The subject-matter disclosed herein relates to systems and methods for performing localized electroless nickel plating.
Typically, in order to provide corrosion and/or improve resistance of a metal piece to be used as a mechanical component, the metal piece is subjected to a nickel-plating process. In general, the nickel-plating process is a process of depositing a layer of nickel onto a metal piece.
The process can use the electroplating technique or be electroless. Typically, according to the nickel electroplating, the metal piece is used as the cathode and is immersed into an electrolyte solution wherein the nickel anode is immersed; when electricity flows, the nickel anode forms nickel ions which travel from the anode, through the electrolyte solution and deposit on the cathode, i.e. on the metal piece. On the other hand, electroless nickel plating does not involve the use of electricity: the metal piece is immersed into a plating bath and the deposition of nickel is made by chemical reaction.
However, the repair of the coating of some metal pieces by immersing the piece in a liquid bath is particularly difficult: for example, the portion that has been damaged or worn may be a small portion of the whole piece and therefore it is neither easy nor advantageous to immerse the piece in the liquid bath. Even if, in some cases, it could be impossible to disassemble a damaged portion of the metal piece, for example the blade of an impeller, the whole piece has to be removed from a machine, disassembled and immersed.
It would be desirable to be able to locally repair the surface coating of a metallic piece, without subjecting the whole metallic piece to a nickel-plating process. In particular, it would be desired to locally repair without removing or disassembling the metallic piece.
According to an aspect, the subject-matter disclosed herein relates to a system for performing electroless nickel plating on a portion of a metallic piece; a chamber is configured to be fixedly coupled to the metallic piece, so that the portion of the metallic piece and the chamber define a closed volume, and to receive, feed and discharge at least a plating fluid so that plating occurs.
According to another aspect, the subject-matter disclosed herein relates to a method for performing localized electroless nickel plating on a portion of a metallic piece, comprising the steps of:
A more complete appreciation of the disclosed embodiments of the invention and many of the attendant advantages thereof will be readily obtained as the same becomes better understood by reference to the following detailed description when considered in connection with the accompanying drawings, wherein:
According to an aspect, the subject-matter disclosed herein relates to a system for locally depositing a layer of nickel plating on a portion of a metallic piece without using electricity. The portion of the metallic piece is to be intended as a surface portion of a whole metallic piece. In fact, the chamber does not surround the whole piece or the whole surface of the piece. The system has a chamber, for example in the form of a jar or a bowl or a shell or a cylindrical can or a sheet, or other form of receptacle, with an inlet and an outlet which can be fixed to the metallic piece, for example with an adhesive or a magnet or a weight. When the chamber is fixed to the metallic piece, it forms a closed volume which can house and feed one or more fluids that are supplied to the volume through the inlet of the chamber and are discharged from the volume through the outlet of the chamber, advantageously in a continuous way. The chamber walls can have a consistent thickness or a variable thickness, and the height of the chamber can vary from different points or segments relative to the metallic piece. At least a first fluid is supplied to the volume is a plating fluid which reacts with a portion (or surface portion) of the metallic piece under the chamber and which forms locally a deposited layer of nickel, i.e. nickel plating. In at least one embodiment, the metallic piece and/or the chamber and/or the plating fluid is heated up to at least 80° C., preferably up to 85° C.-95° C., more preferably up to 88° C.-92° C.
According to another aspect, the subject-matter disclosed herein relates to a method for locally depositing a layer of nickel, i.e. locally forming nickel plating, on a portion of a metallic piece (without using electricity) by flowing a plating fluid on this portion. Preferably, the above-mentioned system may be used for this operation. Advantageously, during the operation, the metallic piece and/or the chamber of the system and/or the plating fluid is heated up to at least 80° C., preferably up to 85° C.-95° C., more preferably up to 88° C.-92° C.
Reference now will be made in detail to embodiments of the disclosure, examples of which are illustrated in the drawings. The examples and drawing figures are provided by way of explanation of the disclosure, and should not be construed as a limitation of the disclosure. In fact, it will be apparent to those skilled in the art that various modifications and variations can be made in the present disclosure without departing from the scope or spirit of the disclosure. In the following description, similar reference numerals are used for the illustration of figures of the embodiments to indicate elements performing the same or similar functions. Moreover, for clarity of illustration, some references may be not repeated in all the figures.
