or spot size. Beamline 114 may filter particles having particular energies or reduce the energy of various particles. Beamline 114 may include one or more particle beam adjustment components disposed in various locations within particle therapy system 100. For example, the particle beam adjustment components may be located inside interaction chamber 108, within an associated beamline 114, or any combination thereof. In some embodiments, beamline 114 may be configured to maintain various conditions such as temperature, pressure (e.g., vacuum), or other conditions conducive to propagating and/or manipulating particle beam 112. Beamline 114 may further include other components for housing charged particle beams, including, but not limited to, elements such as beam dumps, beam attenuators, and protective shielding. Additional details of beamline 114 consistent with embodiments of the disclosure are discussed in further detail below with reference to
Consistent with the present disclosure, patient 118 may be positioned on support platform 116. Support platform 116 may be any shape or form suitable for use with the other components of particle therapy system 100 and conducive to supporting patient 118 during treatment. Support platform 116 may be fixed in place relative to beamline 114, or support platform 116 may be configured for translation and/or rotation relative to beamline 114 prior to or during treatment. In some embodiments, support platform 116 may be adjusted to accommodate patients of different sizes or to position a treatment volume in a path of particle beam 112. In some embodiments support platform 116 may be adjusted during treatment to reposition the treatment volume relative to particle beam 112.
Control system 122 (or simply controller 122) may facilitate monitoring and/or control of various aspects of particle therapy system 100. For example, controller 122 may monitor various detectors associated with electromagnetic radiation source 102, optics 106, interaction chamber 108, beamline 114, and/or support platform 116. Controller 122 may also accept input from a user of system 100, such as a technician or other operator. Controller 122 may also accept, store, and/or execute operations pertaining to particle therapy system 100, including, for example, initiating and maintaining any functionalities of particle therapy system 100. In some embodiments, control system 122 may receive data associated with a treatment plan for treatment volume 120. Controller 122 may operate particle therapy system 100 to conform with the treatment plan. For example, controller 122 may define the energy levels of the particles that are to hit treatment volume 120. Controller 122 may be configured to implement feedback between one or more detectors and one or more of the various components of particle therapy system 100. For example, such feedback may improve precision, efficiency, speed, and/or other aspects of particle therapy system 100 or its operation. Examples of such feedback are described in greater detail below. Additional details of controller 122 are disclosed below with reference to
Oscillator 202 may include one or more lasers for generating an initial laser pulse 218 to be manipulated (e.g., shaped and/or amplified) to reach requirements for electromagnetic radiation beam 104. A wide variety of lasers or laser systems may be used as oscillator 202, including commercially available laser systems.
Pump source 204 may include independent lasers or laser systems configured to transfer energy into laser pulse 218. In some embodiments, pump source 204A may be connected to the output of oscillator 202 by an optical beamline incorporating one or more of optics 106. Additionally or alternatively, pump source 204 may include other pump mechanisms such as flash lamps, diode lasers, and diode-pumped solid-state (DPSS) lasers, or the like. In some embodiments, pump source 204 may be configured to alter a temporal profile of electromagnetic radiation beam 104. For example, control system 122 may be configured to control a timing of pump source 204A, thereby controlling characteristics of electromagnetic radiation beam 104, e.g., adjusting the timing of a pre-pulse of the electromagnetic radiation beam.
Optics components 206 may include any of the components discussed in relation to optics 106 and may perform any of the roles and/or functions described in relation to optics 106. Diagnostics 208 may include optical, opto-mechanical, and/or electronic components designed to monitor laser pulse 218, such as, its temporal and spatial properties, spectral properties, timing, and/or other properties. More specifically, diagnostics 208 may include one or more photodiodes, oscilloscopes, cameras, spectrometers, phase sensors, auto-correlators, cross-correlators, power meters or energy meters, laser position and/or direction sensors (e.g., pointing sensors), dazzlers or mazzlers, etc. Diagnostics 208 may also include or incorporate any of the components identified above with respect to optics components 206.
Stretcher 210 may be configured to chirp or stretch laser pulse 218. More specifically, stretcher 210 may include diffraction gratings or other dispersive components, such as prisms, chirped mirrors, and the like. Amplifier 212 may comprise an amplification medium such as, for example, titanium sapphire crystal, CO2 gas, or Nd:YAG crystal. Amplifier 212 may include a holder for the amplification medium. The holder may be configured to be compatible with supporting environmental conditions, such as positioning, temperature, and others. Amplifier 212 may be configured to receive energy from additional pump source 204B and transfer this energy to laser pulse 218.
Compressor 214 may include one or more optical components configured to compress laser pulse 218 temporally, for example to a final temporal duration. Compressor 214 may be constructed from diffraction gratings positioned on holders and positioned in a vacuum chamber. Alternatively, compressor 214 may be constructed of dispersion fibers or prisms. Compressor 214 may include mirrors or other optics components 306, motors, and/or electronically controlled opto-mechanics.
Controller 216 may include one or more electronic systems that control and/or synchronize various components of electromagnetic radiation source 102. Controller 216 may include any combination of controllers, power supplies, computers, processors, pulse generators, high-voltage power supplies, and/or other components. As an example, controller 216 may include one or more computing systems 500, which may be dedicated to electromagnetic radiation source 102 or shared with other components of system 100. In some embodiments, some or all of the functions of controller 216 may be performed by controller 122 of system 100.
Controller 216 may interface with various components of electromagnetic radiation source 102 and other components of system 100 via communication channels. The communication channels may be configured to transmit electrical or other signals to control various optical or opto-mechanical components associated with electromagnetic radiation source 102 or system 100. The communication channels may include a conductor compatible with high voltage, electrical triggers, various wired or wireless communication protocols, optical communications, or other components.
Consistent with the present disclosure, electromagnetic radiation beam 104 may be manipulated by optics 106. For example, optics 106 may be configured for various uses, such as laser beam steering, laser beam diagnostics, laser-target interaction diagnostics, and/or target viewing and positioning. Optics 106 may be disposed in various places along the path of electromagnetic radiation beam 104 between electromagnetic radiation source 102 and target 110, or in any other system of system 100 where optical components are desired. In some embodiments, optics 106 may be tailored to parameters related to an intended beam. For example, optics 106 may be tailored in terms of wavelength, intensity, temporal pulse shape (e.g., pulse width), spatial size and energy distribution, polarization, and other properties of the intended beam. Such beam parameters may relate to an optics substrate material, size (e.g., lateral size or thickness), coating material (if any), shape (e.g., planar, spherical, or other), orientation relative to a beam, or other specifications.
Optics 106 may be disposed in specific environmental conditions, such as a vacuum and/or an environment purged by one or more gasses. In some embodiments, the lifespan of optics 106 may vary. Some optics 106 may be long-term equipment, reused numerous times. Alternatively or additionally, some optics 106 may be consumable, used fewer times and replaced. Such classification may be based on a number of factors such as laser intensity and presence of debris/contamination. In some use cases, debris shielding may be installed proximate to expensive or delicate optics to reduce a need for frequent replacements. Periodic examination may be performed for optics suspected to be damaged. Specialized optical systems may be installed to examine optics at risk. In addition, optics 106 may be manipulated manually, automatically, or by any combination thereof. Input types for manipulating optics 106 may include high voltage signals, triggering signals, optical pumping, or any other form of input. Further, optics 106 may be monitored by one or more cameras, such as CCD cameras. Automatic manipulation of adaptive mirrors may occur, for example, in response to one or more signals provided by the control system 122. The control system 122 may control one or more motors, piezoelectric elements, microelectromechanical (MEMS) elements, and/or the like associated with a deformable mirror. Alternatively or additionally, the control system 122 may control one or more laser pulses, anti-reflective coated substrates, and/or the like associated with a plasma mirror.
Consistent with the present disclosure, optics 106 may be fixed or adaptive. For example, optics 106 may include one or more active, adaptive, or reconfigurable components, such as deformable mirrors, plasma mirrors, Pockels cells, phase shifters, optical modulators, irises, shutters (manually or computer controlled), and other similar components. In some embodiments, the adaptive properties of optics 106 as well as properties of electromagnetic radiation beam 104 may be manipulated, as in the case of a deformable mirror or plasma mirror. Examples of deformable mirrors that may be included in optics 106 include, for example, segmented mirrors, continuous faceplate mirrors, magnetic mirrors, MEMS mirrors, membrane mirrors, bimorph mirrors, and/or ferrofluidic mirrors. Any number of other mirror technologies capable of altering the wave front of electromagnetic radiation beam 104 may also be used. Examples of plasma mirrors that may be employed in optics 106 include a laser pulse focused onto an anti-reflective coated substrate. The plasma mirrors may be established by directing the laser pulse towards a parabolic mirror located in front of the anti-reflective coated substrate, or any other way.
In some implementations, optics 106 may include one or more adaptive optics. As used in the present disclosure, an adaptive optics may refer to an element that includes a reflective surface that may be adapted. For example, an adaptive mirror may be a deformable mirror that comprises a plurality of facets, each of the plurality of facets being independently controllable by digital logic. As another example, an adaptive mirror may be a plasma mirror that comprises a laser pulse focused onto an anti-reflective coated substrate, one or both of the laser pulse and anti-reflective coated substrate being controllable by digital logic. In some embodiments, an adaptive mirror may be configured to direct electromagnetic radiation beam 104 at target 110, thereby facilitating formation of particle beam 112. An adaptive mirror in accordance with the present disclosure may be configured to adjust or control a spatial profile of electromagnetic radiation beam 104 and/or to adjust or control at least one of a relative position and orientation between electromagnetic radiation beam 104 and target 110. In some instances, an adaptive mirror may be configured to direct electromagnetic radiation beam 104 by adjusting one or more property of electromagnetic radiation beam 104. For example, adjustment may be achieved by at least one of adjusting a focus of electromagnetic radiation beam 104, diverting electromagnetic radiation beam 104, and scanning electromagnetic radiation beam 104.
