The present disclosure relates to a system for relative movement between two plates and to a positioning device comprising such a movement system.
More particularly, though not exclusively, the present disclosure applies to a precise positioning device (or machine) for the semiconductor and electronics industry, in particular for the etching of printed circuits or semiconductors.
The purpose of this system is to allow relative movement between two generally planar plates which are substantially parallel to each other, relative to a given plane. This relative movement generally relates to a “vertical” movement, that is to say, orthogonal to said plane, which is associated with stiffness in said plane.
The decoupling means are generally complex and relatively bulky.
This summary is provided to introduce a selection of concepts in a simplified form that are further described below in the Detailed Description. This summary is not intended to identify key features of the claimed subject matter, nor is it intended to be used as an aid in determining the scope of the claimed subject matter.
The present disclosure relates to a movement system of this type that makes it possible to overcome these drawbacks and, in particular, to enable advantageous optimization of various parameters according to the intended application.
To this end, according to the disclosure, said system for relative movement between two planar plates that are substantially parallel to an XY plane defined by a direction referred to as the X direction and a direction referred to as the Y direction is remarkable in that it comprises a first unit that is configured to allow a relative movement between the two plates in a Z direction, which is orthogonal to the XY plane, and to independently prevent a relative movement between the two plates in the XY plane, and a second unit that is configured to allow one plate to relatively travel with respect to the other plate about the X and Y directions.
Thus, by virtue of the disclosed system, stiffness is generated in the XY plane that is independent of the position in Z, which allows long travel distances in Z. Independence of the functions is provided, which enables optimization of various parameters according to the application in question (mass of the system, size, amplitude of the rotations and of the translation, required stiffness, etc.).
The presently disclosed system is more particularly suitable for microelectronics.
In the context of the present disclosure, the first and second units may be produced in various ways. In particular, said first unit may advantageously comprise one of the following assemblies:
Furthermore, said second unit advantageously comprises one of the following assemblies:
Moreover, in a first variant, the movement system comprises a third unit that is configured to prevent the plates from moving about the Z direction. Advantageously, said third unit comprises one of the following assemblies:
Furthermore, in a second variant, the movement system comprises a fourth unit that is configured to allow movement about the Z direction. Advantageously, the fourth unit comprises one of the following assemblies:
Moreover, in a particular embodiment:
The present disclosure also relates to a positioning device that comprises a movement system as described above.
The foregoing aspects and many of the attendant advantages of this disclosure will become more readily appreciated as the same become better understood by reference to the following detailed description, when taken in conjunction with the accompanying drawings, wherein:
The accompanying figures will give a clear understanding as to how the disclosed system can be implemented. In these figures, identical references designate similar elements.
The system 1 (hereinafter referred to as “movement system 1”) that is depicted in
These two plates 2 and 3 are arranged substantially in parallel with an XY plane that is defined by a direction referred to as the n X direction and a direction referred to as the Y direction. When the two plates 2 and 3 are in a neutral position, they are both completely parallel to the XY plane.
These X and Y directions form part of a frame of reference R (or XYZ) that is depicted in
For reasons of clarity, the frame of reference R detailed in
The adjectives “upper” and “lower” in the following description apply with respect to the direction defined by the arrow of the Z direction, “upper” being in the direction (+z) of the arrow and “lower” being in the opposite direction (−z).
The plate 2 that is arranged under the plate 3, in the direction thus defined, is referred to as “the lower plate”, and the plate 3 is referred to as “the upper plate”. The lower plate 2 may be fixed to a support element (not shown) by means of fixing means, for example screws that pass through holes 6 that are visible in the plate 2 (
As for the plate 3, this can support particular elements, which may be fixed thereto, by means of fixing means, for example screws that pass through holes 7 that are visible in the plate 3 (
The plate 3 comprises three similar plate portions 8A, 8B and 8C that are generally radial and have a general shape that narrows outwards (radially with respect to the Z axis). These three plate portions 8A, 8B and 8C are connected together so as to be uniformly distributed about the Z direction.
In a preferred application, the movement system 1 that comprises these two plates 2 and 3 forms part of a precise positioning device (or machine) for the semiconductor and electronics industry, in particular for the etching of printed circuits or semiconductors.
According to the invention, said movement system 1 comprises:
“Relative movement” is understood to mean a movement of one of said plates 2 and 3 with respect to the other.
The unit 5 may produce as required:
The units 4 and 5 may be produced in various ways, as described below.
Thus, by means of the units 4 and 5, stiffness is generated in the XY plane that is independent of the position of the plate 3 in Z with respect to the plate 2, that is to say the relative position between the two plates 2 and 3, which allows long travel distances in Z.
