1. Field of Invention
This invention pertains generally to the production of carbon nanomaterials and, more particularly, to a system and process for functionalizing graphene.
2. Related Art
Carbon graphenes have a number of unique and desirable qualities, including extraordinary surface area, high electrical conductivity and capacitance, high thermal and mass transfer capability, magnetic properties, and extraordinary values of tensile strength and modulus of elasticity. With such attributes, carbon graphene structures are attractive to a number of important technologies and markets, including electrolytic storage media for lithium ion batteries and ultra capacitors, facilitated transport membranes for micro filtration, catalytic substrate materials, heat transfer materials for use in cooling light-emitting diodes (LEDs) and other applications, high frequency semiconductors capable of operating at frequencies as high as 100 gigahertz or more, hydrogen storage, conductive materials for flatscreen and liquid crystal displays (LCDs), and strengthening agents for advanced materials in wind turbines and automobiles.
There are a number of known methods for producing graphenes, including chemical vapor deposition, epitaxial growth, micro-mechanical exfoliation of graphite, epitaxial growth on an electrically insulating surface, colloidal suspension, graphite oxide reduction, growth from metal-carbon melts, pyrolysis of sodium ethoxide, and from nanotubes. However, these processes have limitations and disadvantages, including a dependency on relatively scarce, highly crystalline graphite feedstock, high cost, and limited scalability. Because of these limitations, the known methods may not be capable of providing a dependable supply of low cost graphenes with high volumes of production, and none of them appears to be suitable for producing graphenes on a commercial scale.
It is, in general, an object of the invention to provide a new and improved system and process for functionalizing graphene.
Another object of the invention is to provide a system and process of the above character which overcome the limitations and disadvantages of systems and processes heretofore provided.
These and other objects are achieved in accordance with the invention by providing a system and process in which graphene is highly purified, then functionalized in a vertical plasma reactor which can also deagglomerate and/or delaminate the graphene, as well as separating or classifying the functionalized graphene particles according to size. In some of the disclosed embodiments, the graphene is produced by combustion of magnesium (Mg) and carbon dioxide (CO2) in a highly exothermic reaction. The graphene is separated from the other reaction products and purified in a series of washing, heating, and drying steps, following which it is functionalized and otherwise processed in the plasma reactor.
In the embodiment illustrated in
One particularly preferred process for producing graphene is described in detail in U.S. Pat. Nos. 8,377,408 and 8,420,042, the disclosures of which are incorporated herein by reference. In that process, magnesium and carbon dioxide are combusted together in a highly exothermic reaction to produce carbon and magnesium oxide (MgO) products which are then separated and purified. This process is highly scalable and capable of producing graphenes of high purity and quality on a commercial basis.
The reaction also produces a mixture of carbon and MgO products which are delivered to a grinder or blender 17 where they are reduced to finer particles and prepared for further processing. The ground-up particles are washed first with deionized water 18 and then with hydrochloric acid (HCl) 19. The carbon graphenes are inert to HCl, but the HCl reacts with unreacted magnesium in the mixture as well as the dissolved MgO and Mg(OH2) to form magnesium chloride (MgCl2) and water (H2O).
The solution of carbon graphenes and MgCl2 is filtered in a Büchner vacuum filter 21 to separate the graphenes from the MgCl2. The graphenes are dried at a temperature on the order of 90° C. in a low temperature oven 22, then further purified in a high temperature furnace 23 operating at a temperature on the order of 1600° C. The graphene particles are then once again washed with HCl and water at 24, then further separated in a second Büchner vacuum filter 26. The graphene particles from the second filter are dried in a low temperature oven 27 and collected at 28.
Another embodiment of a process for separating and purifying the carbon and Mg reaction products is illustrated in
Prior to acid washing, reaction products 31 are screened and ground to provide particles of the desired size for further processing. Thus, the products first go through a screening stage 38, and particles that are too big to pass through the screen are delivered to a grinding stage 39 where they are ground into finer particles which are fed back to the screen. The particles which pass through the screen are delivered to mixing reservoir 32. In applications where the reactor products do not require screening and grinding, those steps can be omitted, and the reactor products can be fed directly to the mixing reservoir.