In some embodiments, the adaptive mirror may be configured such that electromagnetic radiation beam 104 will sequentially or simultaneously strike a plurality of locations on target 110 or a plurality of targets 110 disposed in different locations within system 100. In such configurations, an adaptive mirror or other optics 106 may alter the path of electromagnetic radiation beam 104 to direct the beam onto the multiple locations and/or plurality of targets. For example, an adaptive mirror or other optics 106 may sequentially divert (e.g., scan) electromagnetic radiation beam 104 from one location to an adjacent location in a pattern continuously or intermittently, such as in a stepwise manner. In an automated process, control system 122 may be configured to cause the adaptive mirror to direct electromagnetic radiation beam 104 at predetermined locations on the surface of target 110. For example, it may be advantageous to scan electromagnetic radiation beam 104 over a patterned array of particle-generating features or microstructure elements provided at a surface of target 110. It may also be advantageous to scan electromagnetic radiation beam 104 over target 110 that includes a plurality of particle-generating structures substantially oriented along a common axis, such as protrusions substantially extending away from a surface of target 110. It may also be advantageous to scan electromagnetic radiation beam 104 over target 110 patterned with one or more knife edges, such as target that includes one or more features having a narrow edge similar to an arête or the edge of a blade. The adaptive mirror is described as an example. Those of skill in the art will recognize that other optics 106 may perform the same or similar functions as those described above in reference to the adaptive mirror.
The orientation of stage 302 may be fixed or adjustable by causing a translation and/or rotation along one or more axes. In one embodiment, stage 302 may be associated with a motor and the movement of the motor may adjust stage 302 to alter the relative orientation between electromagnetic radiation beam 104 and target 110. Specifically, stage 302 may be associated with one or more corresponding holders configured to hold stage 302 in place while allowing positioning of stage 302 to an appropriate degree of accuracy, for example translation and rotation, as well as other degrees of freedom. Such degrees of freedom may be manipulated manually or via any appropriate automatic means, such as electric motors. The adjustment of stage 302 may be manual or automated. Automated adjustment may be performed, for example, in response to one or more signals provided by control system 122. For example, feedback signals may relate to measured properties of the laser-target interaction, and, in response, control system 122 may provide a control signal to a motor connected to stage 302.
In some embodiments, stage 302 may optionally be configured to heat, cool, or maintain the temperature of target 110. The temperature control may be achieved, for example, by monitoring the temperature of target 110 and raising, lowering, or maintaining the temperature of target 110 in response to the measured temperature. In one example, temperature monitoring may be achieved with one or more thermocouples, one or more infrared temperature sensors, and/or any other technique used to measure temperature. Temperature adjustment may be made, for example, by adjusting the amount of electric current flowing through a heating element. The heating element may be, for example, a refractory metal such as tungsten, rhenium, tantalum, molybdenum niobium, and/or alloys thereof. Temperature adjustment may also be made, for example, by flowing a coolant, such as water or a cryogenic fluid (e.g., liquid oxygen, liquid helium, liquid nitrogen, etc.) through a conduit directly or indirectly placed in thermal communication with target 110. As a person of ordinary skill in the art would appreciate, these exemplary manners of adjusting temperature are compatible and may be combined. Of course, these temperature adjustment methods are not limiting, and any other known method for heating, cooling, and or maintaining the temperature of target 110 may be used with the disclosures herein.
Consistent with the present disclosure, upon striking target 110, an interaction of electromagnetic radiation beam 104 and target 110 may generate various charged particles that may be used in particle beam 112. In some embodiments, charged particles may be emitted at a particle energy of about 250 MeV from a location on target 110 struck by electromagnetic radiation beam 104 focused to a spot size of about 10 to 100 µm. The two-dimensional divergence angle of charged particles emitted from target 110 may be about 0.2 radians (i.e., about 11 degrees). In addition, particle energy angular distribution ∂Ω/∂E and particle number energy distribution ∂N/∂E may be very small so that the energy angular distribution and particle number energy distribution are reasonably constant. As an example, a pulse of electromagnetic radiation beam 104 may result in the emission of about 108 charged particles, and pulses may be repeated at a rate of about 10 to 1000 Hz. Accordingly, a pulsed electromagnetic radiation beam 104 may thereby produce a pulsed particle beam 112. A pulse of charged particles may also be referred to as a particle “bunch.”
Interaction chamber 108 may also include one or more vacuum pumps 304. For example, either or both of sample preparation and particle beam formation may have sub-atmospheric pressure requirements or may achieve optimal performance within a particular range of sub-atmospheric pressures. Vacuum pump 304 may be used to influence pressure conditions within interaction chamber 108 and/or components associated with interaction chamber 108. For example, vacuum pump 304 may maintain a vacuum condition or near-vacuum condition in interaction chamber 108. Examples of vacuum pump 304 may include one or more turbo-molecular pumps, cryogenic pumps, particle pumps, or mechanical pumps, such as diaphragm or roots pumps. Vacuum pump 304 may operate in conjunction with one or more pressure regulators and/or valves (not shown in the figures).
Interaction chamber 108 may also include optics components 306. Any of the components noted above with respect to optics 106 may be used inside the interaction chamber to direct electromagnetic radiation beam 104. For example, as shown in
Interaction chamber 108 may also include one or more valves 314. Any suitable valve may be used and may be located, for example, between various portions of interaction chamber 108 or between interaction chamber 108 and other components of system 100 or its ambient environment. Valve 314 may be configured, for example, to isolate vacuum pump 304 or beamline 114. Valve 314 may be manual or automatic. Automatic valves may be, for example, pneumatic and/or electronic. Valve 314 may be simple open/close valves, such as a two-position gate valve, or valve 314 may be configured to be partially open. Valve 314, associated with vacuum pump 304, may include one or more butterfly valves that can vary continuously between open and closed states. Valve 314 may be configured to maintain pressure, retain or release materials, and/or allow access to interaction chamber 108 for maintenance of parts or replacement of targets.
Interaction chamber 108 may also include one or more shutters 316. Shutter 316 may be configured to block or allow electromagnetic radiation beam 104 into interaction chamber 108. In some examples, shutter 316 may be a simple open/close shutter. Shutters 316 may also be configured to chop electromagnetic radiation beam 104 if desired. Operation of shutter 316 may be manual or automated. Automated operation may occur, for example, in response to one or more signals provided by control system 122. Interaction chamber 108 may also include one or more windows 318. Windows 318 may be composed of any material suitable for the pressure, temperature, and other environmental factors associated with interaction chamber 108.
Interaction chamber 108 may also include one or more sensors 320. Sensors 320 may be configured to measure conditions associated with interaction chamber 108. As used herein, a sensor may refer to a device that detects one or more properties of a sample chamber condition, an electromagnetic radiation source or beam, a particle beam, and/or a laser-target interaction. Sensor 320 may observe any condition within and/or proximate to the interaction chamber. In some embodiments, a system for generating a particle beam may include other sensors separate from an interaction chamber. As an example, a sensor may be configured to measure at least one laser-target interaction property. As used in the present disclosure, a laser-target interaction may refer to an observable property related to the interaction of an electromagnetic radiation beam with target. Laser-target interaction properties may include, for example, a particle beam property, a secondary electron emission property, an x-ray emission property, a particle beam energy, a particle beam flux, and/or other property indicative of the interaction between electromagnetic radiation beam 104 and target 110. In some embodiments, measurements may be taken on a single-shot basis. That is, sensors 320 may be configured to measure properties associated with an individual interaction between electromagnetic radiation beam 104 and target 110. Sensors 320 may also measure the same or different properties on a more continuous basis, for example, providing results after processing. The placement of sensors 320 may vary based on a number of factors, including space constraints and optimal location for measurement. As shown in
For some sensors 320, there may be an advantage to detection proximate to target 110, and thus to interaction between electromagnetic radiation beam 104 and target 110 (laser-target interaction). In an embodiment, system 100 may be stabilized over time, after which such proximity may be unnecessary. In some embodiments, one or more sensors 320 may be mounted outside of interaction chamber 108. For example,
In some embodiments, one or more sensors 320 may be configured to measure one or more laser-target interaction properties of electromagnetic radiation beam 104 or particle beam 112. In some embodiments, sensors 320 may include quadrupole analyzers, spherical mirror analyzers (SMAs), cylindrical mirror analyzers (CMAs), secondary electron detectors, photomultipliers, scintillators, solid-state detectors, time-of-flight detectors, laser-on-target optical diagnostic detectors, x-ray detectors, cameras, Faraday cups, or other detectors. Sensors 320 may detect properties such as absorption or reflection, a secondary electron emission property, a plasma property such as electron temperature and/or density, and/or an x-ray emission property. Secondary emissions, such as emission of electrons and/or x-rays may be indicative of laser-target interaction properties and/or properties of particle beam 112. For example, the energy spectrum and/or flux of electrons and/or x-rays may indicate particle beam properties. These signals may then be used as input in a feedback loop for modifying the laser-target interaction, for example, by adjusting one or more of electromagnetic radiation source 102, one or more optics components, one or more particle beam adjustment components, and the position/orientation of target 110, as described in greater detail below.
Consistent with the present disclosure, sensors 320 may detect particle beam direction, spatial spread, intensity, flux, energy, particle energy, and/or energy spread. For example, in some embodiments, a Thompson parabola may be employed. In such embodiments, particle beam 112 may be directed into an area in which magnetic and electric fields deflect the charged particles to locations on a detection screen. The location at which the charged particles contact the screen may indicate particle energy. For such a screen, any particle-sensitive device may be used, such as CR-39 plates, image plates, and/or scintillators (coupled to an imaging device such as a CCD camera). As another example, spatial particle beam distribution may be detected with a screen sensitive to charged particles, such as CR-39 and image plate or a scintillator with a detection device (such as a camera).
Sensors 320 may also include a time-of-flight detector. The time-of-flight detector may measure average particle energy. In some embodiments, the time-of-flight detector may include a particle scintillator and a detector with adequate temporal resolution, such as a photo-multiplier-tube (PMT). The time when the particle signature is detected on the PMT may indicate particle velocity and thus particle energy. Sensors 320 may also include instruments configured for plasma diagnostics, such as x-ray spectrometers configured to detect electron temperature and density, or interferometers configured to detect plasma density. Optical diagnostics may include imaging of the reflected laser beam to measure the laser absorption efficiency. These detectors may be used during initial system design, calibration, and testing, and they may optionally be included in the final system.
In some embodiments, target 110 may be prefabricated. In other embodiments, target 110 may be produced in situ within system 100 or an attached sample preparation system. For example, target 110 may disposed within an interaction chamber, such as interaction chamber 108. This may involve forming target from a suitable material, including forming such material on a substrate. Such materials may include any gas, solid, or liquid chemical sources of the types commonly known in techniques such as evaporation, physical vapor deposition, chemical vapor deposition, molecular beam epitaxy, atomic layer deposition, and the like. For example, in embodiments in which target 110 includes ice, materials used to form the targets may include water vapor (H2O), hydrogen gas (H2), and/or oxygen gas (O2). In embodiments in which target 110 includes silicon, materials used to form target 110 may include, for example, silane (SiH4), disilane (Si2H6), trichlorosilane (SiHCl3), or any other silicon source. In embodiments in which target 110 includes plastic, sources may include, for example, polytetrafluoroethylene (PTFE) polymer source materials or any other PTFE source. As a person of ordinary skill in the art would recognize, these are just a few illustrative examples among many available target materials and target source materials. In addition, the interaction chamber may vary in structure to suit the form of the target employed. For example, when the target is ice, the interaction chamber may be specifically configured to maintain an appropriate temperature to support the ice. Each target material may have differing sustaining requirements, and therefore the structure of interaction chamber 108 may vary to suit the type of target 110.
