Claims
- 1. In a process for producing capacitor grade tantalum powder wherein a tantalum compound is reduced to tantalum metal by reaction with a reducing metal, the improvement characterized by introducing the tantalum compound and the reducing metal in a continuous or incremental manner to the reactor during the course of the reduction reaction.
- 2. The process of claim 1 wherein the tantalum compound is selected from potassium fluotantalate, sodium fluotantalate, tantalum chloride, and mixtures thereof.
- 3. The process of claim 1 wherein the reducing metal is selected from sodium, potassium, and mixtures thereof.
- 4. The process of claim 1 wherein potassium fluotantalate is reduced to tantalum metal by reaction with sodium.
- 5. The process of claim 4 wherein the potassium fluotantalate is introduced into the reactor in increments ranging from about one half to about one twentieth of the total tantalum compound charge.
- 6. The process of claim 1 wherein sodium is introduced at a rate ranging from about 0.2 to about 15.0 pounds (0.09 to about 6.80 kg) per minute (60 seconds).
- 7. The process of claim 4 wherein the reduction reaction is maintained at a temperature ranging from about 600.degree. to about 950.degree. C. (873.degree. to about 1223.degree. K).
- 8. In a process for producing columbium powder wherein a columbium compound is reduced to columbium metal by reaction with a reducing metal, the improvement characterized by introducing the columbium compound in a continuous or incremental manner to the reactor during the course of the reduction reaction.
- 9. In a process for producing capacitor grade tantalum powder wherein a tantalum compound is reduced to tantalum metal by reaction with a reducing metal, the improvement characterized by introducing a solid tantalum compound in a continuous or incremental manner to the reactor with agitation during the course of the reduction reaction.
- 10. The process of claim 9 wherein the reducing metal is introduced to the reaction mixture as a unitary charge prior to the introduction of the tantalum compound.
Parent Case Info
This application is a continuation-in-part of Ser. No. 835,915 filed Mar. 4, 1986, and now abandoned.
US Referenced Citations (6)
Foreign Referenced Citations (2)
Number |
Date |
Country |
38-8 |
Jan 1963 |
JPX |
43-25910 |
Jan 1968 |
JPX |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
835915 |
Mar 1986 |
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