The acid washing is done with a diluted HCl solution that is prepared from concentrated HCl and deionized water from tanks 41, 42 and stored in a holding reservoir 43, with a valve 44 between the holding and mixing reservoirs.
The acid washing process is initiated by opening valve 44 and introducing the diluted HCl solution into the mixing reservoir. When the desired amount of solution has been introduced, valve 44 is closed, valve 36 is opened, and pump 34 is turned on to circulate the aqueous solution from the mixing reservoir through inline static mixer 33 and back to the mixing reservoir. The reactor product particles are introduced into the circulating solution and mixed with it as the solution continues to circulate around the loop that includes the reservoir, pump, and mixer.
Upon completion of the acid washing cycle, the aqueous solution and graphene particles are pumped through another valve 46 to a filtration system 47 where the graphene particles are separated from the solution. In a presently preferred embodiment, the filtration system includes a Büchner vacuum filter, and the pumping continues until the majority of the solution has been drained from the reservoir and mixer.
Deionized water from a tank 48 is then delivered to the pump through a valve 49 and flushed through the filtration system to neutralize the aqueous solution in it. Once the solution has been neutralized, water valve 49 is closed, the pump is turned off, and valve 46 is also closed.
Pressurized air from a tank 51 is then introduced into the filtration system through an air valve 52 to air dry the graphene particulate in the filter. When the drying operation has been completed, the filter element and the dried graphene particles 53 are removed from the filter housing, and the aqueous MgO/HCl solution 54 is drained from the housing.
The air dried graphene is then placed in a low temperature drying oven 56 to complete the drying process and ensure the removal of all moisture from it.
The aqueous MgO/HCl solution produced by the process can be used in producing MgCl2 that can be used as feed stock for an electrolytic cell to make magnesium metal.
The embodiment of
In the embodiment of
The acid washing cycle in this embodiment is initiated by opening valve 44 to admit the dilute HCl solution to the mixing reservoir, then closing the valve and turning on the mixer. The reactor product particles are then introduced into the mixer, and the mixing continues until the acid wash process is completed.
When the acid wash is completed, valve 62 is opened, and the pump is turned on to transfer the aqueous solution and graphene particles from the mixer reservoir to the filtration system. As in the previous embodiment, the pumping continues until the majority of the solution has been drained from the reservoir. The filter is then flushed with deionized water from tank 48, after which valve 62 is closed, the pump is turned off, and the graphene particles in the filter are dried with pressurized air from air tank 51. The air dried graphene particles are removed from the filter and placed in low temperature drying oven 56 to complete the moisture removal process.
In the embodiment of
The aqueous MgCl2 solution and carbon graphenes are filtered in a vacuum filter 69 to separate the graphenes from the MgCl2. The graphenes are dried in a dryer 71 and recycled back through the sonification, filter, dryer, and heating stages to further purify them. The number of times the graphenes are recycled is determined by the level of purity desired, and is typically on the order of three or four times per cycle batch. When the purification process is completed, the graphenes are discharged through a product line 72.
Magnesium oxide (MgO) produced by the Mg—CO2 reaction is collected and converted to magnesium which is recycled for use in the reaction. Thus, gaseous MgO from the reactor is collected and solidified in a collector 73, then washed with HCl and converted to MgCl2 in a dissolver 74. This MgCl2 is dried in a dryer 75 along with the MgCl2 that was separated from the carbon graphenes in filter 69. The dried MgCl2 is then separated into magnesium and chlorine by electrolysis in a cell 76. The magnesium is cooled in a cooler 77, then collected and ground into finer particles, e.g. 400 Mesh, in a collector and grinder 78. The magnesium particles from the grinder are fed back to reactor 66 and used in the combustion process. Although grinding is used in this particular embodiment, the magnesium can also be reduced to finer particles by other means such as cutting or cooling small droplets from a melt.