In related embodiments, system 100 may also include a separate or substantially separate preparation chamber connected to interaction chamber 108 and configured for target preparation and/or conditioning. The preparation chamber may include various equipment and instrumentation for preparing targets, such as equipment that may be found in systems for performing evaporation, physical vapor deposition, chemical vapor deposition, molecular beam epitaxy, atomic layer deposition, and the like. The preparation chamber may also include temperature control elements, one or more sample transfer mechanisms, such as a transfer arm or any transfer device known by those familiar with vacuum systems. Additionally, system 100 may also include a load lock between the preparation chamber and interaction chamber 108.
Interaction chamber 108 may include or interface with a particle beamline 114, as illustrated in
Consistent with the present disclosure, controlling a relative movement between a particle beam and a treatment volume in two dimensions of a three-dimensional coordinate system for delivering particle beam 112 to an isocenter 412 may be achieved in numerous ways. For example, controlling the relative movement between particle beam 112 and treatment volume 120 may be achieved by rotating a gantry which may include beamline 114. Alternatively or additionally, controlling the relative movement between particle beam 112 and treatment volume 120 may be achieved by directing a particle beam with an electromagnet and/or moving support platform 116. In some embodiments, isocenter 412 may represent the location of treatment volume 120 or a location within treatment volume 120. A height 414 and a length 416 of beamline 114 may vary based on numerous possible configurations of beamline 114. In some embodiments either or both of height 414 and length 416 may be as little as 2 meters. In addition, beamline 114 may be separated from other components of system 100 by a wall 402 or other barriers. Wall 402 may include one or more openings (not shown) to allow passage of particle beam 112 and any beamline or other equipment configured to deliver particle beam 112. Location of wall 402 may vary based on a number of factors, and in some embodiments wall 402 may not be present.
As illustrated in
Beamline 114A may include coupling 406. Coupling 406 may be any mechanical and or optical connection configured to facilitate physical movement of beamline 114, such as rotation about an axis of rotation. Beamline 114 may be configured to be physically moved by any appropriate arrangement of actuators, which may be controlled by controller 122. Coupling 406 may include one or more bearings or bushings and may be connected to and/or integrated into beamline 114. oupling 406 may be configured to maintain a seal or other barrier to prevent loss of a vacuum state or other environmental conditions within beamline 114.Coupling 406 may include rotationally invariant optics, for example to reduce tune dependence as a function of beamline position.
Beamline 114A may include one or more beam adjustment components 408. Beam adjustment components 408 may include any of beam adjustment components discussed above, configured to guide particle beam 112 through the beamline. In some embodiments, beam adjustment components 408 may include electromagnets, such as dipoles and/or quadrupoles. Beam adjustment components 408 may include normal conducting dipoles, superferric dipoles, superconducting coil dipoles, stripline dipoles, etc. In some embodiments, beam adjustment components 408 may include dipole pairs (e.g., each bending particle beam 112 by approximately 45°) to form a rectangle or any other combinations of angles to form a rectangle or another desired shape. The dipole pairs may operate at about 4.8 T and be about 0.6 m long. Straight sections between dipole pairs may be adjusted independently, providing tuning range flexibility and customization of the electromagnetic optics. Splitting 90° bends into two may improve reference trajectory control, as each dipole may be adjusted independently, such as via shunts on a single power supply, providing at least 10% variation (20% total relative change for two bends). Thus, the dipole pairs may facilitate independent trajectory correction on each arm of beamline 114, increasing tolerances and reducing cost.
Beamline 114A may include one or more collimators 418. Collimators 418 may be configured to filter particle beam 112 such that only charged particles traveling in a desired direction and/or having a desired momentum are allowed to pass. Collimators 418 may be disposed in a variety of locations within beamline 114. For example, if beam adjustment components 408 have achromatic properties producing undesired effects on the beam downstream, collimators 418 may be configured to counteract such effects.
Beamline 114A may include one or more scanning magnet 410. Scanning magnets 410 may include beam adjustment components configured to adjust the location in space of isocenter 412. Scanning magnets 410 may be controlled by control system 122, such as to adjust location of treatment being provided to treatment volume 120. Scanning magnets 410 may be disposed in any of a number of locations within beamline 114. For example, scanning magnets 410 may be upstream from one or more of beam adjustment components 408, downstream of all of beam adjustment components 408, or a combination of such upstream and downstream locations, as shown in
System 100 may be configured such that scanning magnets are operated in cooperation with other components to control the location of treatment within patient 118. For example, control system 122 may control any combination of scanning magnets 410, movement of beamline 114, and/or movement of patient support platform 311. One or more components may be configured for control of particular dimensions and/or degrees of freedom. For example, patient support platform 116 may be configured to adjust patient position in one dimension, while scanning magnets 410 adjust in a dimension orthogonal to the first. Alternatively or additionally, system 100 may be configured such that a coarse adjustment in a given dimension may be performed by a different component than a fine adjustment. For example, a coarse adjustment in a particular dimension may be performed by a motor configured to manipulate patient support platform 116, while fine adjustment may be performed by a scanning magnet 410. Numerous combinations of such adjustments will be apparent to those of skill in the art.
In particle therapy, particles of certain energies are needed to irradiate a treatment volume located at a particular depth within a patient. To isolate charged particles of the desired energies, beamline 114 may be designed for filtering some of the particles of particle beam 112 to deliver the particles having the desired energies to the patient. For example, to deliver charged particles having energies in a desired energy level, beamline 114 may filter a particle bunch by removing any charged particles having energies less than a first energy threshold and particles having energies greater than a second energy threshold. In some embodiments, such filtering may be achieved by combining certain particle beam adjustment components. For example, beamline 114 may manipulate particle beam 112 such that charged particles having certain energies are diverted along a different trajectory than charged particles having other energies. This may be achieved in a number of ways. For example, beamline 114 may include a band-pass filter to isolate charged particles having the desired energy level. In another embodiment, beamline 114 may include a high-pass filter to isolate charged particles having energies greater than an energy cut-off. In another embodiment, beamline 114 may include a low-pass filter to isolate charged particles having energies less than an energy cut-off.
The above embodiments may be combined, and more than one filter may be used. A low-pass filter and a high-pass filter may be combined in series, for example, to create a band-pass filter. In such an embodiment, the low-pass filter may be configured to isolate charged particles having energies less than the first energy threshold, and the high-pass filter may be configured to isolate charged particles having energies greater than the second energy threshold. This may be particularly advantageous for selecting charged particles within a narrow energy band, especially an energy band narrower than a stand-alone band-pass filter can accommodate.
One or more data interfaces 510 may be used to communicate directly or indirectly with a plurality of software-driven components system 100. For example, data interface 510 may communicate with I/O devices 530 and database 570. The term “data interface” may include any device or system configured to receive digital data from one or more sources. The disclosed embodiments are not limited to any particular data interface configurations or protocol. The specific design and implementation of data interfaces 510 may depend on the communication networks over which computing system 500 is intended to operate. For example, in some embodiments, computing system 500 may include a data interface 510 designed to operate and receive digital data from communications network 580, e.g., over the Internet, a Local Area Network, a cellular network, a public switched telephone network (PSTN), or other suitable communications network. Consistent with embodiments of the present disclosure, data interfaces 510 may receive data associated with a treatment plan for a tumor of patient 118.
At least one processor 520 may include one or more known processing devices, such as an application specific integrated circuit (ASIC), a digital signal processor (DSP), a programmable logic device (PLD), a field programmable gate array (FPGA), a processor, a controller, a microprocessor, other electronic units, or combination thereof. At least one processor 520 may constitute a single core or multiple core processor that executes parallel processes simultaneously. For example, at least one processor 520 may be a single core processor configured with virtual processing technologies. In certain embodiments, at least one processor 520 may use logical processors to simultaneously execute and control multiple processes. At least one processor 520 may implement virtual machine technologies, or other known technologies to provide the ability to execute, control, run, manipulate, store, etc. multiple software processes, applications, programs, etc. In other embodiments, at least one processor 520 may include a multiple-core processor arrangement (e.g., dual, quad core, etc.) configured to provide parallel processing functionalities to allow computing system 500 to execute multiple processes simultaneously. One of ordinary skill in the art would understand that other types of processor arrangements could be implemented that provide for the capabilities disclosed herein. The disclosed embodiments are not limited to any number or type of processors.
Memory 540 may include one or more storage devices configured to store instructions used by at least one processor 520 to perform functions related to the disclosed embodiments. For example, memory 540 may be configured with one or more software instructions, such as programs 550 that may perform one or more operations when executed by at least one processor 520. The disclosed embodiments are not limited to separate programs or computers configured to perform dedicated tasks. For example, memory 540 may include a program 550 that performs the functions of computing system 500, or program 550 could comprise multiple programs. Additionally, at least one processor 520 may execute one or more programs located remotely from computing system 500. For example, controller 122, may, via computing system 500 (or variants thereof), access one or more remote programs that, when executed, perform functions related to certain disclosed embodiments. At least one processor 520 may further execute one or more programs located in a database 570. In some embodiments, programs 550 may be stored in an external storage device, such as a server located outside of computing system 500, and processor 520 may execute programs 550 remotely.
Memory 540 may store data that may reflect any type of information in any format that computing system 500 may use to perform operations consistent with the disclosed embodiments. For example, memory 540 may store instructions to enable at least one processor 520 to execute one or more applications, such as server applications, network communication processes, and any other type of application or software. Alternatively, the instructions, application programs, etc., may be stored in an external storage (not shown) in communication with computing system 500 via a suitable network, including a local area network or the internet. Memory 540 may be a volatile or non-volatile, magnetic, semiconductor, tape, optical, removable, non-removable, or other type of storage device or tangible (i.e., non-transitory) computer-readable medium. Memory 540 may include data 560. Data 560 may include any form of data used by controller 122 in controlling particle therapy treatment via system 100. For example, data 560 may include data related to operation of various components of system 100, feedback parameters associated with various components of system 100, data gathered from one or more detectors associated with system 100, treatment plans for particular patients or for particular diseases, calibration data for various components of system 100, etc.