In
With non-limiting reference to
The inlet 11 is configured to supply the first fluid into the volume V and the outlet 12 is configured to discharge the first fluid from the volume V. Advantageously, the inlet 11 is located in a lower portion of the chamber 10 (with respect to a surface of the portion of the metallic piece when the chamber is in an operating condition) and the outlet 12 is located in an upper portion of the chamber 10 (with respect to the surface of the portion of the metallic piece when the chamber is in the operating condition). As it will be apparent from the following, the type and amount of fluid supplied to the volume V may vary, but the volume V is supplied at least with a plating fluid 52. In particular, known plating fluids, already used in plating baths, can be used to deposit a layer of nickel plating on the portion of the metallic piece 1000 under the chamber 10. Advantageously, the plating fluid 52 contains nickel and phosphorus, so that the plating fluid 52 may create an alloy of phosphorus in a range of 10-13% by weight with respect to nickel. For example, the plating fluid 52 may contain 21 g/l of nickel sulfate and 24 g/l of sodium hypophosphite. Advantageously, the plating fluid 52 is an acid solution having pH in the range of 4.3-4.6.
It is to be noted that a chemical reaction is performed in the volume V when the plating fluid 52 is in contact with the portion of the metallic piece 1000 under the chamber. In particular, when the chemical reaction occurs, gas bubbles are released inside the plating fluid 52. Advantageously, at least a portion of the chamber 10 can be made of a transparent or translucent material, so that an operator can check (in particular visually monitor) the progress of the reaction for example by controlling the release of the bubbles in the plating fluid 52.
As shown in
As previously indicated, the chamber 20 may be flexible, in particular in the form of a sheet or a shell laid on the portion of the metallic piece 1000 as shown in
The system 100 or 200 may comprise further a fixing member 15 or 25, for example an adhesive or a magnet or a weight, configured to fixedly coupled the chamber 10 or 20 to the metallic piece 1000. If the chamber is rigid, for example in the form of ajar as shown in
The system 100 or 200 may comprise further a sealing member attached to the chamber 10 or 20 and configured to surround the portion of the metallic piece 1000.
As already mentioned, the volume V of the chamber may contain different fluids which, in some cases, are supplied to the chamber one after the other. In addition to the plating fluid 52, the volume V may be configured to receive also an alkaline fluid 53 (such as NaOH) and/or an acid fluid 54 (such as diluted HCl); advantageously, the chamber is resistant to these fluids 53 and/or 54. As it will be apparent from the following, the alkaline fluid 53 and/or the acid fluid 54 may be used to prepare the portion of the metallic piece to be treated with electroless nickel plating, in particular cleaning the surface with the alkaline fluid 53 and activating the surface with the acid fluid 54. Advantageously, the volume V may be further configured to receive and discharge water, which can be used to wash the chamber between one fluid and the next one.
With non-limiting reference to
Advantageously, the recirculating circuit 50 may comprise further a particulate filter (not shown in the figures). The particulate filter may filter the solid particles which may be present or created in one or more of the fluids 52, 53, 54 during the process.
According to another aspect, the subject-matter disclosed herein refers to a method for performing electroless nickel plating on a portion of a metallic piece. With non-limiting reference to
As already mentioned, the metallic piece may be covered with a rigid or a flexible chamber, depending for example on the shape of the metallic piece or the location of the portion of the metallic piece to be covered: for example, if step B is performed on a corner of a metallic piece, a flexible chamber may be used, preferably in the form of a sheet or a shell.
Preferably, the step C is performed by a fixing member of the chamber, in particular an adhesive or a magnet or a weight.
It is to be noted that step F and step G may be performed once or may be repeated several times. Advantageously, step F and step G are performed simultaneously, so that the plating fluid is continuously supplied into and discharged from the volume V of the chamber.
With non-limiting reference to
It is to be noted that step D and step E may be performed once or may be repeated several times. Advantageously, step D and step E are performed simultaneously, so that the cleaning fluid is continuously supplied into and discharged from the volume V of the chamber. And in some cases, the repetition(s) of step D and step E is performed with a different cleaning fluid. For example, the first time step D and step E are preformed they may be performed with an alkaline fluid, the second time step D and step E are performed they may be performed with water and the third time step D and step E are performed they may be performed with an acid fluid.
Furthermore, steps D, E, F and G may be performed continuously, i.e. without removing the chamber from the metallic piece, so that the portion of the metallic piece to be treated is not exposed to air between one step of the method and the next one, thus avoiding oxidation of the portion which may create for example defects.
With non-limiting reference to
With non-limiting reference to
It is also to be noted that step I of heating (see block 390 in
Number | Date | Country | Kind |
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102021000033113 | Dec 2021 | IT | national |
Filing Document | Filing Date | Country | Kind |
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PCT/EP2022/025594 | 12/23/2022 | WO |