In addition to the reaction products, the combustion of CO2 and magnesium also produces substantial amounts of heat and energy which are captured and utilized in other steps of the process, such as sonification and drying, or otherwise.
Chlorine, hydrogen, and HCl utilized in the process are provided by a cell 79 to which hydrogen (H2) and methane (CH4) are supplied along with the chlorine from electrolysis cell 76.
The purified graphene from the embodiments of
The pusher oven is electrically operated and is typically operated at temperatures ranging from about 800° C. to about 1600° C. The boats are pushed through the tube in stepwise fashion, and the residence time of the boats in the oven cavity can be varied from about one half hour to as many hours as desired. With a residence time of about 4 hours, for example, the purity level of the graphene product is greater than 99 percent.
The highly purified graphene particles from the pusher oven are functionalized in a plasma reactor 96 where they can also be deagglomerated and/or delaminated, and separated or classified according to size. As illustrated in
An inlet section 102 extends between the bottom of the grinder and the top of the tower, with a filter 103 at the bottom of the inlet section for passing particles of the desired size to a reactor chamber 104 within the tower. The inlet section includes a discharge chute 106 for particles that are too large to pass through the filter. The inlet section and discharge chute are provided with vacuum interlocks 107, 108 which allow the particles to pass while maintaining a vacuum within the reactor.
A second filter screen 111 is provided at the lower end of the tower with a first outlet 112 below the screen for particles passing through the screen and a second outlet 113 above the screen for particles that do not pass through it. Vacuum interlocks 114, 116 allow the particles to pass through the outlets while maintaining the vacuum within the reactor. Output filter 111 is chosen in accordance with the size of the particles to be produced and corresponds generally to the size of input filter 103. Thus, for example, with a 200 micron input filter, the output filter might have a size of 300 microns.
Vibrators 117 are mounted on the outer side of tower wall 97 to prevent the graphene material from adhering to the chamber walls.
Plasma generating electrodes 118 extend vertically within the reactor chamber and are supported by a lower electrode support 119, an upper electrode support 121, and a middle electrode support 122. A DC voltage VE on the order of 15 KV to 35 KV is applied between the electrodes and the reactor wall 97.
Inlet ports 123, 124, and 126 are provided for the introduction of gases for ionization in the chamber to form a plasma for functionalizing the graphene particles. The gases are chosen in accordance with the desired functions, and different gases can be used in different regions of the chamber.
Suitable gases for functionalizing the graphene include oxygen, nitrogen, water vapor, hydrogen peroxide, carbon dioxide, ammonia, ozone, carbon monoxide, silane, dimethysilane, trimethylsilane, tetraetoxysilane, hexamethyldisioxane, chloro-silanes, fluoro-silanes, ethylene diamine, maleic anhydride, arylamine, acetylene, methane, ethane, propane, butane, ethylene oxide, hydrogen, air, sulfur dioxide, hydrogen, sulfonyl precursors, argon, helium, alcohols, methanol, ethanol, propanol, carbon tetrafluoride, carbon tetrachloride, carbon tetrabromide, chlorine, fluorine, bromine, and combinations thereof.
With inlet ports 123, 124, and 126 being spaced apart along the length of the reactor, different gases can be introduced through different ones of the ports and ionized to form different plasmas in different regions of the reactor. This allows the graphene particles to be functionalized in different ways, with different gases becoming attached, or adhering, to the reactive sites as the particles drop or fall through the chamber. Examples of gases in different functional groups that can be used in functionalizing the graphene are listed in the table below.