I/O devices 530 may include one or more devices configured to allow data to be received and/or transmitted by computing system 500. I/O devices 530 may include one or more digital and/or analog communication devices that allow computing system 500 to communicate with other machines and devices, such as other components of system 100 shown in
Computing system 500 may contain one or more databases 570. Alternatively, computing system 500 may be communicatively connected to one or more databases 570. For example, computing system 500 may be communicatively connected to database 570 via a communications network, such as a wired or wireless network. Database 570 may include one or more memory devices that store information and are accessed and/or managed through computing system 500. In some embodiments, database 570 is stored at a location separated from computing system 500, and the data from database 570 is obtained using communications network 580 and data interface 510.
Communications network 580 facilitates communications and sharing of data between computing system 500 and other databases. Communications network 580 may be any type of network that provides communications, exchanges information, and/or facilitates the exchange of information between communications system 580 and other devices. For example, communications network 580 may be the Internet, a Local Area Network, a cellular network, a public switched telephone network (PSTN), or other suitable connection(s) that enables system 100 to send and receive data relevant for treating patient 118.
In step 602, the processing device may regulate at least one electromagnetic radiation source (e.g., electromagnetic radiation source 102) to emit an electromagnetic beam an electromagnetic radiation source (e.g., electromagnetic radiation beam 104). In step 604, the processing device may direct the electromagnetic radiation beam to strike a target (e.g., target 110). Electromagnetic radiation beam 104 may be generated and directed via any components capable of radiation beam generation, such as, for example, various combinations of the components described in relation to
In step 606, the processing device may cause a relative movement between the target and the electromagnetic radiation beam to produce charged particles. In some embodiments, the surface of target 110 may be scanned by electromagnetic radiation beam 104. For example, electromagnetic radiation beam 104 may be sequentially scanned over the surface of target 110 by continuous or intermittent rastering, stepwise scanning, or any other scanning waveform desired. Alternatively, electromagnetic radiation beam 104 may be non-sequentially scanned over the surface of target 110. Electromagnetic radiation beam scanning may be achieved by manually or automatically adjusting optics 106 located between electromagnetic radiation source 102 and target 110. Automatic adjustment of optics 106 may be achieved, for example, in response to one or more signals provided by control system 122. The one or more control signals provided by control system 122 may be predetermined by a program, such as a program stored in computing system 500, and they may be provided in response to one or more feedback signals received from various elements of system 100, such as one or more sensors. For example, information from the one or more sensors in system 100 may indicate that altering the location of the laser-target interaction site is desirable.
In step 608, the processing device may use particle beam adjustment components to form a particle beam (e.g., particle beam 112) from the charged particles. The charged particles generated in step 608 initially may not be disposed in a useful configuration or trajectory. The charged particles may be formed into a particle beam, for example, by one or more beam adjustment components of beamline 114. Properties of the particle beam may vary based on the configuration of system 100 and from use to use. In one embodiment, the particle energies may be about 250 MeV, as noted above, and may range, for example, from 60 to 250 MeV. The particle flux may be about 2 Gy/min, and particle pulse duration may be less than about 100 psec. The charged particles generated by system 100 may also have a symmetric phase space profile, allowing improvements in particle beam steering and filtering over accelerator-based particle generation systems, thereby improving the accuracy and the efficiency of particle beam delivery and treatments. Of course, the above ranges are only examples, and the specific energies and flux may vary based on particulars of the configuration.
In step 610, the processing device may control a beamline (e.g., beamline 114) to deliver a portion of a beam of charged particles (e.g., particle beam 112) according to a treatment plan for a treatment volume (e.g., treatment volume 120). In some embodiments, the beam of charged particles may pass through a zone proximate to a particle beam adjustment component being part of beamline 114. The zone may be of any size, but in some embodiments may have a dimension of less than one inch. The zone proximate to particle beam adjustment component may be configured and/or oriented for a particle beam (e.g., a continuous beam or a pulsed beam including particle pulses) to traverse the zone. The particle beam adjustment component may include any of particle beam adjustment components, for example, an electromagnet such as a dipole, CMA, SMA, or time-of-flight analyzer. As the particle beam traverses the zone proximate to particle beam adjustment component, an automated switch may activate particle beam adjustment component such that charged particles having the desired energy range are diverted along a first trajectory and charged particles having energies outside the desired range are diverted along a second trajectory, for example, toward a beam dump.
Performances of a particle therapy system consistent with the present disclosure (e.g., system 100) depend on the characteristics of its electromagnetic radiation source. Specifically, a particle therapy system with a laser that emits pulses at a high repetition rate can generate more charged particles to treat a patient than a particle therapy system with a laser that emits pulses at a lower repetition rate. However, simply upgrading the laser in the particle therapy system to a high repetition laser by itself will not yield optimal performances. The particle therapy system itself needs to be designed to utilize the electromagnetic radiation source to its maximum potential. The following disclosure describes a particle therapy system having a high power and high repetition electromagnetic radiation source.
In disclosed embodiments, a particle therapy system may include an electromagnetic radiation source (e.g., electromagnetic radiation source 102) characterized by a plurality of working parameters (e.g., power, repetition rate, wavelength, pulse duration, coherence length, polarization, and more). The electromagnetic radiation source may generate a pulsed electromagnetic radiation beam (e.g., electromagnetic radiation beam 104). In one example, the generated pulsed electromagnetic radiation beam may be characterized by a power of at least 100 terawatts, for example, at least 150 terawatts, at least 250 terawatts, or at least 500 terawatts. The power of electromagnetic radiation source 102 may describe the average power of a pulsed laser and may be measured in watts (W). Pulsed lasers are also characterized by their pulse energy, which is proportional to average power and inversely proportional to the electromagnetic radiation source’s repetition rate. The pulse energy may be measured in joules (J). The generated pulsed electromagnetic radiation beam may be characterized by a repetition rate of at least 20 Hz, for example, at least 30 Hz, at least 50 Hz, or at least 100 Hz. The repetition rate of electromagnetic radiation source 102 (also known as pulse repetition frequency) may describe the number of pulses emitted every second. As mentioned above, the repetition rate is inversely proportional to pulse energy and directly proportional to average power. Higher repetition rates may result in less thermal relaxation time at the surfaces of the optics and at the final focused spot, which leads to more rapid material heating.
Consistent with the present disclosure, target 110 may be sized to enable at least a plurality of locations of interaction 702 with pulsed electromagnetic radiation beam 104. For example, target 110 may be sized to enable at least 50 locations of interaction, at least 100 locations of interaction, at least 175 locations of interaction, at least 350 locations of interaction, or at least 500 locations of interaction with pulsed electromagnetic radiation beam 104. The term “location of interaction” in this disclosure refers to a point or region on the surface of the target with which the pulsed electromagnetic radiation interacts. Typically, the size of the location of interaction depends on the spot size of pulsed electromagnetic radiation beam 104 and associated with the beam diameter at the focal point of optics 106. In some particle therapy systems, a desired goal may be minimizing the spot size to maximize power density. To do so, one or more aspheric lenses may be used instead of conventional spherical lenses to reduce spherical aberrations and decrease the focal spot size. In some configurations, every time pulsed electromagnetic radiation beam 104 hits the surface of target 110, a crater is formed. The diameter of such a crater depends on the power of electromagnetic radiation source 102. For example, an average diameter of a crater when a 100 terawatts laser is being used can be between about 1 µm and 10 mm. The phrase “a target sized to enable X locations of interaction with pulsed electromagnetic radiation beam” may mean, for example, that the area of the target is greater than about X times the average area of the craters formed at the target. In one embodiment, control system 122 may use an estimated average area of a crater to determine the locations of interaction in target 110. Preferably, the locations of interaction in target 110 should be used only one time for particle generation. In some cases partially overlapping locations of interaction in target 110 may be used as long as the overlapping part is less than a predefined value, for example, less than 25%, less than 15%, or less than 10%.
In some embodiments, the surface of target 110 may include a plurality of microstructured features, and electromagnetic radiation source 102 may destroy some of the microstructured features at each location of interaction between electromagnetic radiation source 102 and target 110. The terms “microstructured features” and “microstructured elements” refer to features of a surface that have at least one dimension (e.g., height, length, width, or diameter) of less than one millimeter. The microstructured features may be purposely imposed on the surface of target 110 and do not include inadvertent formations on the microstructured material. Imposition of the microstructured features on the surface of target 110 may include forming the microstructured features by modifying a surface of an existing layer to generate the microstructured features and/or depositing material onto a surface already having microstructured features. The microstructured features can be formed to have at least one dimension of no more than about 100 micrometers, about 10 micrometers, or less. The term “microstructured layer” refers to a layer having a surface that includes microstructured features. Moreover, each location of interaction may include one or more microstructured element. The term “microstructured element” refers to an individual microstructured feature of the surface of target 110 that extends away from the surface of target 110 and is separate from other microstructured elements. A plurality of microstructured features disposed on a surface of target 110 may have the same cross-section shape (e.g., circle, ellipse, etc.) or different shapes. The plurality of microstructured features may be of the same size or of different sizes. In particular, the size of each microstructured element may vary in a random, pseudorandom, or a planned manner. In one example, the size of each microstructured element may be associated with a height and with a width. The height of each microstructured element may be measured normal to the surface of target 110, and the width of each microstructured element may be measured in the plane of the surface of target 110. In the context of the disclosure, the term “width” refers to the maximum dimension of a microstructured element in the plane of the surface of target 110. For example, when the microstructured element is a circle, the width would be the diameter of the circle, and when the microstructured element is an ellipse, the width would be the major diameter of the ellipse.
In one embodiment, the height distribution (and/or the width distribution) of the plurality of microstructured features may follow a probability density function. The probability density function may include Normal Distribution, Uniform Distribution, Cauchy Distribution, Chi-Square Distribution, Gamma Distribution, Beta Distribution, or others. For example, the height of the plurality of microstructured features may be distributed normally about an average size of about 10 µm. In one embodiment, the average height of the plurality of microstructured features may be greater than about 1 µm and less than about 1 mm. In accordance with another embodiment, an average width of the plurality of microstructured features may be greater than about 100 nm and less than about 100 µm. For example, the average width of the plurality of microstructured features may between about 50 nm and 50 µm. Additionally, the plurality of microstructures may be part of a target with a fractal-like morphology, which offers a wide range of self-similar features with sizes ranging from tens of nanometers to a few microns in the focal volume of the electromagnetic radiation pulses. For example, amorphous snow targets may have a fractal-like morphology.