In the movement system 1, independence of functions is provided, which enables optimisation of the various parameters according to the intended application (mass of the system, size, amplitude of the rotations and of the translation in Z, required stiffness, etc.).
The present invention is particularly suitable for microelectronics. This is because the equipment for positioning components, including plates or semiconductors (wafers), under lenses, requires the following mechanical features: stiffness in the X and Y axes to guarantee short stabilisation times during highly dynamic movements, movements in Z for adapting focal distances, and adjustment of the angular position of the plane of the object having the focal plane.
As shown in
For this purpose, in the example depicted, the unit 4 comprises two ball bushings 10 and 11 that enter a support 12 mounted so as to project with respect to the plate 2, as can be seen in particular in
This support 12 has an elongate shape having a cylindrical internal recess 13, of which the axis is parallel to the Z direction, and a conical external contour 14 that broadens towards the lower end 15 and comprises an annular rim 16 provided at its lower end 15 (
The two similar ball bushings 11 and 12 are mounted coaxially inside the cylindrical recess 13, one above the other in the Z direction.
The plate 3 is connected to an upper end of a solid cylinder 19 (
The solid cylinder 19 can slide in the Z direction. Given that the solid cylinder 19 is rigidly secured to the plate 3 and the support 12 is rigidly secured to the plate 2, this sliding represents vertical guidance in the Z direction between the plate 3 and the plate 2. In addition, a relative movement is prevented in the XY plane.
Furthermore, in the example depicted in the figures, the unit 5 comprises a decoupling-blade assembly 22. This decoupling-blade assembly comprises an external annular structure 23 that is fixed to a rim 24 of the plate 3 (
The decoupling-blade assembly 22 comprises a disc 25 provided for example with four blades 26A, 26B, 26C, 26D that are uniformly distributed about the Z axis and join one other in a central portion 28 (
Owing to the blades 26A to 26D, the decoupling-blade assembly 22 has a certain flexibility. This flexibility allows a slight movement of the plate 3 with respect to the plate 2, about X and Y axes, as illustrated by the angles θX and θY on the frame of reference R (
The unit 4 may be produced in various ways, including the preferred way depicted in the figures. By way of illustration, said first unit 4 may comprise:
The unit 5 may also be produced in various ways, including the preferred way depicted in the figures. By way of illustration, said unit 5 may comprise one of the following assemblies:
Moreover, in a first particular embodiment, the movement system 1 comprises a unit 33 that is configured to prevent a relative movement of the plates 2 and 3 with respect to each other about the Z direction.
In the example depicted in
The end 35 of the link is hinged to the plate 3 so as to able to rotate about an axis L1 parallel to the Z direction (
In addition, the link 34 is hingedly connected by its other end 36 to a support block 37 fixed to the upper face 2A of the plate 2.
The end 36 of the link 34 is hinged to the plate 2 so as to be able to rotate about an axis L2 parallel to the XY plane (
The link 34 may further comprise clearance-takeup springs.
Owing to the hinges provided, the link 34 does not prevent relative movement in Z and movements on θX and θY, but locks against rotation about the Z axis (of the plate 3 with respect to the plate 2).
The three functions of vertical guidance (along the Z axis), of rotational guidance about the X and Y axes and of locking against rotation about the Z axis are carried out by three independent units 4, 5 and 33, respectively. According to the application in question, the independence of these functions enables optimisation of various parameters, such as the mass of the system, the size, the amplitude of the rotations and of the translation, the required stiffness, etc.
The unit 33 may be produced in various ways. By way of illustration, said unit 33 may comprise one of the following assemblies:
Instead of comprising for example a very wide vertical decoupling plate, the movement system 1 comprises a central axis in Z and a small plate 3 that is flexible on θX and θY but stiff in XY and θZ.
Moreover, in a second particular embodiment, the movement system 1 comprises a unit (not shown) configured to allow a movement about the Z direction.
This unit may also be produced in various ways. By way of illustration, this unit comprises one of the following assemblies:
In this second embodiment, it is possible to control the rotation of the plate 3 with respect to the plate 2 about the Z axis by means of the aforementioned unit, which is controllable.
By way of illustration, the movement system 1 can be integrated in a positioning machine for decoupling the movements Z and OZ of a movement base XY for aligning semiconductor wafers, substrates or printed circuits, and for adjustment in Z for focusing or adaptation to semiconductor wafers, substrates or printed circuits of several thicknesses.
In a preferred application:
In addition, in a preferred application, the movement system 1 allows:
While illustrative embodiments have been illustrated and described, it will be appreciated that various changes can be made therein without departing from the spirit and scope of the invention.
Number | Date | Country | Kind |
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1552150 | Mar 2015 | FR | national |