A vacuum pump (not shown) is connected to a vacuum port 127 for maintaining a partial vacuum in the reactor chamber, and cryogenic gases can be introduced into the chamber through a cryogenic port 128 to cool the reactor and deagglomerate graphene clusters, if necessary. With the plasma functionalization process, deagglomeration can increase the surface area of the graphene that is exposed to the plasma and functionalized. In applications where deagglomeration is not required, the cryogenic port can be omitted, if desired.
Another optional feature is a liquid injection port 129 which is positioned toward the lower end of the reaction chamber and can be utilized for introducing liquid into the lower portion of the chamber to direct the functionalized graphene particles toward the output filter and thereby aid in the collection of the particles.
Operation and use of the plasma reactor of
Graphene particles 99 are introduced into the reactor through hopper 98 and grinder 101, with the smaller particles dropping through inlet filter 103 and the larger particles being diverted through discharge chute 106 where they are collected and returned to the hopper.
The particles passing through the filter continue to fall vertically between the electrodes and through the plasma in the chamber. The residence time of the particles in the plasma is determined primarily by the height of the tower or length of the chamber, and vibrators 117 prevent the particles from adhering to the chamber walls.
When the particles reach the bottom of the chamber, the smaller ones pass through outlet filter 111 and outlet 112 where they are collected. Particles that are too big to pass through the filter exit the chamber through outlet 113. Thus, the particles are separated or classified according to size.
If deagglomeration of graphene clusters is necessary, a cryogenic gas can be introduced into the chamber through cryogenic port 128 to cool the chamber and, together with the high voltage applied to the electrodes, break up the clusters without further disintegration of the particles. If deagglomeration is not needed, the cryogenic port remains closed, and the gas is not used.
If the graphene is in discrete layers with random orientation, the high DC voltage in the chamber can also produce a delamination of the particles by generating heat between the layers or by applying an instantaneous different charge to the layers that causes them to separate. The Van De Whals forces are not strong enough to keep the particles together.
If needed, a liquid can be introduced through injection port 129 to flush the functionalized, deagglomerated, and/or delaminated graphene particles through the outlet filter for separation or classification by size.
In another embodiment, the reactor could have a torroidal shape, and the material to be functionalized could be spun continuously through the torroidal chamber and the plasma formed therein. This embodiment can have all of the features of the vertical reactor, but the residence time of the particles in the plasma is not limited by the length of the reactor and can be whatever is needed or desired.
The invention has a number of important features and advantages. It provides graphenes that are highly purified and functionalized. The process is highly scalable and capable of producing graphene on a commercial scale. The combination of washing, heating, and drying the graphene particles results in a product having a purity greater than 99 percent, and with the long, vertical reactor, the graphene particles can be functionalized in different ways by different plasmas as they drop through the reactor. The reactor also has the ability to deagglomerate and/or delaminate the graphene particles and expose more surface area to the plasma. It also serves as a particle separator in which the functionalized particles are separated or classified according to size.
It is apparent from the foregoing that a new and improved system and process for functionalizing graphene have been provided. While only certain presently preferred embodiments have been described in detail, as will be apparent to those familiar with the art, certain changes and modifications can be made without departing from the scope of the invention, as defined by the following claims.
Provisional Application No. 61/682,182, filed Aug. 10, 2012, the priority of which is claimed. Continuation-in-part of application Ser. No. 13/864,080, filed Apr. 16, 2013, which is a continuation-in-Part of application Ser. No. 13/237,766, filed Sep. 20, 2011, now U.S. Pat. No. 8,420,042, a continuation-in-part of application Ser. No. 13/090,053, filed Apr. 19, 2011, now U.S. Pat. No. 8,377,408.
Number | Date | Country | |
---|---|---|---|
61682182 | Aug 2012 | US |
Number | Date | Country | |
---|---|---|---|
Parent | 13864080 | Apr 2013 | US |
Child | 13964844 | US | |
Parent | 13237766 | Sep 2011 | US |
Child | 13864080 | US | |
Parent | 13090053 | Apr 2011 | US |
Child | 13237766 | US |