Particle therapy system 100 may further include an actuator configured to cause relative movement between target 110 and electromagnetic radiation beam 104 at a speed associated with the repetition rate of electromagnetic radiation source 102 to thereby vary a location of interaction of pulsed electromagnetic radiation beam 104 on a surface of target 110. This enables causing a resultant emission from target 110 of at least about 3×106 charged particles per pulse. In other words, to ensure emission of enough charged particles per pulse, particle therapy system 100 may confirm that electromagnetic radiation beam 104 does not hit the same location of interaction twice (or at least strikes partially overlapping locations of interaction). Consistent with the present disclosure, the speed of the relative movement between target 110 and electromagnetic radiation beam 104 may be associated with a rate equal to or exceeding the repetition rate of electromagnetic radiation source 102.
In
In
Consistent with the present disclosure, control system 122 may control at least one actuator such that the relative movement between target 110 and the electromagnetic radiation beam 104 would correlate with the working parameters of electromagnetic radiation source 102 (e.g., power, repetition rate, pulse duration, etc.) to avoid hitting the same location of interaction on the target more than a predetermined number of times or to avoid hitting at least partially overlapping locations of interaction more than a predetermined number of times. For example, electromagnetic radiation beam 104 may avoid hitting the same location of interaction on the target more than once, more than twice, more than three times, etc. In a first embodiment, at least one processor 520 may control actuator 800A such that the movement of target 110 would correlate with a pulsed electromagnetic radiation beam of at least 100 terawatts and at a repetition rate of at least 20 Hz to avoid hitting the same location of interaction on the target more than a predetermined number of times or to avoid hitting at least partially overlapping locations of interaction more than a predetermined number of times. In a second embodiment, processor 520 may control actuator 800B such that the change in the path of electromagnetic radiation beam 104 is determined based on knowing that the power of electromagnetic radiation beam 104 is at least 100 terawatts and its repetition rate is at least 20 Hz to avoid hitting the same location of interaction on the target more than a predetermined number of times or to avoid hitting at least partially overlapping locations of interaction more than a predetermined number of times.
Disclosed embodiments may include “generating a pulsed electromagnetic radiation beam of at least 100 terawatts and at a repetition rate of at least 20 Hz.” As discussed earlier, pulsed electromagnetic radiation beam 104 may be generated by electromagnetic radiation source 102 that may be characterized by a plurality of working parameters. By way of example only, according to step 902 in
Disclosed embodiments may include “directing the pulsed electromagnetic radiation beam along a path towards a target in the interaction chamber.” As discussed earlier, pulsed electromagnetic radiation beam 104 may be directed using optics 106 that may include adaptive optics configured to adjust or control a spatial profile of electromagnetic radiation beam 104 and/or to adjust or control at least one of a relative position and orientation between electromagnetic radiation beam 104 and target 110. By way of example only, according to step 904 in
Disclosed embodiments may include “causing a relative movement between the target and the electromagnetic radiation beam at a speed associated with the repetition rate of the electromagnetic radiation source, to thereby vary a location of interaction of the pulsed electromagnetic radiation beam on the surface of target and thereby cause a resultant emission from the target of at least 3×106 charged particles per pulse.” As discussed earlier, the relative movement between target 110 and electromagnetic radiation beam 104 may be caused by moving target 110 (e.g., using first actuator 800A), by changing the path of electromagnetic radiation beam 104 (e.g., using second actuator 800B), or by any combination thereof. Consistent with the present disclosure, the relative movement includes movement of target 110 within interaction chamber 108 and/or controlling an adjustable mirror within interaction chamber 108. In some cases, the processing device may rotate target 110 at a speed of at least 0.5 RPM and/or linearly move target 110 by at least 20 mm/s. By way of example only, according to step 906 in
In one embodiment, a pulsed electromagnetic radiation beam may include a plurality of pulse chains, each pulse chain including a preliminary pulse and a main pulse. The preliminary pulse may exceed an energy flux threshold and have an energy flux on the target of between about 0.1 and 10 J/cm2. The main pulse may have an intensity on the target of at least about 1018 W/cm2. A time separation between the preliminary pulse and the main pulse may be between about 1 ns and 26 ns, such that during the time separation the target is free from irradiation exceeding the energy flux threshold. This embodiment is discussed in greater detail with reference to
Operating a particle therapy system as described in the present disclosure involves control over different parts and subsystems. For example, various faults may occur in relation to the electromagnetic radiation source, the optics, the target located in the interaction chamber, or the beamline that directs the emitted charged particles. To render a successful treatment session, the operation of all parts and subsystems of the particle therapy system are coordinated. As used in this specification, the term “successful treatment session” refers to delivering at least about 95% of the charged particles specified in the treatment plan to the treatment volume at the desired energy level. The following disclosure explains how the particle therapy system may coordinate operation of its different parts and subsystems during a treatment session.
In disclosed embodiments, a particle therapy system may include an interaction chamber (e.g., interaction chamber 108) configured to contain a target (e.g., target 110) that emits charged particles in response to energy application. The system may include an energy source (e.g., a laser, such as electromagnetic radiation source 102) for applying energy to the target. The particle therapy system may include a magnetic beamline (e.g., beamline 114) for directing a beam of charged particles (e.g., particle beam 112) from the target to a tumor of a patient (e.g., patient 118) in a manner that enables charged particles to strike the tumor at differing tumor locations. The particle therapy system may include at least one processor (e.g., control system 122) configured to selectively direct energy from the energy source to differing locations on the target. During a treatment session, when locations of energy application on the target may change, the at least one processor may selectively control a relative movement between the beam of charged particles and the patient to strike the tumor with charged particles at differing tumor locations.
According to disclosed embodiments, control system 122 may use at least one actuator to selectively direct energy from the energy source (e.g., a laser such as electromagnetic radiation source 102) to different locations on target 110. In a first example, particle therapy system 100 may use least one actuator 800 to move target 110 in interaction chamber 108, and control system 122 may selectively direct energy from the energy source to differing target locations when target 110 moves (e.g., using actuator 800A). In a second example, particle therapy system 100 may use at least one actuator 800 to rotate target 110 in interaction chamber 108, and control system 122 may selectively direct energy from the energy source to differing target locations when target 110 rotates (e.g., using actuator 800A). Thus, at least some of the differing target locations may be radially spaced from each other. In a third example, particle therapy system 100 may use least one actuator 800 to change the path of electromagnetic radiation beam 104 in interaction chamber 108, and control system 122 may selectively direct energy from the energy source to differing target locations when the path of electromagnetic radiation beam 104 changes (e.g., using actuator 800B).At least one actuator 800 may cause the relative movement between target 110 and a pulsed energy beam radiating from the energy source at a rate equal to or exceeding a repetition rate of the pulsed energy beam.
Consistent with the present disclosure, target 110 may emit charged particles in response to energy application. For example, a cloud of charged particles 1006 may be emitted from target 110 in response to first pulse 1000A hitting target 110 and in response to second pulse 1000B hitting target 110. The cloud of charged particles 1006 may be captured by a solenoid (e.g., solenoid 404) that may be part of beamline 114. Beamline 114 may be used to selectively control a relative movement between particle beam 112 and patient 118 to strike a tumor 1008 with charged particles 1006 at differing tumor locations. Consistent with the present location, the term “tumor location” refers to a portion of the treatment volume (i.e., a group of cells or an area of tumor) limited in size. For example, the tumor location may be less than 5 cm3, less than 1 cm3, less than 2500 mm3, less than 50 mm3, less than 25 mm3, or less than 5 mm3. Different tumor locations may be associated with different cartesian or non-cartesian coordinates.
In some embodiments, a first bunch of charged particles 1010A may irradiate tumor 1008 at a first tumor location 1012A at time t1+ε, and a second bunch of charged particles 1010B may irradiate tumor 1008 at a second tumor location 1011B at a time t2+ε. With reference to the depicted reference system, first tumor location 1012A is located at (X=8, Y=9, Z=1), and second tumor location 1012B is located at (X=6, Y=6, Z=1). Scanning path 1014 illustrates the relative movement between particle beam 112 and patient 118 during the treatment session. In some embodiments, particle therapy system 100 may include a movable gantry for steering the beamline relative to patient 118 and for directing charged particles 1006 to differing tumor locations 1012. In addition, particle therapy system 100 may include a movable platform (e.g., support platform 116) for supporting patient 118 and a motor for moving the platform to thereby direct charged particles 1006 at differing tumor locations 1012.
The selective control of relative movement between beam of charged particles 1006 and patient 118 may be carried out in accordance with a treatment plan. The treatment plan may specify the location and size of tumor 1008 and/or the size and type of target 110. Control system 122 may coordinate the operation of the energy source and the beamline of the particle therapy system to comply with the treatment plan. Consistent with the present disclosure, in some cases there may be more possible locations of interaction on target 110 than tumor locations at tumor 1008. In a first embodiment, control system 122 may selectively direct energy from the energy source to a plurality of differing locations of interaction on target 110 to generate charged particles to treat a single tumor location. The plurality of differing locations of interaction on target 110 may be greater than three, greater than five, greater than ten, or greater than fifty. The single tumor location may be within an area of less than 5 cm2, where the size of the area may be defined by a Gaussian fit of the particle distribution. Control system 122 may determine, based on the treatment plan, how to deliver charged particles from the plurality of locations of interaction to the single tumor location (e.g., scanning the tumor locations once or a couple of times). In a second embodiment, control system 122 may selectively direct energy from the energy source to a plurality of differing locations of interaction on target 110 to generate charged particles to treat multiple tumor locations. In some cases, at least one of the multiple tumor locations may receive only charged particles generated from a single location of interaction on target 110. Consistent with the present disclosure, the term “generating charged particles” means causing a plurality of charged particles to emanate from the target.
A plurality of pristine Bragg peaks can be achieved by subjecting a treatment volume to at least one bunch of charged particles having different energies. For example, as discussed above, the energy source may cause concurrent emission of a plurality of charged particles at multiple energy levels each time a single location on the target is irradiated. Control system 122 may enable the plurality of charged particles to treat the tumor with a dose characterized by a spread-out Bragg peak, the dose being delivered using only particles generated concurrently in response to an irradiation of the target. The plurality of charged particles associated with a particle bunch may irradiate the tumor at different depths. The resulting spread-out Bragg peak 1108 can be selected to overlap with the depth boundaries of treatment volume 120. For example, when the beam energies are properly selected, the spread-out Bragg peak can fall off sharply beyond the distal boundary of target volume 120.
Properly matching the depth boundaries of a target region with a spread-out Bragg peak is a consideration in particle therapy. If the distal portion of the spread-out Bragg peak is too deep, unnecessary and harmful irradiation may be provided to a region beyond the distal boundary of target volume 120 (e.g., to healthy tissue behind a tumor). If the proximal portion of the spread-out Bragg peak is too shallow, unnecessary extra radiation dose may be provided to a region in front of the proximal boundary of the target volume 120 (e.g., to healthy tissue in front of a tumor). Similarly, a proximal portion of the spread-out Bragg peak that is too deep and/or a distal portion of the spread-out Bragg peak that is too shallow may result in certain portions of target volume 120 not being irradiated properly (e.g., less than a desired amount). In some embodiments, control system 122 may determine a desired spread-out Bragg peak for each bunch of charged particles based on the treatment plan for treatment volume 120. For example, the desired spread-out Bragg peak for at least one bunch of charged particles directed to a point (X,Y) may be determined in view of the range of Z values associated with treatment volume 120 at that location.
Consistent with the present disclosure, system 100 may deliver charged particles to multiple differing locations within a treatment volume when a single location on a target is irradiated by an electromagnetic radiation beam. The electromagnetic radiation beam causes concurrent emission of a plurality of charged particles having different energies each time a location on the target is irradiated.
Consistent with the present disclosure, control system 122 may enable selection of a subset of the multiple energy levels that conform with a treatment plan and associated with the desired spread-out Bragg peak. For example, selection of a subset of the multiple energy levels may include applying a band-pass filter to the plurality of charged particles. Such selection may be achieved by combining certain particle beam adjustment components of beamline 114. For example, beamline 114 may manipulate particle beam 112 such that charged particles having certain energies may be diverted along a different trajectory than particles having other energies. This may be achieved in a number of ways. For example, beamline 114 may include a band-pass filter to isolate charged particles having energies between energy 1116 and energy 1118. In another embodiment, beamline 114 may include a high pass filter to isolate particles having energies greater than an energy cut-off, such as energy 1116 or 1118. In another embodiment, beamline 114 may include as a low pass filter to isolate particles having energies less than an energy cut-off, such as energy 1116 or 1118. Additional details for this embodiment are provided below.
The above embodiments may be combined, and more than one filter may be used. A low pass filter and a high pass filter may be combined in series, for example, to create a band-pass filter. In such an embodiment, the low pass filter may be configured to isolate particles having energies less than energy 1118, and the high pass filter may be configured to isolate particles having energies greater than energy 1116. This may be particularly advantageous for selecting particles within a narrow energy band, especially an energy band narrower than a stand-alone band-pass filter can accommodate.
Disclosed embodiments may include “orienting a target in an interaction chamber, wherein the target is configured to emit a pulsed beam of charged particles in response to energy applied thereto.” As discussed earlier, the pulsed beam of charged particles may include at least about 3×106 positively charged particles per second (e.g., protons or ions). Alternatively, the pulsed beam of charged particles may include at least about 3×106 negatively charged particles per second (e.g., electrons). By way of example only, according to step 1202 in
Disclosed embodiments may further include “selectively directing energy from an energy source to differing locations on the target, to thereby generate the pulsed beam of charged particles.” As discussed earlier, the energy source may include electromagnetic radiation source 102, which may include a laser. By way of example only, according to step 1204 in
Disclosed embodiments may further include, “during a treatment session when locations of energy application on the target change, directing the pulsed beam of charged particles to a tumor of a patient in a manner that enables charged particles to strike the tumor at differing tumor locations.” As discussed above, directing the pulsed beam of charged particles may be implemented by beamline 114. Beamline 114 may include a movable gantry for steering the beamline relative to patient 118 and/or for directing the charged particles at differing tumor locations. Additionally or alternatively, system 100 may include a movable platform for supporting patient 118 and an associated motor for moving the platform to thereby direct the charged particles at differing tumor locations. By way of example only, according to step 1206 in
Consistent with the present disclosure, the energy source is configured to cause concurrent emission of a plurality of charged particles at multiple energy levels each time a location on the target is irradiated. The multiple energy levels may span more than 5 MeV, more than 10 MeV, more than 20 MeV, or more than 50 MeV. The graph depicted in
A desirable particle therapy system should produce sufficient charged particles (e.g., protons and ions) for effective treatment. For instance, a particle therapy system may deliver millions of charged particles per second to finish a treatment session within a reasonable time period. One way the disclosed particle therapy system can improve the charged particle generation rate is by causing an electron cloud to form in a region near the target before the main laser-target interaction takes place. Such an electron cloud helps the electromagnetic radiation beam to deliver more energy to the target, thereby enabling more charged particles to emanate from the target.
In disclosed embodiments, a particle therapy system (e.g., system 100) may include an interaction chamber (e.g., interaction chamber 108) configured to contain a target (e.g., target 110) having a surface with a plurality of regions thereon. The particle therapy system may also include at least one energy source (e.g., a laser such as electromagnetic radiation source 102) for supplying energy to the target. The particle therapy system may additionally include at least one processor (e.g., control system 122) configured to cause at least one energy source to deliver energy to the target in a manner that causes an electron cloud with a particle density between about 1015 to 1021 cm-3 to form in the vicinity of at least one region of the target. Thereafter, the processor (or processors) may cause the energy source (or energy sources) to irradiate the target while the electron cloud remains in the vicinity of the target, to thereby cause charged particles to emanate from the target. The particle therapy system may further include a beamline (e.g., beamline 114) configured to deliver the plurality of charged particles to a patient (e.g., patient 118).
Diagram 1300 depicts target 110 before any energy is delivered to it. In the illustrated example, the at least one energy source is electromagnetic radiation source 102, and the energy is delivered by electromagnetic radiation beam 104. The energy may be delivered to target 110 that includes a plurality of microstructured elements 1302. Each of the microstructured elements 1302 extends away from a surface of target 110 and is separated from other the microstructured elements 1302. As shown, electromagnetic radiation beam 104 includes a first dose of energy 1304 (e.g., a preliminary pulse) and a second dose of energy 1306 (e.g., a main pulse). Both of the pulses are directed to substantially the same location of interaction 1308 on target 110. Second dose of energy 1306 may be delivered to target 110 between about 1 to 26 ns after the first dose of energy 1304 is delivered to target 110.
Diagram 1310 depicts target 110 after a first dose of energy 1304 is delivered to target 110 and before a second dose of energy 1306 is delivered. In disclosed embodiments, the delivery of first dose of energy 1304 causes an electron cloud 1312 to form with a particle density of between about 1015 to 1021 cm-3 in a vicinity of at least one region 1314 of target 110. Region 1314 of target 110 may include one or more microstructured elements 1302. For example, the first dose of energy 1304 may have an energy flux on target 110 that is less than about 10 J/cm2 and may cause an electron cloud to form with a particle density between about 1017 to 1019 cm-3 within about 1 µm from the surface of target 110. In some cases, electron cloud 1312 may be formed such that it surrounds at least a portion of one microstructured element 1302 of region 1314. The portion of the microstructured element surrounded by the electron cloud may be, for example, more than 10% of the microstructured element, more than 30% of the microstructured element, more than 50% of the microstructured element, or more than 75% of the microstructured element. Consistent with the present disclosure, a first dose of energy may cause ablation of at least one microstructured element 1302. The term “ablation” as used in this disclosure refers any process comparable the one illustrated in diagram 1310. For example, it may refer to the volatilization and/or ionization of a small amount of material in a region 1314, resulting in gaseous and/or particulate matter (e.g., an electron cloud or plasma) within the vicinity of an irradiated region of target 110.
Diagram 1320 depicts target 110 as a second dose of energy 1306 is delivered and electron cloud 1312 remains in the vicinity of region 1314, thereby creating energetic release of particles 1322. Consistent with the present disclosure, second dose of energy 1306 may have an intensity of about 1018 W/cm2 or more, about 1019 W/cm2 or more, about 1020 W/cm2 or more, or about 1021 W/cm2 or more. In some cases, second dose of energy 1306 may be at least 500 times more energetic than first dose of energy 1304, at least 1000 times more energetic than first dose of energy 1304, at least 1500 times more energetic than first dose of energy 1304, at least 2000 times more energetic than first dose of energy 1304, or at least 2500 times more energetic than first dose of energy 1304. As mentioned above, delivering second dose of energy 1306 may destroy certain microstructured elements 1302 in region 1314.
The term “destroy” as used in this disclosure refers any process comparable the one illustrated in diagram 1330. For example, it may refer to the total eradication of at least part of the structure (or structures) in a region 1314, resulting in charged particles suitable for forming an ion beam emanating from within the vicinity of an irradiated region of target 110. Diagram 1330 depicts target 110 after second dose of energy 1306 is delivered to target 110. In disclosed embodiments, delivering second dose of energy 1306 while electron cloud 1312 remains in the vicinity of region 1314 causes a plurality of charged particles 1332 to emanate from target 110. Consistent with the present disclosure, delivering second dose of energy 1306 may cause at least 3×106 charged particles to emanate from target 110 per delivery or at least 3×108 charged particles to emanate from target 110 per second. The disclosed particle therapy system may further include a beamline (e.g., beamline 114) configured to deliver the plurality of charged particles 1332 to patient 118. In some embodiments, the plurality of charged particles 1332 may exhibit a large divergence. As an example, the beam size of a plurality of charged particles 1332 emitted from target 110 may expand by a factor of about 100 over a short distance, such as 1 cm. Accordingly, beamline 114 may include a solenoid for reducing the divergence of the particle beam.
Disclosed embodiments may include “orienting a target having a surface with a plurality of regions thereon in an interaction chamber.” As discussed earlier, a target may include a plurality of microstructured elements, and each region of the target may include at least one microstructured element. By way of example only, according to step 1502 in
Disclosed embodiments may include “causing at least one energy source to deliver energy to the target in a manner causing formation of an electron cloud with a density of between 1015 -1021 cm-3 in a vicinity of at least some plurality of regions.” As discussed above, an electron cloud may surround at least a portion of one or more microstructured elements of target 110. By way of example only, according to step 1504 in
A person skilled in the art would recognize that the particle density of electron cloud 1312 may depend on the relativistic critical density (ncrel) and the wavelength (λ) associated with first dose of energy. For example, the electron-cloud density (ne) of electron cloud 1312 may be in the range: ncrit/106 < ne ≤ ncrit, where ncrit is the critical plasma density related to the wavelength (λ) of the energy source that provided the first dose of energy (e.g., electromagnetic radiation source 102). The critical plasma density may be defined by the following equation:
where c is the speed of light in vacuum, e is the electronic charge, εo is the free-space permittivity, and
is the relativistic mass of the electron. The relativistic electron mass is related to the rest mass (me) of the electron via
where v is the electron velocity. The relativistic electron mass becomes larger than electron rest mass at high laser intensities (>1020 W/cm2), leading to relativistic transparency, which may play a role in enhancing the particles energies. A typical scale length (ls) of electron cloud 1312 may be linked to the wavelength (λ) of the energy source that provided the first dose of energy and may be in the range of: λ/2π ≤ ls < 10λ, where λ/2π is the plasma skin depth at ncrit up to which an electromagnetic radiation can penetrate. In a first example, electromagnetic radiation source 102 may be associated with λ= 800 nm, such that the electron-cloud density (ne) of electron cloud 1312 may be about 1015 < ne ≤ 1021 and a typical scale length of electron cloud 1312 may be about 0.1 µm ≤ ls < 10 µm. In a second example, the energy source may be associated with λ= 400 nm, such that the electron cloud density (ne) of electron cloud 1312 may be about 1016 < ne ≤ 1022, and the typical scale length of electron cloud 1312 may be about 0.05 µm ≤ ls < 5 µm. In a third example, the energy source may be associated with λ= 1600 nm, such that the electron cloud density (ne) of electron cloud 1312 may be about 1014 < ne ≤ 1020, and a typical scale length of electron cloud 1312 may be about 0.2 µm ≤ ls < 20 µm.
Consistent with the present disclosure, the at least one energy source may include a source of electromagnetic radiation (e.g., electromagnetic radiation source 102), and the processing device may regulate the at least one energy source to deliver a first dose with an energy flux on the target less than about 10 J/cm2. In some embodiments, target 110 may have a surface on which microstructured elements 1302 are disposed, and first dose of energy 1304 may be configured to cause ablation of one or more microstructured element. In contrast, second dose of energy 1306 may be configured to destroy at least part of the one or more microstructured elements.
Disclosed embodiments may include “causing the at least one energy source to irradiate the target while the electron cloud is in the vicinity of the at least some of the plurality of regions, to thereby cause a plurality of charged particles to emanate from the target.” A single power source may cause an electron cloud to form in a vicinity of the target and cause a plurality of charged particles to emanate from the target. Alternatively, one power source may cause an electron cloud to form in a vicinity of the target, whereas a different power source causes a plurality of charged particles to emanate from the target. By way of example only, according to step 1506 in
Disclosed embodiments may further include “delivering the plurality of charged particles to a patient.” The plurality of charged particles emanating from target 110 in response to delivering a second dose of energy 1306 may have different energy levels. The various energy levels of the charged particles emanating from target 110 in response to second dose of energy 1306 may span for more than about 5 MeV. By way of example only, according to step 1508 in
In certain embodiments, discussed below with reference to
The following disclosure describes a specific example of a particle therapy system that generates an electron cloud prior to a laser-target interaction. In this example, at least one electromagnetic radiation source generates an electron cloud and causes a plurality of charged particles to emanate from the target. The at least one electromagnetic radiation source may produce a preliminary pulse for generating the electron cloud and thereafter produce a main pulse for causing the plurality of charged particles to emanate from the target. To maximize the number of charged particles (e.g., protons or ions) that emanate from the target, the particle therapy system controls both the preliminary pulse and the main pulse according to certain requirements.
In disclosed embodiments, a particle therapy system (e.g., system 100) may include an interaction chamber (e.g., interaction chamber 108) configured to contain a target (e.g., target 110). The particle therapy system may also include at least one electromagnetic radiation source (e.g., electromagnetic radiation source 102). The particle therapy system may additionally include at least one processor (e.g., control system 122) configured to cause a pulsed beam of charged particles to be emitted from the target by regulating the at least one electromagnetic radiation source to irradiate the target with a plurality of pulse chains, each pulse chain including a preliminary pulse and a main pulse. The plurality of pulse chains may comply with the following conditions:
Consistent with the present disclosure, particle therapy system 100 may generate a preliminary pulse to ablate at least a portion of the target so that a subsequent main pulse may interact with an ablated location of interaction at target 110. Doing so enhances the acceleration of protons and other charged particles in the vicinity of that location. After the preliminary pulse, the ablated material (e.g., electron cloud 1312) and associated plasma (e.g., plasma generated in response to preliminary pulse) expand. As the ablated material expands, the main pulse arrives at a time that enables it to further ionize the target material and interact with the pre-ionized plasma to produce energetic particles. The electromagnetic radiation source (or sources) generating the preliminary and the main pulses may have fixed-pulse configurations or may vary parameters, such as energy flux, temporal duration, wavelength, timing, or others. In some embodiments, a single electromagnetic radiation source 102 may generate the preliminary and the main pulses. For example, optics 106 may include one or more components for extracting the preliminary pulse from the main pulse and for generating the required time separation.
In alternative embodiments, two different electromagnetic radiation sources may generate the preliminary and the main pulses. Reference is now made to
As discussed above with reference to
The pulse chain may be characterized in that the time duration between the preliminary pulse and main pulse, referred to herein as “time separation” or “intra-chain gap,” is different from the duration between pulse chains, referred to herein as “inter-chain gap.” Typically, the inter-chain gap may be greater than the intra-chain gap. For example, the inter-chain gap may be more than 10 times the intra-chain gap, more than 50 times the intra-chain gap, or more than 100 times the intra-chain gap. In a first example, the inter-chain gap may be between about 70 ns and about 200 ns, and the intra-chain gap may be between about 0.5 ns and about 50 ns. In a second example, the inter-chain gap may be between about 50 ns and about 250 ns, and the intra-chain gap may be between about 1 ns and about 25 ns. In a third example, the inter-chain gap may be greater than about 50 ns, and the intra-chain gap may be between about 2 ns and about 15 ns. The optimal timing of the intra-chain gap may differ from target to target (e.g., with respect to the target’s surface features, composition, and orientation); thus, a control system may set an intra-chain gap based on data indicative of a laser-target interaction. In some embodiments, particle therapy system 100 may determine the time separation (i.e., the intra-chain gap) between preliminary pulse 1600 and main pulse 1602 based on the desired properties of the pulsed beam of charged particles. For example, in some cases, the time separation between preliminary pulse 1600 and main pulse 1602 may have an effect on the energy levels of the charged particles emitted from target 110. In the illustrated example, the first time separation (i.e., between preliminary pulse 1600A and main pulse 1602A) may be greater than the second time separation (i.e., between preliminary pulse 1600B and main pulse 1602B).
Consistent with the present disclosure, during a treatment session at least one electromagnetic radiation source 102 may generate a first main pulse (e.g., main pulse 1602A) with a first intensity at the target greater than about 1018 W/cm2 and a second main pulse (e.g., main pulse 1602B) with a second intensity at the target different than the first intensity. In some embodiments, as depicted in
In disclosed embodiments, main pulse 1602 may have an intensity (I) at the target greater than an intensity threshold, and preliminary pulse 1600 may have an intensity at the target less than that intensity threshold. The intensity threshold may be about 1018 W/cm2, and the intensity of main pulse 1602 at the target may be between about 1018 to 1020 W/cm2, between about 1020 to 1022 W/cm2, between about 1022 to 1024 W/cm2, or greater than about 1024 W/cm2. For example, main pulse 1602 may have an intensity on target of at least about 1020 W/cm2. In some cases, the intensity contrast ratio of main pulse 1602 to the one or more additional pulses other than preliminary pulse 1600 should be greater than about 106. For example, chain pulse 1702A includes three additional pulses, and the intensity contrast ratio of main pulse 1602A to these additional pulses may be between about 106 to 108 or greater than about 108. In one embodiment, any such additional pulses may have energy flux below a damage threshold of target 110. If significant additional pulses (i.e., above the damage threshold for ablation) are present, the acceleration of charged particles due to the presence of electron cloud 1312, for example, may be less efficient.
The exact value of the energy flux of preliminary pulse 1600 may depend on properties of target 110 (e.g., composition, physical shape, distribution of microstructured elements, surface roughness, orientation, etc.) and on the arrival time of preliminary pulse 1600 relative to main pulse 1602. Different targets and different timing may provide for different optimal energy fluxes. In some embodiments, the temporal duration of preliminary pulse 1600 may be about the same as main pulse 1602, e.g., several tens of femtoseconds, several hundreds of femtoseconds, several pico-seconds, tens of pico-seconds, hundreds of pico-seconds, or nanoseconds. In some embodiments, the wavelength of preliminary pulse 1600 may be about the same as main pulse 1602 or a different but related wavelength relative to main pulse 1602. For example, the wavelength of preliminary pulse 1600 may be a second harmonic (½ the wavelength), third harmonic (⅓ of the wavelength), or twice the wavelength of main pulse 1602.
Particle therapy system 100 may include one or more sensors configured to measure characteristics of target 110 (e.g., surface roughness) and determine a set of properties for preliminary pulse 1600 and main pulse 1602 based on the measured characteristics of target 110. Particle therapy system 100 may use the determined set of properties to generate preliminary pulse 1600 and main pulse 1602 for generating a beam of charged particles. For example, control system 122 may determine the energy flux of preliminary pulse 1600 and the timing based on the surface roughness of the target. According to additional embodiments, control system 122 may also determine a value for a first energy flux threshold and/or a second energy flux threshold based on physical characteristics of target 110 (e.g., composition, physical shape, distribution of microstructured elements, surface roughness, orientation, etc.).
In disclosed embodiments, particle therapy system 100 may determine a set of properties for preliminary pulse 1600 and use the determined set of properties to generate preliminary pulse 1600 and main pulse 1602. In one example, the set of properties may include the energy flux of preliminary pulse 1600. In some cases, not shown in the figures, preliminary pulse 1600 may comprise a group of pulses, in which case the time separation is measured from the first pulse of the group. Such a group of pulses may include a preliminary pulse 1600 that exceeds a first energy flux threshold and has an energy flux at the target of between about 0.1 and 15 J/cm2. The energy flux may be controlled by changing the number of pulses, changing the energy of each pulse, changing a timing between pulses, or a combination thereof. In another example, the set of properties may include the timing of preliminary pulse 1600, i.e., how much time exists between the preliminary pulse 1600 and main pulse 1602. The set of properties may affect the ablation of target 110 and may affect the properties of the beam of charged particles generated. In one embodiment, the energy flux of preliminary pulse 1600 at the target may be determined based on the desired properties of the pulsed beam of charged particles. For example, when treating a patient or a certain location of a tumor in the X-Y plane, a specific energy band of charged particles may be desired. The system may determine a set of properties for preliminary pulse 1600 and/or main pulse 1602 based on the desired energy level(s) or desired energy band.
A relatively narrow window of energy flux may exist for preliminary pulse 1600. If preliminary pulse 1600 (referred above as a first dose of energy 1304) has an energy flux below a first energy flux threshold, it may have no effect on accelerating the charged particles. For example, it may not form electron cloud 1312 with a particle density between about 1015 and 1021 cm-3. If preliminary pulse 1600 has an energy flux above a second energy flux threshold, target 110 may be excessively damaged before main pulse 1602 arrives. For example, one or more microstructured elements 1302 may be so damaged as to inhibit acceleration of any charged particles generated. During the time separation (e.g., the intra-chain gap), particle therapy system 100 may prevent exposing target 110 to any radiation exceeding the first energy flux threshold. Similarly, particle therapy system 100 may prevent exposing target 110 to any radiation exceeding the first energy flux threshold within a half-millisecond before arrival of preliminary pulse 1600.
Disclosed embodiments may include “producing a pulsed beam of charged particles by regulating at least one electromagnetic radiation source to irradiate a target with a plurality of pulse chains, each pulse chain including a preliminary pulse and a main pulse.” As discussed earlier, the pulsed beam of charged particles may include at least about 3×106 charged particles per second, for example, at least about 3×108 charged particles per second. The charged particles may be negatively charged or positively charged. By way of example only, according to step 1802 in
Disclosed embodiments may include “regulating the at least one electromagnetic radiation source such that the preliminary pulse exceeds an energy flux threshold and has an energy flux on target of between 0.1 and 15 J/cm2.” The electron cloud may at least partially surround a portion of one or more microstructured elements 1302 of target 110. By way of example only, according to step 1804 in
Disclosed embodiments may include “regulating the at least one electromagnetic radiation source such that the main pulse has an intensity at the target of at least 1018 W/cm2.” The main pulse may have an intensity at the target of at least about 1020 W/cm2. By way of example only, according to step 1806 in
Disclosed embodiments may further include “regulating the at least one electromagnetic radiation source such that a time separation between the preliminary pulse and the main pulse is between 0.5 ns and 50 ns.” The time separation between the preliminary pulse and the main pulse may be determined based on the desired properties of the pulsed beam of charged particles. By way of example only, according to step 1808 in
Disclosed embodiments may further include “confirming that, during the time separation, the target is free from irradiation exceeding an energy flux threshold.” By way of example only, according to step 1810 in
In embodiments like those discussed with reference to
In contrast to conventional particle therapy systems that use single-energy accelerators to create substantially monoenergetic beams, the pulsed particle beam generated from target-laser interactions is polyenergetic, with a notably larger energy spread. An exemplary particle energy profile of the particle beam is depicted in
In disclosed embodiments, a particle therapy system (e.g., system 100) may include an interaction chamber (e.g., interaction chamber 108) configured to contain a target (e.g., target 110). The particle therapy system may also include an energy source (e.g., electromagnetic radiation source 102) configured to generate a pulsed electromagnetic radiation beam (e.g., electromagnetic radiation beam 104) for irradiating the target and to thereby produce a polyenergetic particle beam (e.g., particle beam 112) containing multiple energy levels that span an energy range at least about 5 MeV. The particle therapy system may additionally include a data interface (e.g., data interface 510) configured to receive data associated with a treatment plan for a tumor (e.g., treatment volume 120). The particle therapy system may further include a at least one processor (e.g., control system 122) configured to enable selection of a subset of the multiple energy levels to conform with a treatment plan for the tumor. The particle therapy system may also include a magnetic beamline (e.g., beamline 114) configured to deliver to the tumor a portion of the polyenergetic particle beam associated with the selected subset of multiple energy levels.
Consistent with the present disclosure, particle therapy system 100 may provide the desired energy levels of the charged particles. Particle beam 112 may include charged particles with multiple energy levels spanning at least 5 MeV (e.g., at least 10 MeV, at least 25 MeV, or at least 50 MeV). Consistent with the present disclosure, the term “charged particles with energy levels spanning at least X MeV” means the energies of the charged particles may spread between Y MeV and Y+X MeV or more when the energies of the charged particles are measured at full width at half maximum (FWHM). When it said that particle beam 112 contains multiple energy levels spanning at least about 5 MeV, for example, it means when the charged particles are protons, they may have energies at FWMH ranging from about 60 MeV to 65 MeV (or more than 65 MeV), from about 100 MeV to 105 MeV (or more than 105 MeV), from about 120 MeV to 125 MeV (or more than 125 MeV), and so on. Throughout the specification, the listed example energies may refer to protons. One skilled in the art would recognize that, for ions, the values of the energies may be adjusted. For example, particle beam 112 may include ions with multiple energy levels spanning at least 5 MeV/nucleon (e.g., at least 10 MeV/nucleon, at least 25 MeV/nucleon, or at least 50 MeV/nucleon).
System 100 selects a subset of the multiple energy levels that conforms with a treatment plan for the tumor. As used in this specification, the term “treatment plan” may refer to any information that can be used directly or indirectly to prescribe a particle treatment. For example, in some embodiments, a treatment plan may include data associated with one or more treatment parameters, such as a tumor-related parameter (e.g., the location and size of the tumor), a target-related parameter (e.g., the composition, shape, size, structure, or orientation of the target), a dose, a dose rate, a gantry position, a gantry speed, a collimator position, a beam energy, a beam-on condition, a beam-off condition, a patient support position, or other relevant parameters. The treatment plan may be used to carry out at least a portion of the treatment session, and such information may be derived from one or more treatment parameters, including those listed above.
As described with reference to
In some embodiments, beamline 114 may include a beam dump for disposing of charged particles with energy level other than the selected energy band and/or an energy degrader for reducing the energy of the particles with the energy levels higher than the selected subset of the multiple energy levels to a level within the selected subset of the multiple energy levels. The energy degrader may be used to reduce energy and/or flux of the charged particles with energy level other than the selected energy band. To filter particle beam using an energy degrader, charged particles may be diverted through the degrader, where they interact with the degrader. Charged particles transmitted through the degrader along the trajectory of the particle beam then have reduced energies. Other charged particles may either be absorbed by the energy degrader or diverted from the trajectory of the particle beam. An energy degrader may include, for example, carbon, plastics, beryllium, metals such as copper or lead, or any material that is effective at reducing the energy or flux of a particle beam. An energy degrader may also consist of any shape effective at reducing the energy or flux of the particle beam, including a wedge, a double wedge separated by a gap (which may be filled with air or another material), a cylinder, a rectangle, or any other material or configuration capable of degrading the beam.
A conventional Energy Selection System (ESS) may include a dipole bending magnet and a slit. Charged particles passing through the dipole bending magnet are deflected according to their energies, and the slit selects a subset of energies. In one embodiment, system 100 may include a particle separator for stratifying the polyenergetic particle beam 112 into a plurality of sub-beams. The selection of the subset of the multiple energy levels may include using the particle separator to stratify the polyenergetic particle beam 112 into a plurality of sub-beams with desired energy levels. Doing so may enable beamline 114 to concurrently deliver a first part of the plurality of sub-beams to patient 118 and avoid delivering a second part of the plurality of sub-beams to patient 118. In a first embodiment, a particle separator may include at least one dipole magnet and an adjustable, multi-slit array. In a second embodiment, a particle separator may include a focusing magnet and a collimator.
Disclosed embodiments may include “generating a pulsed electromagnetic radiation beam for irradiating a target and to thereby produce a polyenergetic particle beam containing multiple energy levels spanning at least 5 MeV.” The target may be hydrogen-rich, and the polyenergetic particle beam may include protons. Alternatively, the target may be carbon-rich, and the polyenergetic particle beam may include carbon ions. By way of example only, according to step 2102 in
Disclosed embodiments may further include “receiving data associated with a treatment plan for a tumor.” As discussed earlier, the treatment plan may be received using a communications network from a remote source. By way of example only, according to step 2104 in
Disclosed embodiments may further include “selecting a subset of the multiple energy levels that conforms with a treatment plan for the tumor.” As discussed above, the subset of the multiple energy levels may contain multiple energy levels spanning between about 0.1 MeV to 50 MeV. By way of example only, according to step 2106 in
Disclosed embodiments may further include “delivering to the tumor a portion of the polyenergetic particle beam associated with the selected subset of multiple energy levels.” As discussed earlier, the electromagnetic radiation source may cause simultaneous emission of a plurality of charged particles at differing energy levels each time the target is irradiated, and the magnetic beamline may be configured to concurrently deliver multiple charged particles at differing energy levels to a treatment volume. For example, using only particles generated concurrently from an irradiation of the target, the magnetic beamline may deliver to a first tumor location a first group of charged particles associated with a first energy level and deliver to a second tumor location a second group of charged particles associated with a second energy level. By way of example only, according to step 2108 in
The foregoing description has been presented for purposes of illustration. It is not exhaustive and is not limited to the precise forms or embodiments disclosed. Modifications and adaptations will be apparent to those skilled in the art from consideration of the specification and practice of the disclosed embodiments. Additionally, although aspects of the disclosed embodiments are described as being stored in memory, one skilled in the art will appreciate that these aspects can also be stored on other types of computer-readable media, such as secondary storage devices, for example, hard disks or CD ROM, or other forms of RAM or ROM, USB media, DVD, Blu-ray, other optical drive media, or remote storage locations accessible over a network.
Computer programs based on the written description and disclosed methods are within the skill of an experienced developer. The various programs or program modules can be created using any of the techniques known to one skilled in the art or can be designed in connection with existing software. For example, program sections or program modules can be designed in or by means of.Net Framework,.Net Compact Framework (and related languages, such as Visual Basic, C, etc.), Java, C++, Objective-C, HTML, HTML/AJAX combinations, XML, or HTML with included Java applets.
Moreover, while illustrative embodiments have been described herein, the scope of any and all embodiments having equivalent elements, modifications, omissions, combinations (e.g., of aspects across various embodiments), adaptations and/or alterations as would be appreciated by those skilled in the art based on the present disclosure. The limitations in the claims are to be interpreted broadly based on the language employed in the claims and not limited to examples described in the present specification or during the prosecution of the application. The examples are to be construed as non-exclusive. Further, the steps of the disclosed methods may be modified in any manner, including by reordering steps and/or inserting or deleting steps. It is intended that the specification and examples be considered as illustrative only, with a true scope and spirit being indicated by the following claims and their full scope of equivalents.
This application claims the benefit of priority of U.S. Provisional Pat. Application No. 62/988,172, filed on Mar. 11, 2020, which is incorporated herein by reference in its entirety.
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/US2021/021682 | 3/10/2021 | WO |
| Number | Date | Country | |
|---|---|---|---|
| 62988172 | Mar 2020 | US |
